Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC
|
|
|
- Abel McCormick
- 6 years ago
- Views:
Transcription
1 Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC P. Sauer,H.-G.Lotz, A. Hellmich R. Kukla, J. Schröder Applied Films GmbH &,Co. KG, Alzenau, Germany
2 Outline n n n n n n Current ITO layers on glass and web Motivation for MF coating Influence of magnetic field Processing Equipment Results Conclusions
3 Current ITO layers on glass and web ITO on glass at higher substrate temperatures > C Low specific resistivity < 200 micro * Ohm * cm Thickness of 20 Ohm layer : 100 nm. J ITO on web at low substrate temperatures < C High specific resistivity ~ 500 micro * Ohm * cm Thickness of 20 Ohm layer : 250 nm. è high costs, poor optical properties (absorption, light scattering) L
4 Sheet Resistance of ITO layers for different Applications Fraunhofer Institute FeP, Dresden
5 Layer thickness for different specific Resistivities of ITO ITO Layer Thickness [nm] Mikro Ohm * cm 500 Mikro Ohm * cm 400 Mikro Ohm * cm 300 Mikro Ohm * cm 200 Mikro Ohm * cm Sheet Resistance [Ohm/Square]
6 ITO Transmission for different Layer Thickness Values 300 nm ITO 100 nm ITO
7 Motivation for Mid Frequency Sputtering of ITO Higher ion energy è Higher Surface Mobility? è Effect similar to higher Substrate Temp.? è Lower Specific Resistivity? Reduced arcing è Less nodule growth? è Longer target utilization without cleaning? è Lower Specific Resistivity?
8 Smart Web Sputter Coating Machine
9 Sputter Deposition of ITO in MF-Mode MF/AC Power Supply Matching Box Process Conditions: Gas Flow P(Cathode) 1-3 kw Ar flow rate sccm Ar/O 2 flow rate 0-90 sccm Total Target Surface 1400 cm 2 Effective Power Density 0,7-2,1 W/cm 2 Rate (1,2,3 kw) 10, 20, 30 nm*m/min Cathode Substrate (PET)
10 Sputter Deposition of ITO in DC-Mode DC Power Supply left right Process Conditions: Gas Flow P(Cathode on left side) 1,368 kw P(Cathode on right side) 1,290 kw Ar flow rate 255 sccm Ar/O 2 flow rate sccm Total Target Surface 700 cm 2 Effective Power Density Rate of Cathode on left side 1,95 W/cm 2 16 nm*m/min Cathodes Substrate (PET) Rate of Cathode on right side 16,6 nm*m/min
11 Specific Resistivity for different power levels in MF-Mode on Glass Specific Resistivity [Mikro Ohm * cm] P = 1 kw P = 2 kw P = 3 kw Ar/O2-Flow [sccm/min]
12 Specific Resistivity on Glass and PET (MF-Mode, 2 kw) Specific Resistivity [Mikro Ohm * cm] PET Glass Glas Folie Ar/O2 - Flow [sccm/min]
13 Specific Resistivity on PET (MF-Mode, 2 kw) for different layer thickness values 750 Specific Resistivity [Mikro Ohm * cm] ITO Layer Thickness [nm]
14 Specific Resistivity and Roughness of MF sputtered ITO layers on PET (ITO Thickness nm, 1.0 kw) Specific Resistivity [MicroOhm * cm] Roughness Rmax [nm] ITO Layer Thickness [nm]
15 Specific Resistivity and Absorption of MF sputtered ITO layers on PET (Thickness 40 nm, 1.0 kw, A=1-R-T) 1400, ,0 14 Specif. Resistivity [mikro Ohm*cm] 1000,0 800,0 600,0 400,0 200,0 Specific Resistivity Absorption (incl. PET) Absorption (400 nm) in % 0,0 0 0,0 10,0 20,0 30,0 40,0 50,0 60,0 70,0 Ar/O2 Flow [sccm/min]
16 Specific Resistivity and Absorption of DC sputtered ITO layers (Thickness nm, 1,37 kw, A=1-R-T) 1400,0 16 spec. Resistivity (MikroOhm*cm) 1200,0 1000,0 800,0 600,0 400,0 200,0 Specific Resistivity Absorption (incl. PET) Absorption (400 nm) [%] 0, Ar/O 2 -Flow [sccm/min] 0
17 Specific Resistivity of MF-sputtered ITO layers on Glass and PET substrates (P=1.3 kw). Rate of first Cathode: 16 nm * m / min; Rate of second Cathode = 16,6 nm * m / min spec. Resistivity (MikroOhm*cm) Left cathode 22 sccm/min Right cathode Glass LS, Rate PET LS Glass RS PET RS Ar/O2-Flow [sccm/min]
