PRESENT STATUS OF HIGH-POWER LPP-EUV SOURCE FOR HVM

Transcription

1 PRESENT STATUS OF HIGH-POWER LPP-EUV SOURCE FOR HVM Dr. Akiyoshi Suzuki and Dr. Hakaru Mizoguchi Gigaphoton Inc, JAPAN Copyright Gigaphoton Inc.

2 Agenda Introduction HVM Ready System Performance Progress and Target Power Scalability Collector Mirror Life Extension Availability Improvement Summary

3 INTRODUCTION

4 Introduction It is expected HVM EUV lithography will be realized by 2019, but EUV source has been the No.1 critical issue for years. The output power of 250W has not been achieved, but is now within our scope. For HVM, the availability of the source has come to be taken much attention. Gigaphoton has been a main enabler of LPP EUV source since 2002, and invented many innovative technologies; Sn+CO 2 Laser configuration Pre-pulse technology Debris mitigation with super conducting magnets, The status of EUV light source gives greatest influence to EUV HVM. etc.

5 EUVL Concerns in 2017 Light source Resist Light source Resist Mask Mask In EUVL Symposium 2017, light source is still counted as No.1 issue in the short term.

6 2016 Lithography Source Highlights of Gigaphoton DUV #1 Market share In 2016, Gigaphoton achieved 60% share A new Green Innovation Roadmap Environmentally friendly and economical Ne crisis countermeasures Achieved 10,000 Kiloliter/Y Ne reduction EUV Pilot system for HVM started integration. >100W average power with 5% CE on Pilot system Demonstrated 250W capabilities with 4% CE at 100KHz KrF KrF 60 TOTAL SHIPMENTS 94 ArF 34 ArF KrF KrF 73 TOTAL SHIPMENTS 116 ArF ArF ArF

7 The History of EUV Light Source Outputs 2011 ASML 2017 Gigaphoton Power desired 250W Target 100W 10W 1W Now, the out put power is getting close to the target. Power obtained V.Banine: 2011 Int.WS on EUV Lithography (13-17 June 2011, Hawaii, U.S.A.) GPI has been a main enabler of the progress of EUV light source. (Pre-pulse technology, Debris mitigation, etc.)

8 HVM READY PERFORMANCE PROGRESS AND TARGETS

9 Agenda Introduction HVM Ready System Performance Progress and Target Power Scalability Collector Mirror Life Extension Availability Improvement Summary IWAPS 2017 October 13, 2017

10 Gigaphoton s LPP Source Concept Intermediate Focus 1. Dual-wavelength shooting concept High CE attained with CO 2 and pre-pulse solid-state lasers 2. EUV specific Hybrid CO 2 laser system Short pulse/high repetition rate oscillator combined with commercial cw-amplifiers 3. Debris mitigation with Super conductive magnets (SM3) 4. Accurate shooting system Stable droplet generation and shooting beam control 5. Out-of-band light reduction Grating structured collector mirror Droplet Generator Superconductive Magnet Ion Catcher Pre-pulse Laser Tin droplet Shooting point Collector Mirror Superconductive Magnet Ion Catcher Droplet Catcher CO 2 Pulse Laser IWAPS 2017 October 13, 2017

11 Pilot #1 EUV Chamber From Proto #2 to Pilot #1 for HVM

12 System Specification Target Target Performance Proto#1 Proof of Concept Proto#2 Key Technology Pilot#1 HVM Ready EUV Power 25W >100W 250W CE 3% > 4% > 5% Pulse Rate 100kHz 100kHz 100kHz Output Angle Horizontal 62 upper 62 upper Availability ~1 week ~1 week >80% Technology Droplet diameter 20-25μm < 20μm < 20μm CO 2 Laser 5kW 20kW 27kW Pre-pulse Laser picosecond picosecond picosecond Collector Mirror Lifetime Used as development platform 10 days > 3 months

13 Key Performance Status and its Target Current 2018 In-band power (Average Power) 87W (83W) 113W (111W) 113W (91W) 250W Collector lifetime*1 No data -10%/Bpls *3-0.4%/Bpls -0.2%/Bpls Availability*2 15% 44% 53% > 80% Proto #2 Pilot #1 *1, Collector lifetime estimation has been started from 2017 *2, Max availability in 4 week operation. *3, Main issue was capping layer performance.

