Warpage Mechanism of Thin Embedded LSI Packages

Transcription

1 Nakashima et al.: Warpage Mechanism of Thin Embedded LSI Packages (1/10) [Technical Paper] Warpage Mechanism of Thin Embedded LSI Packages Yoshiki Nakashima*, Katsumi Kikuchi*, Kentaro Mori*, Daisuke Ohshima**, and Shintaro Yamamichi* *Device Platforms Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara , Japan **System Jisso Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara , Japan (Received June 29, 2010; accepted October 1, 2010) Abstract The warpage mechanism of a thin embedded LSI package with a thick Cu plate was investigated for various Cu plate thicknesses. The package warpage increased gradually as the Cu plate was made thinner. Even structures with a balanced Cu and resin layer configuration for the top and bottom portions of the embedded chip showed substantial warpage, especially in the chip region, that was greater than that for an unbalanced layer configuration. This indicates the existence of other warpage factors as well as unbalanced residual stress between the top and bottom of the chip. A Birth & Death finite element method simulation showed that the thermal residual stresses induced by the coefficient of thermal expansion mismatch for the LSI chip and embedding resin were concentrated in the resin surrounding the lateral sides of the chip and that the stresses increased with decreasing Cu thickness. The release of these tensile stresses resulted in package warpage. Keywords: Advanced Packaging, Embedded Device Technology, SiP, Simulation, Residual Stress 1. Introduction LSI packaging technologies are needed for fabricating thinner and higher-pin-count LSI packages to meet the market demands for thinner, smaller, and more functional mobile devices.[1] One way to achieve a thinner, higherpin-count LSI packaging structure is to realize a thinner alternative to conventional flip-chip ball-grid array (FCBGA) packaging. Our SIRRIUS (seamless interconnect for re-routing LSI using substrate) technology,[2 5] for example, is well suited to fabricating those alternatives, as shown in Fig. 1. The specifications of the embedded LSI and SIRRIUS packages are shown in Table 1. While several organizations have been developing packaging technologies that have structures similar to that of SIRRIUS,[6 9] SIRRIUS features the ability to embed a highpin-count LSI with a comparably thin structure and sufficient reliability. A reference FCBGA package and a SIRRIUS package were prepared for LSI chips with the same specifications. The total vertical thicknesses of these packages were 1.9 and 0.71 mm, respectively. This remarkable reduction in thickness was achieved by using a thinner LSI chip (only 50 μm), a coreless structure, and seamless copper posts Table 1 SIRRIUS package specifications. Fig. 1 Comparison of (a) Structure A, reference FCBGA package and (b) Structure B, our SIRRIUS package. LSI Package Size (mm) 9 9 Thickness (μm) 50 LSI pad count 1500 LSI pad pitch (μm) 160 (staggered area array) Size (mm) BGA pad count 625 BGA pad pitch (mm) 1.0 (area array) Wiring layer 3 BGA ball size (mm)

2 Transactions of The Japan Institute of Electronics Packaging Vol. 3, No. 1, 2010 for the interconnections instead of solder bumps. However, the continuing market trend makes it necessary to examine the possibility of making the SIRRIUS structure even thinner. Thinning or removing the characteristic 500-μm-thick Cu plate is a valid approach to making the package thinner. However, since the plate is used to control package warpage and remove LSI heat, research into ways to make the SIRRIUS package thinner must address the control of package warpage with a thinner Cu plate. We have now investigated several SIRRIUS package structures with thinner Cu plates or without any Cu plate in order to clarify the warpage mechanism. We performed a birth & death finite element method (FEM) analysis for further discussion on fabrication process flows and structures, though this thermal stress analysis is conventionally used to predict reliability after fabrication.