generating productivity May 14 17, 2018 Freiburg, Germany Please register: www.trumpf.com/s/pe2 Questions? Please contact us: Phone +49 761 8971-2169 PE2@de.trumpf.com
PE² International Conference on Power Electronics for Plasma Engineering Dear Sir or Madam, This year s PE 2 2018 conference will showcase even more practical and relevant information for your day-to-day work! Generating productivity is the theme of the 2018 conference and as in previous years, PE² consists of a multi-faceted program. Lectures on new applications in the field of plasma technology as well as product trends will inspire attendees and inform them on recent trends in research and development. Focus topics Market and application trends in glass, PV, decorative and industrial coating. New networking platform Inspiring poster session. NEW 2018: PE² Semi special This year we will have a further event which focuses exclusively on the semiconductor market Our aim is to inspire and provide true added value. That is why we are putting the spotlight on practical application: Experience exciting technology insights through presentations from leading industrial and R&D plasma experts that coordinate the latest in theory and practice. Till Küppers President TRUMPF Hüttinger GmbH + Co. KG Dr. Rafal Bugyi President TRUMPF Huettinger Sp. z o.o.
Short agenda Day 1, May 14 th : Conference PV & LAC Day 2, May 15 th : Conference Technology development Day 3, May 16 th : Workshop HandsOn Day 4, May 17 th : Conference Semi special 08:15-08:30 Welcome 08:30-09:00 Welcome Health and safety briefing 08:30-09:00 Welcome 08:30-10:15 Session 3 New trends of industrial processing 09:00-11:00 Session 1 MF RF 09:00-10:40 Session 1 Semiconductor industry: current status and trends 10:15-10:45 Time2Network 11:00-11:30 Time2Network 10:40-11:10 Time2Network 10:45-12:50 Session 4 New trends of industrial processing (cont.) 11:30-12:30 Session 2 Bipolar DC 11:10-12:50 Session 2 Thin layer depostion and processing 11:30-12:00 Conference registration 13:00-14:00 Lunch break 12:30-13:30 Lunch break 13:00-14:00 Lunch break 12:00-14:00 Session 1 Advances in photovoltaic industry 14:00-15:00 Company tour 13:30-14:30 Session 2 (cont.) Bipolar DC 14:00-15:40 Session 3 Advances in plasma technology for SEMI manufacturing 14:00-14:30 Time2Network 15:00-15:45 Time2Network @ Poster session 14:30-15:00 Time2Network 15:40-17:00 Company tour & Get together 14:30-17:00 Session 2 Large area coating 15:45-17:45 Session 5 Beyond plasma technology 15:00-17:00 Session 3 IoT services Bi-HiPIMS For further information and conference fee please visit www.trumpf.com/s/pe2 19:00 Evening event
Agenda Day 1, May 14 th Conference Conference registration 11:30-12:00 Welcome speech 12:00-12:15 1 Advanced materials enabled by plasma technologies 12:15-12:45* Till Küppers, Prof. Bernd Szyszka, TU Berlin, DE Session 1 Advances in photovoltaic industry 2 Magnetron sputtered thin films for photovoltaic applications 12:45-13:10* Dr. Ronald Korn, Singulus Technologies AG, DE 3 Analysis of ICP plasma processes for crystalline silicon solar cell surface passivation 13:10-13:35* Marc Hofmann, Fraunhofer Institute for Solar Energy Systems ISE, DE 4 Hardware functionality driven PVD process optimization: a dual-output pulsed-dc plasma source utilization in CIGS photovoltaic cell production 13:35-14:00* Paweł Lesiuk, Get together: Time2Network 14:00-14:30 Session 2 Large area coating 5 Efficiency and yield enhancing optical monitoring system for inline coaters 14:30-14:55* Wilmert De Bosscher, Soleras, BE 6 Simulation study on input power effects in magnetron discharges 14:55-15:20* Michael Siemers, Fraunhofer Institute for Surface Engineering and Thin Films IST, DE 7 Basic study on ZrOx rotatable sputtering target development 15:20-15:45* Christoph Simons, Materion, DE generating productivity
8 Success factors in ZrOx target MF sputtering 15:45-16:10* Dr. Moritz Heintze, 9 Large area industrial PVD coatings 16:10-16:35* Dr. Andriy Kharchenko, Saint Gobain Recherche, FR 10 Understanding crazing effect in large area coating critical factors and mitigation methods 16:35-17:00* Dr. Wojciech Gajewski, Conclusion day 1 ~ 17:00 Michael Ehinger, Evening event 19:00 * incl. 5 mins discussion
Agenda Day 2, May 15 th Conference Welcome 08:15-08:30 Dr. Rafal Bugyi, Session 3 Technology development I: New trends of industrial processing 11 Smooth, highly adherent HiPIMS coatings for friction stir welding of aluminium 08:30-09:00* Prof. Arutiun Ehiasarian, Sheffield Hallam University, UK 12 Challenges of HiPIMS for directional deposition 09:00-09:25* Dr. Jürgen Weichart, Evatec AG, CH 13 A comprehensive tutorial for successful HiPIMS application in mass production: a case of C-based optical and decorative coatings 09:25-09:50* Dr. Anna W. Oniszczuk, 14 Recent progress in pulse magnetron sputtering at Fraunhofer FEP 09:50-10:15* Dr. Matthias Fahland, Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, DE Get together: Time2Network 10:15-10:45 Session 4 Technology development I: New trends of industrial processing (cont.) 15 Next generation of power supplies for plasma diffusion treatment 10:45-11:10* Dr. Peter Kästner, Fraunhofer Institute for Surface Engineering and Thin Films IST, DE 16 Multiple plasma source synchronization for improved process optimization: a Ti-Cr-based anticorrosion coating case study 11:10-11:35* Krzysztof Ruda, 17 E-beam evaporation for packaging and security applications 11:35-12:00* Roland Trassl, Applied Materials, DE generating productivity