18 Influence of magnetic field on Target utilization and Specific Resistance ka Magnetic field strength N/S/N magnetic field HLK optimised mag. field ToraMag Targetwidth / mm
19 Erosion profiles using different magnetic fields Targetthickness / mm Targetwidth / mm Cathode utilization HLK 22 % ToraMag 40 %
20 Specific Resistivity on PET for different magnetic field strength Spec. Resistance ITO Specific Resistance HLK ToraMag ITO Layerthickness
21 Conclusions : Similar layer properties were obtained with MF and DC sputtering. Operating point for sputter process must be optimized for both cathodes separately. No beneficial effect of MF sputtering compared to DC. Higher Target utilization using adapted mag. Fields for planar cathodes. Save Money :Use optimized mag. fields Don t change from DC to MF sputtering of ITO
22 Thank you
23 BACK TO LIST
Magnetron Sputter Cathodes planar & rotatable. Linear ion sources. Reactive gas controller & endpoint detector
GENCOA products cover 3 sputtering related areas Magnetron Sputter Cathodes planar & rotatable Reactive gas controller & endpoint detector Linear ion sources Other activities include on-site process implementation,
ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING?
ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING? Paul Lippens AIMCAL Web coating conference 2012 Outline Introduction
Roll-to-roll Technology for Transparent High Barrier Films
Roll-to-roll Technology for Transparent High Barrier Films Presented at the AIMCAL Fall Technical Conference, October 19-22, 2008, Myrtle Beach, SC, USA Nicolas Schiller, John Fahlteich, Matthias Fahland,
AC Reactive Sputtering with Inverted Cylindrical Magnetrons
AC Reactive Sputtering with Inverted Cylindrical Magnetrons D.A. Glocker, Isoflux Incorporated, Rush, NY; and V.W. Lindberg and A.R. Woodard, Rochester Institute of Technology, Rochester, NY Key Words:
Advanced Sheet-to-Sheet and Roll-to-Roll thin-film processing on ultra-thin flexible glass for flexible electronic devices
Advanced Sheet-to-Sheet and Roll-to-Roll thin-film processing on ultra-thin flexible glass for flexible electronic devices M. Junghaehnel 1, J. Westphalen 1, F. Naumann 2, G. Lorenz 2, M. Fahland 1, S.
Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD
AIMCAL 2005 Myrtle Beach, SC, USA, October 19th, 2005 Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD E. Reinhold, C. Steuer VON ARDENNE Anlagentechnik GmbH, Dresden, Germany
Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets
Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets Frank Papa*, Dermot Monaghan**, Victor Bellido- González**, and Alex Azzopardi** *Gencoa Technical & Business Support in US,
Vacuum Equipment for TCO and AR Coatings Deposition by Reactive Magnetron Sputtering
Vacuum Equipment for TCO and AR Coatings Deposition by Reactive Magnetron Sputtering E. Yadin; V. Kozlov; E. Machevskis, Sidrabe, Inc., 17 Krustpils str.,riga, LV1073, Latvia. Tel: +371 7249806, Fax: +371
1 Introduction. 2 Basic Technology
Innovative Clear Barrier Technology for the Packaging Industry Nicolas Schiller 1, Steffen Straach, Steffen Günther Fraunhofer FEP, Germany Alexandra L. Quiceno G., Antonio García Contreras BIOFILM, Columbia
PRECISION OPTICAL FILTERS BY EOSS - ENHANCED OPTICAL SPUTTERING SYSTEM. Fraunhofer
PRECISION OPTICAL FILTERS BY EOSS - ENHANCED OPTICAL SPUTTERING SYSTEM EOSS ENHANCED OPTICAL SPUTTERING SYSTEM Fraunhofer IST, Braunschweig Contact: Dr. M. Vergöhl +49 531 2155 640 EOSS Coating System
Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties
Journal of Multidisciplinary Engineering Science and Technology (JMEST) Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties Ahmed K. Abbas 1, Mohammed K. Khalaf
Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high
Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high vacuum ~10-7 torr Removes residual gases eg oxygen from
Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications
Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications AIMCAL 2016 Cindy Steiner John Fahlteich Dresden, 01.06.2016 page 1 Ethylene Tetrafluoroethylene (ETFE) semi-crystalline
High Rate low pressure PECVD for barrier and optical coatings
High Rate low pressure PECVD for barrier and optical coatings, Matthias Fahland, John Fahlteich, Björn Meyer, Steffen Straach, Nicolas Schiller Outline Introduction PECVD New developments magpecvd arcpecv
Productivity versus Profitability in Vacuum Web Coating
Productivity versus Profitability in Vacuum Web Coating Liz Josephson, Applied Films Corp., Longmont, USA Dirk Hoffmann, Applied Films GmbH & Co KG, Alzenau, Germany Gerard Loebig, Applied Films GmbH &
Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating
Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating Dr Tony Williams Gencoa Ltd, UK Victor Bellido-Gonzalez, Dr Dermot Monaghan, Dr Joseph Brindley, Robert Brown SVC 2016,
micro resist technology
Characteristics Processing guidelines Negative Tone Photoresist Series ma-n 1400 ma-n 1400 is a negative tone photoresist series designed for the use in microelectronics and microsystems. The resists are
Gridless end-hall. Ion Sources. For Ion Assisted Thin Film Deposition & Substrate Cleaning
Gridless end-hall Ion Sources For Ion Assisted Thin Film Deposition & Substrate Cleaning End-Hall Ion Sources mark I Ion Source The Mark I End-Hall is ideal for small research and development and pilot
HiPIMS Technology: advantages and disadvantages
Vacuum plasma technology HiPIMS Technology: advantages and disadvantages Cr - DC Cr - HiPIMS Alessandro Patelli alessandro.patelli@venetonanotech.it Outline 1. What is HiPIMS Ti target surface 2. What
Applied Research for Vacuum Web Coating: What is Coming Next?
Applied Research for Vacuum Web Coating: What is Coming Next? Matthias Fahland, John Fahlteich, Steffen Günther, Manuela Junghähnel, Claus Luber, Nicolas Schiller, Cindy Steiner, Steffen Straach, Michiel
ZnO-based Transparent Conductive Oxide Thin Films
IEEE EDS Mini-colloquium WIMNACT 32 ZnO-based Transparent Conductive Oxide Thin Films Weijie SONG Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, P. R. China
Hitachi Anisotropic Conductive Film ANISOLM AC-8955YW. Issued 2007/03/30
Hitachi Chemical Data Sheet Hitachi Anisotropic Conductive Film ANISOLM AC-8955YW Issued 27/3/3 1. Standard specification, bonding condition, storage condition and characteristic...1 2. Precautions in
Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material
Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material on any substrate (in principal) Start with pumping down
High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets
High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets H. Zhu 1, 2, *, J. Hüpkes 1, E. Bunte 1 1 IEF5-Photovoltaik, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany
Thin Films & AR Coated. Viewports. Thin Film & AR Coated. Viewports
Thin Films & AR Item Page Thin Film Coatings Introduction P 02 Kodial Zero Length with Anti-Reflective Coatings P 04 Kodial Zero Length with Anti-Reflective Coatings-Non-Magnetic P 07 Kodial Zero Length
TUTORIAL ON SPUTTER DEPOSITION
MATERION ADVANCED CHEMICALS COATING MATERIALS NEWS September 2011 Volume 22 Issue 1 TUTORIAL ON SPUTTER DEPOSITION NEW ON THE WEB Non-Silicon Thin-Film PV Materials Progress and Challenges by - David A.
2007 PLACE Conference September 16-20 St Louis, MO Nano-Composite Polymer Optical Coatings Vampire Optical Coatings, Inc. Tom Faris vcoat@copper.net Introduction What is a nano-composite polymer coating?
