Ageing Resistance (12 years) of Hard and Oxidation Resistant SiBCN Coatings

Size: px
Start display at page:

Download "Ageing Resistance (12 years) of Hard and Oxidation Resistant SiBCN Coatings"

Transcription

1 Ageing Resistance (12 years) of Hard and Oxidation Resistant SiBCN Coatings Jiri Houska Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Czech Republic Acknowledgment Grant Agency of the Czech Republic through Project No Y 1/14

2 SiBCN coatings in as-deposited state studied for years University of West Bohemia J. Vlcek et al. J. Vac. Sci. Technol. A 23, Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance Phys. Rev. B 72, Ab initio simulations of nitrogen evolution in quenched CNx and SiBCN amorphous materials J. Phys.: Condens. Matter 18, The effect of argon on the structure of amorphous SiBCN materials: an experimental and ab initio study J. Vlcek et al. Trans. Mater. Res. Soc. Jpn 31, 447 Europhys. Lett. 76, 512 Diamond Relat. Mater. 16, 29 J. Vac. Sci. Technol. A 25, New quaternary Si-B-C-N films prepared by reactive magnetron sputtering Effect of B and the Si/C ratio on high-temperature stability of novel Si-B-C-N materials Influence of substrate bias voltage on structure and properties of hard Si-B-C-N films prepared by... Bonding statistics and electronic structure of novel Si-B-C-N materials: ab-initio calculations and... J. Phys.: Condens. Matter 19, Effect of implanted argon on hardness of novel magnetron sputtered Si-B-C-N materials:... J. Cizek et al. Thin Solid Films 516, Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering J. Vlcek et al. J. Vac. Sci. Technol. A26, Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in... J. Capek et al. Surf. Coat. Technol. 23, Effect of the gas mixture composition on high temperature behavior of magnetron suttered Si-B-C-N... J. Kalas et al. Thin Solid Films 518, High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by... J. Appl. Phys. 18, SiBCN materials for high-temperature applications: Atomistic origin of electrical conductivity P. Zeman et al. V. Petrman et al. Thin Solid Films 519, 36 Acta Materialia 59, Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 17 C Effect of nitrogen content on electronic structure and properties of SiBCN materials J.J. Gengler et al. Surf. Coat. Technol. 26, Thermal conductivity of high-temperature Si-B-C-N thin films J. Vlcek et al. Surf. Coat. Technol. 226, Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency J. He et al. Thin Solid Films 542, Microstructure characterization of high-temperature, oxidation-resistant Si-B-C-N films Ceram. Int. 41, Ageing resistance of SiBCN ceramics Other labs (examples) M.A. Rooke et al. Chem. Mater. 9, Surface Studies of Potentially Oxidation Protective Si-B-N-C Films for Carbon Fibers D. Hegemann et al. Chem. Vap. Deposition 5, PACVD-Derived Thin Films in the System Si-B-C-N P.A. Ramakrishnan et al. Appl. Phys. Lett. 78, Silicoboron carbonitride ceramics: A class of high-temperature, dopable electronic materials A. Vijayakumar et al. IEEE Electron Device Lett. 28, Amorphous-SiCBN-based metal-semiconductor-metal photodetector for high-temperature applications V.M. Vishnyakov et al. Surf. Coat. Technol. 26, Amorphous boron containing silicon carbo-nitrides created by ion sputtering H. Abu Samra et al. Surf. Coat. Technol. 223, Development of a new generation of amorphous hard coatings based on the Si-B-C-N-O system for... 2/14

3 SiBCN coatings in as-deposited state studied for years University of West Bohemia J. Vlcek et al. J. Vac. Sci. Technol. A 23, Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance Phys. Rev. B 72, Ab initio simulations of nitrogen evolution in quenched CNx and SiBCN amorphous materials J. Phys.: Condens. Matter 18, The effect of argon on the structure of amorphous SiBCN materials: an experimental and ab initio study J. Vlcek et al. Trans. Mater. Res. Soc. Jpn 31, New quaternary Si-B-C-N films prepared by reactive magnetron sputtering Europhys. Lett. 76, Effect of B and the Si/C ratio on high-temperature stability of novel Si-B-C-N materials Diamond Relat. Mater. 16, Influence of substrate bias voltage on structure and properties of hard Si-B-C-N films prepared by... J. Vac. Sci. Technol. A 25, J. Phys.: Condens. Matter 19, Bonding statistics and electronic structure of novel Si-B-C-N materials: ab-initio calculations and... This work Effect of implanted argon on hardness of novel magnetron sputtered Si-B-C-N materials:... J. Cizek et al. Thin Solid Films 516, Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering J. Vlcek et al. J. Vac. Sci. Technol. A26, Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in... ageing resistance (12yr) of coatings prepared in 22-3 J. Capek et al. Surf. Coat. Technol. 23, Effect of the gas mixture composition on high temperature behavior of magnetron suttered Si-B-C-N... J. Kalas et al. Thin Solid Films 518, High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by... J. Appl. Phys. 18, SiBCN materials for high-temperature applications: Atomistic origin of electrical conductivity P. Zeman et al. Thin Solid Films 519, Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 17 C V. Petrman et al. Acta Materialia 59, Effect of nitrogen content on electronic structure and properties of SiBCN materials J.J. Gengler et al. Surf. Coat. Technol. 26, Thermal conductivity of high-temperature Si-B-C-N thin films J. Vlcek et al. Surf. Coat. Technol. 226, Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency J. He et al. Thin Solid Films 542, Microstructure characterization of high-temperature, oxidation-resistant Si-B-C-N films Ceram. Int. 41, Ageing resistance of SiBCN ceramics Other labs (examples) M.A. Rooke et al. Chem. Mater. 9, Surface Studies of Potentially Oxidation Protective Si-B-N-C Films for Carbon Fibers D. Hegemann et al. Chem. Vap. Deposition 5, PACVD-Derived Thin Films in the System Si-B-C-N P.A. Ramakrishnan et al. Appl. Phys. Lett. 78, Silicoboron carbonitride ceramics: A class of high-temperature, dopable electronic materials A. Vijayakumar et al. IEEE Electron Device Lett. 28, Amorphous-SiCBN-based metal-semiconductor-metal photodetector for high-temperature applications V.M. Vishnyakov et al. Surf. Coat. Technol. 26, Amorphous boron containing silicon carbo-nitrides created by ion sputtering H. Abu Samra et al. Surf. Coat. Technol. 223, Development of a new generation of amorphous hard coatings based on the Si-B-C-N-O system for... 2/14

