Center for Scalable and Integrated NanoManufacturing

Transcription

1 Nanomanufacturing Summit 2009 Center for Scalable and Integrated NanoManufacturing Li Zeng Berkeley, CA Boston, MA May 27-29, 2009 UC Berkeley UCLA Stanford MIT UNCC HP Labs NSF Nanoscale Science and Engineering Center

2 Motivation: Grand Challenges in Nanomanufacturing Modern Fabs State of the Art Current optical litho tool ($20M/tool) EUV lithography Projection e-beam lithography Nano-imprinting lithography Self assembly X-ray lithography AMD Intel Future Integrated Nano-Systems Technological Barriers Critical dimensions below 30 nm Heterogeneous integration Cost effective nano-manufacturing Ultra Compact light source & integrated photonics Nano Fluidic Circuits Ultra Sensitive Bio-sensor Terabit Memory

3 Vision and Mission A New Nano Manufacturing Paradigm that Enables the Knowledge Transfer from Lab Science to Industry Revolution Nano Industry Lab Science Nano-CAD Nano Product Hetero-integration Mission: Nano-manufacturing concept: Design, Process, and Tools Key enabling technology from Lab Science Industry Education: Engineering workforce

4 Core Research Competence Design & Modeling Bogy, Bogy, Hahn, Hahn, Lavine, Lavine, Grigoropoulos Grigoropoulos Materials Y. Y. Chen, Chen, Maynard, Maynard, Fréchet, Fréchet, G. G. Chen Chen Manufacturing Dornfeld, Dornfeld, Prinz, Prinz, Hocken, Hocken, Sun, Sun, Tsao, Tsao, Zhang Zhang Devices Majumdar, Majumdar, Ho, Ho, Yablonovitch, Yablonovitch, D. D. Ho Ho

5 Integrated Approaches Product Development Workforce Training NanoMfg Tools Societal Impact Impact IRG 1 Top-Down NanoMFG Precision Engineering IRG 2 Hybrid Topdown & Bottom-up Nano-CAD IRG 3 System Engineering Education and Outreach

6 IRG I. Top-Down Nano-manufacturing Participants: Zhang and Yablonovitch (lead), Bogy, Chen, Dornfeld, Fréchet, Grigoropoulos superlensing a High Speed Modulator (100 MHz) Laser PR Ag PMMA Quartz Cr 365 nm Illumination Compress light into deep subwavelength Air bearing Plasmonic lenses Substrate (1000s rpm) Proof of Concept (Knowledge base) Device Design (Technology base) System Engineering (Technology Integration) Deposition Etching Imprinting SiGe Si Ultra-thin mold Selective Etching

7 Plasmonic Lens Plasmonic Nano-Lithography 3 um Plasmonic Lens Contact mode NSOM, AFM tip Illustration of Plasmonic Lithography Zhang & Bogy, Sun

8 Plasmonic Nano-Lithography Plasmonic lens PNL Prototype Illumination Plasmonic Lens Disk Flying head 3 um Quartz Slider Plasmonic Lens Array Air Bearing Zhang & Bogy, Sun

9 2 cm ~2 mm

10 PNL_nano PNL_nano

11 PNL_nano Results For high-throughput maskless lithography 80 nm Line Scale-up Arbitrary Patterning 80 nm AFM image AFM image 140 nm linewidth for arbitrary 10 m/sec

12 PNL_pico PNL_pico Laser System Optical & Mechanical System Control System

13 PNL_pico Results AFM image of Semidashed lines modulated between 20 nm and 30 nm in width with 1 um period. (b) 20 nm 30 nm Linewidth ~120 nm (d) AFM image of pattern PIL with 120 nm linewidth 5 um 1 um period AFM image of ~20 nm dots with 50 nm pitch. ~20 nm dots (c)

14 IRG II. Hybrid Bottom-up and Top-down Nano-Mfg Participants: Ho (lead), Chen, Hahn, Majumdar, Maynard Parallel nano- assembling using electronic arrays Scalable Assembly of Nano-LEGOs Arbitrary patterns (UCLA) Vertical Nano- assembly in 3D 100 nm Actin Growth 70 nm Assembling of fluorescence molecules to form the word NSF 50 nm Smallest features 80 nm Amine-modified nanometer sized PEG hydro-gels

