r^a light-emitting diodes (LEDs) Nitride semiconductor Materials, technologies and applications JianJang Huang, Hao-Chung Kuo and Shyh-Chiang Shen
|
|
- Domenic O’Connor’
- 6 years ago
- Views:
Transcription
1 Woodhead Publishing Series in Electronic and Optical Materials: Number 54 Nitride semiconductor light-emitting diodes (LEDs) Materials, technologies and applications Edited by JianJang Huang, Hao-Chung Kuo and Shyh-Chiang Shen WP WOODHEAD PUBLISHING r^a Oxford Cambridge Philadelphia New Delhi
2 Contents Contributor contact details Woodhead Publishing Series in Electronic and Optical Materials Preface xiii xvii xxiii Part I Materials and fabrication 1 1 Molecular beam epitaxy (MBE) growth of nitride semiconductors 3 Q.-D. Zhuang, Lancaster University, UK 1.1 Introduction Molecular beam epitaxial (MBE) growth techniques Plasma-assisted MBE (PAMBE) growth of nitride epilayers and quantum structures Nitride nanocolumn (NC) materials Nitride nanostructures based on NCs Conclusion References 21 2 Modern metal-organic chemical vapor deposition (MOCVD) reactors and growing nitride-based materials 27 F. H. Yang, AIXTRON Taiwan Co Ltd, Taiwan 2.1 Introduction MOCVD systems Planetary reactors Close-coupled showerhead (CCS) reactors In situ monitoring systems and growing nitride-based materials Acknowledgements References 65 v
3 vi Contents 3 Gallium nitride (GaN) on sapphire substrates for visible LEDs 66 J.-H. Ryou, University of Houston, USA 3.1 Introduction Sapphire substrates Strained heteroepitaxial growth on sapphire substrates Epitaxial overgrowth of GaN on sapphire substrates GaN growth on non-polar and semi-polar surfaces Future trends References 89 4 Gallium nitride (GaN) on silicon substrates for LEDs 99 M. H. Kane, Texas A & M University at Galveston, USA and N. Arefin, University of Oklahoma, USA 4.1 Introduction An overview of gallium nitride (GaN) on silicon substrates Silicon overview Challenges for the growth of GaN on silicon substrates Buffer-layer strategies Device technologies Conclusion References Phosphors for white LEDs 144 H. Yamamoto, formerly of Tokyo University of Technology, Japan and T. Yamamoto, Ajinomoto Pharmaceuticals Co, Ltd, Japan 5.1 Introduction Optical transitions of Ce3+and Eu Chemical composition of representative nitride and oxynitride phosphors Compounds activated by Eu Compounds activated by Ce Features of the crystal structure of nitride and oxynitride phosphors Features of optical transitions of nitride and oxynitride phosphors Conclusion and future trends Acknowledgements References Fabrication of nitride LEDs 181 R.-H. Horng, D.-S. Wuu and C.-F. Lin, National Chung Hsing University, Taiwan and C.-F. Lai, Feng-Chia University, Taiwan 6.1 Introduction 181
4 Contents vii 6.2 GaN-based flip-chip LEDs and flip-chip technology GaN FCLEDs with textured micro-pillar arrays GaN FCLEDs with a geometric sapphire shaping structure GaN thin-film photonic crystal (PC) LEDs PC nano-structures and PC LEDs Light emission characteristics of GaN PC TFLEDs Conclusion References Nanostructured LEDs 216 C. -C. Lin, D. W. Lin, C.-H. Chiu, Z. Y. Li and Y. P. Lan, National Chiao Tung University, Taiwan, J. J. Huang, National Taiwan University, Taiwan and H.-C. Kuo, National Chiao Tung University, Taiwan 7.1 Introduction General mechanisms for growth of gallium nitride (GaN) related materials General characterization method Top-down technique for nanostructured LEDs Bottom-up technique for GaN nanopillar substrates prepared by molecular beam epitaxy Conclusion References Nonpolar and semipolar LEDs 250 Y.-R. Wu, National Taiwan University, Taiwan, C.-Y. Huang, TSMC Solid State Lighting, Ltd, Taiwan, and Y. Zhao and J. S. Speck, University of California, Santa Barbara, USA 8.1 Motivation: limitations of conventional c-plane LEDs Introduction to selected nonpolar and semipolar planes Challenges in nonpolar and semipolar epitaxial growth Light extraction for nonpolar and semipolar LEDs References 270 Part II Performance of nitride LEDs Efficiency droop in gallium indium nitride (GalnN)/gallium nitride (GaN) LEDs 279 D. S. Meyaard, G.-B. Lin, J. Cho and E. F. Schubert, Rensselaer Polytechnic Institute, USA 9.1 Introduction Recombination models in LEDs Thermal roll-over in gallium indium nitride (GalnN) LEDs Auger recombination 284