4 SiBCN coatings in as-deposited state studied for years University of West Bohemia J. Vlcek et al. J. Vac. Sci. Technol. A 23, Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance Phys. Rev. B 72, Ab initio simulations of nitrogen evolution in quenched CNx and SiBCN amorphous materials J. Phys.: Condens. Matter 18, The effect of argon on the structure of amorphous SiBCN materials: an experimental and ab initio study J. Vlcek et al. Trans. Mater. Res. Soc. Jpn 31, New quaternary Si-B-C-N films prepared by reactive magnetron sputtering Europhys. Lett. 76, Effect of B and the Si/C ratio on high-temperature stability of novel Si-B-C-N materials Diamond Relat. Mater. 16, Influence of substrate bias voltage on structure and properties of hard Si-B-C-N films prepared by... J. Vac. Sci. Technol. A 25, J. Phys.: Condens. Matter 19, Bonding statistics and electronic structure of novel Si-B-C-N materials: ab-initio calculations and... This work Effect of implanted argon on hardness of novel magnetron sputtered Si-B-C-N materials:... J. Cizek et al. Thin Solid Films 516, Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering J. Vlcek et al. J. Vac. Sci. Technol. A26, Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in... ageing resistance (12yr) of coatings prepared in 22-3 J. Capek et al. Surf. Coat. Technol. 23, Effect of the gas mixture composition on high temperature behavior of magnetron suttered Si-B-C-N... J. Kalas et al. Thin Solid Films 518, High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by... J. Appl. Phys. 18, SiBCN materials for high-temperature applications: Atomistic origin of electrical conductivity P. Zeman et al. Thin Solid Films 519, Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 17 C V. Petrman et al. Acta Materialia 59, Effect of nitrogen content on electronic structure and properties of SiBCN materials J.J. Gengler et al. Surf. Coat. Technol. 26, Thermal conductivity of high-temperature Si-B-C-N thin films J. Vlcek et al. Surf. Coat. Technol. 226, Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency J. He et al. Thin Solid Films 542, Microstructure characterization of high-temperature, oxidation-resistant Si-B-C-N films Ceram. Int. 41, Ageing resistance of SiBCN ceramics Other labs (examples) Important (for obvious reasons) M.A. Rooke et al. Chem. Mater. 9, Surface Studies of Potentially Oxidation Protective Si-B-N-C Films for Carbon Fibers D. Hegemann et al. but Chem. Vap. rarely Deposition 5, 61 studied 1999 PACVD-Derived (also Thin for Films obvious in the System Si-B-C-N reasons) P.A. Ramakrishnan et al. Appl. Phys. Lett. 78, Silicoboron carbonitride ceramics: A class of high-temperature, dopable electronic materials A. Vijayakumar et al. IEEE Electron Device Lett. 28, Amorphous-SiCBN-based metal-semiconductor-metal photodetector for high-temperature applications V.M. Vishnyakov et al. Surf. Coat. Technol. 26, Amorphous boron containing silicon carbo-nitrides created by ion sputtering H. Abu Samra et al. Surf. Coat. Technol. 223, Development of a new generation of amorphous hard coatings based on the Si-B-C-N-O system for... 2/14

5 Motivation: examples of as-deposited propeties of SiBCN Thermal stability and oxidation resistance up to ~15 C (thin surf. oxide at 17 C) Heat flow (a.u.) calorimetry in Ar 25% N 2 5% N Temperature ( C) Mass change (mg/cm 2 ) TiC Münz et al. TiAlZrN Münz et al. TiAlN TiN Münz et al. Donohue et al. nc-tin/a-si 3 N 4 Veprek et al. TiAlCrYN Donohue et al. TiAlN/CrN Wadsworth et al. Si-Ta-N Si-Zr-N Si-Mo-N Si-Ti-N Temperature ( C) Si-Al-N Si-B-C-N Vlcek et al. 19 3/14

6 Motivation: examples of as-deposited propeties of SiBCN Thermal stability and oxidation resistance up to ~15 C (thin surf. oxide at 17 C) Heat flow (a.u.) Hardness (GPa) E/(1-ν 2 ) (GPa) calorimetry in Ar 3mN 25% N 2 5% N 2 Temperature ( C) 3mN 5mN Stress (GPa) Negative substrate bias (V) Elastic recovery (%) Mass change (mg/cm 2 ) Optical gap (ev) TiC Münz et al. TiAlZrN Münz et al. TiAlN TiN Münz et al. Donohue et al. nc-tin/a-si 3 N 4 Veprek et al. TiAlCrYN Donohue et al. TiAlN/CrN Wadsworth et al. Si-Ta-N Si-Zr-N Si-Mo-N Si-Ti-N Si 83 B 14 C 3 (<1Ωm) Temperature ( C) Si 31 B 12 C 3 N 54 (>1 8 Ωm) N 2 fraction in the gas mixture Si-Al-N Si-B-C-N Vlcek et al. Tailored mechanical properties (H up to ~35 GPa, E >3 GPa,...) Tailored electronic structure optical & electrical prop. 19 3/14

7 Motivation: examples of as-deposited propeties of SiBCN Thermal stability and oxidation resistance up to ~15 C (thin surf. oxide at 17 C) Heat flow (a.u.) Hardness (GPa) E/(1-ν 2 ) (GPa) calorimetry in Ar 3mN 25% N 2 5% N 2 Temperature ( C) 3mN 5mN Stress (GPa) Negative substrate bias (V) Elastic recovery (%) Mass change (mg/cm 2 ) Optical gap (ev) TiC Münz et al. TiAlZrN Münz et al. TiAlN TiN Münz et al. Donohue et al. nc-tin/a-si 3 N 4 Veprek et al. TiAlCrYN Donohue et al. TiAlN/CrN Wadsworth et al. Si-Ta-N Si-Zr-N Si-Mo-N Si-Ti-N Si 83 B 14 C 3 (<1Ωm) Temperature ( C) Si 31 B 12 C 3 N 54 (>1 8 Ωm) N 2 fraction in the gas mixture Si-Al-N Si-B-C-N Vlcek et al. Tailored mechanical properties (H up to ~35 GPa, E >3 GPa,...) Tailored electronic structure optical & electrical prop. 19 Hardness (GPa) Extinction coefficient mn 3 mn 5 mn as deposited Temperature ( C) 14 C in He 115 C in He Wavelength (nm) High-temperature stability of mechanical properties and optical properties 3/14

8 Motivation: examples of as-deposited propeties of SiBCN Thermal stability and oxidation resistance up to ~15 C (thin surf. oxide at 17 C) Heat flow (a.u.) Hardness (GPa) E/(1-ν 2 ) (GPa) calorimetry in Ar 3mN 25% N 2 5% N 2 Temperature ( C) 3mN 5mN Stress (GPa) Negative substrate bias (V) Elastic recovery (%) Mass change (mg/cm 2 ) Optical gap (ev) TiC Münz et al. TiAlZrN Münz et al. TiAlN TiN Münz et al. Donohue et al. nc-tin/a-si 3 N 4 Veprek et al. TiAlCrYN Donohue et al. TiAlN/CrN Wadsworth et al. Si-Ta-N Si-Zr-N Si-Mo-N Si-Ti-N Si 83 B 14 C 3 (<1Ωm) Temperature ( C) Si 31 B 12 C 3 N 54 (>1 8 Ωm) N 2 fraction in the gas mixture Si-Al-N Si-B-C-N Vlcek et al. Tailored mechanical properties (H up to ~35 GPa, E >3 GPa,...) Tailored electronic structure optical & electrical prop. 19 Hardness (GPa) Extinction coefficient mn 3 mn 5 mn as deposited Temperature ( C) 14 C in He 115 C in He Wavelength (nm) Si relaxes stress caused (in BCN) by implanted Ar Compressive stress (GPa) % Si Ar content (%) % Si 5 % Si 2 % Si High-temperature stability of mechanical properties and optical properties 3/14

9 Motivation: examples of as-deposited propeties of SiBCN Thermal stability and oxidation resistance up to ~15 C (thin surf. oxide at 17 C) Heat flow (a.u.) Hardness (GPa) E/(1-ν 2 ) (GPa) calorimetry in Ar 25% N 2 5% N mN Temperature ( C) 3mN 5mN Stress (GPa) Negative substrate bias (V) Elastic recovery (%) Mass change (mg/cm 2 ) Optical gap (ev) TiC Münz et al. TiAlZrN Münz et al. TiAlN TiN Münz et al. Donohue et al. nc-tin/a-si 3 N 4 Veprek et al. TiAlCrYN Donohue et al. TiAlN/CrN Wadsworth et al. Si-Ta-N Si-Zr-N Si-Mo-N Si-Ti-N Si 83 B 14 C 3 (<1Ωm) Temperature ( C) Si 31 B 12 C 3 N 54 (>1 8 Ωm) N 2 fraction in the gas mixture Si-Al-N Si-B-C-N Vlcek et al. Tailored mechanical properties (H up to ~35 GPa, E >3 GPa,...) Tailored electronic structure optical & electrical prop. 19 Hardness (GPa) Extinction coefficient mn 3 mn 5 mn as deposited Temperature ( C) 14 C in He 115 C in He Wavelength (nm) Si relaxes stress caused (in BCN) by implanted Ar Compressive stress (GPa) % Si Ar content (%) % Si 5 % Si 2 % Si High-temperature stability of mechanical properties and optical properties Explanations by ab-initio calculation of structures and electronic structures (clustering of Si around Ar, doping role of C atoms and CC bonds,...) Absorption coef. (1 4 cm -1 ) hbnsi-n cbn Experiment Si-C cbn N-N C-N (IR) B-C Si-Si hbn C-C C=C C=N Wavenumber (cm -1 ) Number of bonds Wavenumber (cm -1 ) Simulation 3/14