[10, 11] We found that the Cu plate thickness reduction created residual tensile stress in the resin layers surrounding the chip, mainly in the areas lateral to the chip. The release of these tensile stresses, along with the release of the compressive stress in the chip, caused the package to warp. 2. Structures and Experimental Processes As mentioned above, one approach to thinning the structure is to thin or remove the Cu plate while retaining the embedding resin and wiring structure, as shown in Fig. 2. We used this approach to fabricate several structures for evaluation. The first structure, Structure C in Fig. 2 (b), had three wiring layers on the lower side of the LSI chip and a thinner or no Cu plate on the upper side of the chip, with an adhesive layer between the plate and the chip. The thickness of the thinned Cu plate was set to slightly less than half the original thickness. There are two factors that make Structure C susceptible to warpage: the structure is vertically asymmetric, so there is a vertical imbalance in the residual thermal stresses caused by the coefficient of thermal expansion (CTE) mismatch; and there is little in the structure besides the Cu plate to keep the package flat and stiff. The next structure fabricated, Structure D, is not affected by these two warpage factors. It is compared with Structure C on the same scale in Fig. 3. Vertical asymmetry was eliminated by introducing balance resin and remaining Cu layers above the chip. The remaining Cu layer was only 10 μm thick, approximately the same thickness as that of the first wiring layer. A glass cloth (GC) sheet was added to the same layer as the LSI chip to reinforce that layer so as to improve flatness and stiffness. The fabrication process flow for Structure C is shown in Fig. 4. Note that the direction of the cross-sectional illustrations is upside-down compared with Figs. 1 to 3. The LSI chips were pre-processed to form Cu posts on the LSI pads by semi-additive metallization. This was followed by back-grinding to make them 50 μm thick, 20-μm-thick adhesive layer lamination on the backside, and dicing to form 9-mm-square chips. The first process step was LSI chip mounting, as shown in Fig. 4 (a). The chips were stabilized by curing the adhesive layer. The CTE for the adhesive layers was 80 ppm. The chips were then embedded in 90-μm-thick epoxy resin using a simple vacuum lamination process, as shown in Fig. 4 (b). The CTE for the epoxy layer was 60 ppm. The Cu posts were then exposed by grinding the epoxy resin surface, as shown in Fig. 4 (c). A microscopic photo of the exposed Cu posts is shown in Fig. 5 (a). Next, the wiring layers were fabricated. The first Fig. 2 Comparison of (a) Structure B, our initial SIRRIUS package and (b) Structure C, our SIRRIUS package with thinned or removed Cu plate. Fig. 3 Comparison of (a) Structure C, our SIRRIUS package with thinned or removed Cu plate and (b) Structure D, antiwarpage structure. 48

3 Nakashima et al.: Warpage Mechanism of Thin Embedded LSI Packages (3/10) Fig. 4 Steps in fabrication of Structure C. Fig. 5 Photos of Structure C: (a) microscopic photo of exposed Cu posts; (b) photo of first wiring layer. fan-out wiring layer was fabricated using semi-additive metallization, as shown in Fig. 4 (d). A photo of the wiring layer is shown in Fig. 5 (b). Then, the second and third fanout wiring layers were fabricated, with resin layers that had the same physical properties as the cover resin and balance resin layers. This process was followed by solder resist (SR) formation and package dicing, as shown in Figs. 4 (e) and (f), respectively. The last process was Cu plate etching, as shown in Fig. 4 (g). The fabrication process flow for Structure D is shown in Fig. 6. The first step was balance resin layer lamination, as shown in Fig. 6 (a). The same resin used for chip embedding with Structure C was laminated on the Cu plate by simple vacuum lamination to a thickness of 20 μm. Next was LSI chip mounting. The chips were the same as those used for Structure D. The next step, resin-gc sheet and cover resin lamination started with the formation of square holes for the chips on 50-μm-thick resin-gc sheets, or epoxy resin sheets reinforced by GC. Then the resin-gc sheet and a 20-μm-thick epoxy resin sheet were laminated, and the LSI chips were embedded in the layers, as shown in Fig. 6 (c). The laminated resin-gc sheet created a reinforcement layer, which had a CTE of 24 ppm. The epoxy resin sheet, which is called the cover resin layer, was composed of the same material as the balance resin layer. Once the LSI chips had been embedded into the resin layers, the