Novel Solutions for ESD Sensitive Devices
Novel Solutions for ESD Sensitive Devices Chris Schreiber Magnecomp cschreiber@magnecomp.com Safely Dissipating ESD Problem Static Charging is created by either Tribocharging or Induction and the uncontrolled
Sputtered Zinc Oxide Films for Silicon Thin Film Solar Cells: Material Properties and Surface Texture
Poster FVS Workshop 2002 Sputtered Zinc Oxide Films for Silicon Thin Film Solar Cells: Material Properties and Surface Texture Texture etching of sputtered ZnO:Al films has opened up a variety of possibilities
A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering
Thin Solid Films 476 (2005) 59 64 www.elsevier.com/locate/tsf A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering Seung-Ik Jun a, *, Timothy E. McKnight
Precision Optical Engineering
Precision Optical Engineering Products: Prisms Windows Mirrors Flats and Master angles Sight Glasses Key Features: Prisms (Contacted, Cemented, AR coated, Mounted) Windows (Flat, wedged, curved, drilled,
Laser Micromachining of Bulk Substrates and Thin Films Celine Bansal
Laser Micromachining of Bulk Substrates and Thin Films Celine Bansal Oxford Lasers Ltd Moorbrook Park Didcot, Oxfordshire, OX11 7HP Tel: +44 (0) 1235 810088 www.oxfordlasers.com Outline Oxford Lasers Importance
Innovative Laser Processing Technologies
Innovative Laser Processing Technologies Reinhard Ferstl Director Sales & Marketing EMEA / Asia Corning Laser Technologies September 21, 2016 2016 Corning Incorporated Corning Market Segments and Additional
"ITO Film Trend for Touch Panel Applications"
AIMCAL Web Coating Conference 2011 October 23-26 Reno, Nevada USA 1 "ITO Film Trend for Touch Panel Applications" Teijin Chemicals Ltd. Haruhiko Itoh 2 Content 1. Structure and Features of TCF 2. Touch
Understanding Optical Coatings For Military Applications
Understanding Optical Coatings For Military Applications By Trey Turner, Chief Technology Officer, REO Virtually all optical components used in military applications, such as target designation, rangefinding
Arcing prevention by dry clean optimization using plasma parameter monitoring
Arcing prevention by dry clean optimization using plasma parameter monitoring Das diesem Bericht zugrundeliegende Vorhaben wurde mit Mitteln des Sächsischen Staatsministeriums für Wirtschaft und Arbeit
Hitachi Anisotropic Conductive Film ANISOLM AC-7106U
HITACHI CHEMICAL DATA SHEET Hitachi Anisotropic Conductive Film ANISOLM AC-7106U 1. Standard Specification, Bonding and Storage Conditions, Reparability, and Characteristics... 1 Page 2. Precautions in
Supplementary Figure S1 Crystal structure of the conducting filaments in sputtered SiO 2
Supplementary Figure S1 Crystal structure of the conducting filaments in sputtered SiO 2 based devices. (a) TEM image of the conducting filament in a SiO 2 based memory device used for SAED analysis. (b)
HiPIMS Deposition of Metal and Oxide Coatings
HiPIMS Deposition of Metal and Oxide Coatings 1 GT West, 1 PJ Kelly, 1 P Barker, 2 JW Bradley and 2 A Mishra 1. Surface Engineering Group, Manchester Metropolitan University, UK 2. Electrical Engineering
Via Fill in Small Trenches using Hot Aluminum Process. By Alice Wong
Via Fill in Small Trenches using Hot Aluminum Process By Alice Wong Goals for Project Good Via Fill in Small contact holes using hot aluminum process Be able to get good images of the contact holes using
Template fabrication schemes for step and flash imprint lithography
Microelectronic Engineering 61 6 (00) 461 467 www.elsevier.com/ locate/ mee Template fabrication schemes for step and flash imprint lithography * E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi,
Using a standard Penning Gauge as a powerful means of monitoring and feedback control
Gencoa - Dermot Monaghan Using a standard Penning Gauge as a powerful means of monitoring and feedback control Victor Bellido-González, Sarah Powell, Benoit Daniel, John Counsell, Dermot Monaghan Structure
II. NEG THIN FILM DEPOSITION
Deposition of Non-Evaporable Getter Thin Films and Vacuum Pumping Performances Ankit Sur Engineering Department, Wayne State University, Detroit, MI 48202 The ERL (Energy Recovery Linac) proposed at Cornell
LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS. Dr. Saad Ahmed XENON Corporation November 19, 2015
LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS Dr. Saad Ahmed XENON Corporation November 19, 2015 Topics Introduction to Pulsed Light Photonic sintering for Printed Electronics R&D Tools for
Development of low roughness, low resistance bottom electrodes for tunnel junction devices
Development of low roughness, low resistance bottom electrodes for tunnel junction devices Designing and assembly of a new annealing setup for 150mm wafers David Filipe Coelho de Almeida Aurélio Setembro
IMRE/ETPL Flagship Project
IMRE/ETPL Flagship Project Nanoparticulate Barrier Films & Gas Permeation Measurement Techniques for Thin Film Solar & Display Application Problems Senthil Ramadas Institute of Materials Research & Engineering
Metallization deposition and etching. Material mainly taken from Campbell, UCCS
Metallization deposition and etching Material mainly taken from Campbell, UCCS Application Metallization is back-end processing Metals used are aluminum and copper Mainly involves deposition and etching,
Challenges for Commercially viable Transparent Conductive Oxide Layers
Challenges for Commercially viable Transparent Conductive Oxide Layers Arkema Inc. 900 First Ave., King of Prussia, PA 19406 R. Y. Korotkov, L. Fang, P. Ricou, M. Bluhm, J. Coffey, C. Polsz and G. Silverman
Analysis of optical properties of solar energy materials
Analysis of optical properties of solar energy materials Comices Energie solaire - Namur - 23/04/2012 Michel Voué Physique des Matériaux et Optique Centre de Recherche en Physique des Matériaux Université
] [ High Power Impulse Magnetron Sputtering (HIPIMS) A New Tool for Interface Engineering
![] [ High Power Impulse Magnetron Sputtering (HIPIMS) A New Tool for Interface Engineering](/thumbs/73/69324238.jpg "] [ High Power Impulse Magnetron Sputtering (HIPIMS) A New Tool for Interface Engineering")
[ High Power Impulse Magnetron Sputtering (HIPIMS) A New Tool for Interface Engineering A. P. Ehiasarian A.Ehiasarian@shu.ac.uk Motivation Goal: Improvement of adhesion of PVD coatings Objectives: Local
Full Nanomechanical Characterization of Ultra-Thin Films
APPLICATION NOTE By: Jeffrey Schirer and Julia Nowak, Ph.D. Hysitron, Inc. Eiji Kusano and Mune-aki Sakamoto Department of Chemistry, Kanazawa Institute of Technology, Japan Full Nanomechanical Characterization
Woven Electrodes for Optoelectronic Devices. Peter Chabrecek. Sefar AG, 9425 Thal, Switzerland
Peter Chabrecek Sefar AG, 9425 Thal, Switzerland Actual SEFAR business Sefar's core skills is the manufacture and market of fabrics with precise mesh openings for screen printing and filtration processes
Advances in Intense Pulsed Light Solutions For Display Manufacturing. XENON Corporation Dr. Saad Ahmed Japan IDW 2016
Advances in Intense Pulsed Light Solutions For Display Manufacturing XENON Corporation Dr. Saad Ahmed Japan IDW 2016 Talk Outline Introduction to Pulsed Light Applications in Display UV Curing Applications
Supplementary Materials for
advances.sciencemag.org/cgi/content/full/2/4/e1501856/dc1 Ultraflexible organic photonic skin Supplementary Materials for Tomoyuki Yokota, Peter Zalar, Martin Kaltenbrunner, Hiroaki Jinno, Naoji Matsuhisa,
SUPPLEMENTARY INFORMATION
In the format provided by the authors and unedited. ARTICLE NUMBER: 16178 DOI: 10.1038/NENERGY.2016.178 Enhanced Stability and Efficiency in Hole-Transport Layer Free CsSnI3 Perovskite Photovoltaics Supplementary
3.155J / 6.152J Micro/Nano Processing Technology TAKE-HOME QUIZ FALL TERM 2005
3.155J / 6.152J Micro/Nano Processing Technology TAKE-HOME QUIZ FALL TERM 2005 1) This is an open book, take-home quiz. You are not to consult with other class members or anyone else. You may discuss the
11.3 Polishing with Laser Radiation
196 E. Willenborg 11.3 Polishing with Laser Radiation Edgar Willenborg The surface roughness of a part or product strongly influences its properties and functions. Among these can be counted abrasion and
Optical Coatings. Photonics 4 Luxury Coatings , Genève. Dr. Andreas Bächli Head of Optical Coatings at RhySearch, Buchs (SG)