10 Deposition technique DC magnetron sputtering of Si x (B 4 C) 1-x in N 2 +Ar at 35 C (selected compositions: cross-check using dc pulsed magnetron sputtering) Three main control parameters sputter target composition discharge gas mixture compositon substrate bias voltage Gas inlet Matching Network MHz Generator DC Magnetron N S N I m U b T s Substrate holder Thermocouple Heater Cryopump 4/14

11 Main characterization technique Ageing resistance expressed in terms of the thickness of the surface oxide layer measured by spectroscopic ellipsometry Example of measured and fitted 8 raw ellipsometric data: 6 (change of light polarization after its reflection from the coating) clear optical boundary between thin surface oxide (low n) and 4 2 thick bulk nitride (high n) Ψ ( ) Energy (ev) 22 nm bulk 214 nm oxide Exp. Fit 5/14

12 SiBCN coatings studied 5 Si x (B 4 C) 1-x sputter target comp. [Si target ] = 5, 2, 4, 6, 75% 4 N 2 +Ar gas mixture comp. [Ar plasma ] =, 25, 5, 75% 2 substrate bias values U b = -1 or -5 V 2 storage conditions (open air or in polyethylene bags) 8 coatings studied 6/14

13 SiBCN coatings studied 5 Si x (B 4 C) 1-x sputter target comp. [Si target ] = 5, 2, 4, 6, 75% 4 N 2 +Ar gas mixture comp. [Ar plasma ] =, 25, 5, 75% 2 substrate bias values U b = -1 or -5 V 2 storage conditions (open air or in polyethylene bags) 8 coatings studied controlling elemental composition controlling ion bombardment (densification) 6/14

14 SiBCN coatings studied 5 Si x (B 4 C) 1-x sputter target comp. [Si target ] = 5, 2, 4, 6, 75% 4 N 2 +Ar gas mixture comp. [Ar plasma ] =, 25, 5, 75% 2 substrate bias values U b = -1 or -5 V 2 storage conditions (open air or in polyethylene bags) 8 coatings studied (a) 5% Ar + 5% N 2 (b) 75% Ar + 25% N 2 6/14

15 SiBCN coatings studied : 8 coatings deposited, as-deposited properties measured 25+ : as-deposited properties published : storage of 4 coatings under open air + 4 coatings in polyethylene bags 215 : ageing resistance (surface oxide thickness) studied DC Magnetron N S N Im Gas inlet Ub Ts Cryopump Substrate holder Matching Network MHz Generator Thermocouple Heater 7/14

16 Ageing resistance for Si 5 (B 4 C) 95 target oxidation barrier formed in all cases effect of gas mixture composition qualitatively depends on U b perfect ageing resistance at high U b and low [Ar plasma ] Si 5 (B 4 C) 95 8/14

17 Ageing resistance for Si 2 (B 4 C) 8 target least optimum target composition: frequent complete oxidation down to a substrate ageing resistance at strong Ar + bomb. (highest [Ar plasma ]) Si 5 (B 4 C) 95 Si 2 (B 4 C) : complete oxidation (down to substrate) 8/14

18 Ageing resistance for Si 4 (B 4 C) 6 target overall improvement compared to Si 2 (B 4 C) 8 target perfect ageing resistance at high [Ar plasma ] even higher Si content: even better (only resistant samples) Si 5 (B 4 C) 95 Si 2 (B 4 C) 8 Si 4 (B 4 C) 6 Si 6-75 (B 4 C) 25-4 resistant (no oxidation beyond surf. roughness) : complete oxidation (down to substrate) 8/14

19 Ageing resistance for 1% N 2 + % Ar plasma ( "saturation" N content in SiBCN) ageing at medium [Si target ] = 2-4% stronger dependence on [Si target ] at high U b = 5 V 1% N 2 + % Ar : complete oxidation (down to substrate) 9/14

20 Ageing resistance for 25% N % Ar plasma ( "sub-saturation" N content in SiBCN) better - or even perfect - ageing resistance at higher [Si target ] again, stronger dependence on [Si target ] at high U b = 5 V 1% N 2 + % Ar 25% N % Ar : complete oxidation (down to substrate) 9/14

21 SiBCN ageing resistance map two information in one box: effect of substrate bias Si x (B 4 C) 1-x sputter target composition N 2 +Ar discharge gas mixture composition 1/14

22 SiBCN ageing resistance map two information in one box: effect of substrate bias SiO 2 can protect bulk material Si x (B 4 C) 1-x sputter target composition Si x B y O z (silicon constitutes impurities, not oxide in its own right) can NOT protect bulk material B 2 O 3 can protect bulk material N 2 +Ar discharge gas mixture composition 1/14

23 SiBCN ageing resistance map two information in one box: effect of substrate bias best high-temperature (~15 C) stability and oxidation resistance Si x (B 4 C) 1-x sputter target composition N 2 +Ar discharge gas mixture composition 1/14

24 SiBCN ageing resistance map substrate bias leading to better performance Si x (B 4 C) 1-x sputter target composition N 2 +Ar discharge gas mixture composition 11/14

25 Explanation of some trends shown: densification Densification expressed (despite compositional changes with [Ar plasma ]) in terms of hardness in terms of refractive index Higher [Ar plasma ]: densification of SiBCN coatings (steeper trends at higher [Si target ] and lower U b ) Other words: transition from U b = -5 V to -1 V is more beneficial / less harmful at higher [Ar plasma ] Yet other words: do not combine high U b + high [Ar plasma ] 12/14

26 Explanation of some trends shown: densification ageing resistance (densification in terms of) hardness Performance of Si-rich films - steeply dependent on [Ar plasma ] - the best at high [Ar plasma ] and low U b (densification in terms of) refractive index 13/14

27 Explanation of some trends shown: densification ageing resistance (densification in terms of) hardness (densification in terms of) refractive index Performance of Si-rich films - steeply dependent on [Ar plasma ] - the best at high [Ar plasma ] and low U b Performance of Si-poor films - more weakly dependent on [Ar plasma ] - the best at low [Ar plasma ] and high U b 13/14

28 Conclusions SiBCN coatings prepared in a wide range of compositions ( properties) Ageing expressed in terms of surface oxide thickness (ellipsometry) after 12 yr Optimization of process parameters for each composition ageing resistance (and densification) Si-rich compositions resistant, prefered preparation in Ar-rich plasma at low U b B 4 C-rich compositions resistant, prefered preparation in Ar-poor plasma at high U b [ J. Houska, Ceram. Int. 41, 7921 (215) ] 14/14

Flexible Ti-Ni-N Thin Films Prepared by Magnetron Sputtering

Flexible Ti-Ni-N Thin Films Prepared by Magnetron Sputtering Journal of Materials Science and Engineering A 4 (1) (2014) 27-33 D DAVID PUBLISHING Flexible Ti-Ni-N Thin Films Prepared by Magnetron Sputtering Jindrich Musil, Richard Jílek and Radomír Čerstvý Department

More information

Microstructure, morphology and their annealing behaviors of alumina films synthesized by ion beam assisted deposition

Microstructure, morphology and their annealing behaviors of alumina films synthesized by ion beam assisted deposition Nuclear Instruments and Methods in Physics Research B 206 (2003) 357 361 www.elsevier.com/locate/nimb Microstructure, morphology and their annealing behaviors of alumina films synthesized by ion beam assisted