14 HVM READY POWER SCALABILITY

15 Pre-Pulse Technology Higher CE and Power Optimum wavelength to transform droplets into fine mist Higher CE achievement with ideal expansion of the fine mist Long Life Chamber Debris mitigation by magnetic field Ionized tin atoms are guided to tin catcher by magnetic field Droplet (liquid) pre-pulse laser Fine-mist (liquid) main-pulse laser Plasma (gas) Magnetic Field Ion Guiding Gas Etching droplet <20µm mist size <300µm KEY TECHNOLOGY m CO 2 laser Ions with low energy trapped by B field Ion ~0 Pre-pulse enables the size matching between the size of an droplet and CO 2 laser beam Remaining atoms to mirror etched by gas

16 Pre-Pulse Optimization CO 2 laser pre-pulse laser Pre-pulse Droplet generator The mist shape of a picosecond pre-pulse is different from that of a nanosecond Nano-cluster distribution could be a key factor for high CE main-pulse simulation Pulse duration time of a pre-pulse is essential to high CE.

17 Latest LPP Source Systems Experiment Update Proto#2: 250W with 4% CE at 100KHz 301W with 4% CE 256W with 15% Dose Margin 268W with 3.5% CE With proto #2, we have already demonstrated 250W feasibility.

18 Conversion Efficiency (%) Pilot System Driver Laser and PPL System Improvements OSC OSC PA1 MA1 MA2 MA3 Plasma Point Pilot #1 OSC Pre-Amp Pre-Amp AMP AMP AMP AMP Proto #2 OSC Pre-Amp Pre-Amp AMP AMP AMP AMP Pilot#1 Due to EO isolator damage from back reflection Pilot#1 Proto#2 Proto#2 Specially designed new CO 2 lasers have improved beam quality to give higher CE.

19 Droplet Generation and Shooting System LPP EUV Source Shooting Control System OSC Laser mirror DLG X-Z Stage X PZT device X flow camera Plasma sensor Z DLG Y Z Flow camera Laser (CO 2, Fiber) Timing sensor Plasma point Droplet catcher Proto#2 Pilot#1 Droplet Speed ( m s ) Back Pressure (MPa) Max Repetition Rate (khz) High speed droplet control/shooting technology was successfully developed.

20 Dose Performance (Apr.-17) Performance Average power at IF 85W Burst pattern: 1000ms ON, 333ms OFF Dose error: including pre-exposure phase(10ms) Die yield: defined by 0.16% dose error Dose error (3 sigma) 0.04% Die yield (< 0.16%) 99.4% Operation time Pulse Number 143h 19Bpls Duty cycle 75% In-band power 113W Dose margin 35% CE 4.4% Availability 4wk 32% Droplet combination failure Collector lifetime Repetition rate CO 2 power -10%/Bpls 50kHz 12kW Note Dose error was mainly due to droplet combination failure and it was improved by droplet generator improvement(but not perfect). Pilot #1 is now under construction, and 113W output power has already been achieved for 143h.

21 CO2 laser Energy [mj] CO2 laser ave. Power [kw] High Power EUV Source for High NA EUV Exposure Tool EUV ave.power[w] Conversion Efficiency 2% 3% 4% 5% 6% 7% 8% HVM1 HVM2 HVM3 EUV Power 250W 300W 500W Pulse Rate 100kHz 100kHz 100kHz CE 4.5% 5% 5% CO 2 Laser Power 25kW 25kW 40kW Our LPP system has capability to give 300~500W output power.

22 HVM READY LONG-LIFETIME COLLECTOR MIRROR

23 SM3 : Superconducting Magnet Mitigation Method Gigaphoton s Magnetic Debris Mitigation concept Higher CE and Power Optimum wavelength to transform droplets into fine mist Higher CE achievement with ideal expansion of the fine mist Long Life Chamber Debris mitigation by superconducting magnetic field Ionized tin atoms are guided to tin catcher by magnetic field Droplet (liquid) pre-pulse laser Fine-mist (liquid) main-pulse laser Plasma (gas) Magnetic Field Ion Guiding Gas Etching droplet <20µm mist size <300µm 100% vaporization to atom CO 2 laser irradiation ~100% ionization Ions with low energy trapped by B field Remaining atoms to mirror etched by gas No Fragments Atom ~0 Ion ~0 KEY TECHNOLOGY 2 SM3 is the basis of debris mitigation system.

24 Difference of Deposition to the Dummy Mirror Capping layer disappearance Blister generation Capping layer deformation Blister generation Capping layer survived No blister generation Capping Mo/Si Sample A 124W, 7.3Bpls Sample B 124W, 6.1Bpls Sample C 124W, 7.3Bpls The capping layer material has great influence on ML durability.