Cu posts were exposed using the same grinding process as that used for Structure C, as shown in Fig. 6 (d). A microscopic photo of the posts is shown in Fig. 7 (a). The cover resin layer thickness is the same as the Cu post thickness between the surface of the chip passivation film (PF) resin and the surface of the cover resin. We measured the cover resin layer thicknesses at the center of four chips after the grinding. The thicknesses of the four chips selected near the four edges of the work were 10.5, 12.1, 13.1 and 13.4 μm respectively. The variation of the thickness is within approximately 3 μm. Next, the first wiring layer was fabricated using the same process as that used for Structure C, as shown in Fig. 6 (e). A photo of the layer is shown in Fig. 7 (b). We omitted the second and third wiring layer formation processes for Structure D because the vertical balance effect was the focus in this experiment. In the last step, the Cu plate was etched so that a Cu layer about 10 μm thick remained, as shown in Fig. 6 (f). The resulting structure is basically unsusceptible to the warpage factors. We measured the average thicknesses of the balance resin layer, cover resin layer, reinforcement layer, adhesive layer, and LSI layer with PF resin in Structure D at the center, at the chip edge, and at the package edge after the process flow. As shown in Table 2, the cover resin layer was thicker at the package edge than at the center while the balance resin layer was thicker at the center than at the package edge. This tendency is explained by the shrinkage of the Cu plate, which causes the chips to take an arch form, after step (c) in Fig

4 Transactions of The Japan Institute of Electronics Packaging Vol. 3, No. 1, 2010 Fig. 6 Steps in fabrication of Structure D. Fig. 8 Two partial warpage definitions: (a) package warpage Wp is larger than chip region warpage Wc; (a) Wc is larger than Wp. Table 3 Average warpage for Structures C and D after Cu plate etching. Structure Structure-C Structure-D Cu plate thickness (μm) Warpage [Wp or Wc] (μm) 135 [Wp] 362 [Wp] 316 [Wc] 370 [Wc] Fig. 7 Photos of Structure D; (a) microscopic photo of exposed Cu posts; and (b) photo of first wiring layer. Table 2 Average layer thicknesses for Structure D. Thickness (μm) Layer PKG Edge Chip Edge Center Average Cover Resin LSI (w/pf) Adhesive Reinforcement Balance Resin Total Results and Discussion 3.1 Structures C and D To enable detailed discussion of the warpage, we defined two partial warpage values (Fig. 8). Warpage Wp is complete-package warpage and is the vertical distance between the highest and lowest points, excepting the embedded LSI chip region. Warpage Wc is embedded-chip-region warpage and is the vertical distance between the highest and lowest points of the region. The directions of the two warpages differed for the fabricated Structure C and Structure D samples. When warpage Wp exceeds warpage Wc, the warpage for the package was defined as Wp, as shown in Fig. 8 (a), and vice versa, as shown in Fig. 8 (b). The warpages for Structures C and D, as measured after Cu plate etching using the shadow Moiré technique and a stylus surface profiler, respectively, are shown in Table 3. The common warpage measurement line for both structures is shown in Fig. 9. In these measurements, the fan-out wiring layer side was up, as shown in Figs. 4 (g) and 6 (f). The warpage profiles after Cu-plate etching for Structure C, with Cu plate thicknesses of 250, 100, and 0 μm, and for Structure D, with a 10-μm-thick copper layer, are shown in Figs. 10 (a) and (b), respectively. 50

5 Nakashima et al.: Warpage Mechanism of Thin Embedded LSI Packages (5/10) Fig. 9 Common warpage measurement line. Fig. 11 Other two warpage factors investigated: imbalance in thermal history and thermal stress in adhesive layer. Fig. 10 Warpage forms for (a) Structure C and (b) Structure D samples. The warpage for Structure C with Cu plate 100 μm thick or less was significant. When the Cu plate thickness was 100 μm or more, the concave warpage, Wp, exceeded the convex warpage, Wc. This indicates that, with Cu plates, the CTE mismatch between the resin for the three fan-out wiring layers and the Cu plate was the dominant factor causing warpage. In contrast, without the Cu plate, the concave warpage, Wc, exceeded convex warpage, Wp. This indicates that the CTE