Semiconductor Abatement Systems

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Semiconductor Abatement Systems Aug 2013 Jay Jung VP of Marketing

What is the customer looking for? Capacity, Capability & Commitment GST Confidential 2

Capacity Size Engineering Capacity Production Capacity GST Confidential 3

Global Standard Technology Co., Ltd. $55M in 2012 Abatement Revenue 287 direct employees >3,500 installed base Head Quarters, Dongtan Industrial Complex Jincheon Manufacturing Plant - 88,000 ft 2 GST Confidential 4

Engineering Capacity >5 concurrent development projects Head Quarters Scrubber R&D Lab GST Confidential 5

Manufacturing Capacity >100 scrubbers per month Scalable to 300 units in 2 months Manufacturing Plant Scrubber Assembly Line Final Test and Evaluation Unit Area GST Confidential 6

Capability Wide Range of Technologies Technology Innovations GST Confidential 7

GST Abatement Product Line FACILITY LEVEL PFC ABATEMENT (CATALYST & RTO) PROJECT RCO and Zone PFC Scrubber BURN-WET DRAGON / DRAGON DUO HIGH CAPACITY BURN-WET GALLANT DRY SDS-500 PLASMA-WET Durian PUMP & ABATEMENT EXCELLION HEAT-WET ISIS-I,II,III,IV WET & WET-EP SWS-500 / AQUA EP GST Confidential 8

GST Product Performance Target GST strives to provide best practical abatement solutions to semiconductor industry GST Abatement Efficiency and Emissions Target Toxic: < TLV Flammable: < ¼ LEL PFC DRE: > 95% NOx Emissions: < 50 ppm CO Emissions: < 50 ppm Other parameters: THC, odor, etc. GST Confidential 9

Heat-Wet Type: ISIS ISIS-II HVM (high volume manufacturing) proven Well suited for semiconductor deposition processes Powder tolerant design with large reactor volume High abatement efficiency Steam generator option for Cl 2 and F 2 SiC high temperature heaters Low NOx and CO Lower operating temperature than Burn-Wet type No fuel Various capacity models available ISIS-I ~ ISIS-IV GST Confidential 10

ISIS-I & II Hardware

ISIS Hardware Entry & Reactor 4 independent inlets 4 x 40mm entry CDA / Steam GST Confidential 12

ISIS-I & II Hardware High Performance Heater SiC Heater 5.5kW 6 INCONEL600 Heater Housing High Performance SiC Heater GST Confidential 13

Air Curtain Cleaning System Quench section view between PM ACCS (Air Curtain Clean System) N2 / CDA Curtain Reactor side: Inconel shield Wetted path: Teflon coated stainless steel 14 GST Confidential 14

Air Curtain Cleaning System Reactor view between PM Sleeve N2 40LPM Sleeve N2 0LPM 15 GST Confidential 15

Dry Type SDS Single & Twin SDS HVM (high volume manufacturing) proven Implant application Low utility consumption Simple construction High abatement efficiency Various adsorbent media available Bypass Operation Normal Operation GST Confidential 16

Adsorbent Media Media Capacity & DRE Abatement efficiency: Effluent concentration to non-detection level Media operation limits for full capacity utilization: Maximum 0.02 m/second (0.02 m/second at 150 slm) Maximum 2% target gas concentration (typical operating range < 1%) Media Key Composition Target Gas Capacity ULTIMA-Sorb Cu(OH)2 AsH3 PH3 100 l/l 100 l/l Sorbent A-1 Ca(OH)2 BF3 F2 55 l/l 40 l/l Sorbent A-2 FeCl3 Cl2, BCl3, HBr, HCl, F2, HF 50 l/l Sorbent A-7 Ca(OH)2 HCl, HF 200 l/l GST Confidential 17

Break-through Detection Hydride Series Acid Series Target Gases AsH3, PH3, etc. Cl2, F2, BF3, etc. Composition Metal Oxide & Salt Metal Oxide & Salt Before Exposure Reaction with Chloride After Exposure Reaction with Fluoride GST Confidential 18

Plasma-Wet Type: Durian Durian HVM (high volume manufacturing) proven Ideally suited for semiconductor etch PFC abatement Low utility consumption High abatement efficiency N2 plasma Ceramic reactor No fuel Energy savings operation ready GST Confidential 19