5 viii Contents 9.5 High-level injection and the asymmetry of carrier concentration and mobility Non-capture of carriers Polarization fields Carrier derealization Discussion and comparison of droop mechanisms Methods for overcoming droop References Photonic crystal nitride LEDs 301 M. D. B. Charlton, University of Southampton, UK 10.1 Introduction Photonic crystal (PC) technology Improving LED extraction efficiency through PC surface patterning PC-enhanced light extraction in P-side up LEDs Modelling PC-LEDs P-side up PC-LED performance PC-enhanced light extraction in N-side up LEDs Summary Conclusions References Surface plasmon enhanced LEDs 355 Q. Hao and T. Qiu, Southeast University, China and P. K. Chu, City University of Hong Kong, China 11.1 Introduction Mechanism for plasmon-coupled emission Fabrication of plasmon-coupled nanostructures Performance and outlook Acknowledgements References Nitride LEDs based on quantum wells and quantum dots 368 J. Verma, A. Verma, V. Protasenko, S. M. Islam and D. Jena, University of Notre Dame, USA 12.1 Light-emitting diodes (LEDs) Polarization effects in IH-nitride LEDs Current status of Ill-nitride LEDs Modern LED designs and enhancements References 400
6 Contents ix 13 Color tunable LEDs 409 Y. F. Cheung, Z. Ma and H. W. Choi, The University of Hong Kong, People's Republic of China 13.1 Introduction Initial idea for stacked LEDs Second-generation LED stack with inclined sidewalls Third-generation tightly-integrated chip-stacking approach Group-addressable pixelated micro-led arrays Conclusions References Reliability of nitride LEDs 428 T.-T. Chen, C.-F. Dai, C.-P. Wang, H.-K. Fu, P.-T. Chou and W. Y. Yeh, Industrial Technology Research Institute (ITRI), Taiwan 14.1 Introduction Reliability testing of nitride LEDs Evaluation of LED degradation Degradation mechanisms Conclusion References Chip packaging: encapsulation of nitride LEDs 441 X. Luo and R. Hu, Huazhong University of Science and Technology, People's Republic of China 15.1 Functions of LED chip packaging Basic structure of LED packaging modules Processes used in LED packaging Optical effects of gold wire bonding Optical effects of phosphor coating Optical effects of freeform lenses Thermal design and processing of LED packaging Conclusion References 476 Part III Applications of nitride LEDs White LEDs for lighting applications: the role of standards 485 R. Kotschenreuther, OSRAM GmbH, Germany 16.1 General lighting applications LED terminology Copying traditional lamps? 490
7 x Contents 16.4 Freedom ofchoice Current and future trends References Ultraviolet LEDs 497 H. Hirayama, RIKEN, Japan 17.1 Research background of deep ultraviolet (DUV) LEDs Growth of low threading dislocation density (TDD) A1N layers on sapphire Marked increases in internal quantum efficiency (IQE) Aluminum gallium nitride (AlGaN)-based DUV-LEDs fabricated on high-quality aluminum nitride (A1N) Increase in electron injection efficiency (EIE) and light extraction efficiency (LEE) Conclusions and future trends References Infrared emitters made from Ill-nitride semiconductors 533 Y. Kotsar and E. Monroy, CEA-Grenoble, INAC/SP2M/NPSC, France 18.1 Introduction High indium (In) content alloys for infrared emitters Rare-earth (RE) doped gallium nitride (GaN) emitters Ill-nitride materials for intersubband (ISB) optoelectronics ISB devices Conclusions Acknowledgements References LEDs for liquid crystal display (LCD) backlighting 566 C.-F. Chen, National Central University, Taiwan 19.1 Introduction Types of LED LCD backlighting units (BLUs) Technical considerations for optical films and plates Requirements for LCD BLUs Advantages and history of LED BLUs Market trends and technological developments Optical design References LEDs in automotive lighting 595 J. D. Bullough, Rensselaer Polytechnic Institute, USA 20.1 Introduction 595
8 Contents xi 20.2 Forward lighting Signal lighting Human factor issues with LEDs Energy and environmental issues Future trends Sources offurther information and advice Acknowledgments References 604 Index 607
InGaN quantum dot based LED for white light emitting
Emerging Photonics 2014 InGaN quantum dot based LED for white light emitting Luo Yi, Wang Lai, Hao Zhibiao, Han Yanjun, and Li Hongtao Tsinghua National Laboratory for Information Science and Technology,
More informationThe Effects of Sapphire Substrates Processes to the LED Efficiency
The Effects of Sapphire Substrates Processes to the LED Efficiency Hua Yang*, Yu Chen, Libin Wang, Xiaoyan Yi, Jingmei Fan, Zhiqiang Liu, Fuhua Yang, Liangchen Wang, Guohong Wang, Yiping Zeng, Jinmin Li
More informationISSN: ISO 9001:2008 Certified International Journal of Engineering and Innovative Technology (IJEIT) Volume 3, Issue 6, December 2013
ISSN: 2277-3754 Fabrication and Characterization of Flip-Chip Power Light Emitting Diode with Backside Reflector Ping-Yu Kuei, Wen-Yu Kuo, Liann-Be Chang, Tung-Wuu Huang, Ming-Jer Jeng, Chun-Te Wu, Sung-Cheng
