XV750 Imageline Etch Resist Family

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1 XV750 Imageline Etch Resist Family Imageline XV750 etch resist is a liquid photoimageable product, which dries by evaporation to give a film that can be sensitized by exposure to UV wavelengths between 310nm and 420nm (for conventional exposure products scatter light type units can be used, it is not essential to use a collimated light source). The unexposed material is developed in dilute alkali solution. The remaining film is then stable in etch solution. After the etch process the film can be stripped in strong caustic media. XV750 liquid etch resists can offer several key benefits over traditional dry film process; 30-50% Saving over Dry Film 50-70µm (2-3mil) Line and Space with better resolution Faster developing and etching times Improved adhesion and performance to Metals / Alloys Versions are available suitable for application by screen printing, Dip Coating, Roller Coating, Curtain Coating and spray. A Laser Direct Imaging (LDI) version is also available. Further details of the individual products that comprise the XV750 product range are given below. SEM of 50/50µm tracks & gaps

2 XV750 Imageline Etch & (Limited) Plating Resist Screen Print Version -Scatter light type exposure units can be used. -Suitable for both acid and alkali etching (up to ph9.5) -Can also be used as an electrolytic plating resist, however it has been found unsuitable for electroless plating processes. -Stripping solution of 5% potassium hydroxide is recommended (sodium hydroxide can be 50-60OC -Normal print thickness is 8-12micron DFT using a 100T/cm mesh, higher film weights are possible using coarser meshes (e.g., 62T or 77T/cm). -Resolution of 50µm (2mil) is usually achievable (resolution is always dependant not just on the etch resist but customers develop & etch capability and production environment clean room class 10,000 is recommended) -Good photospeed ( mJ/cm 2 ) -Single pack system with good shelf life. Available in dark blue colour only & comes in 1kg packs; XV750 Imageline Etch Resist Screen Version 1 CAWN1112 T025 * No addition of solvent should be needed however if required standard screen thinner (eg XZ40 or XZ42) or XZ101 up to a maximum 2% addition may be added. Please refer to TIL T025 for further information. XV750 Imageline Etch Resist Dip Coat, Photochemical Machining Product -Scatter light type exposure units can be used. -Excellent adhesion and is suitable for use on a wide range of metals (stainless steel, brass, etc). -Only suitable for acid etch (Ferric Chloride is recommended). -Less Preclean steps required than traditional PCM products. -Excellent chemical resistance which allows long etch dwell times in excess of 1hour for certain industries, however please note longer dwell times (in excess of 45minutes) may require thicker DFT. This will lower the resolution achievable. - Offers faster, cleaner etch than traditional PCM products. -Fast stripping (faster than XV750 screen print versions above). The dry resist may be stripped in a solution of 3% potassium hydroxide (sodium hydroxide can also be used). -Normal print thickness is 6-8µm DFT, although this is strongly dependent on extraction speed and resist viscosity. -Resolution of below 50µm is usually achievable (resolution is always dependant not just on the etch resist but customers develop & etch capability and production environment clean room class 10,000 is recommended). -Reasonable photospeed ( mJ/cm 2 ). -Single pack system with good shelf life. Available in dark blue colour only. This product is subject to a minimum order restriction. (Requires thinning to application viscosity [~30-35%] with XZ95 before use) XV750 *Imageline Etch Resist Dip Coat PCM Ver.* 10 CKXN0146 T125

3 * must be thinned with XZ % addition prior to use. Please refer to TIL T125 for further information. Some examples of parts made by PCM process. XV750 Imageline Etch Resist Multi-purpose Version; Suitable for application by Roller Coat, Curtain Coat and Spray. -Good yield per KG, gives low running cost with high performance. -CAWN2289 is suitable for acid etch chemistries only. This gives the advantage that the product is fast stripping in alkali solution, giving easier processing and better throughputs (customers interested in a version compatible for alkali etch can enquire about the previous version CAWN1302 which is suitable for acid & alkali (up to ph9.0) etching ) -Scatter light type exposure units can be used. -Stripping solution of 5% potassium hydroxide at C is recommended (sodium hydroxide can also be used). -Normal coating thickness 8-10µm DFT. -Resolution 50µm is usually achievable (resolution is always dependant not just on the etch resist but customers develop & etch capability and production environment clean room class 10,000 is recommended). -Excellent photospeed (50-100mJ/cm 2 ). -Single pack system with excellent shelf life. Available in dark blue colour only & comes in 10kg packs; XV750 XV750 Imageline Etch Resist Roller Coat/Curtain Coat /Spray Version (Acid Etch Only) Imageline Etch Resist Roller Coat/Curtain Coat /Spray Version (Acid or Alkali Etch) * Depending on application method solvent must be added prior to use. 10 CAWN2289 TBC 10 CAWN1302 T135

4 Normally thinning is with XZ95*;- Rollercoat 10-15% addition, Curtain Coat 15-20% addition and Spray 15% addition *For certain applications the slower aromatic solvent XZ105 is recommended. In particular for rollercoaters which do not constantly circulate ink around the print rollers (Some rollercoaters such as the machine offered by GroUp dose a small amount of ink when a panel is coated. During periods of inactivity this may lead to drying on the rollers) Please refer to TIL for further information on CAWN2289 (TBC), CAWN1302 (T135). In our constant initiative to improve our products to meet the industries ever changing needs Coates are currently undertaking production tests at customer facilities with an improved version of CAWN1302. Development product V1004 offers a higher degree of colour change during processing (to make visual inspection under yellow light conditions easier). It is faster stripping to make production faster and also has a harder surface after drying to prevent handling scratches, etc. (Parties interested in beta-testing should contact their local agent or alex.brooks@eu.sunchem.com)

5 XV750 Imageline Etch Resist Laser Direct Imaging Version. For Application by Screen Print or Rollercoat -Suitable for acid etching only. -High Exposure sensitivity (10mJ 15mJ/cm 2 ) for LDI processing. -Excellent adhesion and conformation to copper and other metal surfaces. -Stripping solution of 3% potassium 40 C is recommended, sodium hydroxide can also be used. -Resolution capability is up to & beyond 50µm (resolution is always dependant not just on the etch resist but customers develop & etch capability and production environment clean room class 10,000 is recommended). -Single pack system with good shelf life. - Application by screen print (horizontal or vertical) or rollercoat, -2% maximum XZ101 can be added for screen printing if required. -Print using T/cm with shore squeegee *This will give a DFT of 8-12 microns -The product must be diluted 10-15% with XZ95 for rollercoating For grooved rollers (~49GPI) sec (Ford No4) is required For smooth rollers sec. (Ford No.4) is preferred Versions: XV750 Imageline Etch Resist LDI Screen & 5 CKXN0330 TBC Rollercoat XV750 Imageline Etch Resist LDI Screen Only TBC V9966/3 TBC TIL number currently unavailable - interested parties should contact Coates 50µm features shown. Pattern was acid (cupric) etched on 0.5-oz copper.

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