N2 Plasma Tungsten Cathode Gas Exhaust O 2 Free Copper Anode Waste Gas Inlet Wet Chamber Torch Reactor Ceramic Plasma Torch Cooling Chamber Reactor Circulation Tank Inconel Cooling Chamber GST Confidential 20

Catalyst Type: RCO & Zone Scrubber Catalyst Aided GST exclusive PFC catalyst lowers the decomposition temperature For example, CF4 may be abated at <750 C RCO Facility Level PFC Abatement Combination of heat recovery and catalyst technology Ultra-low energy consumption >20 process tool coverage Zone Scrubber Subfab Level PFC Abatement Coverage for entire bay (10 etch tool effluents) Energy efficient <20 process tool coverage GST Confidential 21

GST Exclusive PFC Catalyst Decomposition PFC s without Catalyst CF 4 > 1120 C C 2 F 6 > 842 C SF 6 > 800 C NF 3 > 300 C Decomposition PFC s with Catalyst CF 4 > 410 C C 2 F 6 > 425 C SF 6 > 350 C NF 3 > 200 C Catalyst facilitates reaction by hydrolyzing PFC s to HF and CO 2 at temperatures well below typical thermal oxidation C 2 F 6 + 3H 2 0 CO + CO 2 + 6HF CO + ½ O 2 CO 2 GST Confidential 22

Catalyst Performance 100 Conversion, % 80 60 40 NF 3 CHF 3 SF 6 CF 4 C 2 F 6 C 3 F 8 c-c 4 F 8 20 0 200 300 400 500 600 700 800 Temperature, o C [PFC] = 1,000 ppm [H 2 O] = 3.5 % Applicable for semiconductor PFC gas species GST Confidential 23

Catalyst Performance (influent concentration) Al 2 O 3 based catalyst (M/Al 2 O 3 ) Metal : Ti, Zr, Co, Ni additives Effect of concentration on SF 6 Light-off curve. GST Confidential 24

Removal percent(%) Catalyst Performance (temperature & space velocity) Temp.( ) Efficiency (%) 600 75.6 650 99.9 700 99.9 Space Velocity : 2500 h -1, SF 6 : 1500ppm, TOS : 5hr Time (hr) GHSV(h -1 ) Efficiency (%) 1000 99.6 2000 99.9 3000 98.9 Temperature : 650 C, SF 6 : 1500ppm, TOS : 5hr GST Confidential 25

Lab - Catalyst Performance Testing Catalyst GST Confidential 26

Pilot - Catalyst Performance Testing Utility Specification Capacity Dimension LNG H 2 O Power Burn & Catalyst & Wet Type 1CMM 2500W X 2000D X 3000H 30LPM 2 LPM 220V, 8KW GST Confidential 27

PFC RCO/Zone System Block Diagram Bypass Influent Pre-Treatment (Wet) Thermal Treatment (w Catalyst) Post-Treatment (Wet) Effluent GST Confidential 28

Burn-Wet Type: DRAGON Dragon LE/HE/HEX HVM (high volume manufacturing) proven Ideally suited for semiconductor deposition processes Virtually zero unscheduled downtime with DUO Low utility consumption High abatement efficiency Fuel provides reagent Burner Higher temperature compared to Heat-Wet type Dual stage combustion for low NOx and CO Wet Scrubbing Packing Zone Reactor Stage 1: Fuel rich for low NOx and high CO Stage 2: 2 nd combustion for CO conversion Quenching Energy savings operation ready Wet Tank GST Confidential 29

Burn-Wet Improvement: Dragon LE Dual Stage Combustion Higher temperature operation range Separate control for NOx and CO LNG+O 2 +CDA Stage 1 O2 lean environment Higher temperature operation vs. Gen 1 Stage 1 Stage 2 O2 rich environment 2 nd stage combustion for CO conversion Stage 2 Benefits Wide range of application Low NOx emissions GST Confidential 30

Dragon LE Separate Control for CO Fuel/O2 Mix Settings : LNG 20 slm, O2 5 slm, Mix CDA 90 slm Stage 2 CDA for CO to CO2 conversion GST Confidential 31

GST Reactor Types Multi-stage Combustion Reactor (for Dragon LE & HE) Independent control of NOx and CO >99% NF3 DRE with <10 ppm NOx emissions Multi-stage Combustion Reactor Pre-heat Reactor (for Dragon HEX) Heat recovery for >30% energy savings CF 4 abatement capability Pre-heat Reactor GST Confidential 32