More informationThermal Model and Control of Metal-Organic Chemical Vapor Deposition Process
Thermal Model and Control of Metal-Organic Chemical Vapor Deposition Process Jon L. Ebert, Sarbajit Ghosal, and Narasimha Acharya SC Solutions, Inc. 1261 Oakmead Pkwy., Sunnyvale, CA 94085. jle@acsolutions.com
More information2014 the Nobel Prize in Physics Awarded to Isamu Akasaki
Awarded Awarded to Isamu Akasaki Isamu Akasaki ( 赤崎勇 ) was born in Kagoshima, Japan. Dr. Akasaki graduated from Kyoto University in 1952, and obtained a Ph.D degree in Electronics from Nagoya University
More informationLight enhancement by the formation of an Al-oxide honeycomb nano-structure on the n-gan surface of thin-gan light-emitting diodes
Light enhancement by the formation of an Al-oxide honeycomb nano-structure on the n-gan surface of thin-gan light-emitting diodes C. L. Lin, P. H. Chen Department of Chemical and Materials Engineering,
More informationIn-Situ Characterization During MOVPE Growth of III-Nitrides using Reflectrometry
18 Annual Report 1999, Dept. of Optoelectronics, University of Ulm In-Situ Characterization During MOVPE Growth of III-Nitrides using Reflectrometry Christoph Kirchner and Matthias Seyboth The suitability
More informationFABRICATION ENGINEERING MICRO- NANOSCALE ATTHE AND. Fourth Edition STEPHEN A. CAMPBELL. of Minnesota. University OXFORD UNIVERSITY PRESS
AND FABRICATION ENGINEERING ATTHE MICRO- NANOSCALE Fourth Edition STEPHEN A. CAMPBELL University of Minnesota New York Oxford OXFORD UNIVERSITY PRESS CONTENTS Preface xiii prrt i OVERVIEW AND MATERIALS
More informationHigh-efficiency light-emitting diode with air voids embedded in lateral epitaxially overgrown GaN using a metal mask
High-efficiency light-emitting diode with air voids embedded in lateral epitaxially overgrown GaN using a metal mask Chu-Young Cho, 1 Min-Ki Kwon, 3 Il-Kyu Park, 4 Sang-Hyun Hong, 1 Jae-Joon Kim, 2 Seong-Eun
More informationHigh performance 380-nm ultraviolet light-emitting-diodes with 3% efficiency droop by using freestanding. manufacturing from GaAs substrate
High performance 380-nm ultraviolet light-emitting-diodes with 3% efficiency droop by using freestanding GaN substrate manufacturing from GaAs substrate Chen-Yu Shieh Ming-Ta Tsai Zhen-Yu Li Hao-Chung
More informationHow can MOCVD enable production of cost efficient HB LED's
How can MOCVD enable production of cost efficient HB LED's Dr. Frank Schulte AIXTRON SE Company and Market Market requests and challenges Answer from the technology Conclusion P 2 Confidential Proprietary
More informationCONVENTIONAL -plane InGaN GaN multiple
JOURNAL OF LIGHTWAVE TECHNOLOGY, VOL. 29, NO. 18, SEPTEMBER 15, 2011 2761 Investigation of Emission Polarization and Strain in InGaN GaN Multiple Quantum Wells on Nanorod Epitaxially Lateral Overgrowth
More informationGrundlagen der LED Technik
www.osram-os.com Grundlagen der LED Technik Dr. Berthold Hahn 8.3.14 Ilmenau 1 Dateienname ORG CODE Initiale Titel/Veranstaltung TT/MM/JJJJ Grundlagen der LED Technik 1. Einführung 2. Lichterzeugung im
More informationEPITAXY extended single-crystal film formation on top of a crystalline substrate. Homoepitaxy (Si on Si) Heteroepitaxy (AlAs on GaAs)
extended single-crystal film formation on top of a crystalline substrate Homoepitaxy (Si on Si) Heteroepitaxy (AlAs on GaAs) optoelectronic devices (GaInN) high-frequency wireless communication devices
More informationHigh-efficiency GaN-based light-emitting diodes fabricated with identical Ag contact formed on both n- and p-layers
High-efficiency GaN-based light-emitting diodes fabricated with identical Ag contact formed on both n- and p-layers Munsik Oh and Hyunsoo Kim * School of Semiconductor and Chemical Engineering and Semiconductor
More informationAnalysis of Phosphor Heat Generation and Temperature Distribution in Remoteplate Phosphor-Converted Light-Emitting Diodes
Proceedings of the Asian Conference on Thermal Sciences 2017, 1st ACTS March 26-30, 2017, Jeju Island, Korea ACTS-P00328 Analysis of Phosphor Heat Generation and Temperature Distribution in Remoteplate
More informationGROWTH AND CHARACTERIZATION OF III-NITRIDE SEMICONDUCTORS FOR HIGH-EFFICIENT LIGHT-EMITTING DIODES BY METALORGANIC CHEMICAL VAPOR DEPOSITION
GROWTH AND CHARACTERIZATION OF III-NITRIDE SEMICONDUCTORS FOR HIGH-EFFICIENT LIGHT-EMITTING DIODES BY METALORGANIC CHEMICAL VAPOR DEPOSITION A Ph.D Dissertation Presented to The Academic Faculty by Jeomoh
More informationSPIE NTU Student Chapter activities
