Seminar Micro- and Nano-technology

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Seminar Micro- and Nano-technology Seminar 1 Schedule Wednesday 17:45-18:30 Yannick Bourgin yannick.bourgin@uni-jena.de Phone: +49(3641)947990 www.iap.uni-jena.de

Presentations 2 Presentation by 2 students 25 minutes presentation 15 minutes questions From the audience and then from me General informations Head lines Numering slides An introduction to the subject A conclusion

Criterion 3 Target Self-learning about a topic Synthetise informations Exposing and transmiting some information Be active!! You are at a master level Inactivity makes the seminar very boring for everybody Good to know... I do have internet I know wikipedia I was a student I have the presentations of the previous years

Criterion 4 The authors Self presentation (position, dressing, speaking...) English skills The talk Content is clear The targeted objectives are well presented Easy to follow Questions Quality and clarity of the answers

MNT seminar SS15 calendar 5 Presentation schedule Date Topic Students 13/05/2015 Clean Room and Cleaning Techniques 20/05/2015 Resist coating techniques 2 27/05/2015 Photo resists 2 03/06/2015 AFM 2 10/06/2015 SEM/FIB 2 17/06/2015 Diamond Turning 2 24/06/2015 Nano imprint litho/roll to roll 01/07/2015 Self Assembly Double/Q/O Patterning - LELE 08/07/2015 Direct self assembly 2 2 2 2

Clean room and cleaning techniques 6 Why working in clean room? Clean room classes (ISO normes) and dressing.. How a clean room works. Contaminant sources. Typical substrates used in micro-optics: Si, SiO2, glass Cleaning methods: Wet and dry Standart wet cleaning RCA Ultra sonic Plasma ashing Cleaning after the fabrication

Resist coating techniques 7 Spin coating wafer syringe dispensed fluid Principle and equipment Basic physics model Spin coating defects Dip coating Spray coating Thickness measurment of resist vacuum chuck Spin parameter settings

Photo resists 8 Resists properties tone (positive, negative) CD Thickness, sensitivity (l), dose... Photoresist structure (resin, solvent, photoactive compound) Photoresist processing (do not focus on the coating!!) Adhesion on substrate Baking (why?) Development Chemistry (reaction to UV light) Optical parameters (dill, cauchy)

Atomic Force Microscope 9 How an AFM works Forces involved Different type of operation (contact, non contact, tapping) Advantages and drawbacks Using AFM to make nano-structures

Scanning Electron Micrope Focussed Ion Beam 10 How a SEM works (principle, sources, detector) Electron-matter interaction (secondary or back scattered e, Auger e, X-ray) Preparation of the sample How a FIB works Different type of characterization (profile, chemistry) Advantages and drawbacks Using FIB to make nano-structures

Diamond Turning 11 Methode used (diamond turning, milling, shaping) Raster cutting Requirement for micro-optics For which kind of component

Nano Imprint Lithography roll to roll 12 Principle Thermal NIL UV-NIL Materials used Operation types (full wafer VS step and repeat) Introduction to the roll to roll technique

Self Assembly Double patterning Litho Etch Litho Etch 13 Principle of SADP Materials used SA Quadruple and Octuple Patterning Double exposure/lele Applications-resolution

Direct Self Assembly 14 Principle (What is DSA?) Phase diagramm of block copolymer Graphoepitaxy VS Chemoepitaxy Resolution Applications

Useful links 15 Interested links Some company provides free materials or courses: The Dow chemical company, Nikon, ASML... Microchemical Some university as well (MIT...) Read article and recent papers, lithography is field that progress quickly

MNT seminar SS15 calendar 16 Date Topic Students 13/05/2015 Clean Room and Cleaning Techniques -Johannes Wilde -Manuel Hopf 20/05/2015 Resist coating techniques -Vivek Beladiya -Mohammadreza Younesi 27/05/2015 Photo resists -Felix Kröger -Martina Riuz 03/06/2015 AFM -Olga Rusykina -Liyenn Song 10/06/2015 SEM/FIB -Malte Siems -Henning Stark 17/06/2015 Diamond Turning -Jui-hsin Chen -Ming-Snng Chao 24/06/2015 Nano imprint litho/roll to roll -Justus Bohn -Sabine Stück 01/07/2015 Self Assembly Double/Q/O Patterning - LELE -Gerrit Feldkamp -Parijat Barman 08/07/2015 Direct self assembly -Hui Zhou -Anda-Maria Tafrosi -Cristina Madonna Maqnedo