25 Etching and Dissociation of Sn on the Collector Mirror Surface Chemical Equilibrium on the Mirror Surface Protection & cleaning of a collector with H 2 gas Deceleration of high energy tin neutrals to prevent sputtering. Etching of deposited tin by H radical gas*. Gas flow optimization Cooling system to prevent decomposition of etched tin (SnH 4 ) *H 2 molecules are dissociated to H radical by EUV-UV radiation from plasma. Tin ionization & magnetic guiding Effective ionization by double pulses Confinement of Sn ions with magnetic field Guidance to exhaust ports and discharge Both physical and chemical countermeasures must work together. IWAPS 2017 October 13, 2017

26 Collector Lifetime Status after improvement Operation: 100W in Burst, (= 2mJ x 50kHz), 33% duty cycle, 30W in average. Proto#2 31W low heat load with condition A Proto#2 31W Low heat load with condition C -0.4%/Bpls Pilot#1 85W high heat load with condition B 0.1Bpls 9.6Bpls 15.8Bpls Far field pattern in test condition C Edge Tin deposition by H2 flow convection Reflectivity loss: 0.4%/Bps was achieved with 100W burst operation.

27 AVAILABILITY IMPROVEMENT TOWARD HVM

28 Agenda Introduction HVM Ready System Performance Progress and Target Power Scalability Collector Mirror Life Extension Availability Improvement Summary

29 Availability Analysis Availability breakdown Downtime causes are classified into modules. Idling time: Time for waiting operator Downtime breakdown Time for gas replacement in CO 2 pre-amplifier The reasons of downtime were analyzed, and the countermeasures are on-going.

30 Availability Potential 2 week availability potential test There is no operator on Sat. and Sun. Dose error : System stopped at > 2% dose error (3 sigma) /10kpls slit and error was not recovered by automatic function Idle time: Time for waiting operators. 24 hour x 7 days definition: Unmanned operation between 9pm thru 8am Day The potential availability is 89%. (Availability: 64% / Idle time: 25%)

31 Improvement Plan >80% availability Current Dec Availability Demonstrated 64% N/A N/A Calculated or Target (89%) incl. Idling time >80% >90% Target Vessel including Collector Lifetime 3.0 months 6 months 6 months Droplet generator Lifetime 0.5 months <- 2 months Maintenance time 24 hour <- 16 hours CO 2 Lase chamber Lifetime 24 months <- <- Maintenance time 36 hours <- <-

32 SUMMARY

33 Summary Pilot#1 for HVM is now under construction, and shows promising results; Demonstrated 113W in-burst power at 75% duty ( 85W average ) for 143 hours based on the preliminary results of CE 5%, 250W power with Proto#2 Next target : 250W full specification operation with long term by 1H Pilot#1 Collector Mirror test shows HVM capable lifetime; Superconducting Magnet Mitigation Method SM3 realized the reflectance degradation rate of 0.4%/Bpls at over 100W level operation (in burst mode, up to 30Bp). Pilot#1 shows HVM ready availability; Pilot#1 system achieved the potential availability of 89% (2week-average). Gigaphoton will deliver the EUV source for HVM by 2019.

34 Layout of 250W EUV Light Source Pilot #1 First HVM EUV Source EUV Exposure Tool 250W EUV source Operational specification (Target) EUV Power HVM Source > 250W Perform ance CE > 4.0 % Pulse rate 100kHz Availability > > 80 75% % Techno logy Droplet generator Droplet size < 20mm CO2 laser Power > 20kW Pre-pulse Pulse laser duration psec Debris Magnet, mitigation Etching > 15 days ( >1500Mpls)

35 Acknowledgements Thank you for co-operation: Dr. Akira Endo :HiLase Project (Prague) and Prof. Masakazu Washio and others in Waseda University Dr. Kentaro Tomita, Prof. Kiichiro Uchino and others in Kyushu University Dr. Jun Sunahara, Dr. Katsunori Nishihara, Prof. Hiroaki Nishimura, and others in Osaka University Mitsubishi electric CO 2 laser amp. develop. team: Dr. Yoichi Tanino*, Dr. Junichi Nishimae, Dr. Shuichi Fujikawa and others * The authors would like to express their deepest condolences to the family of Dr. Yoichi Tanino who suddenly passed away on February 1st, Thank you to my colleagues: EUV development team of Gigaphoton: Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou and other engineers Thank you for funding: EUV source development funding is partially support by NEDO (New Energy and Industrial Technology Development Organization) in JAPAN IWAPS 2017 October 13, 2017

36 THANK YOU IWAPS 2017 IWAPS 2017 October 13, 2017 Copyright Gigaphoton Inc.