SPIE NTU Student Chapter activities Names and affiliations of current officers: President, Yuan Hsing Fu, yhfu@phys.ntu.edu.tw Vice-President, Tai Chi Chu, d91222023@ntu.edu.tw Secretary, Hung Ji Huang,
More informationCrystalline silicon surface passivation with SiON:H films deposited by medium frequency magnetron sputtering
Available online at www.sciencedirect.com Physics Procedia 18 (2011) 56 60 The Fourth International Conference on Surface and Interface Science and Engineering Crystalline silicon surface passivation with
More information- DUV-LEDs - Development and Applications
2 October 23th 2015 Room 201, National Taiwan University Hospital International Convention Center - DUV-LEDs - Development and Applications Cyril Pernot Nagoya Development Detached Office Nikkiso Co.,
More informationDefects in Nitride Lasers
Defects in Nitride Lasers Julita Smalc-Koziorowska Institute of High Pressure Physics UNIPRESS, PAS, Sokolowska 29/37, 01-142 Warsaw, Poland TopGaN Ltd., Sokolowska 29/37, 01-142 Warsaw, Poland Thessaloniki
More informationCharacterisation of multiple carrier transport in indium nitride grown by molecular beam epitaxy
phys. stat. sol. (c) 4, No. 7, 2423 2427 (2007) / DOI 10.1002/pssc.200674780 Characterisation of multiple carrier transport in indium nitride grown by molecular beam epitaxy Tamara B. Fehlberg 1, Gilberto
More informationStudies on Si-doped AlGaN Epilayers
Studies on Si-doped AlGaN Epilayers 47 Studies on Si-doped AlGaN Epilayers Kamran Forghani Growth optimization of Si doped AlGaN epilayers with 20%, 30% and 45%Al content grown on AlGaN-sapphire by MOVPE
More informationARTICLE IN PRESS. Journal of Crystal Growth
Journal of Crystal Growth 312 (2010) 1311 1315 Contents lists available at ScienceDirect Journal of Crystal Growth journal homepage: www.elsevier.com/locate/jcrysgro Abbreviated MOVPE nucleation of III-nitride
More informationTechnology. Semiconductor Manufacturing. Hong Xiao INTRODUCTION TO SECOND EDITION SPIE PRESS
INTRODUCTION TO Semiconductor Manufacturing Technology SECOND EDITION Hong Xiao TECHNISCHE INFORMATIONSBiBUOTHEK UNIVERSITATSBIBLIOTHEK HANNOVER SPIE PRESS Bellingham,Washington USA Contents Preface to
More informationIII-V heterostructure TFETs integrated on silicon for low-power electronics
In the Quest of Zero Power: Energy Efficient Computing Devices and Circuits III-V heterostructure TFETs integrated on silicon for low-power electronics K. E. Moselund, M. Borg, H. Schmid, D. Cutaia and
More informationInvestigation of Efficiency and Droop Behavior Comparison for InGaN/GaN Super Wide-Well Light Emitting Diodes Grown on Different Substrates
Investigation of Efficiency and Droop Behavior Comparison for InGaN/GaN Super Wide-Well Light Emitting Diodes Grown on Different Substrates Volume 6, Number 6, December 2014 Tongbo Wei Lian Zhang Xiaoli
More informationA Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment
Paper: A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment Jian-Shian Lin Λ;ΛΛ, Chieh-Lung Lai Λ, Ya-Chun Tu Λ, Cheng-Hua Wu Λ, and Yoshimi Takeuchi ΛΛ Λ Mechanical and System Research
More informationA CRITICAL COMPARISON BETWEEN MOVPE AND MBE GROWTH OF III-V NITRIDE SEMICONDUCTOR MATERIALS FOR OPTO-ELECTRONIC DEVICE APPLICATIONS
A CRITICAL COMPARISON BETWEEN MOVPE AND MBE GROWTH OF III-V NITRIDE SEMICONDUCTOR MATERIALS FOR OPTO-ELECTRONIC DEVICE APPLICATIONS M.A.L. JOHNSON,**, ZHONGHAI YU *, J.D. BROWN *, F.A. KOECK *, N.A. EL-MASRY
More informationLarge-area laser-lift-off processing in microelectronics
Available online at www.sciencedirect.com Physics Procedia 41 (2013 ) 241 248 Lasers in Manufacturing Conference 2013 Large-area laser-lift-off processing in microelectronics R. Delmdahl*, R. Pätzel, J.
More informationCurrent injection 1.54 µm light-emitting devices based on Er-doped GaN/AlGaN multiple quantum wells
Vol. 6, No. 11 1 Nov 2016 OPTICAL MATERIALS EXPRESS 3476 Current injection 1.54 µm light-emitting devices based on Er-doped GaN/AlGaN multiple quantum wells T. M. AL TAHTAMOUNI,1,* J. LI,2 J. Y. LIN,2
More informationRecent Invited Presentations
Recent Invited Presentations 1. North China Electric Power University, Beijing, China, 03/16/2016 Amorphous Metal Oxide Thin Films in MOSFET, Nonvolatile Memory, and Optoeletronic Applications 2. Chinese
More informationThe components of. Technology focus: III-Vs on silicon. Fiber-optic gallium antimonide
76 Direct growth of III-V laser structures on silicon substrates From infrared to ultraviolet wavelengths, researchers are enabling lower-cost production of silicon photonics. Mike Cooke reports. The components
More informationHIGH-PERFORMANCE blue and green light emitting