More information

Excimer Laser Annealing of Hydrogen Modulation Doped a-si Film

Excimer Laser Annealing of Hydrogen Modulation Doped a-si Film Materials Transactions, Vol. 48, No. 5 (27) pp. 975 to 979 #27 The Japan Institute of Metals Excimer Laser Annealing of Hydrogen Modulation Doped a-si Film Akira Heya 1, Naoto Matsuo 1, Tadashi Serikawa

More information

This article was originally published in a journal published by Elsevier, and the attached copy is provided by Elsevier for the author s benefit and for the benefit of the author s institution, for non-commercial

More information

XPS STUDY OF DIAMOND-LIKE CARBON-BASED NANOCOMPOSITE FILMS

XPS STUDY OF DIAMOND-LIKE CARBON-BASED NANOCOMPOSITE FILMS International Journal of Nanoscience Vol. 3, No. 6 (2004) 797 802 c World Scientific Publishing Company XPS STUDY OF DIAMOND-LIKE CARBON-BASED NANOCOMPOSITE FILMS S. ZHANG,Y.Q.FU,X.L.BUIandH.J.DU School

More information

OPTICAL CHARACTERISTICS OF CARBON NITRIDE FILMS PREPARED BY HOLLOW CATHODE DISCHARGE *

OPTICAL CHARACTERISTICS OF CARBON NITRIDE FILMS PREPARED BY HOLLOW CATHODE DISCHARGE * Journal of Optoelectronics and Advanced Materials Vol., No., December 000, p. 5-55 OPTICAL CHARACTERISTICS OF CARBON NITRIDE FILMS PREPARED BY HOLLOW CATHODE DISCHARGE * M. Balaceanu, E. Grigore, G. Pavelescu

More information

Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering

Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering Bull. Mater. Sci., Vol. 26, No. 2, February 2003, pp. 233 237. Indian Academy of Sciences. Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering HARISH C BARSHILIA and K S RAJAM*

More information

Investigation of molybdenum-carbon films Mo C:H deposited using an electron cyclotron resonance chemical vapor deposition system

Investigation of molybdenum-carbon films Mo C:H deposited using an electron cyclotron resonance chemical vapor deposition system JOURNAL OF APPLIED PHYSICS VOLUME 88, NUMBER 6 15 SEPTEMBER 2000 Investigation of molybdenum-carbon films Mo C:H deposited using an electron cyclotron resonance chemical vapor deposition system Rusli,

More information

Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD

Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD AIMCAL 2005 Myrtle Beach, SC, USA, October 19th, 2005 Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD E. Reinhold, C. Steuer VON ARDENNE Anlagentechnik GmbH, Dresden, Germany

More information

The discharge voltage behaviour during reactive sputtering of oxides. R. De Gryse, D. Depla, J. Haemers

The discharge voltage behaviour during reactive sputtering of oxides. R. De Gryse, D. Depla, J. Haemers The discharge voltage behaviour during reactive sputtering of oxides R. De Gryse, D. Depla, J. Haemers AIMCAL 2007 1 Hysteresis behaviour /O 2 and /O 2 discharge voltage (V) 480 460 440 420 380 440 360

More information

PLASMA FLOW AND PLASMA EXPANSION AROUND 3D OBJECTS IN METAL PLASMA IMMERSION ION IMPLANTATION

PLASMA FLOW AND PLASMA EXPANSION AROUND 3D OBJECTS IN METAL PLASMA IMMERSION ION IMPLANTATION PLASMA FLOW AND PLASMA EXPANSION AROUND 3D OBJECTS IN METAL PLASMA IMMERSION ION IMPLANTATION Darina Manova & Stephan Mändl 1 Motivation 2 Motivation Visualisation of Water Flow from Dynamic Sand Dunes

More information

Relation Between Internal Stress and Surface Roughness of Titanium Nitride Films Deposited by HCD Ion Plating

Relation Between Internal Stress and Surface Roughness of Titanium Nitride Films Deposited by HCD Ion Plating No.22,28 65 Relation Between Internal Stress and Surface Roughness of Titanium Nitride Films Deposited by HCD Ion Plating Itsuo Ishigami Ken-ichi Miura Hideaki Hoshino Tomoyuki Mizukoshi (28 6 17 ) An

More information

ZnO-based Transparent Conductive Oxide Thin Films

ZnO-based Transparent Conductive Oxide Thin Films IEEE EDS Mini-colloquium WIMNACT 32 ZnO-based Transparent Conductive Oxide Thin Films Weijie SONG Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, P. R. China

More information

Hard Coatings & Coatings Competence Center (Ingenia S3p TM )

Hard Coatings & Coatings Competence Center (Ingenia S3p TM ) Willkommen Welcome Bienvenue Hard Coatings & Coatings Competence Center (Ingenia S3p TM ) Prof. Dr. Hans Hug, Empa Nanoscale Materials Science Lab Outline Nanocomposite Hard Coatings by reactive sputtering

More information

Tribomechanical Properties of DLC Coatings Deposited by Magnetron Sputtering on Metallic and Insulating Substrates

Tribomechanical Properties of DLC Coatings Deposited by Magnetron Sputtering on Metallic and Insulating Substrates Tribomechanical Properties of DLC Coatings Deposited by Magnetron Sputtering on Metallic and Insulating Substrates Dr. Iván Fernández Martínez Indianapolis, May 10th, 2016 Diamond Like Carbon (DLC) Diamond-like

More information

THE INFLUENCE OF NITROGEN CONTENT ON THE MECHANICAL PROPERTIES OF TiN x THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

THE INFLUENCE OF NITROGEN CONTENT ON THE MECHANICAL PROPERTIES OF TiN x THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING Bulletin of the Transilvania University of Braşov Series I: Engineering Sciences Vol. 5 (54) No. 2-2012 THE INFLUENCE OF NITROGEN CONTENT ON THE MECHANICAL PROPERTIES OF TiN x THIN FILMS PREPARED BY REACTIVE

More information

SOLID SOLUTION METAL ALLOYS

SOLID SOLUTION METAL ALLOYS SOLID SOLUTION METAL ALLOYS Synergy Effects vs. Segregation Phenomena D. Manova, J. Lutz, S. Mändl, H. Neumann 1 Table of Content Motivation Alloys vs. Pure Elements or Intermetallic Compounds Introduction

More information

Silicon nitride deposited by ECR CVD at room temperature for LOCOS isolation technology

Silicon nitride deposited by ECR CVD at room temperature for LOCOS isolation technology Applied Surface Science 212 213 (2003) 388 392 Silicon nitride deposited by ECR CVD at room temperature for LOCOS isolation technology Marcus A. Pereira, José A. Diniz, Ioshiaki Doi *, Jacobus W. Swart

More information

Solar Selective Absorber Coating Methods Plasma Processes

Solar Selective Absorber Coating Methods Plasma Processes Solar Selective Absorber Coating Methods Plasma Processes Paul Gantenbein & Elimar Frank SPF - Institut für Solartechnik University of Applied Sciences Rapperswil (HSR) Optical properties of a selective

More information

RightCopyright 2006 American Vacuum Soci

RightCopyright 2006 American Vacuum Soci Title Gallium nitride thin films deposite magnetron sputtering Author(s) Maruyama, T; Miyake, H Citation JOURNAL OF VACUUM SCIENCE & (2006), 24(4): 1096-1099 TECHNOL Issue Date 2006 URL http://hdl.handle.net/2433/43541

More information

Deposited by Sputtering of Sn and SnO 2

Deposited by Sputtering of Sn and SnO 2 Journal of the Korean Ceramic Society Vol. 49, No. 5, pp. 448~453, 2012. http://dx.doi.org/10.4191/kcers.2012.49.5.448 Comparative Study of Nitrogen Incorporated SnO 2 Deposited by Sputtering of Sn and

More information

High Power Impulse Magnetron Sputtering: a Tool for Synthesizing New Functional Thin Films and Coatings

