Technologies challenges and opportunities in UV and thermal Nanoimprint Lithography Roll2Roll technologies for flexible hybrid electronics

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1 Technologies challenges and opportunities in UV and thermal Nanoimprint Lithography Roll2Roll technologies for flexible hybrid electronics Thomas Kolbusch, Vice President, Coatema GmbH Wilfried Schipper, Head of BU Films, Temicon GmbH COATEMA Coating Machinery GmbH 1

2 Outline Coatema & TEMICOAT Introduction Products Equipment Summary COATEMA Coating Machinery GmbH 2

3 COATEMA Coating Machinery GmbH 3

4 innovations Introduction Coatema quality made in Germay working widths from100 mm coating bespoken equipment up to 5,400 mm printing laminating founded 1974 Film/Paper Printed Electronics Prepreg Membranes Renewables Textile Glass From Lab2Fab R&D projects & network worldwide service COATEMA Coating Machinery GmbH 4

5 Introduction COATEMA Coating Machinery GmbH 5

6 Introduction TEMICOAT The leading producer of high-quality micro- and nanostructured products serving as key components for applications like lighting, display, life science, solar technology and environmental engineering. The market leader in coating, printing and laminating technology with more than 40 years of experience in providing the most advanced scale-up solutions from lab to fab as well as state-of-art full production lines COATEMA Coating Machinery GmbH 6

7 Introduction Why we are here? COATEMA Coating Machinery GmbH 7

8 Introduction Applications COATEMA Coating Machinery GmbH 8

9 Introduction Why we are here! We developed a seamless, endless patterning technology and deliver the chemistry, substrates and the equipment to provide you with patterns beyond light guides. This is the added surface value revolution in trillions of products COATEMA Coating Machinery GmbH 9

10 Nanoimprint technology Technology & Processes COATEMA Coating Machinery GmbH 10

11 Hard mold Soft mold Ultra Violet NIL Thermal NIL Technology & Processes NIL Nano imprint lithography R2R roll-to-roll R2P roll-to-plate P2P plate-to-plate UV-curable lacquer/ resin short process time processing at room temperature Hard or soft molds Low imprint pressure High replication resolution Low material shrinkage Thermoplastic substrate/ resin Long process time processing above T G Hard molds High imprint pressure one-component system High material shrinkage + wear behaviour + imprint pressure + life time of replication mold + life time of master mold + resolution + flexibilty COATEMA Coating Machinery GmbH 11

12 Nanoimprinting Combi System COATEMA Coating Machinery GmbH 12

13 Introduction Comparison of Printing Processes Nanoscaled Imprint Microscaled Imprint COATEMA Coating Machinery GmbH 13

14 Technologies & Processes Nanoimprint Lithography THERMAL NIL UV NIL (1) Resist coating (1) Resist coating Imprint mold Imprint mold (solid) thermoplastic polymer resist Photopolymer resist (liquid) Substrate Temperature above glass transition temp Substrate (2) Heat and Press (2) Expose and Press Heat UV light Room temperature (3) Cool and Separate (3) Separate (no cooling) COATEMA Coating Machinery GmbH 14

15 Technologies & Processes Nanoimprint Lithography THERMAL NIL vs UV NIL Imprint into substrate possible Great depths possible (slower) heat distribution Thermal conductive mold Thermal expansion of mold and resist Cooling Higher pressure (faster) Uniformity Less viscous resists (less pressure) Soft molds possible UV resists (Transparent substrate or mold) COATEMA Coating Machinery GmbH 15

16 Technologies & Processes Nanoimprint Lithography UV-NIL system designs: Surface activation Corona, plasma, chemical treatment Coating Slot die, knife, roller coater UV curing Mercury, LED UV radiator NIL system designs: Heating IR/ NIR, inductive, laser heating or heated fluids in embossing drum Replication mold Drum, endless belt, film One-/ Multi-Temperature zones COATEMA Coating Machinery GmbH 16

17 Technologies & Processes Nanoimprint Lithography COATEMA Coating Machinery GmbH 17

18 COATEMA Coating Machinery GmbH 18

19 UV - NIL Machines for Lab2Fab - R2R R2P COATEMA Coating Machinery GmbH 19

20 Technologies & Processes Nanoimprint Lithography Process parameters (selection): Resist Chem. Formulation Viscosity/ Rheology Film Chem. Formulation Chemical/ mechanical pre-treatment Tool Hard/ soft mold Anti-adhesion layer UV-source Spectral distribution LED-/ conventional source Production system Web (tension) control Process specific sub-assemblies COATEMA Coating Machinery GmbH 20

