[ High Power Impulse Magnetron Sputtering (HIPIMS) A New Tool for Interface Engineering A. P. Ehiasarian A.Ehiasarian@shu.ac.uk
Motivation Goal: Improvement of adhesion of PVD coatings Objectives: Local epitaxial growth METAL ION SOURCE efficient removal of surface oxides -> CLEAN INTERFACE metal incorporation -> DIFFUSION BONDING Avoid droplets -> DEFECT-FREE COATINGS Avoid incorporation of Argon -> HIGH TOUGHNESS INTERFACE
High Power Impulse Magnetron Sputtering 200 Wcm -2 n pl = 10 13 cm -3 active arc suppression 100 Hz Target area > 400 cm 2
I-U Characteristic In conventional magnetron discharges: n plasma = 10 13 cm -3 I = k U n n = 5..10 HIPIMS exhibits n = 1! (Ehiasarian et al, Vacuum 65 (2002) 147)
Plasma Composition OES-Chromium HIPIMS Emission from Cr 1+ and Cr 2+ metal ions (Ehiasarian et al, Vacuum 65 (2002) 147) Cathode area = 1200 cm 2
Plasma Composition OES-Titanium HIPIMS Emission from Ti 1+ and Ti 2+ metal ions Cathode area = 1200 cm 2
Temporal Evolution of HIPIMS Plasma-OES
Temporal Evolution of HIPIMS Plasma-Mass Spectroscopy (Bohlmark et al, Thin Soild Films, 515 (2006) 1522)
Plasma Composition Ion Current Density J s [
Influence of HIPIMS Power on Plasma Composition
Ionisation of Cr in HIPIMS Cr 0 slope 0.56 Cr 1+ slope 1.8
Ionisation of V in HIPIMS
Hauzer HTC 1000/4 ABS Batch Coater
Hauzer HTC 1000/4 ABS Batch Coater HIPIMS Power Supply AC (Advanced Converters)
Interface Chemistry-STEM-EDS and Coating Adhesion-HIPIMS CrN Scratch Test Critical Load on HSS = 85 N (Ehiasarian et al, Surf Coat Technol 163-164 (2003) 267)
Interface High Resolution-TEM (Ehiasarian et al, J. Appl. Phys. 101, 054301 (2007)
Epitaxy at Interface- Selected Area Diffraction [ (Ehiasarian et al, J. Appl. Phys. 101, 054301 (2007)
Coating Deposition (Ehiasarian et al, Surf Coat Technol 163-164 (2003) 267)
CrN/NbN Nanoscale Multilayer Coating - Adhesion (Ehiasarian et al, J. Appl. Phys 101, 054301 (2007))
Corrosion Performance-CrN/NbN on Mild Steel (C. Reinhard et al., Thin Soild Films 515 (2007) 3685)
CrN/NbN Salt Spray Test
Sliding Wear Resistance (Ehiasarian et al, J. Vac. Sci. Technol., accepted for publication)
Impact Wear Craters (Ehiasarian et al, Thin Soild Films 457 (2004) 270)
Conclusions HIPIMS has been implemented successfully on industrial scale machines (cathode area >1200 cm2) with the help of an industrial size power supply HIPIMS discharges produce metal ions charged up to 2+ for Ti, Cr and Nb The metal ion-to-neutral ratio increases continuously as a function of peak power Metal ion etching by HIPIMS promotes local epitaxial growth and improves the adhesion of coatings without incorporation of droplets HIPIMS pre-treatment improves the corrosion performance due to defect-free interface of CrN/NbN nanoscale multilayer films produced in industrial scale machine
Further Reading HIPIMS Plasma: High-current low-pressure quasi-stationery discharge in a magnetic field: experimental research - Mozgrin D. V. (Moscow Eng. Phys. Inst., Russia); Fetisov I. K.; Khodachenko G. V. Source: Plasma Physics Reports, v 21, n 5, May 1995, p 400-9 A novel pulsed magnetron sputter technique utilizing very high target power densities - Kouznetsov, V. (Dept. of Phys., Linkoping Univ., Sweden); Macak, K.; Schneider, J.M.; Helmersson, U.; Petrov, I. Source: Surface and Coatings Technology, v 122, n 2-3, 15 Dec. 1999, p 290-3 Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge - Gudmundsson, J.T. (Sci. Inst., Iceland Univ., Reykjavik, Iceland); Alami, J.; Helmersson, U. Source: Applied Physics Letters, v 78, n 22, 28 May 2001, p 3427-9 Influence of high power densities on the composition of pulsed magnetron plasmas - Ehiasarian, A.P. (Materials Research Institute, Sheffield Hallam University); New, R.; Munz, W.-D.; Hultman, L.; Helmersson, U.; Kouznetsov, V. Source: Vacuum, v 65, n 2, Apr 19, 2002, p 147-154 The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge - Bohlmark, J. (IFM Material Physics, Linkoping University); Lattemann, M.; Gudmundsson, J.T.; Ehiasarian, A.P.; Aranda Gonzalvo, Y.; Brenning, N.; Helmersson, U. Source: Thin Solid Films, v 515, n 4, Dec 5, 2006, p 1522-1526 Ionized physical vapor deposition (IPVD): A review of technology and applications - Helmersson, U. (IFM Mater. Sci., Linkoping Univ., Sweden); Lattemann, M.; Bohlmark, J.; Ehiasarian, A.P.; Gudmundsson, J.T. Source: Thin Solid Films, v 513, n 1-2, 14 Aug. 2006, p 1-24
Further Reading HIPIMS Deposition High power pulsed magnetron sputtered CrNx films - Ehiasarian, A.P. (Mater. Res. Inst., Sheffield- Hallam Univ., Sheffield, UK); Munz, W.-D.; Hultman, L.; Helmersson, U.; Petrov, I. Source: Surface & Coatings Technology, v 163-164, 30 Jan. 2003, p 267-72 On the deposition rate in a high power pulsed magnetron sputtering discharge - Alami, J. (Inst. of Phys., RWTH Aachen Univ., Germany); Sarakinos, K.; Mark, G.; Wuttig, M. Source: Applied Physics Letters, v 89, n 15, 9 Oct. 2006, p 154104-1-3 HIPIMS Interface Engineering CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique - Hovsepian, P.Eh. (Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University); Reinhard, C.; Ehiasarian, A.P. Source: Surface and Coatings Technology, v 201, n 7 SPEC. ISS., Dec 20, 2006, p 4105-4110 CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by high power impulse magnetron sputtering interface pre-treatment - Reinhard, C. (Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University); Ehiasarian, A.P.; Hovsepian, P.Eh. Source: Thin Solid Films, v 515, n 7-8, Feb 26, 2007, p 3685-3692 Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion - A. P. Ehiasarian, J. G. Wen, and I. Petrov, J. Appl. Phys. 101, 054301 (2007)