High Power Impulse Magnetron Sputtering: a Tool for Synthesizing New Functional Thin Films and Coatings High Power Impulse Magnetron Sputtering: a Tool for Synthesizing New Functional Thin Films and Coatings Dr. Kostas Sarakinos (Linköping University, Švédsko ) The project is co-financed by the European

More information

0HE, United Kingdom. United Kingdom , Japan

0HE, United Kingdom. United Kingdom , Japan Tel. No.: 81-45-924-5357 Fax No.: 81-45-924-5339 e-mail: tkamiya@msl.titech.ac.jp Effects of Oxidation and Annealing Temperature on Grain Boundary Properties in Polycrystalline Silicon Probed Using Nanometre-Scale

More information

Ruthenium Oxide Films Prepared by Reactive Biased Target Sputtering

Ruthenium Oxide Films Prepared by Reactive Biased Target Sputtering Ruthenium Oxide Films Prepared by Reactive Biased Target Sputtering Hengda Zhang Anthony Githinji 1. Background RuO2 in both crystalline and amorphous forms is of crucial importance for theoretical as

More information

Materials Characterization

Materials Characterization Materials Characterization C. R. Abernathy, B. Gila, K. Jones Cathodoluminescence (CL) system FEI Nova NanoSEM (FEG source) with: EDAX Apollo silicon drift detector (TE cooled) Gatan MonoCL3+ FEI SEM arrived

More information

Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition Ž. Surface and Coatings Technology 17 000 60 65 Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition Y.P. Zhang a,, Y.S. Gu a, X.R. Chang a, Z.Z. Tian a,

More information

Surface Analysis of Electrochromic Switchable Mirror Glass Based on Magnesium-Nickel Thin Film in Accelerated Degradation Test

Surface Analysis of Electrochromic Switchable Mirror Glass Based on Magnesium-Nickel Thin Film in Accelerated Degradation Test Materials Transactions, Vol. 52, No. 3 (2011) pp. 464 to 468 #2011 The Japan Institute of Metals Surface Analysis of Electrochromic Switchable Mirror Glass Based on Magnesium-Nickel Thin Film in Accelerated

More information

LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology

LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology Introduction to Thin Film Contents 1. Introduction and Application Examples (2h) 2. Preparation of Thin Films by PVD (Physical Vapor Deposition) (6h) 2.1 Vacuum Technique (1h) 2.1.1 Kinetics of Gases 2.1.2

More information

Synthesis of diamond-like carbon films with super-low friction and wear properties

Synthesis of diamond-like carbon films with super-low friction and wear properties Synthesis of diamond-like carbon films with super-low friction and wear properties MSE 676 All Things Carbon / 09-29-2009 A. Erdemir, O.L. Eryilmaz, and G. Fenske J. Vac. Sci. Technol. A 18(4), Jul/Aug

More information

Author(s) Chayahara, A; Kinomura, A; Horino, RightCopyright 1999 American Vacuum Soci

Author(s) Chayahara, A; Kinomura, A; Horino,   RightCopyright 1999 American Vacuum Soci Title Titanium nitride prepared by plasma implantation Author(s) Yukimura, K; Sano, M; Maruyama, T; Chayahara, A; Kinomura, A; Horino, Citation JOURNAL OF VACUUM SCIENCE & (1999), 17(2): 840-844 TECHNOL

More information

Applications of Energy-Assistance to the formation of novel surface coatings

Applications of Energy-Assistance to the formation of novel surface coatings Innovation Into Success; The quarterly Journal of the UK Science Park Association Issue No 17 Spring 2015 p65-8 (www.scienceparks.co.uk) Applications of Energy-Assistance to the formation of novel surface

More information

ARTICLE IN PRESS. Materials Science in Semiconductor Processing

ARTICLE IN PRESS. Materials Science in Semiconductor Processing Materials Science in Semiconductor Processing ] (]]]]) ]]] ]]] Contents lists available at ScienceDirect Materials Science in Semiconductor Processing journal homepage: www.elsevier.com/locate/mssp High-dielectric

More information

HiPIMS Technology: advantages and disadvantages

HiPIMS Technology: advantages and disadvantages Vacuum plasma technology HiPIMS Technology: advantages and disadvantages Cr - DC Cr - HiPIMS Alessandro Patelli alessandro.patelli@venetonanotech.it Outline 1. What is HiPIMS Ti target surface 2. What

More information

Synthesis of nanoscale CN x /TiAlN multilayered coatings by ion-beam-assisted deposition

Synthesis of nanoscale CN x /TiAlN multilayered coatings by ion-beam-assisted deposition Synthesis of nanoscale / multilayered coatings by ion-beam-assisted deposition M. Cao, D. J. Li, a and X. Y. Deng College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin

More information

Roman Chistyakov and Bassam Abraham Zond Inc/Zpulser LLC, Mansfield, MA

Roman Chistyakov and Bassam Abraham Zond Inc/Zpulser LLC, Mansfield, MA HIPIMS Arc-Free Reactive Sputtering of Non-conductive Films Using the ENDURA 200 mm Cluster Tool: Direct Comparison Between Pulsed DC Pinnacle Plus and HIPIMS Cyprium Roman Chistyakov and Bassam Abraham

More information

Etching Mask Properties of Diamond-Like Carbon Films

Etching Mask Properties of Diamond-Like Carbon Films N. New Nawachi Diamond et al. and Frontier Carbon Technology 13 Vol. 15, No. 1 2005 MYU Tokyo NDFCT 470 Etching Mask Properties of Diamond-Like Carbon Films Norio Nawachi *, Akira Yamamoto, Takahiro Tsutsumoto

More information

Characterization and erosion of metal-containing carbon layers

Characterization and erosion of metal-containing carbon layers Characterization and erosion of metal-containing carbon layers Martin Balden Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching, Germany Materials Research Division (MF) Outline

More information

Tribological and Catalytic Coatings

Tribological and Catalytic Coatings Tribological and Catalytic Coatings Objectives: Study of mechanical properties of nanocomposite and nanolaminate thin films deposited by pulsed laser deposition (PLD): Nitride-based coatings (AlN, TiN,

More information

Chapter 3. Deposition and Characterization of yttrium oxide (Y 2 O 3 ) thin films

Chapter 3. Deposition and Characterization of yttrium oxide (Y 2 O 3 ) thin films Chapter 3 Deposition and Characterization of yttrium oxide (Y 2 O 3 ) thin films This chapter describes about the deposition of yttrium oxide thin films by RF plasma enhanced MOCVD technique using Y(thd)

More information

Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by DC/RF Magnetron Sputtering

Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by DC/RF Magnetron Sputtering Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by DC/RF Magnetron Sputtering Sung Han Kim, Seo Han Kim, and Pung Keun Song* Department of materials science and engineering,

More information

Electron field emission properties of tetrahedral amorphous carbon films

Electron field emission properties of tetrahedral amorphous carbon films JOURNAL OF APPLIED PHYSICS VOLUME 85, NUMBER 9 1 MAY 1999 Electron field emission properties of tetrahedral amorphous carbon films L. K. Cheah, a) X. Shi, E. Liu, and B. K. Tay Ion Beam Processing Lab,

More information

Properties of TiN thin films grown on SiO 2 by reactive HiPIMS

Properties of TiN thin films grown on SiO 2 by reactive HiPIMS Properties of TiN thin films grown on SiO 2 by reactive HiPIMS Friðrik Magnus 1, Árni S. Ingason 1, Ólafur B. Sveinsson 1, S. Shayestehaminzadeh 1, Sveinn Ólafsson 1 and Jón Tómas Guðmundsson 1,2 1 Science

More information

Influence of Underlayer on Crystallography and Roughness of Aluminum Nitride Thin Film Reactively Sputtered by Ion-Beam Kaufman Source