21 Technologies & Processes Nanoimprint Lithography COATEMA Coating Machinery GmbH 21

22 Technologies & Processes Nanoimprint Lithography Influences on the quality mainly result from Substrate: Impurities/ Dust Wetting behaviour Embossing drum: Bubble enclosures Machining errors (e.g. badly joint sleeves) Wear Partial/ total lacquer adhesion Resist: Impurities/ Dust Bubbles/ Foam Geometrical defects Coating homogeneity COATEMA Coating Machinery GmbH 22

23 Technologies & Processes COATEMA Coating Machinery GmbH 23

24 echnologies & Processes Nanoimprint Lithography Protective film Coating Unit: Knife Slotdie Rewinding Unwinding UVNIL COATEMA Coating Machinery GmbH 24

25 Coating and Printing for NIL Nanoimprint Lithography Slot die coating for pre-metered film coating Layer control Level control in the nip 12/9 position Intermittent ink control COATEMA Coating Machinery GmbH 25

26 Coating and Printing for NIL Nanoimprint Lithography Nip coating Layer control by gap Level control in the nip Compact process COATEMA Coating Machinery GmbH 26

27 Coating and Printing for NIL Nanoimprint Lithography Homogeneous Structure Inhomogeneous Structure COATEMA Coating Machinery GmbH 27

28 Coating and Printing for NIL Nanoimprint Lithography Printing for inhomogeneous structure? Case Knife Inkjet Layer control inhomogeneous Matched level control in the nip Nip material fits sleeve consumption COATEMA Coating Machinery GmbH 28

29 Coating and Printing for NIL Nanoimprint Lithography Pretreatment of substrate? Good nip material control? Total layer thickness? Coating void free? COATEMA Coating Machinery GmbH 29

30 COATEMA Coating Machinery GmbH 30

31 Introduction Comparison Printing Parameters COATEMA Coating Machinery GmbH 31

32 Technologies & Processes Classical Approach Structured nickel plate Welded sleeve with seam Final product with seamlines New Approach Seamless structured sleeve Seamless sleeve on imprint cylinder Final product without seamlines COATEMA Coating Machinery GmbH 32

33 Imprint tools COATEMA Coating Machinery GmbH 33

34 UV - NIL Laser Interference patterning COATEMA Coating Machinery GmbH 34

35 Coating and Printing for NIL Nanoimprint Lithography Aspect ratio (AR) 5.4:1 (h:w) (ETFE mold, UV R2R NIL) [1] Residual layer (RL) thickness 30 nm [2] Coating thickness 160 nm [2] 150 µm [3] Film speed 15m/min [4] Resolution 70 nm (gratings of 70-nm lines) [4] [1] Ahn, B.S.H.; Guo, L.J.: High-Speed Roll-to-Roll Nanoimprint Lithography on Flexible Plastic Substrates. In: Advanced Materials. vol , p [2] Mäkelä, T.; Haatainen, T.; Majander, P.; Ahopelto, J.: Continuous roll to roll nanoimprinting of inherently conducting polyaniline. In: Microelectronic Engineering. vol. 84, 2007, p [3] Shan, X.C.; Lau, S.K.; Mohahidin, M.B.; Liu, T.; Lu, A.C.W.: Formation of Large Format Functional Films via Roll-to-Roll (R2R) Ultraviolet (UV) Embossing. In: IEEE Proc. of 13th Electronics Packinging Technology Conference [4] Kooy, N.; Mohamed, K.; Pin, L.T.; Guan, O.S.: A review of roll-to-roll nanoimprint lithography. In: Nanoscale Research Letters. vol. 9:320, COATEMA Coating Machinery GmbH 35

36 COATEMA Coating Machinery GmbH 36

37 Display Bionics Life Science Photonics Applications Lightguides OLED 3D Displays Light Enhancement AR Surfaces Lotus Moth Eye Shark Skin Gecko Micro Fluidics Micro Titer Plates Cell Separation Printed Electronics Solar Optical Encoders Micro Lens Arrays Waveguides COATEMA Coating Machinery GmbH 37

38 Applications Display Photonics Bionics Life Science Diffractive Printed Electronics Retroreflectors Optical Elements Antibacterial Surfaces Super Hydrophobic Surfaces Shark Skin Haptic Surfaces Microfluidic Structures COATEMA Coating Machinery GmbH 38