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, VOL. 5, NO. 2, JUNE 2005 277 ESD Engineering of Nitride-Based LEDs Y. K. Su, S. J. Chang, S. C. Wei, Shi-Ming Chen, and Wen-Liang Li Abstract GaN-based
More informationAvailable online at ScienceDirect. Procedia Engineering 79 (2014 )
Available online at www.sciencedirect.com ScienceDirect Procedia Engineering 79 (2014 ) 333 338 37th National Conference on Theoretical and Applied Mechanics (37th NCTAM 2013) & The 1st International Conference
More informationGLOBAL warming and high oil prices have led to much
354 IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 50, NO. 5, MAY 2014 High-Efficiency and Crack-Free InGaN-Based LEDs on a 6-inch Si (111) Substrate With a Composite Buffer Layer Structure and Quaternary Superlattices
More informationEfficient 350 nm LEDs on low edge threading dislocation density AlGaN buffer layers
Efficient 350 nm LEDs on low edge threading dislocation density AlGaN buffer layers Richard Gutt a, Thorsten Passow *a, Wilfried Pletschen a, Michael Kunzer a, Lutz Kirste a, Kamran Forghani b, Ferdinand
More informationGaN Nano- and MicroLED Technology
Funded by the European Union - GA 737089 Kick-Off Meeting, Barcelona, Jan 17-18, 2017 1 ChipScope project kick-off meeting GaN Nano- and MicroLED Technology Hutomo Suryo Wasisto and Andreas Waag Institute
More informationHIGH-EFFICIENCY DILUTE NITRIDE MULTIJUNCTION SOLAR CELLS: INFLUENCE OF POINT DEFECTS ON THE DEVICE PERFORMANCE
HIGH-EFFICIENCY DILUTE NITRIDE MULTIJUNCTION SOLAR CELLS: INFLUENCE OF POINT DEFECTS ON THE DEVICE PERFORMANCE Ville Polojärvi, Arto Aho, Antti Tukiainen, Marianna Raappana, Timo Aho, Mircea Guina Optoelectronics
More informationAmorphous Silicon Solar Cells
The Birnie Group solar class and website were created with much-appreciated support from the NSF CRCD Program under grants 0203504 and 0509886. Continuing Support from the McLaren Endowment is also greatly
More informationHigh Efficiency UV LEDs Enabled by Next Generation Substrates. Whitepaper
High Efficiency UV LEDs Enabled by Next Generation Substrates Whitepaper Introduction A primary industrial market for high power ultra-violet (UV) LED modules is curing equipment used for drying paints,
More informationEnergy Efficient LEDs For Sustainable Solid State Lighting
Engineering Insights Conference UCSB 2008 Energy Efficient LEDs For Sustainable Solid State Lighting Steve DenBaars Solid State Lighting and Display Center Materials and ECE Departments University of California,
More informationLuminescent Materials: Phosphors and Organic LEDs Prof. Michael J. Sailor Department of Chemistry and Biochemistry University of California, San Diego
Luminescent Materials: Phosphors and Organic LEDs Prof. Michael J. Sailor Department of Chemistry and Biochemistry University of California, San Diego Outline I. Luminescence in Nature -Bioluminescence
More informationDirect green LED development in nano-patterned epitaxy
Invited Paper Direct green LED development in nano-patterned epitaxy Christian Wetzel and Theeradetch Detchprohm Future Chips Constellation, Rensselaer Polytechnic Institute, Troy NY 12180 U.S.A. Department
More information3.46 OPTICAL AND OPTOELECTRONIC MATERIALS
Badgap Engineering: Precise Control of Emission Wavelength Wavelength Division Multiplexing Fiber Transmission Window Optical Amplification Spectrum Design and Fabrication of emitters and detectors Composition
More informationAdvanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment
Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment Editors: E. P. Gusev Qualcomm MEMS Technologies San Jose, California, USA D-L. Kwong
More informationChemical analysis of Ti/Al/Ni/Au ohmic contacts to AlGaN/GaN heterostructures
Optica Applicata, Vol. XLIII, No. 1, 213 DOI: 1.277/oa1319 Chemical analysis of Ti/Al/Ni/Au ohmic contacts to AlGaN/GaN heterostructures WOJCIECH MACHERZYŃSKI *, KORNELIA INDYKIEWICZ, BOGDAN PASZKIEWICZ
More informationAnnouncement from ElectroniCast Consultants. LEDs Used in Test/Measurement, Medical & Other Science Devices. Market Forecast and Analysis
Announcement from ElectroniCast Consultants LEDs Used in Test/Measurement, Medical & Other Science Devices Market Forecast and Analysis 2016-2026 Date: April 13, 2017 Published: April 13, 2017 Text Pages:
More informationSolar Electric Power Generation - Photovoltaic Energy Systems
Stefan C.W. Krauter Solar Electric Power Generation - Photovoltaic Energy Systems Modeling of Optical and Thermal Performance, Electrical Yield, Energy Balance, Effect on Reduction of Greenhouse Gas Emissions
More informationFaceted inversion domain boundary in GaN films doped with Mg