mismatch between the LSI chip and the resin in the three fan-out wiring layers was the dominant factor causing the warpage. These results for Structure C were as expected. The warpage for Structure D was also remarkable, as shown in Fig. 10 (b). Convex warpage, Wc, exceeded concave warpage, Wp. Comparing warpage Wc for Structure C without the Cu plate with that for Structure D, we see that the warpage for Structure D, 370 μm, was larger than that for Structure C, 316 μm, as shown in Table 3. In our discussion here of warpage Wc, we focus on the thermal residual stress factors of the chip-embedding 9 9 mm central region of the mm package. For Structure C, the main warpage factor, especially for the chip-embedding region, should be the imbalance between the Si for the LSI chip and the resin for the three fan-out wiring layers. The resin for the fan-out layers was 140 μm thick, and they were only on the upper side of the LSI chip, as shown in Figs. 4 (g) and 6 (f). The CTE for the resin is much larger than that for the Si, which would result in comparable shrinkage for the three resin layers during the cooling phase following curing. Moreover, there was no stiff material to suppress the warpage after the Cu plate etching. These configuration and physical properties explain the observation of the large concave Wc. For Structure D, the resin layers for the chip-embedding region were on the upper and lower sides of the chip and had the same thickness. Therefore, if the resin layers shrank during the cooling phase, the shrink force should have been balanced. Moreover, the chip layer was reinforced to suppress warpage. Therefore, the larger warpage than for Structure C needed more explanation. We thus considered other factors which might explain the results for Structure D. 3.2 Factor Analysis and Discussion of Other Possible Warpage Factors We considered two other possible warpage factors for Structure D, which are illustrated in Fig. 11: the imbalance in the thermal history of the resin layers and the thermal stress in the adhesive layer. The balance resin layer was first laminated and cured on the Cu plate. Next, after LSI mounting, the reinforcement layer and cover resin layer were laminated and cured, as was the balance resin layer. Therefore, the balance resin layer was cured twice while the upper two layers were cured only once, resulting in an imbalance in the thermal history. The thermal stress in the adhesive layer likely caused the layer to shrink, resulting in convex warpage of the chips. To investigate the effect of these two factors, we performed an additional factor analysis experiment in which the wiring layer was not included. Cross-sectional illustrations of the two structures fabricated for the experiment are shown in Fig. 12. Both struc- 51

6 Transactions of The Japan Institute of Electronics Packaging Vol. 3, No. 1, 2010 Table 4 analysis. Pros and cons of three possible structures for FEM Fig. 12 Cross-sectional illustrations of (a) Structure E and (b) Structure F. Pros Cons Realization for the fabrication Known warpage mechanism discussion Realization for the fabrication Remaining two factors and further warpage mechanism discussion Further warpage mechanism discussion No realization for the wiring fabrication Obviously, Structure D was warped by another mechanism. To identify candidate factors, we performed a FEM simulation. Fig. 13 Results of factor analysis experiment: (a) warpage form for Structure E and (b) for Structure F. tures had embedded bare Si chips, simulating LSI chips. They were the same thickness and size as the LSI chips used for Structures C and D. The control sample structure, Structure E, is shown in Fig. 13 (a). It had the same resin configuration and was fabricated in the same way as Structure D. The experimental structure, Structure F, is shown in Fig. 13 (b). It was fabricated using a simultaneous lamination process to eliminate the two remaining factors. First, bare Si chips and a reinforcement layer with chip holes were set in place. Then, the two resin layers were laminated onto the upper and lower sides of the chip and reinforcement layer simultaneously. Next, the entire package was cured all at once. As a result, the thermal history was balanced, and there was no need for an adhesive layer. The warpage profiles for Structures E and F are shown in Fig. 13. As these warpage were too large for a stylus surface profiler or the shadow Moiré technique, we used a microscope that enabled us to measure the vertical level of the focus point and focused on certain points on the measurement line (Fig. 9). The warpages for the two structures were almost the same. They exceeded warpage Wc for both structures. These results indicate that these two other factors, imbalance in the thermal history of the resin layers and thermal stress in the adhesive layer, were not the main factors in the package warpage. 