High Quality Multi-arc Targets

Size: px
Start display at page:

Download "High Quality Multi-arc Targets"

Transcription

1 High Quality Multi-arc Targets IKS provides high-quality multi-arc targets for a wide range of applications for ferromagnetic, complex oxides, and semiconducting films. Our targets are offered in various purity levels to suit your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys. Adopting advanced technologies such as hot isostatic pressing (HIP), vacuum sintering and vacuum melting process, our multi-arc targets are characterized by high purity, high density, homogenous composition, uniform grain size and high utilization. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories. IKS manufactures all shapes and sizes of high quality multi-arc targets. Let us know the material and dimensions you need and we will meet your special requirement. Application Flat panel display Solar photovoltaic Tool and moulds surface treatment Architectural and auto glass Hardware and decoration Other fields

2 Main Products Material Symbol Atomic Ratio Purity Relative Density Stock Dimensions Technology Features Chromium Cr 99.5%~99.95% >99% Dia100xH40mm Good Oxidation Resistance Tungsten W 99.9% >99% Dia100xH40mm High Hardness Titanium Ti 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting Good Wear Resistance Nickel Ni 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting Great Corrosion Resistance Molybdenum Mo 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting Great Corrosion Resistance Silicon Si 99.99% >99% Dia100xH40mm Vacuum Sintering High Hardness Silver Ag 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting Good Electrical and Thermal Conductivity Tantalum Ta 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting High Ductility Copper Cu 99.9%~99.99% >99% Dia100xH40mm Vacuum Melting Good Ductility, Thermal Conductivity and Corrosion Resistance Graphite 99.9%~99.99% >99% Dia100xH40mm Vacuum Sintering High Hardness Al 99.9%~99.99% >99% Dia100xH40mm Silicon- SiAl 25/75 30/ %~99.99% >99% Dia100xH40mm Vacuum Melting Good Ductility, Thermal Conductivity and Corrosion Resistance High Ductility and Good Wear Resistance

3 Titanium- Chromium- Titanium- - Silicon Chromium- - Silicon TiAl 30/70 33/67 45/55 60/40 70/30 75/25 80/20 CrAl 25/75 30/70 TiAlSi 30/60/10 40/50/10 CrAlSi 30/60/10 40/50/10 High Mechanical Strength and Good Corrosion Resistance Good Oxidation Resistance and Corrosion Resistance High Hardness and Ductility Good Oxidation Resistance and Corrosion Resistance More Information Certification: ISO9001 Average Grain Size: 30-40μm (national standard is 100μm) Other special specifications are available on customer s request.

4 Quality Analysis of CrAl Sputtering Target (Take CrAl 30/70 at% as a sample) Main component (wt%) Impurity content (%) CrAl C N O Fe Si S >99.7 Cr Al balance Dimension: Dia 65x40 mm True density: 3.764(g/cm 3 ) Theoretical density: >99%) The average grain size of our multi-arc target is 30-40μm which is far below the national standard (100μm).

5 The IKS Advantages Variety of materials including: Silver, Titanium,, Silicon, Silicon- Titanium--Silicon, Graphite and so on to suit your requirements. Extremely high material utilization (about 80%) ensures lower consumption of raw materials and save your costs. Provide thick & dense film with extremely smooth surface. Multi-layer films & multi process films are possible Ensure the high efficiency of coating process and availably increase the throughput of the coating machine. Our cathodic arc targets are best choice for providing hard surfaces with excellent corrosion resistance and wear resistance for cutting tools, punching and forming moulds to increase their service time, give them the higher feed speeds, cutting performance and metal removal rates can be achieved easily.