Faceted inversion domain boundary in GaN films doped with Mg L. T. Romano* and J.E. Northrup Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, CA 94304 A. J. Ptak and T.H. Myers Department
More informationAdvances in Intense Pulsed Light Solutions For Display Manufacturing. XENON Corporation Dr. Saad Ahmed Japan IDW 2016
Advances in Intense Pulsed Light Solutions For Display Manufacturing XENON Corporation Dr. Saad Ahmed Japan IDW 2016 Talk Outline Introduction to Pulsed Light Applications in Display UV Curing Applications
More informationSupporting Information
Supporting Information Fast-Response, Sensitivitive and Low-Powered Chemosensors by Fusing Nanostructured Porous Thin Film and IDEs-Microheater Chip Zhengfei Dai,, Lei Xu,#,, Guotao Duan *,, Tie Li *,,
More informationADOPT Winter School Merging silicon photonics and plasmonics
ADOPT Winter School 2014 Merging silicon photonics and plasmonics Prof. Min Qiu Optics and Photonics, Royal Institute of Technology, Sweden and Optical Engineering, Zhejiang University, China Contents
More informationSublimation growth of thick freestanding 3C- SiC using CVD-templates on silicon as seeds
Sublimation growth of thick freestanding 3C- SiC using CVD-templates on silicon as seeds Philip Hens, Valdas Jokubavicius, Rickard Liljedahl, G Wagner, Rositsa Yakimova, P Wellmann and Mikael Syväjärvi
More informationR Sensor resistance (Ω) ρ Specific resistivity of bulk Silicon (Ω cm) d Diameter of measuring point (cm)
4 Silicon Temperature Sensors 4.1 Introduction The KTY temperature sensor developed by Infineon Technologies is based on the principle of the Spreading Resistance. The expression Spreading Resistance derives
More informationFABRICATION FOR MICRO PATTERNS OF NICKEL MATRIX DIAMOND COMPOSITES USING THE COMPOSITE ELECTROFORMING AND UV- LITHOGRAPHY
16 TH INTERNATIONAL CONFERENCE ON COMPOSITE MATERIALS FABRICATION FOR MICRO PATTERNS OF NICKEL MATRIX DIAMOND COMPOSITES USING THE COMPOSITE ELECTROFORMING AND UV- LITHOGRAPHY Tsung-Han Yu, Shenq-Yih Luo,
More informationWhite Paper: Pixelligent Internal Light Extraction Layer for OLED Lighting
White Paper: Pixelligent Internal Light Zhiyun (Gene) Chen, Ph.D., Vice President of Engineering Jian Wang, Ph.D., Manager, Application Engineering Pixelligent Technologies LLC, 6411 Beckley Street, Baltimore,
More informationFirst Electrically Pumped Hybrid Silicon Laser
First Electrically Pumped Hybrid Silicon Laser UCSB Engineering Insights Oct 18 th 2006 Mario Paniccia Intel Corporation 1 Sept 18 th 2006 What We are Announcing Research Breakthrough: 1st Electrically
More informationFe doped Magnetic Nanodiamonds made by Ion
Fe doped Magnetic Nanodiamonds made by Ion Implantation ChienHsu Chen a, I.C. Cho b, Hui-Shan Jian c and H. Niu a* a Nuclear Science and Technology Development Center, National Tsing Hua University, HsinChu
More information纳米压印技术最新进展. Obducat Technologies AB., Sweden Gang Luo,
纳米压印技术最新进展 Obducat Technologies AB., Sweden Gang Luo, 20170711 History 2016 Launch of SINDRE Large Area 2015 Acquire Solarsemi Gmbh 2015 Awarded by NNT for Pioneering NIL into production 2014 Launch and
More informationDeep-UV Light Emitting Diodes: An Experimental Investigation of Characterization and Optimization Techniques
Claremont Colleges Scholarship @ Claremont Pomona Senior Theses Pomona Student Scholarship 2005 Deep-UV Light Emitting Diodes: An Experimental Investigation of Characterization and Optimization Techniques
More informationPreface... VII ForewordbyDr.FranzAlt... IX Foreword by Dr. Hermann Scheer... XIII Table of Contents... XV. 1.3 Global warming by CO
Contents Preface... VII ForewordbyDr.FranzAlt... IX Foreword by Dr. Hermann Scheer... XIII Table of Contents.... XV 1 Introduction...1 1.1 World s Energy Consumption...1 1. CO -Emissions by Humankind...
More informationFigure 2.3 (cont., p. 60) (e) Block diagram of Pentium 4 processor with 42 million transistors (2000). [Courtesy Intel Corporation.
Figure 2.1 (p. 58) Basic fabrication steps in the silicon planar process: (a) oxide formation, (b) selective oxide removal, (c) deposition of dopant atoms on wafer, (d) diffusion of dopant atoms into exposed
More informationMOVPE growth of GaN and LED on (1 1 1) MgAl
Journal of Crystal Growth 189/190 (1998) 197 201 MOVPE growth of GaN and LED on (1 1 1) Shukun Duan *, Xuegong Teng, Yutian Wang, Gaohua Li, Hongxing Jiang, Peide Han, Da-Cheng Lu National Integrated Optoelectronics
More informationIHS. Report. Light-Emitting Diodes LED silicone encapsulant market to nearly double in size by 2017 compared to November ihs.