Optical Coatings Photonics 4 Luxury Coatings 21.06.2017, Genève Dr. Andreas Bächli Head of Optical Coatings at RhySearch, Buchs (SG) RhySearch The Research- and Innovation Center in the Rhine Valley RhySearch
"Thin Film Technology" "Physics of Thin Films"
D r d "Thin Film Technology" "Physics of Thin Films" Contents: Preface 1. Introduction 1.1. General 1.2. History 1.3. Definition of Terms 1.4. Applications of Thin Film Technology 1.5. Deposition Methods
CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS
64 Rev.Adv.Mater.Sci. 24(2010) K. 64-68 Abu-Shgair, H.H. Abu-Safe, A. Aryasomayajula, B. Beake and M.H. Gordon CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS Khaleel Abu-Shgair 1,
Laser Micromachining for Industrial Applications and R&D. 3D-Micromac AG. Symposium on Smart Integrated Systems in Chemnitz. 3D-Micromac AG
3D-Micromac AG Symposium on Smart Integrated Systems in Chemnitz 1 1 microdice - TLS-Dicing for separation of SiC 2 microprep - for high-throughput microstructure diagnostics 3 About 3D-Micromac AG 2 microdice
A Plasma Emission Controller for Reactive. Magnetron Sputtering of Titanium Dioxide Films
Adv. Theor. Appl. Mech., Vol. 5, 2012, no. 1, 1-10 A Plasma Emission Controller for Reactive Magnetron Sputtering of Titanium Dioxide Films Raad A. Swady DMPS, College of Arts & Sciences, University of
3D technologies for integration of MEMS
3D technologies for integration of MEMS, Fraunhofer Institute for Electronic Nano Systems Folie 1 Outlook Introduction 3D Processes Process integration Characterization Sample Applications Conclusion Folie
Optimized Cu plating in fan-out wafer-level packaging MultiPlate: a turnkey solution
Optimized Cu plating in fan-out wafer-level packaging MultiPlate: a turnkey solution Cassandra Melvin Global Product Manager, Advanced Packaging Outline 1. Global megatrend IoT 2. Fan-out wafer-level packaging
Nanostructured Engineered Materials With High Magneto-optic Performance For Integrated Photonics Applications
Edith Cowan University Research Online School of Engineering Publications 28 Nanostructured Engineered Materials With High Magneto-optic Performance For Integrated Photonics Applications Mikhail Vasiliev
Coatings. Ion Assisted Deposition (IAD) process Advance Plasma Source (APS) plasma-ion assisted Deposition. Coatings on Optical Fibers
Anti-Reflection Custom Ion Assisted Deposition (IAD) process Advance Plasma Source (APS) plasma-ion assisted Deposition Anti-Reflection on Optical Fibers OptoSigma supplies a wide selection of optical
Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications
Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications Philip D. Rack,, Jason D. Fowlkes, and Yuepeng Deng Department of Materials Science and Engineering University
Optical characterization of an amorphoushydrogenated carbon film and its application in phase modulated diffractive optical elements
Optical characterization of an amorphoushydrogenated carbon film and its application in phase modulated diffractive optical elements G. A. Cirino a, P. Verdonck a, R. D. Mansano a, L. G. Neto b a LSI-PEE-EPUSP
Surface Analysis of Electrochromic Switchable Mirror Glass Based on Magnesium-Nickel Thin Film in Accelerated Degradation Test
Materials Transactions, Vol. 52, No. 3 (2011) pp. 464 to 468 #2011 The Japan Institute of Metals Surface Analysis of Electrochromic Switchable Mirror Glass Based on Magnesium-Nickel Thin Film in Accelerated
LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology
Introduction to Thin Film Contents 1. Introduction and Application Examples (2h) 2. Preparation of Thin Films by PVD (Physical Vapor Deposition) (6h) 2.1 Vacuum Technique (1h) 2.1.1 Kinetics of Gases 2.1.2
From Vacuum to Atmosphere and back an in-house Process Chain for Different Products
From Vacuum to Atmosphere and back an in-house Process Chain for Different Products Dr. Steffen Günther Vacuum coating low pressure 10-1 10-4 Pa (10-3 10-6 mbar) unhindered particle movement no unintended
R&D ACTIVITIES AT ASSCP-BHEL,GURGAON IN SOLAR PV. DST-EPSRC Workshop on Solar Energy Research
R&D ACTIVITIES AT -BHEL,GURGAON IN SOLAR PV at the DST-EPSRC Workshop on Solar Energy Research (22 nd 23 rd April, 2009) by Dr.R.K. Bhogra, Addl. General Manager & Head Email: cpdrkb@bhel.co.in Dr.A.K.