Standard Wet Type SWS-500 SWS-500 HVM (high volume manufacturing) proven Acid gas abatement Low capital and low utility consumption Original scrubber for semiconductor industry GST Confidential 33

Larger Wet Type Aqua & Aqua EP Aqua HVM (high volume manufacturing) proven Acid gas abatement Low capital and low utility consumption Larger Capacity 40~60 m 3 /min EP option for fine particulate removal Aqua Aqua EP GST Confidential 34

Commitment Continuous Improvement Service GST Confidential 35

GST Principle Locations Regional Support North America BAZM Solutions Brian Kingston +1 408 887 6132 sales@bazmsolutions.com GST America Jason Smith +1 916 969 9829 Jason_smith@gst-in.com Head Quarters GST Project Management SM Shim +82 10 9491 2675 smshim@gst-in.com GST Sales & Marketing Jay Jung +1 408 338 7263 jay_jung@gst-in.com WUXI GST HQ/R&D TEL: +82-31-371-2200 HWASEONG MANUFACTURING PLANT TEL: +82-43-531-2000 JINCHEON GST AMERICA Scrubber Service TEL: +1-512-289-6249 AUSTIN GST CHINA Scrubber & Chiller Service TEL: +86-159-5157-7530 WUXI AUSTIN GST Confidential 36

Conclusions and Recommendations GST strives to provide BEST PRACTICAL ABATEMENT solutions Full product portfolio World wide reach Premier semiconductor abatement company GST stands behind our products and customers GST is pleased to offer subfab solutions for North America customers Evaluations / qualifications Joint development and custom engineering Invitation to tour GST facilities and install base GST Confidential 37

Thank you

Application Matrix - Deposition Process Process Gas Typical Concerns Option 1 Option 2 Accessories PECVD SiH4 SiH4 / NH3 / N2O NF3 Flammable effluent mix Incompatible gases (clean and dep) F2 and GHG Dragon - LE ISIS-II Hot N2 Heater jackets PECVD TEOS Low k CVD SACVD, HDPCVD Metal TEOS / TEB / TEPO NF3 TMS / mdeos / BCHD NF3 TEOS / O3 / others NF3 SiH4 / WF6 NF3 or ClF3 Flammable effluent mix Incompatible gases (clean and dep) F2 and GHG Dragon - LE ISIS-II Byproduct build-up and clogging Flammable effluent mix Incompatible gases (clean and dep) F2 and GHG Dragon - HE ISIS-II Byproduct build-up and clogging Flammable effluent mix Incompatible gases (clean and dep) F2 and GHG Dragon - LE ISIS-II Byproduct build-up and clogging Flammable effluent mix Incompatible & reactive gases F2 and GHG Dragon - LE ISIS-II Hot N2 Heater jackets Hot N2 Heater jackets Hot N2 Heater jackets Hot N2 Heater jackets Nitride DCS / NH3 Byproduct build-up and clogging Flammable effluent mix Dragon - LE ISIS-II Hot N2 Heater jackets GST Confidential 39

Application Matrix - Etch, Implant, etc. Process Process Gas Typical Concerns Option 1 Option 2 Accessories Poly SiH4 / PH3 ClF3 Highly toxic and flammable effluent Incompatible & reactive gases Dragon - LE ISIS-II Conductor Etch Cl2 / BCl3 / HBr / SF6 / CF4 / CHF3 Byproduct build-up and clogging Toxic and corrosive effluent mix F2 and GHG Durian SWS-500 Dragon HE Catalyst Aided Hot N2 Heater jackets Dielectric / Silicon Etch NF3 / CF4 / SF6 / CHF3 Toxic and corrosive effluent mix F2 and GHG Durian SWS-500 Dragon-HEX Catalyst Aided Implant AsH3 / PH3 / BF3 Highly toxic and flammable effluent SDS-500 Epi DCS / PH3 / AsH3 / SiH4 / H2 Highly toxic and flammable effluent High volume of flammable gases Byproduct build-up and clogging Dragon - LE ISIS-II Hot N2 Heater jackets Wet bench NH4OH / HCl / HF Large exhaust volume NH4OH and HCl fume byproduct Aqua - EP GST Confidential 40