4. FEM Simulation First, we identified an appropriate structure for the FEM simulation. The pros and cons for possible structures are listed in Table 4. Structure E was not considered because its process flow and resin configuration are the same as those for Structure D. As shown in Table 4, the fabrication process flow for Structure C has already been developed, so fabrication is not a problem. However, the measured warpage is basically explained already, so this structure is not suitable for further warpage investigation. The fabrication process flow for Structure D has also been developed. Moreover, the warpage factor for this structure is not fully explained by a known mechanism. Additionally, with this structure, we can discuss the other two factors. The warpage mechanism for Structure F is also unknown, but a fabrication process with wiring has not been developed. We thus used Structure D for our thermo-mechanical FEM simulation using ANSYS mechanical. The model used for the simulation is illustrated in Figs. 14 and 15. The subject of the simulation was a work of several mm packages, and by setting symmetric boundaries in the simulation model, we calculated the model of one package in a practical manner. We set the fan-out wiring layer on the top, just as illustrated in Fig. 6. As shown in Fig. 14, we divided the first fan-out wiring layer (CAD design shown in Fig. 14 (a)) in the model into nine parts, and set the physical properties of the parts between Cu and air on the basis of the area ratio of the wirings, as shown in Fig. 14 (b). The crosssection line on the model shown in Fig. 14 (b) defines the 52

7 Nakashima et al.: Warpage Mechanism of Thin Embedded LSI Packages (7/10) Fig. 14 (a) Top view of Structure D package wiring layer and (b) top view of FEM model for ANSYS mechanical analysis, which is divided into nine parts on basis of Cu area ratio of wiring. Fig. 15 Cross-sectional views of embedded LSI components: (a) material configuration defined using ANSYS mechanical and (b) actual component configuration. cross-sectional maps of the residual stress contour maps. Figure 15 shows cross-sectional views of (a) the actual components in the LSI chip margin area and (b) the materials defined for the simulation. The first fan-out wiring layer, labeled 9 in Fig. 15 (a), corresponds to the Cu + air material in Fig. 15 (b), which means that, in this layer, there is no insulation material but air between the Cu wirings. We used the birth & death method [12] to simulate the fabrication process flow. In this method, insulator materials such as resin and adhesive layers appear (are born ) at the same time that these components are cured in the actual procedure, as shown in Table 5. The Cu plate disappears ( dies ) when it is etched out in the actual procedure. Other materials, such as Cu and Si, appear (are born ) with the insulator materials, or between processes. In this simulation, the physical properties of the material, such as Young s modulus, the CTE values, the Poisson ratio, and the glass transition temperature, were used as parameters in the calculation. However, the chemical shrinkage factors of the resins were not parameterized. Therefore, we were unable to verify the thermal history imbalance in this simulation. The points labeled I VII on the thermal condition chart in Table 5 are the process points at which the residual stresses were observed. Three observation points were set for the Cu plate etching process to enable detailed analysis of the warpage mechanism. Contour maps of the residual stresses at the observation points (I VII) are shown in Figs. 16 and 17 as seen from the cross section line in Fig. 14 (b). The scale for the residual stress is shown to the right of Fig. 16. The black and white shadings correspond to compressive and tensile residual stress, respectively. The first residual stress map, Fig. 16 I, is for the room temperature point after curing the balance-resin layer. The resin layer showed about MPa tensile stress due to shrinkage. The second map, Fig. 16 II, is for the room temperature point after mounting the LSI. Due to the CTE gap between Cu and Si, the Cu plate showed MPa tensile stress, and the LSI chip showed 100 to 0 MPa compressive stress. The third map, Fig. 16 III, is for the room temperature point after lamination and curing of the reinforcement and cover-resin layers. The reinforcement Table 5 Birth and Death simulation processes for Structure D. 53