Influence of Underlayer on Crystallography and Roughness of Aluminum Nitride Thin Film Reactively Sputtered by Ion-Beam Kaufman Source Influence of Underlayer on Crystallography and Roughness of Aluminum Nitride Thin Film Reactively Sputtered by Ion-Beam Kaufman Source GABLECH Imrich 1,*, SVATOŠ Vojtěch 1,, PRÁŠEK Jan 1,, HUBÁLEK Jaromír

More information

Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by DC/RF Magnetron Sputtering

Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by DC/RF Magnetron Sputtering [Research Paper] 대한금속 재료학회지 (Korean J. Met. Mater.), Vol. 55, No. 8 (2017), pp.581~586 DOI: 10.3365/KJMM.2017.55.8.581 581 Near Infrared Reflecting Properties of TiO 2 /Ag/TiO 2 Multilayers Prepared by

More information

Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li

Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li Science and Technology on Surface Engineering Laboratory,

More information

THIN NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING: FABRICATION AND THE STUDY OF ELECTROPHYSICAL PARAMETERS

THIN NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING: FABRICATION AND THE STUDY OF ELECTROPHYSICAL PARAMETERS THIN NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING: FABRICATION AND THE STUDY OF ELECTROPHYSICAL PARAMETERS Pavel HORÁK a,b, Václav BEJŠOVEC b, Vasyl LAVRENTIEV b, Jiří VACÍK b, Martin VRŇATA a,

More information

Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC

Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC P. Sauer, H.-G. Lotz, A. Hellmich, R. Kukla, J. Schröder Applied Films GmbH & Co. KG, Alzenau, Germany Key Words: ITO MF PET

More information

Microwave PECVD of Nanocrystalline Diamond with RF Induced Bias Nucleation

Microwave PECVD of Nanocrystalline Diamond with RF Induced Bias Nucleation Microwave PECVD of Nanocrystalline Diamond with RF Induced Bias Nucleation Z. Frgala, O. Jašek, M. Karásková, L. Zajíčková, V. Buršíková, D. Franta Deptartment of Physical Electronics, Masaryk University,

More information

Fundamental Characteristics of a Microwave Discharge Type Plasma Source Working under Atmosphere Pressure

Fundamental Characteristics of a Microwave Discharge Type Plasma Source Working under Atmosphere Pressure Fundamental Characteristics of a Microwave Discharge Type Plasma Source Working under Atmosphere Pressure KOBAYASHI Akira*, TAKAO Yoshiyuki**, KOMURASAKI Kimiya*** Abstract The microwave discharge plasma

More information

Mechanical Properti es of ZnO:Mo Transparent Conducting Oxide Thin Film Prepared by Sputtering

Mechanical Properti es of ZnO:Mo Transparent Conducting Oxide Thin Film Prepared by Sputtering CHINESE JOURNAL OF PHYSICS VOL. 51, NO. 3 June 2013 Mechanical Properti es of ZnO:Mo Transparent Conducting Oxide Thin Film Prepared by Sputtering Y. C. Lin, C. C. Chen, and W. Y. Lai Department of Mechatronics

More information

1. Aluminum alloys for direct contacts. 1.1 Advantages of aluminum alloys for direct contacts

1. Aluminum alloys for direct contacts. 1.1 Advantages of aluminum alloys for direct contacts Direct contacts between aluminum alloys and thin film transistors (TFTs) contact layers were studied. An Al-Ni alloy was found to be contacted directly with an indium tin oxide (ITO) layer successfully

More information

Deposition of niobium and other superconducting materials with high power impulse magnetron sputtering: Concept and first results

Deposition of niobium and other superconducting materials with high power impulse magnetron sputtering: Concept and first results 15th International Conference on RF Superconductivity July 25-29, 2011, Chicago Deposition of niobium and other superconducting materials with high power impulse magnetron sputtering: Concept and first

More information

Target effective electron emission coefficients during reactive sputtering of Oxides and Nitrides.

Target effective electron emission coefficients during reactive sputtering of Oxides and Nitrides. Target effective electron emission coefficients during reactive sputtering of and R. De Gryse, D. Depla, S. Mahieu Department for Solid State Sciences Ghent University (S1) B-9000 Ghent, Belgium X.Y. Li

More information

Improvement of gas barrier properties by combination of polymer film and gas barrier layer

Improvement of gas barrier properties by combination of polymer film and gas barrier layer Improvement of gas barrier properties by combination of polymer film and gas barrier Y. Tsumagari, H. Murakami, K. Iseki and S. Yokoyama Toyobo Co., LTD. RESEARCH CENTER, - Katata 2-chome, Otsu, Shiga,

More information

Power Vision Ltd. PV Research. Power Vision Ltd. Unit R2, Herald Park, Crewe, Cheshire, CW1 6EA, UK Tel:

Power Vision Ltd. PV Research. Power Vision Ltd. Unit R2, Herald Park, Crewe, Cheshire, CW1 6EA, UK   Tel: Power Vision Ltd PV Research Power Vision Ltd Unit R2, Herald Park, Crewe, Cheshire, CW1 6EA, UK www.pvoptical.com Tel: +44 1270 253000 Flexible Whether it be fast AR coating onto temperature sensitive

More information

Previous Lecture. Vacuum & Plasma systems for. Dry etching

Previous Lecture. Vacuum & Plasma systems for. Dry etching Previous Lecture Vacuum & Plasma systems for Dry etching Lecture 9: Evaporation & sputtering Objectives From this evaporation lecture you will learn: Evaporator system layout & parts Vapor pressure Crucible

More information

Activation Behavior of Boron and Phosphorus Atoms Implanted in Polycrystalline Silicon Films by Heat Treatment at 250 C

Activation Behavior of Boron and Phosphorus Atoms Implanted in Polycrystalline Silicon Films by Heat Treatment at 250 C Japanese Journal of Applied Physics Vol. 44, No. 3, 2005, pp. 1186 1191 #2005 The Japan Society of Applied Physics Activation Behavior of Boron and Phosphorus Atoms Implanted in Polycrystalline Silicon

More information

Supplementary Figure 1 TEM of external salt byproducts. TEM image of some salt byproducts precipitated out separately from the Si network, with

Supplementary Figure 1 TEM of external salt byproducts. TEM image of some salt byproducts precipitated out separately from the Si network, with Supplementary Figure 1 TEM of external salt byproducts. TEM image of some salt byproducts precipitated out separately from the Si network, with non-uniform particle size distribution. The scale bar is

More information

Correlation Between Energy Gap and Defect Formation of Al Doped Zinc Oxide on Carbon Doped Silicon Oxide

Correlation Between Energy Gap and Defect Formation of Al Doped Zinc Oxide on Carbon Doped Silicon Oxide TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS Vol. 15, No. 4, pp. 207-212, August 25, 2014 Regular Paper pissn: 1229-7607 eissn: 2092-7592 DOI: http://dx.doi.org/10.4313/teem.2014.15.4.207 Correlation

More information

Ceramic Processing Research

Ceramic Processing Research Journal of Ceramic Processing Research. Vol. 9, No. 6, pp. 638~642 (2008) J O U R N A L O F Ceramic Processing Research Study of Ga-Doped ZnO films deposited on PET substrates by DC magnetron sputtering

More information

Tribological properties of diamond-like carbon films deposited by pulsed laser arc deposition

Tribological properties of diamond-like carbon films deposited by pulsed laser arc deposition Vol 16 No 12, December 2007 c 2007 Chin. Phys. Soc. 1009-1963/2007/16(12)/3790-08 Chinese Physics and IOP Publishing Ltd Tribological properties of diamond-like carbon films deposited by pulsed laser arc

More information

Deposition and characterization of sputtered ZnO films

Deposition and characterization of sputtered ZnO films Superlattices and Microstructures 42 (2007) 89 93 www.elsevier.com/locate/superlattices Deposition and characterization of sputtered ZnO films W.L. Dang, Y.Q. Fu, J.K. Luo, A.J. Flewitt, W.I. Milne Electrical

