CYRANNUS. Welcome at iplas. See the latest developments! CYRANNUS.

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1 Welcome at iplas. See the latest developments!

2 High performance plasma CYlindrical Resonator with ANNUlar Slots EH-tuner from vacuum to atmosphere uniform plasma large plasma extension high power density easy and stable ignition plasma source circulator magnetron

3 CYRANNUS I plasma source Performance of I plasma source spatial homogeneous stationary plasma central excitation area from vacuum to ambient pressure arbitrary process gas high gasflow possible electrodeless plasma excitation few maintenance required

4 iplas plasma know-how Diamond deposition is one application from a large variety of plasma processes glas coating activation Applications cleaning polymerisation exhaust Processes etching diamond Synergy effects from various applications film growth surface modification material removal gas chemistry gas dynamics...

5 Use of plasma source in different configuration Process gas + precursor Plasm a source Plasm a Substrate direct plasma treatment Substrates are treated within the area of plasma generation. Typical application: diamond deposition, exhaust cleaning Process gas Plasma source Plasma Activated species Precursor Substrat e down stream plasma treatment Substrates are treated beside the area of plasma generation, down stream, close to plasma source. Typical application: activation of surfaces, deposition of SiOx

6 Examples: diamond growth plasma is used for various types diamond <100> and HOD on Silicon homoepitaxial growth ultra nano crystalline diamond 5µm 50µm 5µm 0.5mm

7 picture: univerity of Dortmund processes... a large spectrum deposition various coatings (scratch and corrosion resistance, optics, diffusion barrier) growth rate of several µm/min (SiOx/polymer) or 5-50 µm/h (diamond) windows, free standing structures, MEM functionalisation hydrophobic surface for water repellent property on various materials treatment time < 10 sec etching / ashing removal of photo resist, stripping of coatings ca. 5 µm desmearing of circuit boards removal of oxides from lead frames within few seconds before plasma treatment highly oriented <100> random <100> water on functionalized carbon after plasma treatment activation improved wetting of varnish or dye, increased adhesion 3D plastics activation, > 70 dyn/cm treatment time 1-10 sec complete cracking of molecules destruction of molecules abatement, exhaust cleaning, waste destruction reforming cleaning ultra cleaning, degreasing for adhesion improvement fast on-line cleaning local activation of damaged bumpers untreated bumper plasma treated bumper

8 Supply spectrum... for all technology needs Services Systems Components CYRANNUS I - plasma sources CYRANNUS II - plasma sources EH-Tuner feasibility R&D prototypes lab units manual systems semi-automatic systems production systems

9 Scaling of plasma plasma can vary in diameter and volume M Hz GHz GHz mm 8 5 mm 2 2 mm mm mm 3 6 mm mm mm 5 0 mm mm mm 6 3 mm mm mm 7 5 mm Plasma size increases with excitation frequency excitation frequency order of antennas order of antennas

10 iplas ~ develops and produced leading microwave plasma technology basing on principle ~ covers several application fields of plasma technology as core competence with focus on reliable technology which is easy to handle ~ co-operates with partners who in general are global players with a good market position in their specific field ~ is independent and privately owned

11 I plasma sources comparison of equipment at 2.45GHz and 915MHz I - 6 plasma source (2.45 GHz) I - 16 plasma source (915 MHz)

12 Equipment scaling from 2.45GHz to 915MHz plasma source relation of plasma source sizes magnetron circulator tuner [2.45GH 915MHz; similar coupling structure]

13 scalabitity of plasma sources for larger diameter I -16 plasma source 2.45 GHz, at 259 hpa

14 Diamond CVD unit Flexibility in technique and budget semi-automated operation compact set-up high performance from proofen production design

15 Gas Flow Dominated Reactions in Atmospheric Plasma Plasma generates radicals... Gas flow in plasma afterglow High mass transport Intensive gas phase interaction / low wall interaction... and interacts with surface Lamiar flow? Turbulent flow!

16 Reactions of ions, radicals and electrons in plasma Plasma generates radicals excitation and cracking in gas phase... interaction with surface

17 Plasma chemistry reactor plasma catalytic reactions high cracking energy from excited electrons contact free excitation waste gas Plasmacracking cracked gas wast gas cleaning nano particle synthesis Hydrogen synthesis Washer neutralised gas

18 Nano Particle Synthesis Synthesis of nano particles in CYRANNUS systems enables new qualities and very high productivity microwave excitation allows non-equilibrium chemical reactions (clean compound, no reactive chemicals (burner) required high pressure operation of plasma (up to several bar) allows high gas flow rates and very high production quantities (several pounds per hour) precise process control via plasma parameters and gas flow (generation of particle size with very small variation)

19 Nano Particle Synthesis - Example Ultra clean Silicon synthesis von large quantities of clean (purified) Silicon decomposition of Silan purification via chemical reaction (Silan synthesis) recovering cracking reaction (Silicon particle synthesis)

20 Bio Agredable Nano Surface Ultra clean Silicon synthesis von large quantities of clean (purified) Silicon decomposition of Silan purification via chemical reaction (Silan synthesis) recovering cracking reaction (Silicon particle synthesis)

21 CYRANNUS I plasma systems for development and production Plasma treatment of surfaces - a modular and compact system- Individual systems, made of standardised modules easy connection to customer s PLC simple and fast maintenance or repair exchange of complete modules very fast supply time through standardisation of modules

22 Fragen? Phone +49(0) Fax +49(0)

23 Plasma chemistry reactor