IHS Report Light-Emitting Diodes LED silicone encapsulant market to nearly double in size by 2017 compared to 2012 November 2013 ihs.com Richard Son, Senior Analyst(author), +82 31 704 7188, Richard.Son@ihs.com
More informationContents. 1. Introduction to Materials Processing Starting Materials 21. Acknowledgements
Preface Acknowledgements xiii xv 1. Introduction to Materials Processing 1 1.1 Materials Processing: Definition and Scope 1 1.2 Three Approaches to Materials Processing 4 1.3 Materials Processing Steps
More information(12) United States Patent
(12) United States Patent USOO9640724B2 (10) Patent No.: Shen et al. (45) Date of Patent: *May 2, 2017 (54) III-NITRIDE LIGHT EMITTING DEVICE (52) U.S. Cl. WITH DOUBLE HETEROSTRUCTURE CPC... HOIL 33/32
More informationChapter 1. Semiconductor Materials
Chapter 1 Semiconductor Materials 1.0 Introduction In this Chapter, the discussion of semiconductor types and materials used for fabrication of integrated circuit will be presented. The characteristics
More informationPoly-SiGe MEMS actuators for adaptive optics
Poly-SiGe MEMS actuators for adaptive optics Blake C.-Y. Lin a,b, Tsu-Jae King a, and Richard S. Muller a,b a Department of Electrical Engineering and Computer Sciences, b Berkeley Sensor and Actuator
More informationMaking III-V contact with silicon substrates
106Technology focus: III-Vs on silicon Making III-V contact with silicon substrates High-speed logic, high-frequency/high-power transistors and photonics systems could benefit from marrying with silicon
More informationFabrication of the Crystalline ITO Pattern by Picosecond Laser with a Diffractive Optical Element
Fabrication of the Crystalline ITO Pattern by Picosecond Laser with a Diffractive Optical Element C.W. Chien and C.W. Cheng* ITRI South Campus, Industrial Technology Research Institute, No. 8, Gongyan
More informationThermal management of the remote phosphor layer in LED systems
Thermal management of the remote phosphor layer in LED systems Indika U. Perera and Nadarajah Narendran* Lighting Research Center, Rensselaer Polytechnic Institute, 21 Union St., Troy, NY 12180 USA ABSTRACT
More informationand Technology of Thin Films
An Introduction to Physics and Technology of Thin Films This page is intentionally left blank An Introduction to Physics and Technology of Thin Films Alfred Wagendriste1 Institute of Applied and Technical
More information08. Market Landscape 08.1 Market overview 08.2 Market size and forecast by revenue 08.3 Five forces analysis 09. Market Segmentation by Application
Quantum dots Project Portfolio Quantum Dots 2017 Global Market Expected to Grow at CAGR 11.39% and Forecast to 2019 April 5, 2017April 5, 2017 researchreports2017 Bussiness, Chemical And Materials, Market
More informationLecture Day 2 Deposition
Deposition Lecture Day 2 Deposition PVD - Physical Vapor Deposition E-beam Evaporation Thermal Evaporation (wire feed vs boat) Sputtering CVD - Chemical Vapor Deposition PECVD LPCVD MVD ALD MBE Plating
More informationAmorphous Oxide Transistor Electrokinetic Reflective Display on Flexible Glass
Amorphous Oxide Transistor Electrokinetic Reflective Display on Flexible Glass Devin A. Mourey, Randy L. Hoffman, Sean M. Garner *, Arliena Holm, Brad Benson, Gregg Combs, James E. Abbott, Xinghua Li*,
More informationIn-Situ Monitoring of Pattern Filling in Nano-Imprint Lithography Using Surface Plasmon Resonance
Copyright 2011 American Scientific Publishers All rights reserved Printed in the United States of America Journal of Nanoscience and Nanotechnology Vol. 11, 1 6, 2011 In-Situ Monitoring of Pattern Filling
More informationElectron Channeling Contrast Imaging: Rapid Characterization of Semiconductors. Julia I. Deitz 1
Electron Channeling Contrast Imaging: Rapid Characterization of Semiconductors Julia I. Deitz 1 Introduction For semiconductor technologies, achievement of their ultimate potential depends greatly upon
More informationenabling tomorrow s technologies CVD Production Systems for Industrial Coatings powered by
enabling tomorrow s technologies CVD Production Systems for Industrial Coatings powered by www.cvdequipment.com Equipment Design, Engineering, and Manufacturing Thin film deposition systems for industrial
More informationMachining. composite materials. technology for. Principles and practice. Edited by. H. Hocheng WOODHEAD PUBLISHING
Machining technology for composite materials Principles and practice Edited by H. Hocheng WP WOODHEAD PUBLISHING, ^ Oxford Cambridge Philadelphia New Delhi Contents Contributor contact details xi Part
More informationInGaN/GaN microcolumn light-emitting diode arrays with sidewall metal contact
InGaN/GaN microcolumn light-emitting diode arrays with sidewall metal contact Duk-Jo Kong, Si-Young Bae, Chang-Mo Kang, and Dong-Seon Lee * School of Information and Communications, Gwangju Institute of
More informationFabrication Technology
Fabrication Technology By B.G.Balagangadhar Department of Electronics and Communication Ghousia College of Engineering, Ramanagaram 1 OUTLINE Introduction Why Silicon The purity of Silicon Czochralski
More informationSuperionic Solid State Stamping (S4)
Superionic Solid State Stamping (S4) Lead Faculty Researcher: Placid Ferreira Department: Materials Science & Engineering Hsu et al, Nano Letters, 2007 1. Description: This dry, single step, electrochemical
More informationLED Lighting. benefits. LED Lighting
LED Lighting LED Lighting benefits Compact LED construction, high operating efficiency, eco-friendliness and optimal lighting design / This is Why Sharp offers LED Lighting. Turn the many benefits of
More informationSolar Cells and Photosensors.