More information

Laser Annealing of Amorphous Ni-Ti Shape Memory Alloy Thin Films

Laser Annealing of Amorphous Ni-Ti Shape Memory Alloy Thin Films Laser Annealing of Amorphous Ni-Ti Shape Memory Alloy Thin Films Xi Wang, Zhenyu Xue, Joost J. Vlassak Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA, U.S.A. Yves Bellouard

More information

Title. Author(s)Shimozuma, M.; Date, H.; Iwasaki, T.; Tagashira, H.; Issue Date Doc URL. Type. Note. Additional There Information

Title. Author(s)Shimozuma, M.; Date, H.; Iwasaki, T.; Tagashira, H.; Issue Date Doc URL. Type. Note. Additional There Information Title Three-dimensional deposition of TiN film using low f Author(s)Shimozuma, M.; Date, H.; Iwasaki, T.; Tagashira, H.; CitationJournal of Vacuum Science & Technology. A, Vacuum, S Issue Date 1997-07

More information

THE INCREASE IN THICKNESS UNIFORMITY OF FILMS OBTAINED BY MAGNETRON SPUTTERING WITH ROTATING SUBSTRATE

THE INCREASE IN THICKNESS UNIFORMITY OF FILMS OBTAINED BY MAGNETRON SPUTTERING WITH ROTATING SUBSTRATE Plasma Physics and Technology 3(3):1 14, 216 Department of Physics, FEE CTU in Prague, 216 THE INCREASE IN THICKNESS UNIFORMITY OF FILMS OBTAINED BY MAGNETRON SPUTTERING WITH ROTATING SUBSTRATE Golosov

More information

Adhesion enhancement of DLC hard coatings by HiPIMS metal ion etching pretreatment and its tribological properties José Antonio Santiago Varela

Adhesion enhancement of DLC hard coatings by HiPIMS metal ion etching pretreatment and its tribological properties José Antonio Santiago Varela Adhesion enhancement of hard coatings by HiPIMS metal ion etching pretreatment and its tribological properties José Antonio Santiago Varela Bilbao, October 19 th 2016 E-mail: jose.santiago@imdea.org Aim

More information

Characterization of thin Gd 2 O 3 magnetron sputtered layers

Characterization of thin Gd 2 O 3 magnetron sputtered layers Characterization of thin Gd 2 O 3 magnetron sputtered layers Jacek Gryglewicz * a, Piotr Firek b, Jakub Jaśiński b, Robert Mroczyński b, Jan Szmidt b a Wroclaw University of Technology, Janiszewskiego

More information

Structure and properties of Si incorporated tetrahedral amorphous carbon films prepared by hybrid filtered vacuum arc process

Structure and properties of Si incorporated tetrahedral amorphous carbon films prepared by hybrid filtered vacuum arc process Diamond and Related Materials 11 (2002) 198 20 Structure and properties of Si incorporated tetrahedral amorphous carbon films prepared by hybrid filtered vacuum arc process a a, a b c Churl Seung Lee,

More information

Oxide Growth. 1. Introduction

Oxide Growth. 1. Introduction Oxide Growth 1. Introduction Development of high-quality silicon dioxide (SiO2) has helped to establish the dominance of silicon in the production of commercial integrated circuits. Among all the various

More information

Crystallization of Amorphous Silicon Thin Film. by Using a Thermal Plasma Jet. Hyun Seok Lee, Sooseok Choi, Sung Woo Kim, and Sang Hee Hong*

Crystallization of Amorphous Silicon Thin Film. by Using a Thermal Plasma Jet. Hyun Seok Lee, Sooseok Choi, Sung Woo Kim, and Sang Hee Hong* Crystallization of Amorphous Silicon Thin Film by Using a Thermal Plasma Jet Hyun Seok Lee, Sooseok Choi, Sung Woo Kim, and Sang Hee Hong* Department of Nuclear Engineering, Seoul National University Seoul

More information

atoms g/mol

atoms g/mol CHAPTER 2 ATOMIC STRUCTURE 2 6(a) Aluminum foil used for storing food weighs about 0.05 g/cm². How many atoms of aluminum are contained in this sample of foil? In a one square centimeter sample: number

More information

Title: COMPLEX STUDY OF MECHANICAL PROPERTIES OF a-si:h AND a-sic:h BORON DOPED FILMS

Title: COMPLEX STUDY OF MECHANICAL PROPERTIES OF a-si:h AND a-sic:h BORON DOPED FILMS Elsevier Editorial System(tm) for Journal of Non-Crystalline Solids Manuscript Draft Manuscript Number: Title: COMPLEX STUDY OF MECHANICAL PROPERTIES OF a-si:h AND a-sic:h BORON DOPED FILMS Article Type:

More information

High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM

High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM Integrated Ferroelectrics, 84: 169 177, 2006 Copyright Taylor & Francis Group, LLC ISSN 1058-4587 print / 1607-8489 online DOI: 10.1080/10584580601085750 High Density Plasma Etching of IrRu Thin Films

More information

Effect of negative rf bias on electrophotographic properties of hard diamond-like carbon films deposited on organic photoconductors

Effect of negative rf bias on electrophotographic properties of hard diamond-like carbon films deposited on organic photoconductors J. Phys.: Condens. Matter 10 (1998) 7835 7841. Printed in the UK PII: S0953-8984(98)92663-7 Effect of negative rf bias on electrophotographic properties of hard diamond-like carbon films deposited on organic

More information

Thermal stability and oxidation properties of magnetron sputtered diamond-like carbon and its nanocomposite coatings

Thermal stability and oxidation properties of magnetron sputtered diamond-like carbon and its nanocomposite coatings Diamond & Related Materials 15 (6) 972 976 www.elsevier.com/locate/diamond Thermal stability and oxidation properties of magnetron sputtered diamond-like carbon and its nanocomposite coatings Sam Zhang

More information

Low temperature deposition of thin passivation layers by plasma ALD

Low temperature deposition of thin passivation layers by plasma ALD 1 Low temperature deposition of thin passivation layers by plasma ALD Bernd Gruska, SENTECH Instruments GmbH, Germany 1. SENTECH in brief 2. Low temperature deposition processes 3. SENTECH SI ALD LL System

More information

AC Reactive Sputtering with Inverted Cylindrical Magnetrons

AC Reactive Sputtering with Inverted Cylindrical Magnetrons AC Reactive Sputtering with Inverted Cylindrical Magnetrons D.A. Glocker, Isoflux Incorporated, Rush, NY; and V.W. Lindberg and A.R. Woodard, Rochester Institute of Technology, Rochester, NY Key Words:

More information

Hydrogen-induced surface blistering of sample chuck materials in hydrogen plasma immersion ion implantation

Hydrogen-induced surface blistering of sample chuck materials in hydrogen plasma immersion ion implantation Hydrogen-induced surface blistering of sample chuck materials in hydrogen plasma immersion ion implantation Paul K. Chu a) and Xuchu Zeng Department of Physics and Materials Science, City University of

More information

Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen

Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen Ž. Applied Surface Science 161 2000 54 60 www.elsevier.nlrlocaterapsusc Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen Andreas Othonos a,),

More information

Citation JOURNAL OF APPLIED PHYSICS (1995),

Citation JOURNAL OF APPLIED PHYSICS (1995), Title Copper nitride thin films prepared sputtering Author(s) MARUYAMA, T; MORISHITA, T Citation JOURNAL OF APPLIED PHYSICS (1995), Issue Date 1995-09-15 URL http://hdl.handle.net/2433/43537 Copyright

More information

Pre-treatment of low temperature GaN buffer layer deposited on AlN Si substrate by hydride vapor phase epitaxy

Pre-treatment of low temperature GaN buffer layer deposited on AlN Si substrate by hydride vapor phase epitaxy Ž. Surface and Coatings Technology 131 000 465 469 Pre-treatment of low temperature GaN buffer layer deposited on AlN Si substrate by hydride vapor phase epitaxy Ha Jin Kim, Ho-Sun Paek, Ji-Beom Yoo Department

More information

4-in-1 Nano Machine & Technology

4-in-1 Nano Machine & Technology 4-in-1 Nano Machine & Technology Machine combines 1) CVD, 2) PVD, 3) ion saturation and 4) ion-treatment processes in one (1) production cycle in one machine that produces functional coatings used to harden

More information

Citation JOURNAL OF APPLIED PHYSICS (1995),

Citation JOURNAL OF APPLIED PHYSICS (1995), Title Copper nitride thin films prepared sputtering Author(s) MARUYAMA, T; MORISHITA, T Citation JOURNAL OF APPLIED PHYSICS (1995), Issue Date 1995-09-15 URL http://hdl.handle.net/2433/43537 Copyright

More information

Optimization of nitrogenated amorphous carbon films deposited by dual ion beam sputtering

Optimization of nitrogenated amorphous carbon films deposited by dual ion beam sputtering Materials Science and Engineering B64 (1999) 6 11 www.elsevier.com/locate/mseb Optimization of nitrogenated amorphous carbon films deposited by dual ion beam sputtering L.K. Cheah *, X. Shi, E. Liu, B.K.

