X-ray Stress Measurement and Mechanical Properties of TiN Films Coated by Various PVD Methods

Transcription

1 50 X-ray Stress Measurement and Mechanical Properties of TiN Films Coated by Various PVD Methods Yasuhiro MIKI Tadashi TANIGUCHI Takao HANABUSA and Kazuya KUSAKA TiN film, 3 m in thickness, was deposited on aluminum JIS A1050 and aluminum alloy JIS A2017 and JIS A5052 substrates by an Arc Ion Plating AIP method and Ion Beam Mixing IBM method. For AIP method, bias voltage and N 2 gas pressure were changed to examine their role on hardness and residual stress of TiN film. Wear experiment was also conducted using a ball-on-disk type wear apparatus. Vickers hardness tests revealed high value HV The TiN films coated by AIP and IBM methods, respectively, exhibited high 111 and 110 preferred orientation. Residual stresses in the TiN film were measured by the two-exposure X-ray stress measuring method. Very high compressive residual stresses, GPa, were observed. The depth of wear scars on the surface of the processed specimens were greatly shallow. Al Al Al Al AIP IBM Al Al TiN TiN HV Ra TiN Al Al AIP IBM 1 JIS A1050 Al A2017 Al-Cu A5052 Al-Mg A1050 A2017 A505 2 H24 T451 H min A1050 A2017 A5052 Ra m AIP AIP3012 AIP TiN 10 - Pa 573K 673K 20min 423K 373K 0.5Pa N 2 600V 60A min Ti Pa N V 60A Al TiN 3.0 m AIP IBM IMX W Al 10 Pa N min 20kV 1.0A 36

2 PVD TiN 51 N ions Ti 0.25nm s nm s Al TiN 3.0 m IBM 1 2, S 44 sin 1 3 2S 11 4S 12 S S cos S 44 sin 1 2 2S 11 6S 12 S 44 S S 11 S S S 11 S 12 S 44 TiN S TPa S TP a S TPa 4 hkl 4 3 arctan k h l 4 Schematic illustration of the apparatus for arc ion plating. sin cos S 44 sin sin 5 Schematic illustration of the apparatus for ion beam mixing N TiN TiN 2.94N IBM TiN AIP 80V TiN S S 44 sin sin 6 X CrK 35kV 20mA TiN Rank Taylar Hobson 294K JIS SUJ2 0.5N s 200m

3 Pa Al AIP AIP A1050 A2017 A V 430K 30V 30V 430K 80V Pa A2017 AIP TiN TiN 30V HV V HV A1050 A5052 TiN TiN -50V 125V 5 A2017 IBM Ti TiN Ti A2017 Ti TiN XPS TiN TiN N Ti Ti A2017 IBM Vickers hardness of substrates coated by arc ion plating method. Vickers hardness of substrates and TiN films coated by ion beam mixing method. Vickers hardness of TiN films coated by arc ion plating method. Particle size of TiN crystal coated by ion beam mixing method.

4 PVD TiN 53 Ti TiN Ti TiN 6 IBM TiN TiN TiN TiN IBM TiN Ti TiN AIP 0 V 30V TiN 30V TiN AIP 0V 30V 30V 30V 80V A2017 AIP 30V Pa 80V 80V 80V A2017 AIP TiN TiN TiN Relationship between Vickers hardness of substrates and N 2 gas pressure. Sundgren 7 TiN N Ti TiN N 2 TiN N A V Pa AIP TiN N Ti TiN N TiN Relationship between Vickers hardness of TiN films and N 2 gas pressure. CrKa X NaCl TiN AIP TiN 0V TiN 111 IBM TiN Ti 220 TiN X 8 AIP TiN TiN TiN TiN222 Al AIP TiN 80V TiN CrK TiN IBM TiN TiN220

5 54 26 X-ray diffraction profiles of specimens th IBM TiN GPa th T th 1 6 4S 11 8S 12 S 44 1 T 110 th coated by arc ion plating method S 11 22S 12 S 44 1 T TiN Al K T K S i j K 9 A1050 A2017 A K K K 10 AIP Pa 80V 470 K 460K 450K IBM 425K 7 8 TiN 10 AIP Al TiN X AIP TiN Bias voltage : a 80V, b 30V, c 0V GPa GPa 7 TiN GPa IBM Al Ti TiN X 11 AIP TiN 8 TiN GPa AIP IBM 7 AIP IBM TiN A1050 A5052 A2017 A A2017 A Residual stresses of TiN films coated by arc ion plating method. Residual stresses of TiN films coated by ion beam mixing method.

6 PVD TiN GPa TiN Al TiN Al TiN Al TiN AIP TiN TiN TiN TiN TiN TiN 11 TiC TiC EPMA 80V Pa A2017 TiN TiN Ti IBM TiN Ti TiN EPMA Ti 2.5at 4.1at 12 IBM TiN N Ti TiN N Ti 0.8 TiN Ti TiN N Ti Ti TiN TiN AIP 30V 80V TiN Ra 12 TiN SEM 13 AIP Ra TiN 13 IBM Ti 0.2nm s 0.5nm s TiN SEM 14 Ti 0.2nm s TiN 2 m Ti 0.5nm s TiN IBM TiN Relationship between surface roughness of TiN films and N 2 gas pressure. 15 A1050 A2017 A m AIP 1.0Pa V 16 AIP 80V AIP 10 A1050 m 1 12 AIP A V FeK SUJ2 TiN IBM Ti 0.2nm s 0.5nm s 17 Al T i A1050 Ti 10 m m A2017 A V AIP SUJ2 TiN AIP IBM TiN

7 56 26 Surface morphologies of TiN films coated by arc ion plating method. JIS A2017 substrate Surface morphologies of TiN films coated by ion beam mixing method. JIS A2017 substrate TiN SUJ2 Surface profiles of the wear scars on undeposited substrates. Benjamin 13 9 W HV r 1 E 1 E 9 W N HV N r E E N Pa AIP 9 Al 0.5N A1050 A1050 TiN TiN A2017 A5052 Surface profiles of the wear scars of TiN films coated by arc ion plating method. N gas pressure : 1.0 Pa Surface profiles of the wear scars of TiN films coated by ion beam mixing method.

8 PVD TiN 57 Relationship between load required to start plastic deformation and bias voltage. AIP TiN Ti Ti SUJ2 1, 42, , 8, , 46, A. J. Perry Thin solid Films, 170, S. J. Bull and D. S. Rickerby Surf. Coat. Technol., 36, ,,,,, 37, J. E-. Sundgren Thin Solid Films, 128, X,, ,, , , 53, , 46, P. Benjamin and C. Weaver Proc. Roy. Soc., 254A, AIP IBM A1050 A2017 A5052 Al TiN 1 AIP 30V TiN HV V TiN IBM TiN Ti HV 1150 HV AIP TiN V TiN GPa IBM TiN 110 Ti 0.5 nm s TiN GPa 3 AIP IBM Al TiN A