8 Transactions of The Japan Institute of Electronics Packaging Vol. 3, No. 1, 2010 Fig. 16 Residual stress contour maps of cross-sectional views for process points I (balance resin layer lamination), II (LSI mounting), and III (LSI embedding). Fig. 18 Residual stress contour maps of cross-sectional views with enhanced vertical deformation for last two process points shown in Fig. 17: (a) VI and (b) VII. Fig. 17 Residual stress contour maps of cross-sectional views for process points IV VII (Cu plate etch-out). layer showed MPa tensile stress. Maps IV VII show the residual stress distributions for the Cu plate-etching process. At the earlier points of the process (IV-V), there was MPa tensile stress for the reinforcement layer. At the following point (VI), MPa tensile stress remained in almost all regions of the reinforcement layer; however, in the vicinity of the LSI chip, tensile stress was greater than 400 MPa. At the last point (VII), there was almost zero stress in the reinforcement layer while there was stress greater than 500 MPa near the LSI chip. These results indicate that compressive stress in the LSI chip and/or Cu plate, caused by reinforcement layer shrinkage, gradually concentrated in the vicinity of the LSI chip as the Cu plate was etched. The compressive stresses were mainly balanced by the reaction force of the thick Cu plate before point V. Figures 18 (a) and (b) shown enlarged images of the VI and VII contour maps, with vertically enhanced deformation or warpage. Figure 18 (a) shows the contour map for a sample with a Cu plate one-third the original size, and Fig. 18 (b) shows the map for a sample without a Cu plate. The lower side of the LSI chip showed tensile stress of around MPa for both maps, meaning that this part had no effect on the warpage. The upper side of the LSI Fig. 19 Overhead views of Structure D at process point after Cu plate etch out: (a) complete package simulation model, (b) maximum principal stress vector map for central region, middle layer meshes of chip and surrounding resin, and (c) enlarged and simplified figure of nearside edge of (b). chip showed tensile stress of between 600 and 700 MPa for both maps, so this part also had little effect on the warpage. However, lateral to the chip, the tensile stress distribution was clearly different. Along with the Cu-etching process, the upper parts of the lateral sides of the chip showed stronger tensile stresses while the lower parts of the lateral sides showed weaker tensile stresses. This means that the tensile stresses on the lateral sides of the chip were released in the lower parts. This caused the chip to warp convexly on its lateral side, as shown in Fig. 18 (b). To discuss the directions of the stress in the chip itself and in its vicinity, as shown in Fig. 18 (b), we use Fig. 19 (a), which shows an overhead view of the ANSYS simulation model for the entire Structure D package after Cuplate etching. The chip and its surrounding region are enlarged in Fig. 19 (b) and shown as a map of the maximum principal stress vectors for each mesh of the model. The meshes in the map are located in the central region of the middle layer of the package, including the LSI chip meshes. The principal stress vectors are set to be positive 54