More information

OXYGEN SENSOR BASED ON Ga 2 O 3 FILMS OPERATING AT HIGH TEMPERATURE

OXYGEN SENSOR BASED ON Ga 2 O 3 FILMS OPERATING AT HIGH TEMPERATURE Journal of ptoelectronics and Advanced Materials Vol. 7, No. 2, Apil 2005, p. 891-896 Section 6: Functional materials. Applications XYGEN SENSR BASED N Ga 2 3 FILMS PERATING AT HIGH TEMPERATURE C. Baban

More information

Inductively Coupled Plasma Etching of Pb(Zr x Ti 1 x )O 3 Thin Films in Cl 2 /C 2 F 6 /Ar and HBr/Ar Plasmas

Inductively Coupled Plasma Etching of Pb(Zr x Ti 1 x )O 3 Thin Films in Cl 2 /C 2 F 6 /Ar and HBr/Ar Plasmas Korean J. Chem. Eng., 19(3), 524-528 (2002) Inductively Coupled Plasma Etching of Pb(Zr x Ti 1 x )O 3 Thin Films in Cl 2 /C 2 F 6 /Ar and HBr/Ar Plasmas Chee Won Chung, Yo Han Byun and Hye In Kim Department

More information

Co-Evolution of Stress and Structure During Growth of Polycrystalline Thin Films

Co-Evolution of Stress and Structure During Growth of Polycrystalline Thin Films Co-Evolution of Stress and Structure During Growth of Polycrystalline Thin Films Carl V. Thompson and Hang Z. Yu* Dept. of Materials Science and Engineering MIT, Cambridge, MA, USA Effects of intrinsic

More information

Nanocomposite Thin Films for both Mechanical and Functional Applications

Nanocomposite Thin Films for both Mechanical and Functional Applications Nanocomposite Thin Films for both Mechanical and Functional Applications SAM ZHANG, 1 YONGQING FU, 1,2 HEJUN DU, 1,2 YANG LIU, 3 TUPEI CHEN 3 1 School of MPE, Nanyang Technological University, Singapore

More information

Ultrathin oxynitride films for CMOS technology

Ultrathin oxynitride films for CMOS technology Invited paper Ultrathin oxynitride films for CMOS technology Romuald B. Beck and Andrzej Jakubowski Abstract In this work, a review of possible methods of oxynitride film formation will be given. These

More information

Synthesis and characterization of super hard, self-lubricating Ti Si C N nanocomposite coatings

Synthesis and characterization of super hard, self-lubricating Ti Si C N nanocomposite coatings Acta Materialia (07) 63 63 www.elsevier.com/locate/actamat Synthesis and characterization of super hard, self-lubricating Ti Si C N nanocomposite coatings S.L. Ma a, *, D.Y. Ma a, Y. Guo a,b.xu a, G.Z.

More information

Tunable ion flux density and its impact on AlN thin films deposited in a confocal DC Magnetron Sputtering System

Tunable ion flux density and its impact on AlN thin films deposited in a confocal DC Magnetron Sputtering System Willkommen Welcome Bienvenue Tunable ion flux density and its impact on AlN thin films deposited in a confocal DC Magnetron Sputtering System XXIV. Erfahrungsaustausch Oberflächentechnologie mit Plasma-

More information

Electronic structure and x-ray-absorption near-edge structure of amorphous Zr-oxide and Hf-oxide thin films: A first-principles study

Electronic structure and x-ray-absorption near-edge structure of amorphous Zr-oxide and Hf-oxide thin films: A first-principles study JOURNAL OF APPLIED PHYSICS 97, 073519 2005 Electronic structure and x-ray-absorption near-edge structure of amorphous Zr-oxide and Hf-oxide thin films: A first-principles study SungKwan Kim, a Yangsoo

More information

Growth and properties of (ultra) nano crystalline diamond

Growth and properties of (ultra) nano crystalline diamond Growth and properties of (ultra) nano crystalline diamond Hadwig Sternschulte 1,2 1 nanotum, Technische Universität München, D-85748 Garching, Germany 2 Physik Department E19, Technische Universität München,

More information

Synthesis and Characterization of DC Magnetron Sputtered ZnO Thin Films Under High Working Pressures

Synthesis and Characterization of DC Magnetron Sputtered ZnO Thin Films Under High Working Pressures Accepted Manuscript Synthesis and Characterization of DC Magnetron Sputtered ZnO Thin Films Under High Working Pressures M. Hezam, N. Tabet, A. Mekki PII: S0040-6090(10)00417-7 DOI: doi: 10.1016/j.tsf.2010.03.091

More information

Nucleation and growth of nanostructures and films. Seongshik (Sean) Oh

Nucleation and growth of nanostructures and films. Seongshik (Sean) Oh Nucleation and growth of nanostructures and films Seongshik (Sean) Oh Outline Introduction and Overview 1. Thermodynamics and Kinetics of thin film growth 2. Defects in films 3. Amorphous, Polycrystalline

More information

Physical Vapor Deposition (PVD) Zheng Yang

Physical Vapor Deposition (PVD) Zheng Yang Physical Vapor Deposition (PVD) Zheng Yang ERF 3017, email: yangzhen@uic.edu Page 1 Major Fabrication Steps in MOS Process Flow UV light Mask oxygen Silicon dioxide photoresist exposed photoresist oxide

More information

New tools and processes for improving machining of heat resistant alloys used in aerospace applications MACHERENA

New tools and processes for improving machining of heat resistant alloys used in aerospace applications MACHERENA New tools and processes for improving machining of heat resistant alloys used in aerospace applications MACHERENA P. Alonso, GEYCA, Spain Aeronautical Days 2006 Vienna, 20 June 2006 Objective Improvement

More information

Chapter 1. Introduction to Thin Film Technology

Chapter 1. Introduction to Thin Film Technology Chapter 1. Introduction to Thin Film Technology Thin films are deposited onto bulk materials (substrates) to achieve properties unattainable or not easily attainable by substrates alone. How thin? 1 Properties:

More information

Studies on Atmospheric Non-Thermal Plasma Jet Device

Studies on Atmospheric Non-Thermal Plasma Jet Device Int. J. New. Hor. Phys. 3, No. 1, 1-6 (2016) 1 International Journal of New Horizons in Physics http://dx.doi.org/10.18576/ijnhp/030101 Studies on Atmospheric Non-Thermal Plasma Jet Device H. A. El-sayed*,

More information

Highly Reliable Low Temperature Ultrathin Oxides Grown Using N 2 O Plasma

Highly Reliable Low Temperature Ultrathin Oxides Grown Using N 2 O Plasma Highly Reliable Low Temperature Ultrathin Oxides Grown Using N 2 O Plasma Jam-Wem Lee 1, Yiming Li 1,2, and S. M. Sze 1,3 1 Department of Nano Device Technology, National Nano Device Laboratories, Hsinchu,

More information