39 Applications 50 µm 10 µm Shark Skin (Riblet) 10 µm Anti-bacterial Surfaces Micro and Nanostructures under SEM Haptic Surfaces µm µm 50 µm 10 µm Micro Pillars (Super-Hydrophobic Surfaces) COATEMA Coating Machinery GmbH 39

40 Applications 100 µm Diffractive Optical Elements Retroreflectors Micro and Nanostructures under SEM 500 nm Microfluidic Structures 500 nm 10 µm Printed Electronics 2 µm COATEMA Coating Machinery GmbH 40

41 Applications Hierarchical Structures Hierarchical Micro-/ nano structures Anti-sticking properties Perforation 3-layered antimicrobial film Active Layer Intermediate layer References: [19-20] Inner layer COATEMA Coating Machinery GmbH 41

42 Products COATEMA Coating Machinery GmbH 42

43 roducts temilux TO Transmission Optics temilux LG Lightguide Solutions temilux 3D 3D lighting effects COATEMA Coating Machinery GmbH 43

44 Equipment COATEMA Coating Machinery GmbH 44

45 Nanoimprinting Combi System COATEMA Coating Machinery GmbH 45

46 UV - NIL Lab2Fab - R2R & R2P Temicoat Test Solution S2S Temicoat Test Solution R2R Temicoat 300mm R2R Temicoat 300mm R2P COATEMA Coating Machinery GmbH 46

47 UV - NIL Machines for Lab2Fab - S2S A4 Size or A3 Structures on film supplied from Temicoat COATEMA Coating Machinery GmbH 47

48 UV - NIL Machines for Lab2Fab - R2R - 100mm COATEMA Coating Machinery GmbH 48

49 UV - NIL Machines for Lab2Fab - R2R 300mm COATEMA Coating Machinery GmbH 49

50 UV - NIL Machines for Lab2Fab - R2P 300 mm COATEMA Coating Machinery GmbH 50

51 UV - NIL Machines for Lab2Fab - R2R mm COATEMA Coating Machinery GmbH 51

52 UV - NIL Machines for Lab2Fab - R2P mm COATEMA Coating Machinery GmbH 52

53 UV - NIL Machines for Lab2Fab - R2R & R2P mm COATEMA Coating Machinery GmbH 53

54 Proof of concept COATEMA Coating Machinery GmbH 54

55 Temicoat Nanoimprint R2R 300 Qualification Coating Unit: Knife Slotdie Protective film Unwinding UVNIL Rewinding COATEMA Coating Machinery GmbH 55

56 Temicoat Nanoimprint R2R 300 Qualification direct resist application Unwinding UVNIL COATEMA Coating Machinery GmbH 56

57 Temicoat Nanoimprint R2R 300 Qualification How to not do NiL: Too much resist Too little UV Too fast substrate speeds COATEMA Coating Machinery GmbH 57

58 Internal Qualification Microscale Successful Imprint several mm down to 40µm feature size COATEMA Coating Machinery GmbH 58

59 Internal Qualification Microscale Characterization 25µm dry layer thickness Aspect ratio 1:1 But: 50µm Resist too brittle COATEMA Coating Machinery GmbH 59

60 Internal Qualification Nanoscale 380nm feature size Aspect ratio 2:1 low density of defects 10µm COATEMA Coating Machinery GmbH 60

61 Internal Qualification Typical Defects Imprint defects: 1. Surface scratches 2. Pointdefects 3. Damages in sleeve COATEMA Coating Machinery GmbH 61

62 Temicoat Nanoimprint R2R 300 Nano scale COATEMA Coating Machinery GmbH 62

63 Temicoat Nanoimprint R2R 300 Nano scale COATEMA Coating Machinery GmbH 63

64 Temicoat Nanoimprint R2R 300 Nano scale COATEMA Coating Machinery GmbH 64

65 Summary COATEMA Coating Machinery GmbH 65

66 Summary Process value chain Simulation Origination Tooling Replication COATEMA Coating Machinery GmbH

67 Summary Process value chain COATEMA Coating Machinery GmbH 67

68 Process value chain Products 3D effects Life sciences Architecture Solar Automotive Security Hologramms Optics Display COATEMA Coating Machinery GmbH 68

69 COATEMA Coating Machinery GmbH 69

70 Thank You COATEMA Coating Machinery GmbH 70