GENCOA. Perfect your process
GENCOA Perfect your process 02 Introduction Providing expert solutions to a worldwide customer base over three decades, Gencoa is among the world leaders in the design and manufacture of products for the
Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers
SRF Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers J. Langner 1, M.J. Sadowski 1, P. Strzyzewski 1, R. Mirowski 1, J. Witkowski 1, S. Tazzari 2, L.
12th International Workshop on RF Superconductivity. A.Frigo, G.Lanza, H.Padamsee, V.Palmieri, D.Tonini
12th International Workshop on RF Superconductivity A.Frigo, G.Lanza, H.Padamsee, V.Palmieri, D.Tonini CERN geometry C. Benvenuti, S. Calatroni, I.E. Campisi, P. Darriulat, M.A. Peck, R. Russo, A.-M. Valente,
EFFECT OF HYDROGEN, CERIUM AND TUNGSTEN DOPING ON INDIUM OXIDE THIN FILMS FOR HETEROJUNCTION SOLAR CELLS
EFFECT OF HYDROGEN, CERIUM AND TUNGSTEN DOPING ON INDIUM OXIDE THIN FILMS FOR HETEROJUNCTION SOLAR CELLS A. Valla, P. Carroy, F. Ozanne, G. Rodriguez & D. Muñoz 1 OVERVIEW Description of amorphous / crystalline
TECHNICAL INFORMATION P8/0713 vitroflex NOISE BARRIER features
TECHNICAL INFORMATION P8/0713 vitroflex NOISE BARRIER features Methacrylate cast sheets special for acoustic insulations. Vitroflex NOISE BARRIER sheets placed in a sound barrier to protect a residential
Sputtering and Co-sputtering of Optical Coatings using a C-MAG Rotatable Cylindrical Cathode
Sputtering and Co-sputtering of Optical Coatings using a C-MAG Rotatable Cylindrical Cathode A. Belkind, BOC Group Technical Center; J. Felts and M. McBride, Airco Coating Technology Keywords: Optical
PV research in Neuchâtel: from high efficiency crystalline cells to novel module concepts
PV research in Neuchâtel: from high efficiency crystalline cells to novel module concepts Laure-Emmanuelle Perret-Aebi, Christophe Ballif April 11 th 2014 Congrès Photovoltaïque National 2014, Lausanne
This article was originally published in a journal published by Elsevier, and the attached copy is provided by Elsevier for the author s benefit and for the benefit of the author s institution, for non-commercial
Evaporated aluminum on polypropylene: oxide layer thicknesses as a function of oxygen plasma treatment level
Evaporated aluminum on polypropylene: oxide layer thicknesses as a function of oxygen plasma treatment level Donald J. McClure, Acuity Consulting and Training and 3M Corporate Research Laboratory Carolin
The Effects of Defects on the Moisture-Barrier Performance of Clear Coatings on Polymer Substrates.