15 IRG II Research for Device Nanofluidic Channel Device With Digital Control Digital Micromirror Array Photoconductive Layer Arun Majumdar, Berkeley Optically-controllable reconfigurable nano/microchannels platform CM Ho, UCLA

16 Case Study in IRG II: Integrated Research Project: Optoelectronic reconfigurable micro-channels Increase SiO 2 thickness Nanofluidic router Au 100 nm SiO 2 Au 100nm diameter 500 nm pitch Nano-imprinting, 10 9 /inch 2 Nanoplasmonic sensors nanoburgers Ho, Y. Chen (UCLA), Zhang (Berkeley)

17 Case Study in IRG 2: Scalability Issue in Research 10 um Extracellular detection 5 um Tens of Billions daily to make the cell biologists happy! Intracellular detection Enhance fluorescence, Raman spectroscopy Study signal path way in cell, inter-cellular communication HEK cells like Nanoburgers Ho, Y. Chen (UCLA), Zhang (Berkeley)

18 IRG III System Engineering Participants: Tsao and Prinz (lead), Chen, Dornfeld, Hocken, Lavine, Zhang UMIL PIL Nanometrology FAPNA CAD/CAM Control Thermal NanoCAD Multiscale Alignment & Positioning System (MAPS)

19 MAPS: From Design to Realization Through 4 years close collaboration among researchers Design Fabricated Hardware Substrate fixture Substrate Fixture Platen

20 Key Accomplishments New Top-down Nanomanufacturing High-throughput Plasmonic Nano-Lithography (PNL) process development 80 nm PNL at a writing speed of 10 m/s! New Plasmonic Focusing lens design has sub 20 nm focusing 20 nm lines and dots have been demonstrated at 10 m/s More work need to approach the fundament limit of <10 nm Controlled Nano-assembly (Hybrid Nanomanufacturing) Demonstrated Parallel Nano-assembler using electrode arrays Sub-100 nm assembly on patterns defined combining top-down methods Controlled transport in nanochannels, reconfigurable. System Engineering Nano-Imprint Lithography (NIL) machine completed Systematic Analysis on Manufacturability and the environmental impact Completed MAPS system design, fabrication and assembly Established the building block of Nano-CAD Critical Length Scale Scalability - Integration

21 Strategic Framework- Future Plan Requirements Products Product Dev. Testbed Scale-up Mfg Testbed Design for Mfg Testbed NanoCAD PNL Tool NIL Tool CNA Tool Technology Integration Phase II Plasmonic Lens Flying Head Microelectrode New Materials array Surface Binding MultiScale Modeling MAPS Fluid Dynamics Technology Base Biology Materials Sci. Control Precision Eng. Phase I Physics Chemistry Thermal Knowledge Base

22 Nano-MFG Enabled Applications Plasmonic Structures Plasmonic Structure Nano-Mfg for Healthcare Plasmonic PV Nano-Mfg for Energy Substrate Molecules and Catalyst Plasmonic Reactors Electricity Generation (Chen, Grigoropolous, Hahn, and Prinz) Electricity Storage (Majumdar, Prinz, and Chen) Design with Quantum Nano-CAD (Prinz) Electromagnetic Simulation (Chen, Grigoropoulos) Plasmonic Nano- Manufacturing Seed fund: Gang Chen (MIT) New Lead in IRG 2

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24 Search Over Collection nanomanufacturing 24

25 FACULTY UC Berkeley Xiang Zhang Eli Yablonovitch David Bogy C. Grigoropoulos David Dornfeld Arun Majumdar Jean Frechet Acknowledgement 18 Faculties from 5 different universities 33 Graduate Students, 8 Postdocs 30 Ph.Ds, 5 Masters, 9 Undergraduates Examples from Chris Rhode, Sheng Wang, Liang Pan Spin-off UCLA Chih-Ming Ho T-C Tsao Thomas Hahn Adrienne Lavine Yong Cheng Heather Maynard Cheng Sun, Northwestern Dean Ho, Northwestern Gang Chen, MIT Robert Hocken, UNCC Fritz Prinz, Stanford Member Institutes Kalinex Inc. Industrial Partners CMMI