The Role of Universities and National Laboratories in EUV Lithography

Transcription

1 EUVL R&D Status Panel Discussion, June 11, Maui The Role of Universities and National Laboratories in EUV Lithography Hiroo kinoshita University of Hyogo

2 EUVL Research in Japan Process & Mask R&D EUV Litho.G Selete EUV Mask G Tool R&D EUV1 SFET EUVA Nikon Canon Gigaphoton EUV Optics Komatu Ushio manufacturing LPP & DPP Source ASET & MIRAI Basic Research Leading Project By Univ. National lab. source Ion figuring Osaka U. Mirror fabrication Tokyo Univ. Sci. EEM Resist Mask Inspection Contami. U.Hyogo NewSUBARU

3 Leading Project for EUV light source funded by Ministry of E&S Japan collaborated with EUVA From to Osaka U. U. Hyogo Yamanashi U. Okayama U. Hiroshima U. Kyushuu U. Utsunomiya U. Tokyo Metropolitan U. Tokyo Institute of Tech. Kitazato U. U. Miyazaki Nara W U. JAERI

4 Purpose and Subject of Project Clarification of EUV plasma physics and presentation of the guidelines for practical light source Leading Project understanding of basic physic and technology Theoretical database Database experimental database Development of the target Development of the laser 2003 new material new supply system 2004 high-power,high- iteration Stability,quality of beam Development of light source elemental technology Development of equipment Optimal condition benchmarking high accuracy Optimal condition summarization of basic physic and technology supply effectivity of tin optimal condition polishing technology high-efficiency low debris continuous suplly technology for low cost production airplane basic technology technology for practical use 50W The Project of Ministry of Education, Culture, Sport, Science & Technology guidelines for practical light source With sharing the development trend,mext and METI enhance the partnerships and promote research technology transfer EUVA The project of the Ministry of Economy,Trade and Industry exposure estimation SEFT Selete Resist process development Module process development Industry Development -machine -machine Production machin

5 EUVA EUVL Stepper R&D From to Funded by NEDO Osaka U. EEM Mirror fabrication Tokyo U. of Science Ion Beam Figuring Contamination Univ. Hyogo Exposure experiment using NewSUBARU Mission: Basic R&D of Mirror fabrication And Contamination

6 MIRAI-ASET Selete From EUVL Mask Univ. Hyogo Mask Inspection Partially funded by NEDO Kyushu U. Hydrogen source for contamination removal EUV Lithography Univ. Hyogo Resist Outgassing

7 Devel opme n t of t h e Cor e EUVL t e c hnol ogy i n Kor e a Project 1 Project 2 Project 3 Project 4 EUVL Mask development EUVL Resist development EUVL Cleaning technology EUVL evaluation system and technology Samsung Electronics Hanyang University SungKyunKwan University Inha University Dongjin Semichem Hanyang University IMT Hanyang University Postech Hanyang University Samsung electronics Dongjin Semichem Postech Pohang Accelerator Laboratory Supported by Ministry of Commerce, Industry and Energy (MOCIE)

8 New SUBARU EUVL Project Bending Monochrometer Reflectometer Resist absorption & Transmittance 11m Long Undulator PDI Experiment(Nikon & Canon) Interference Lithography for 22nm and below Clean Room Mark 8 ICP Etcher Nanometorics FT-IR Clean Draft Chamber SEM,AFM Bending Mask Inspection Resist characteristics Mask CD Measurement Contamination

9 Resist evaluation Incoherent IL Contamination In-situ monitor CSM EUVM BL-3

10 AGC PDI Nikon & Canon HOYA Interference Lithography Mask Reflectometer BL-10 BL-9 11m Undulator line

11 The role of university develop the creation of the guideline based on fundamental knowledge or pacesetting equipment which is support of research and development for industries. The project of the Ministry of Education, Culture, Sport, Science and Technology and the project of the Ministry of Economy, Trade and Industry have developed an EUV light source together and succeeded. This is the first big enterprise which is not in the history of Japan