AIMCAL, CHARLESTON, SC, 2013 The Effects of Defects on the Moisture-Barrier Performance of Clear Coatings on Polymer Substrates. The National Centre for Printed Electronics ALF part SMITH of Centre for
Lasers and Laser Systems for Micro-machining
Lasers and Laser Systems for Micro-machining Martyn Knowles Oxford Lasers Ltd Unit 8, Moorbrook Park Didcot, Oxfordshire, OX11 7HP Tel: +44 (0) 1235 810088 www.oxfordlasers.com Lasers and Laser Systems
inemi ALTERNATIVE ENERGY WORKSHOP October 21, 2010 OPPORTUNITIES THROUGHOUT THE PHOTOVOLTAICS VALUE CHAIN
inemi ALTERNATIVE ENERGY WORKSHOP October 21, 2010 OPPORTUNITIES THROUGHOUT THE PHOTOVOLTAICS VALUE CHAIN Prepared By: PRISMARK PARTNERS LLC 130 Main Street, Cold Spring Harbor NY 11724 USA Tel: 631 367-9187
ABSTRACT: INTRODUCTION:
ABSTRACT: Nano-Composite Polymer Optical Coatings Tom Faris Vampire Optical Coatings, Inc. P.O. Box 240 Kirkersville, Ohio 43033 (740)-927-5257 f(740)-927-5032 vampirecoatings@earthlink.net Traditionally
Thickness and composition analysis of thin film samples using FP method by XRF analysis
Technical articles Thickness and composition analysis of thin film samples using FP method by XRF analysis Hikari Takahara* 1. Introduction X-ray fluorescence spectroscopy (XRF) is an elemental quantification
Sputter Coating. Technical Brief
Sputter Coating Technical Brief Document Number TB-SPUTTER Issue 2 (01/02) Introduction HP000107 Quorum Technologies Ltd main sales office: South Stour Avenue Ashford Kent U.K. Tel: ++44(0) 1233 646332
vacuum coating technology
COATING TECHNOLOGIES EMI shielding by means of CREASHIELD R vacuum coating technology Some outstanding features of EMI shielding as carried out by the CREASHIELD process are: Ecellent shielding efficiency
High Transmittance Ti doped ITO Transparent Conducting Layer Applying to UV-LED. Y. H. Lin and C. Y. Liu
High Transmittance Ti doped ITO Transparent Conducting Layer Applying to UV-LED Y. H. Lin and C. Y. Liu Department of Chemical Engineering and Materials Engineering, National Central University, Jhongli,
LUXAR. Anti-reflective glass
LUXAR Anti-reflective glass LUXAR anti-reflective glass. A new dimension for anti-reflective glass Residual Reflection* LUXAR Magnetron Sputtered anti-reflective glass with almost no reflectance, is an
Specimen Preparation Technique for a Microstructure Analysis Using the Focused Ion Beam Process
Specimen Preparation Technique for a Microstructure Analysis Using the Focused Ion Beam Process by Kozue Yabusaki * and Hirokazu Sasaki * In recent years the FIB technique has been widely used for specimen
White Paper: Pixelligent Internal Light Extraction Layer for OLED Lighting
White Paper: Pixelligent Internal Light Zhiyun (Gene) Chen, Ph.D., Vice President of Engineering Jian Wang, Ph.D., Manager, Application Engineering Pixelligent Technologies LLC, 6411 Beckley Street, Baltimore,
Barix Multilayers: a Water and Oxygen Barrier for Flexible Organic Electronics. Robert Jan Visser
Barix Multilayers: a Water and Oxygen Barrier for Flexible Organic Electronics Robert Jan Visser Organic Electronics Is the Future of Electronics Organic? MIT Stanford UC Berkeley Nano Forum Vitex Systems,
Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications
Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications Cindy Steiner, John Fahlteich Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP,
Lateral epitaxial growth of two-dimensional layered semiconductor heterojunctions
Lateral epitaxial growth of two-dimensional layered semiconductor heterojunctions Xidong Duan, Chen Wang, Jonathan Shaw, Rui Cheng, Yu Chen, Honglai Li, Xueping Wu, Ying Tang, Qinling Zhang, Anlian Pan,
Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities
Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities J. Langner, L. Catani*, A. Cianchi*, K. Czaus, R. Mirowski, R. Russo*, M.J. Sadowski, S. Tazzari*, F. Tazzioli***,
Multiphoton lithography based 3D micro/nano printing Dr Qin Hu
Multiphoton lithography based 3D micro/nano printing Dr Qin Hu EPSRC Centre for Innovative Manufacturing in Additive Manufacturing University of Nottingham Multiphoton lithography Also known as direct
Course schedule. Universität Karlsruhe (TH)
Course schedule 1 Preliminary schedule 1. Introduction, The Sun 2. Semiconductor fundamentals 3. Solar cell working principles / pn-junction solar cell 4. Silicon solar cells 5. Copper-Indiumdiselenide
Grain Sizes and Surface Roughness in Platinum and Gold Thin Films. L.L. Melo, A. R. Vaz, M.C. Salvadori, M. Cattani
Journal of Metastable and Nanocrystalline Materials Vols. 20-21 (2004) pp. 623-628 online at http://www.scientific.net 2004 Trans Tech Publications, Switzerland Grain Sizes and Surface Roughness in Platinum