9 Nakashima et al.: Warpage Mechanism of Thin Embedded LSI Packages (9/10) in tensile, and negative in compressive, just as for Figs. 16, 17, and 18. Figure 19 (c) shows an enlarged and simplified illustration of four meshes at the near edge of the map in Fig. 19 (b). The mesh with Vector A is for a part of the chip, and the other three meshes are for parts of the surrounding resin-gc area. As these vectors in Fig. 19 (c) show, the resin-gc meshes have tensile stresses parallel to the chip side as maximum principal stresses. In contrast, the maximum principal stress for the chip mesh is compressive stress in the vertical direction ( Vector A ). This means that the minimum and middle principal stresses for the chip, which should be larger compressive stresses than the maximum principal stress shown as Vector A, are in horizontal directions. In short, these tensile stresses were caused by the shrinkage of the resin and GC surrounding the LSI chip., For the stress balance of these tensile stresses, the compressive stresses were generated in the chip horizontally. Therefore, from Fig. 18 (b), we can understand that the tensile stresses surrounding the chip (Figs. 19 (b) and (c)) were partially released in the lower parts of the structure lateral to the chip after Cu-plate etching. This stress release created substantial convex warpage in the region surrounding the chip. Also, the compressive stresses created in the chip caused the entire chip to warp convexly, as shown in Fig. 18 (b). We thus conclude that for Structure D, the Cu-plate etching created residual tensile stress in the resin layers surrounding the chip, mainly in the areas lateral to the chip. The package warpage was caused by the release of these tensile stresses, along with the release of the compressive stress in the chip. This mechanism can also be applied to the warpage for Structure F. In the resin-curing process after the simultaneous lamination, tensile stress was created in the areas lateral to the chip, which was immediately released by the package warpage. 5. Conclusion We fabricated several different structures to investigate the warpage mechanism for thin embedded LSI packages. We found that such warpage factors as an imbalance in the resin configuration above and below the LSI chip, the reduced use of stiff materials, an imbalance in the thermal history, and thermal stress in the adhesive layer were not the dominant factors. The results of a birth and death FEM simulation showed that, after the Cu-plate etching, the tensile residual stresses in the embedded LSI layer gradually concentrated in the area surrounding the chip, that the stresses increased with decreasing Cu-plate thickness, and that the warpage was caused by the release of these tensile stresses, along with the compressive stress in the chip. Therefore, simple structural considerations are insufficient for obtaining a reduced-warpage structure. In this study, when the Cu plate thickness was 100 μm or less, we did not find a package without substantial warpage, which was the case with Structures D and F as well. The material properties should also be considered, which could change these balanced structures into reducedwarpage structures. One possible consideration for the material properties is the use of a resin with less tensile stress in the areas lateral to the LSI chips. The resin could be stiffer to reduce the CTE mismatch or softer to reduce the elastic modulus. Acknowledgments We thank Dr. Yasunori Mochizuki, Mr. Kazuhiro Baba, Mr. Tomoo Murakami, Mr. Masanobu Hashimoto, and Dr. Takashi Harada of NEC Corporation, and Dr. Hideki Sasaki of Renesas Electronics Corporation for their encouragement and useful feedback and suggestions. We also thank Mr. Seiicihro Ohkawa and Ms. Keiko Kishino of NEC Informatec Systems Ltd. for their guidance on the simulation. References [1] ITRS 2009, Assembly and Packaging White Paper. [2] K. Mori, et al., A Novel Ultra-Thin Package for Embedded High-Pin-Count-LSI Supported by Cu plate, Proc. 59th IEEE Electronic Components and Technology Conf., San Diego, CA, May [3] D. Ohshima, et al., Electrical Design and Demonstration of an Embedded High-pin-count LSI Chip package, Proc. 59th IEEE Electronic Components and Technology Conf., San Diego, CA, May [4] H. Murai, et al., A Direct Fanning-out Packaging Technology using Cu Base Plate for Embedded Fine-pad-pitch LSI, Proc. 42nd IMAPS, San Jose, CA, November [5] K. Mori, et al., Embedded Active Packaging Technology for High-pin-count LSI with Cu plate. Proc. 60th IEEE Electronic Components and Technology Conf., Las Vegas, NV, June [6] R. Fillion, et al., Embedded Chip Build-Up Using Fine Line Interconnect, Proc. 57th IEEE Electronic Components and Technology Conf., Reno, NV, May

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