Optional shutter. Optional shutter

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1 High Temperature Effusion Cells : HT SERIES Especially designed for metals and refractory materials : Fe, Co, Cr, Ni, V, Au, etc. n Operating temperature range : 500 C to 2000 C n Ultra high vacuum design, clean and easy to use n Self supporting filament for clean operation n Low cost alternative solution compared to e-beam gun n Very large variety of crucibles and liners available The Riber High Temperature effusion cells provide clean operation under UHV environment at a temperature up to 2000 C. This cell is designed for ease of use with low vapor pressure materials which usually require the use of an electron-gun for evaporation. The necessary temperatures for most vacuum thin deposition operations can, in fact, be achieved readily through use of a robust resistively heated filament. Because this filament is self supported it is also possible to remove insulating material from the hot zone and avoid the problems of contamination due to insulator outgassing during the operation. Only refractory materials are used in the hot zone of the cell. The use of insulating ceramics is restricted to the cooler region of the source, preventing outgassing during operation. Several types of crucibles and liners made of refractory metal and ceramic materials can be employed, according to the source material to be evaporated, and the desired application. Models integrating a water cooling circuit surrounding the source as well as an integrated shutter are available.

2 specifications Optional shutter Optional water shielding Crucible Optional shutter Mounting flange Power feedthrough Shutter motorization CHARACTERISTICS cell model Characteristics Filament Heating filament Thermocouple Crucible Mounting flange (min) S40 HT Single Wire, No insulator support C-type Ta (PBN / PG / etc.) DN40 CF Typical operating temperature 700 C C Maximum continuous operating temperature 1900 C Maximum outgassing temperature 2000 C Temperature stability ±0.2 C water / gas / electrical Power consumption Power supply recommended Power output connector Thermocouple output connector Water connection Pneumatic connection <1000 W 35 V / 35 A M-Sock-Ø5 HMPW-M Swagelok fitting Ø3 mm Ø4 mm tube fitting options Integrated water shielding Integrated shutter and water shielding Ø46 mm / DN63 CF Ø56 mm / DN63 CF

3 RESULTS The high temperature cell provides clean UHV operation up to 2000 C. The use of insulating ceramics is restricted to the cooler part of the source. The thermocouple is not in contact with the crucible to prevent from welding. The curve shows the relation between the thermocouple reading and the temperature of the crucible measured with a pyrometer. SIMS profile on low temperature GaAs(001) doped with Titanium Titanium doping is performed at two temperatures, 1321 C and 1260 C. Titanium deposition rates reach Å/sec and Å/ sec, respectively. A stable and reproducible Titanium flux profile is obtained run after run. Vanadium evaporation at 1712 C shows stable flux at 13.5Å/sec. Courtesy of K.Durmenil, Lab. Phys. Mat. Unibv. H. Poincarré Nancy

4 ORDERING INFORMATION cell O.L. PRoduct guide Technology Vacuum length O.D. S40 HT 012 Ri I.V.L. Gauge Volume Ri : IVL VG : IVL 326 cell model p.n. H2O SH flange i.v.l. O.L. O.D. S 40 HT 12 Ri R No No CF40 (2.75'') S 40 HT 12 VG R Yes No CF63 (4.5'') S 40 HT 12 - R No No CF63 (4.5'') S 40 HT 12 - R Yes No CF63 (4.5'') S 40 HT 12 - R No Yes CF63 (4.5'') S 40 HT 12 - R Yes Yes CF63 (4.5'') CRUCIBLES AND LINERS Liner Lip Crucible PRoduct guide Shape Gauge Volume Material TA 2 : Metal 8 : Cylindrical L : Liner Al2O3 : Aluminum Oxide Mo : Molybdenum PBN : Pyrolytic Boron Nitride Ta : Tantalum W : Tungsten cell model Crucible Max. temp. p.n TA 2000 C R crucible liner Max. Temp. p.n. L AL2O C R S 40 HT W 2000 C R Mo 2000 C R Ta L PBN 1400 C R L PG 2000 C R PBN 1400 C R L BeO C R PG 2000 C R

5 OPERATING THE SOURCE Cell (1) Process control system Filament power cable (2) Filament T/C cable (6) Filament PID controller (5) Communication assembly (7) Power supply (3) Filament command cable (4) source selection guide Systems source model S40 HT MBE 32 RECOMMENDED Compact 12 RIBER Compact 21 EPINEAT MBE 412 (4"/6") CONTACT RIBER FOR MORE DETAILS GEN II MOD GEN II GEN 930 VEECO / VARIAN GEN 10 GEN 20 GEN 200 GEN 2000 V80 VG V90 V100 V150 OTHER SYSTEMS Riber cells are also available for use on systems from Eiko, Anelva, Ulvac, SVTA and DCA, as well as customs chambers. Contact Riber for details.

6 Technological leadership Riber is the world leading supplier of MBE processing equipment and related services. In total, 850 of our MBE systems have been installed with at least one system in each of the 35 countries with which MBE is involved. This represents 75% of the global market. Capitalizing on more than 30 years of experience, the company s core philosophy is to design systems in close association with customers. Riber has invented and designed major features which are now found in all MBE systems. Riber plays a key role in the development of MBE technology, providing customers with solutions from equipment to epitaxial growth. worldwide presence Headquarters and subsidiaries Representatives For more information: Tel: +33 (0) info@riber.com Internet: N Technical specifications reserved RIBER - 31, rue Casimir Périer, B.P 70083, Bezons, France Tel: +33 (0) Fax: +33 (0) info@riber.com Internet: