文章编号 溅射功率对氧化锡薄膜结构和电化学性能的影响

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1 ELECTROCHEM ISTRY Vol. 14 No. 1 Feb : (2008) , 2, 1, 2, 33, 23 (1., ; 2.,, ; 3., ) :,. XRD, SEM,, ; ;,.. : ; ; ; : O 646 : A ( SnO x ),,, [ 123 ]. SnO SnO 2, 2 [ 428 ],,.,. 1 JC50023 /D SiO 2 /Si (111) Ti/Au,, Au % Sn,, ( % )( % ) 1 2, Pa, 80 mm, (50 W 80 W 120 W 150 W 180 W ), 60 m in. X ( XRD, Panalytical X pert PRO ) ( SEM, LEO1530).,, 1. 0mol/L L ipf 6 /EC + EMC + DMC (1 1, by mass).. A rbin BT22000 (A rbin ) L i/sno x XRD 1X., 180 W 2 = , SnO 2 ( 110 ) ( 101 ) (211) ( 112 ). 150 W, (112),.,,. 80 W 50 W (101).,, ;., XRD SnO, SnO. : , : , E2mail: wst@ xmu. edu. cn, qfdong@ xmu. edu. cn (973, No. 2002CB211807)

2 1 : 67 3 SEM. 1 3,. 3,,. 1,,. 1 X Fig. 1 XRD patterns of the tin oxide thin film s p repared by the RF magnetron sputtering 2. 2 SEM 2 SEM.,,.,,.,,,,. 50 W 80 W,, Sn,,. 3150W SEM Fig. 3 The cross section SEM photograph of tin oxide thin film p repared by the RF magnetron sputtering under sputte2 ring power of 150W A / cm V, 4., Ah /cm 2 m, 647 Ah /cm 2 m. 50 W 80 W 120 W 2 SEM Fig. 2 SEM photographs of the tin oxide thin film s p repared by the RF magnetron sputtering sputtering power/w: a) 50, b) 80, c) 120, d) 150, e) 180

3 Fig. 4 The cycle curves of of the tin oxide thin film s p repared with different sputtering power/w a) 50, b) 80, c) 120, d) 150, e) Tab. 1 Thickness and growth rate of the tin oxide thin film s p repared by the RF magnetron sputtering Sputtering power/w Thickness /nm Growth rate /nm m in V, V 0. 4 V, 10,, L i2sn,. 120 W 150 W 180 W, V,2,, L i 2 O Sn., 12, 210,2. 5., 12. 2,.. [ 9 ],, L i 2 O Sn, L i Sn,. 1, 1 2.,,..,,,,, ,,,. Sn,,

4 1 : 69 [ 10 ]... 5 Fig. 5 Cycle charge /discharge ability of the tin oxide thin film electrodes p repared by the RF magnetron sputtering ( References) : [ 1 ] Dudney N J, Neudecker B J. Solid state thin2film lithi2 um battery system s [ J ]. Current Op inion in Solid and M aterials Science, 1999, 4: [ 2 ] Kanehori K, Matsumoto K, M iyauchi K, et al. Thin film solid electrolyte and its app lication to secondary lithium cell [ J ]. Solid State Ionics, 1983, ( 9 10 ) : [ 3 ] Park K S, Park Y J, Kim M K, et al. Characteristics of tin nitride thin2film negative electrode for thin2film m i2 crobattery[ J ]. J Power Sources, 2001, 103: [ 4 ] Nam S C, Paik C H, Cho W L, et al. Electrochem ical characterization of various tin2based oxides as negative electrodes for rechargeable lithium batteries[ J ]. J Power Sources, 1999, 84: [ 5 ] R istoscu C, Cultrera L, D ima A, et al. SnO 2 nano2 structured film s obtained by pulsed laser ablation depo2 sition[ J ]. App lied Surface Science, 2005, 247: [ 6 ] Santos2Pena J, B rousse T, Sanchez L, et al. Antimony dop ing effect on the electrochem ical behavior of SnO 2 thin film electrodes [ J ]. J Power Sources, 2001, ( ) : Fig. 6 Variation second discharge capacity and first irreversi2 ble capacity loss, for the tin oxide thin film electrodes p repared by the RFmagnetron sputtering with different sputtering power. 3,.,,,.,,, [ 7 ] Maranchi J P, Hepp A F, Kum ta P N, et al. L icoo 2 and SnO 2 thin film electrodes for lithium2ion battery ap2 p lications [ J ]. Materials Science and Engineering, 2005, 116: [ 8 ] GubbinsM A, Casey V, Newcomb S B. Nanostructural characterisation of SnO 2 thin film s p repared by reactive r. f. magnetron sputtering of tin [ J ]. Thin Solid Film s, 2002, 405: [ 9 ] Courtiney I A, Dahn J R. Electrochem ical and in Situ X2ray diffraction studies of the reaction of lithium with tin oxide composites[ J ]. J Electrochem Soc, 1997, 144 (6) : [ 10 ] Kim Y I, Lee W H, Moon H S, et al. Effect of Si ad2 dition to thin2film SnO 2 m icrobattery anodes on cycling performance[ J ]. Journal of Power Sources, 2001, 101:

5 The Influence of the Sputtering Power on the Structural and Electrochem ical Properties of Tin Oxide Film s CA IM in2zhen 1, SONG J ie 2, ZHENG M ing2sen 2, WU Q i2hui 1, WU Sun2tao 33, Dong Quan2Feng 23 (1. D epartm ent of Physics, X iam en U n iversity, X iam en , Fujian, China; 2. School of Chem istry and Chem ica l Engineering, X iam en U niversity, X iam en , Fujian, China; 3. Pen Tung Sah M EM S R esearch Center, X iam en U niversity, X iam en , Fujian, China) Abstract: Tin oxide film s were deposited on silicon substrates at room temperature using the radio frequency (RF) magnetron sputtering w ith different sputtering power. The influence of sputtering power upon the crystal structure, surface morphology and electrochem ical p roperties of tin oxide film s were then investigated. The XRD and SEM results illustrate that the phase of tin oxide thin film s changed from amorphous to crystalline and the grain size augments w ith the increase of the sputtering power. The constant current charge and discharge cycle tests imp ly that the initial irreversible capacity loss of L i/ tin oxide batteries increase and which capacity decrease as the sputtering power increases. The sputtering power has a great influence upon the structural and electro2 chem ical p roperties of tin oxide film s. Key words: tin oxide film s; the anode material; RF m agnetron sputtering; electrochem ical p roperty