The Berkeley Marvell NanoLab

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1 The History The Berkeley Marvell NanoLab The Culture The Present The BNLA The Capabilities The End MEMS Industry Group M2M 20May2014 Bill Flounders, Ph.D. NanoLabExecutive Director

2 The History The Berkeley Micro/Nanofabrication Facility has evolved over 50 years through 3 phases

3 The History

4 The History

5 The History

6 The Culture A self supporting operation ~ $5 M annual operating budget >200 grants billed, enables >$40M in research contracts ~20 company members providing ~1/3 revenue Faculty Drive New equipment, custom modifications, and new materials are driven by faculty research programs and industry collaborations Lab Management and Staff Steer Facility Management, Utility Support, Resource Coordination Equipment Maintenance, Process Development

7 The Culture The NanoLab is a research community researchers are considered members not users academic research is the priority mission it is a highly diverse lab environment, Si, III-V, glass, plastic Process and Equipment Staff are Community Leaders Staff provide information, guidance and equipment/process development. They don t do your work for you Every tool has a primary and a back up equipment and process engineer. Every tool has a standard process. Equipment considered up when results of the standard process are within spec Process staff execute standard process after major repair and according to periodic schedule called Quality Monitoring

8 The Present Members by Department FY 13 Total = 471 BSAC is the largest set of members Industry ~20% of Users & Growing UCB: 340 External: 131 (28%) UCB: 372 External: 125 (25%) UCB: 353 External: 121 (26%) UCB: 370 External: 99 (21%)

9 The Present The NanoLab is Busy people per hour 24/7

10 The BNLA Industry Affiliates Welcome BNLA Program Enables Company Access Companies request access to the NanoLab for experimental work, subject to recharge fees. Primarily but not exclusively start ups. Director reviews Company s proposed use and verifies it does not conflict with academic research priorities Companies pay annual membership fee + equipment recharge Commercial researchers are and are viewed as contributing members of the laboratory

11 The BNLA Startups Welcome BNLA Program Advantages For a Start Up 6 photoresist systems characterized and maintained cleanroom immediately available no application and wait for chemical handling permits purchase specialized equipment only compare multiple technologies prior to equipment purchase immediate mask making capability well defined research expenses during proof of concept

12 The BNLA Industry Welcome FY 14/15 BNLA Recharge Rates *BSAC Members $5,000 Annual Member Fee Discount Category FY 14/15 Annual* Access Fee/month $ user $17,500 General Laboratory Rate $ users $27,500 General Lab Rate Max $2, users $37,500 Special Equipment Rate $ users $47,500 E beam Lithography $ Access Cap $2300/month High Performance SEM $72.00 Equipment Cap None Staff Services $78.60

13 The Capabilities Staff Supported Quality Monitoring Program The Microlab has had a Baseline Monitor effort for more than 10 years. Grew out of the CMOS Baseline Select processes are run by process staff on a regular basis and results are posted at NanoLab website This effort has been expanded to include more equipment, track etch selectivity, include etch images Selectivity monitoring requires patterning; images require SEM time.

14 The Capabilities QM Sample: Latest Data with Image

15 The Capabilities Thermal process (oxidation, diffusion, anneal) CVD Litho - 11 atmospheric furnaces, 5 RTP systems - solid source boron doping, POCl 3 doping - N2, O2, Ar, N2/H2-9 LPCVD tubes poly-si, poly-ge, poly SiGe, Si 3 N 4, SiO 2 SiC - 2 PP PECVD SiO2, Si3N4, a-si - 2 ALD Al2O3, ZrO2, TiO2, TiN, Ru - AMAT RP-epi epitaxial silicon deposition (FY15) - ASML 6 248nm, 5:1 stepper - GCA 10:1 4 g-line steppers, 5:1 6 i-line stepper - Karl Suss contact align, backside capable - Quintel up to 6 contact align, backside capable - 6 and 4 SVG coat and develop tracks - Manual coat, bake, develop work stations SU-8, PIMD - Pattern generator for in-house mask making - Crestec 9510 Nanowriter 10nm line

16 The Capabilities Etch - Lam oxide, poly, metal etchers - STS pulsed gas DRIE silicon and oxide - 2 parallel plate oxide / nitride etcher - 2 O 2 asher/etcher. Pyrex and Polymer approved RIE -XeF 2 for silicon, HF vapor for oxide - Wet etch: Al, poly-si, KOH, TMAH, H 3 PO 4, HF, critical point drying - AMAT Centura: deep trench Si and SiO 2 ME-RIE PVD - Reactive sputter deposition aluminum nitride - MRC 4 target sputter dep (Al/2% Si, Ti, W, Ni) - 2 thermal, 4 ebeam evap - 4 additional multi-target sputter deposition systems - AMST molecular vapor deposition - Hot wire CVD for polycrystalline diamond deposition Planarize and Package - Strasbaugh 6 /4 CMP, GnP 6 CMP - Disco dicing saw, Au / Al wire bond - FC150 flipchip bonder, Finetech bonder Metrology spectroscopic ellips, profilometer, reflectometer SEM, AFM, XRD

17 The End Last Year Oski had a great visit to the NanoLab Today, The NanoLab welcomes: Thank You