Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets

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1 Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets Frank Papa*, Dermot Monaghan**, Victor Bellido- González**, and Alex Azzopardi** *Gencoa Technical & Business Support in US, Davis, CA, USA **Gencoa, Liverpool, UK AIMCAL USA 2013

2 Overview Introduction to Gencoa Magnetron Sputtering Heat loads Anodes and plasma confinement Rotatables AC Rotatable DC + Magnetic Active Anode Results Conclusions NREL 2

3 GENCOA products cover 3 sputtering related areas Magnetron Sputter Cathodes planar & rotatable Reactive gas controller & endpoint detector Linear ion sources and plasma treaters 3 Other activities include on-site process implementation, training and tuning

4 Magnetron Sputtering + Ion with kinetic energy Surface + - Atom, ion e - 4 In magnetron sputtering electric & magnetic field & effective cross sections drive the collisions and target bombardment

5 Magnetron Sputtering Positive Particles will be attracted to negatively biased target producing sputtering V 5 Target Plasma Target erosion

6 Sputtering Courtesy of Heraeus 6

7 Magnetron Sputtering Atom or ion with kinetic energy e - current 7 Atom, ion Condensation (from vapour to solid) Kinetic energy Heat sink effect from substrate Radiation Electric conductivity via substrate or coating Plasma interaction (Ion bombardment,..) Scattering collisions + - e -

8 Anode effect Comparison of the plasma expansion with an anode that intersects with the magnetic field and one moved just 1mm to avoid a magnetic interaction 8

9 Heat effects due to magnetic design 9 Janet O Brien, V. Bellido-Gonzalez, Peter Kelly, AEPSE 2001

10 Heat effects due to magnetic design Ion Current at substrate with Magnetic Configuration Ion Current with Magnetic Field Strength Ion Current [15,0] Position [0,0] [0,12] 0 Moving outer out Moving inner out [0,0] Balanced to Unbalanced Ti target Al Target Ion Current (A) Moving both Inner and Outer out -1 [1, 1] 1 [3, 3] 3 [5, 5] 5 7 [8, 8] 9 Decreasing Magnetic Field Strength Anode Temperature o C anode Temperature: Magnetron 1 y = x R 2 = y = x R 2 = [0, 0] to [15, 0] [0, 0] to [0, 12] Anode temperature depends on interaction with anode and total resulting power (current constant in experiments) Power (W)

11 Anodes in standard rotatables Plasma traps Whilst for a planar magnetron discharge and anode can be used to confine the plasma, typically for rotatable magnetron no anode is close-by 11

12 Electrons need to find the anode return DC AC Absence of anode can be seen in a plasma spread away from the target area 12

13 Dual AC rotatable - Industry Standard AC current leaks 70 mm mm 100 mm Industry standard magnetics with AC power mode and electron movement

14 Gencoa Dual Low Impedance (DLIM) AC rotatable AC current channelled NREL 70 mm mm 100 mm Magnetic field channels the electron movement

15 Gencoa DLIM AC rotatable AC 15 The position of the plasma can be controlled by adjusting the angle of the magnetic arrays relative to substrate position.

16 Gencoa DLIM AC rotatable Courtesy of Bobst Manchester 16 Uniform anode effects Uniform impedance Uniform coating

17 DC Experimental work Experimental work was performed using adaptation of SCI s standard end-blocks to accommodate 75 mm OD Al targets. Magnetics DLIM+ Active Anode (AA) 17

18 Experimental work Vacuum chamber door flange Anode Cathodes 18

19 V/I versus Power curve DC tests Al target, 75 mm OD, 360 mm length, Pressure 3.1 mtorr v i 20 Target Voltage Current Amps Power (kw) 0

20 20 DC - magnetically enhanced anode

21 V/I versus Power curve with Grounded anode DC tests # Al target, 75 mm OD, 360 mm length, Pres: 3.1 mtorr V/I for rotatable 75mm diameter and different anode configuration. Anode fitted and grounded Voltage, v Current, amps Vag Iag Power, kw

22 V/I versus Power curve with +30 V anode DC tests # Al target, 75 mm OD, 360 mm length, Pres: 3.1 mtorr V/I for 75mm diam anode in different configurations. Anode +30V Voltage, v Current, Amps Va+30 Ia Power, kw

23 Experimental work Target V versus Power for different anode V Target Voltage reduction affects the energy of neutrals 23

24 Experimental work Shutter Thermal sensor strips Mask on glass for step thickness measurements Stencil mask on OLED device crystal sensors 24

25 Static coating uniformity across the width Static Uniformity vs T/S distance at 0 deg tilt 100 Relative deposition, % Unif 100mm Unif 150mm Unif 200mm Probe position

26 Static coating uniformity along the length Uniformity along the length at 150 mm T/S 100 Relative deposition, % Unif L Distance from centre, mm

27 Temp versus Deposition rate - different conditions Temperature vs Deposition rate Temperature ºC Deposition rate for Al (nm/min)

28 Temp versus Target Voltage - different conditions Temperature for same thickness vs Target Voltage 60 Temperature on Substrate, deg C Some experimental data grouping would indicate that the lower the target voltage the lower the temperature - also experience e.g. on web/cd etc. - Neutral energy Target Voltage 28

29 Temperature and pressure Temperature with Pressure Temperature, deg C Temp E E E E-03 Pressure, mtorr

30 Temperature and active anode Temperature results vs Anode condition Temperature, deg C Floating (-30 V) Biased (+30 V) 0 Exp A Exp B2 30 Unbalanced Experiments Balanced

31 Other results Things to consider Different power supplies were also tested and results also showed variations. Higher frequency components on the power supplies added other effects. System outgassing also affected results System/shutter precleaning and background temperature also affected results NREL Experiments were fitted around customer samples with varied elements which had different heat capacity and thermal conductivity across interfaces - lack of control of those would have also affected the experiments,... 31

32 Conclusions Magnetic design affects the heat load performance. This is mainly due to the plasma interaction with the substrate. The plasma can be focussed or defocussed with regards to the substrate with both AC processes with DLIM and DC processes with a magnetically guided anode. The heat load to the substrate is related to the ion flux and NREL the energy of impinging neutrals. DC with magnetically guided anode shows a high deposition rate versus temperature. 32

33 Conclusions DC + Active Anode experiments with other customers (not reported here) have shown improvements in deposition rate ability due to lower plasma interaction. 3 x the deposition rate at constant substrate temperature as compared to standard magnetics. DC + Active Anode can affect the heat load due to plasma interaction and neutral energy as the operating voltage and NREL plasma impedance are lower. More work needs to be done concerning the combined effects of balancing/unbalancing of the magnetrons in combination with the DC + Active Anode. 33

34 THANK YOU FOR YOUR ATTENTION 34

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