Flexible functional devices at mass production level with the FLEx R2R sald platform
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1 Flexible functional devices at mass production level with the FLEx R2R sald platform D. Spee, W. Boonen, D. Borsa and E. Clerkx Meyer Burger (Netherlands) B.V.
2 Meyer Burger Introduction to sald Challenges in sald Layer performance Application performance Summary Contents
3
4 Meyer Burger Technology Group
5 Global infrastructure Netherlands Germany Manufacturing Support Office South Korea Switzerland (HQ) China Taiwan Hillsboro Singapore India
6 Meyer Burger (Netherlands) B.V. Equipment manufacturer based in Eindhoven, the Netherlands. Functional Inkjet Printing PECVD and sald Thin Film Coating
7 Atomic Layer Deposition (ALD) principle ALD is cyclic exposure of different precursors separated by purge cycles Thickness control on atomic scale Very good conformity - No pinholes Huge opportunities in flexible electronics Volume production needs higher growth speeds! 7
8 Spatial Atomic Layer Deposition principle Grow rates > 1 nm/s No parasitic deposition Atmospheric pressure No contact to web Multiple precursors possible Materials deposited R&D Al 2 O 3, TiO 2, SiO 2, HfO 2, In 2 O 3, ZnO, ZnO:Al, ZnO:In, IGZO, ZnSnO x, Zn(O,S), silver, Alucone Materials deposited Roll to Roll Al 2 O 3, TiO 2, Zn(O,S), ZnO, ZnO:Al 8
9 From Proof of Principle to Production 60 precursor slots Each individual slot can be supplied with a different precursor Up to 6 different precursors can be used simultaneously General Configuration Concept Web handling WEB speed Web material Web width Web guidance ALD coating Drum diameter Layer thickness MBNL specs R2R Line, used for development and production Proprietary Spatial ALD technology 0,1-15 m/min for single drum; different speed possible PET, PEN; micron 600 mm; Wider width possible No touching on coating side ~ 600 mm 2 nm nm Temperature C Optional modules Wind - unwind; Ink Jet printing; slot die coating; UV or thermal curing, surface activation (corona or plasma treatment); downflow units; particle cleaning; foil pre-treatment; interleaf wind- unwind
10 From Proof of Principle to Production Requirements Prevent CVD No contact with coating side of the web Higher throughput Precursor and gas utilization Development Principles and main parameters in spatial ALD drum Modelling for drum design Drum-web interaction and gas separation 2D, 3D modelling of gas flows Process validation
11 Drum-web interaction and gas separation Trade-off: Good gas separation is dependent on i) low flight height above bearing and ii) sufficient N 2 flow from bearing to exhaust (difference P bearing and P exhaust is large) No contact drum-web is dependent on i) sufficient flight height above bearing and ii) stable web (difference P bearing and P exhaust is small)
12 Drum-web interaction and gas separation Requirement for precursor concentration ratio in consecutive slots is 10 6 Validity of model was experimentally verified: For gas separation this was done with Helium leak test For flight height of the web with triangulation measurements
13 TMA and water saturation curve Growth per cycle (GPC) dependence on precursor gas flow Fingerprint of ALD process: match theory vs. experiment
14 Cross web thickness uniformity Thickness measurements by Dektak Cross web thickness uniformity over 500 mm better than 0.8% 72 nm ALD layer with 96 cycles/min ~ 42 m 2 /h coated web for a layer thickness of 20 nm
15 Barriers 125µm PET with 20 nm AlOx 80µm PI with 20 nm Alox Barrier improvement 6 decades From 10 to 10-5 g/m 2 /day Optical properties unchanged CoC <0,11 /m 2
16 Optical Stacks Max reflectance at 550 nm on PET Deposited stack by R2R ALD tool TiCl 4 +H 2 O and TMA+H 2 O Deposition temp 100 C Result uniform reflective coating Nearly perfect fit with calculated model
17 SUMMARY
18 Summary Meyer Burger developed a R2R sald production system Growth per cycle prooves real ALD Superb coating uniformity Coatings with high performing barrier and optical performance Many more opportunities in the field of flexible electronics to come
19 THANK YOU FOR YOUR ATTENTION! Come and visit us at booth 3013
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