Designing Photonic Crystals in Strongly Absorbing Material for Applications in Solar Cells and Photosensors. Minda Wagenmaker 1, Ebuka S. Arinze 2, Botong Qiu 2, Susanna M. Thon 2 1 Mechanical Engineering
More informationResearch in physical properties of Al x Ga 1-x As III-V Arsenide ternary semiconductor alloys
Vol. 9(12), pp. 281-291, 30 June, 2014 DOI: 10.5897/IJPS2013.3838 ISSN 1992-1950 Article Number: 809ED7345860 Copyright 2014 Author(s) retain the copyright of this article http://www.academicjournals.org/ijps
More informationRDT&E BUDGET ITEM JUSTIFICATION SHEET (R-2 Exhibit)
PE 0601101E, R1 #2 COST (In Millions) FY 1998 FY 1999 FY 2000 FY 2001 FY 2002 FY 2003 FY 2004 FY 2005 Cost To Complete Total Cost Total Program Element (PE) Cost 66.706 64.429 64.293 68.792 69.837 75.398
More informationLecture 19 Microfabrication 4/1/03 Prof. Andy Neureuther
EECS 40 Spring 2003 Lecture 19 Microfabrication 4/1/03 Prof. ndy Neureuther How are Integrated Circuits made? Silicon wafers Oxide formation by growth or deposition Other films Pattern transfer by lithography
More informationFinal Report for AOARD Grant FA Focused Ion Beam Milling Applied in Future Tunable-Wavelength Nano-LED's Fabrication.
Final Report for AOARD Grant FA2386-08-1-4119 Focused Ion Beam Milling Applied in Future Tunable-Wavelength Nano-LED's Fabrication Date: 1/7/2010 Name of Principal Investigators: - e-mail address : cpliu@mail.ncku.edu.tw
More informationLOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS. Dr. Saad Ahmed XENON Corporation November 19, 2015
LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS Dr. Saad Ahmed XENON Corporation November 19, 2015 Topics Introduction to Pulsed Light Photonic sintering for Printed Electronics R&D Tools for
More information8. Epitaxy. - Extended single-crystal film formation on top of a crystalline substrate
8. Epitaxy 1. Introduction επι(epi placed or resting upon) ταξιζ(taxis arrangement) - Extended single-crystal film formation on top of a crystalline substrate - Homoepitaxy : Film and substrate are the
More informationMOCVD technology in research, development and mass production. H. Juergensen. AIXTRON AG, Kackertstr , D Aachen, Germany
MOCVD technology in research, development and mass production H. Juergensen AIXTRON AG, Kackertstr. 15-17, D-52072 Aachen, Germany e-mail: info@aixtron.com, phone: +49-241-8909-0, fax: +49-241-8909-40
More informationInvestigation of metal contacts via thermal treatment at Interfaces between low temperature Ag pastes and TCO layer for HIT solar cell
Investigation of metal contacts via thermal treatment at Interfaces between low temperature Ag pastes and TCO layer for HIT solar cell Ming-Shiou Lin, Kuang-Yang Kuo, Yong-Han Lin, Yueh-Lin Lee, Liang-Pin
More informationSTRUCTURE AND MORPHOLOGY OF INDIUM NITRIDE THIN FILMS GROWN BY PLASMA ASSISTED PLD: THE IMPACT OF NITROGEN FLOW AND SUBSTRATE TEMPERATURE
Romanian Reports in Physics, Vol. 65, No. 1, P. 213 218, 2013 PLASMA PHYSICS STRUCTURE AND MORPHOLOGY OF INDIUM NITRIDE THIN FILMS GROWN BY PLASMA ASSISTED PLD: THE IMPACT OF NITROGEN FLOW AND SUBSTRATE
More informationSingle Crystal Growth of Aluminum Nitride
Single Crystal Growth of Aluminum Nitride Hiroyuki Kamata 1, Yuu Ishii 2, Toshiaki Mabuchi 3, Kunihiro Naoe 1, Shoji Ajimura 4, Kazuo Sanada 5 Single crystalline aluminum nitride (AlN) is a promising material
More informationChallenges for Embedded Device Technologies for Package Level Integration
Challenges for Embedded Device Technologies for Package Level Integration Kevin Cannon, Steve Riches Tribus-D Ltd Guangbin Dou, Andrew Holmes Imperial College London Embedded Die Technology IMAPS-UK/NMI
More informationMaterials Characterization
Materials Characterization C. R. Abernathy, B. Gila, K. Jones Cathodoluminescence (CL) system FEI Nova NanoSEM (FEG source) with: EDAX Apollo silicon drift detector (TE cooled) Gatan MonoCL3+ FEI SEM arrived
More informationFABRICATION AND CHARACTERIZATION OF QUANTUM-WELL AND QUANTUM-DOT METAL CAVITY SURFACE-EMITTING NANOLASERS
FABRICATION AND CHARACTERIZATION OF QUANTUM-WELL AND QUANTUM-DOT METAL CAVITY SURFACE-EMITTING NANOLASERS By Eric Wei Senior Thesis in Electrical Engineering University of Illinois at Urbana-Champaign
More informationAIXTRON Investor Presentation. IR Presentation H1/2015 (FSE: AIXA, ISIN DE000A0WMPJ6, NASDAQ: AIXG, ISIN: US )
AIXTRON Investor Presentation IR Presentation H1/2015 (FSE: AIXA, ISIN DE000A0WMPJ6, NASDAQ: AIXG, ISIN: US0096061041) AIXTRON Investor Relations, September 2015 AIXTRON INVESTOR PRESENTATION 2 Forward-Looking
More informationSupplementary Figure 1 Scanning electron micrograph (SEM) of a groove-structured silicon substrate. The micropillars are ca. 10 μm wide, 20 μm high
Supplementary Figure 1 Scanning electron micrograph (SEM) of a groove-structured silicon substrate. The micropillars are ca. 10 μm wide, 20 μm high and own the gap of 10 μm. Supplementary Figure 2 Strictly
More information