18 Ultra-clean and high performance substrates for plasma treatment technologies 12:00-12:25* Valentijn von Morgen, DuPont Teijin Films, UK 19 Laser based rapid thermal processing 12:25-12:50* Jan Wieduwilt, TRUMPF Laser, DE Lunch break 13:00-14:00 Company tour & Group picture 14:00-15:00 Time2Network @ Poster session 15:00-15:45 20 Defects and doping in oxides: case of doped TiO 2 films 15:45-16:15* Dr. Nadhira Laidani, Fondazione Bruno Kessler, IT Session 5 Technology development II: Beyond plasma technology 21 Synthesis of electrochromic thin films by reactive co-sputtering 16:15-16:40* Oliver Kappertz, Fraunhofer Institute for Surface Engineering and Thin Films IST, DE 22 The road to predictability for industrial plasma coating: data-based process and up-time optimization 16:40-17:05* Dr. Ioana Luciu, 23 Silicon layers for application in lithium ion batteries 17:05-17:30* Conclusion of conference ~ 17:45 Dr. Andreas Georg, Fraunhofer Institute for Solar Energy Systems ISE, DE Michael Ehinger, City Tour and free time for your own exploration of the town. 19:00 * incl. 5 mins discussion
Agenda Day 3, May 16 th Workshop Welcome Health and safety briefing 08:30-09:00 Dr. Jan Peter Engelstädter, Group 1 Group 2 1 Session 1 Session 1 Electrical measurement techniques for process characterization in MF dual magnetron sputtering 09:00-10:00 Multi frequency plasma systems for etch applications 2 Multi frequency plasma systems for etch applications 10:00-11:00 Electrical measurement techniques for process characterization in MF dual magnetron sputtering Get together: Time2Network 11:00-11:30 3 Session 2 Session 2 Gentle approach for sensitive materials step mode in Bipolar power supply 11:30-12:30 Dual output pulsed DC application flexibility Lunch break 12:30-13:30 4 Dual output pulsed DC application flexibility 13:30-14:30 Gentle approach for sensitive materials step mode in Bipolar power supply Get together: Time2Network 14:30-15:00 Session 3 Session 3 5 IoT services 15:00-16:00 Bi-HiPIMS HiPIMS in Bipolar operation 6 Bi-HiPIMS HiPIMS in Bipolar operation 16:00-17:00 IoT services Conclusion of workshop ~ 17:00 Dr. Jan Peter Engelstädter, generating productivity
Agenda Day 4, May 17 th Conference Semi special Welcome Start of the conference 08:30-09:00 Dr.-Ing. Daniel Krausse, Session 1 Semiconductor industry: current status and trends 1 Enhancing the EU Semiconductor Industry in the Digital Economy 09:00-09:25* Emir Demircan, Semi Europa, BE 2 Dr. Production and predictive maintenance: lessons learned from semiconductor manufacturing 09:25-09:50* Dr.-Ing. Martin Schellenberger, Fraunhofer Institute for Integrated Systems and Device Technology IISB, DE 3 Gallium nitride power devices for MHz-switching applications 09:50-10:15* Dr.-Ing. Richard Reiner Fraunhofer Institute for Applied Solid State Physics 4 Design for reliability and availability challenges in the development of plasma processing power supply 10:15-10:40* Jacek Kałowski, Get together: Time2Network 10:40-11:10 Session 2 Thin layer depostion and processing 5 RF plasma enhanced methods (@13.56 MHz) for the applications in modern semiconductor structures and devices 11:10-11:35* Prof. Robert Mroczyński, Warsaw University of Technology, PL 6 Controlled reactive HiPIMS effective technique for low-temperature deposition of functional oxide films 11:35-12:00* Prof. Jaroslav Vlcek, University of West Bohemia, CZ 7 High Voltage (HV) technology for ion energy management: current status and development trends 12:00-12:25* Dr. Paweł Ozimek, * incl. 5 mins discussion
Agenda Day 4, May 17 th Conference Semi special 8 RhySearch the new research and innovation center in the heart of the Alpine Rhine Valley applied research in optical coating and precision manufacturing 12:25-12:50* Dr. Richard Quaderer, RhySearch, CH Lunch break 13:00-14:00 Session 3 Advances in plasma technology for SEMI manufacturing 9 Efficient PECVD chamber cleaning with F2-based chemistry 14:00-14:25* Robert Wieland, Fraunhofer Research Institution for Microsystems and Solid State Technologies EMFT, DE 10 Requirements for modern semiconductor PECVD / Etch applications 14:25-14:50* Dr.-Ing. Daniel Krausse, 11 Multi frequency plasma systems for etch applications 14:50-15:15* Wojciech Głazek, 12 How small solution provider can help to improve your bottom line 15:15-15:40* Philipp Quaderer, SPM, DE Conclusion of conference 15:40-16:00 Dr.-Ing. Daniel Krausse, Company tour & Get together 16:00-17:00 * incl. 5 mins discussion generating productivity
Conference venue and impressions of past conferences Conference venue TRUMPF Hüttinger GmbH + Co. KG Bötzinger Straße 80 79111 Freiburg Germany Phone +49 761 8971-2169 Fax +49 761 8971-1150 Scan GPS data for your navigation system Impressions of past conferences
TRUMPF Hüttinger GmbH + Co. KG Bötzinger Straße 80 79111 Freiburg Germany Phone +49 761 8971-2169 PE2@de.trumpf.com www.trumpf-huettinger.com Company website Conference website Issue: April 2018 Version 2 Please visit our website for latest news and abstracts: www.trumpf.com/s/pe2