A. Hershcovitch, M. Blaskiewicz, J.M. Brennan, W. Fischer, C-J Liaw, W. Meng, R. Todd Brookhaven National Laboratory, Upton, New York 11973, U.S.A A.

Similar documents
II. NEG THIN FILM DEPOSITION

EQUIPMENT AND SYSTEM FOR VACUUM COATING METALLIZING, SPUTTERING, PLASMA and PECVD. Hybrid system KOLZER DGK 36

Metallization deposition and etching. Material mainly taken from Campbell, UCCS

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material

High Rate Deposition of Reactive Oxide Coatings by New Plasma Enhanced Chemical Vapor Deposition Source Technology

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high

Thermal Evaporation. Theory

Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities

Sputter Coating. Technical Brief

SAES experience in NEG coating of narrow gap insertion devices and small diameter chambers for accelerators

AC Reactive Sputtering with Inverted Cylindrical Magnetrons

Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating

Lecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE Dr. Alan Doolittle

Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties

LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS. Dr. Saad Ahmed XENON Corporation November 19, 2015

Prospects of MgB 2 Superconductor in Energy and Magnet Applications

Influence of copper substrate treatments on properties of niobium coatings

Sensitivity of Nb 3 Sn Rutherford-type cables to transverse pressure

Transactions on Engineering Sciences vol 2, 1993 WIT Press, ISSN

Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers

Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD

Lecture Day 2 Deposition

Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets

Device Fabrication: Metallization

THERMOFIT ADHESIVE S Flex Fluid Resistant, High Temperature, One Part-Flexible Epoxy

Vacuum deposition of TiN

Using Argon Plasma to Remove Fluorine, Organic and Metal Oxide Contamination for Improved Wire Bonding Performance

RESEARCH WORKING SURFACE STRUCTURE SERIAL CONTACTS

Development of low roughness, low resistance bottom electrodes for tunnel junction devices

Vacuum properties of TiZrV non-evaporable getter films

Alternative Methods of Yttria Deposition For Semiconductor Applications. Rajan Bamola Paul Robinson

QUANTUM EFFICIENCY MEASUREMENTS OF Mg FILMS PRODUCED BY PULSED LASER ABLATION DEPOSITION FOR HIGH BRIGHTNESS ELECTRON SOURCES*

COOLING EFFECT ENHANCEMENT IN MAGNETRON SPUTTERING SYSTEM

Small-Scale Resistance Welding for Medical and Industrial Applications

BALKANTRIB O5 5 th INTERNATIONAL CONFERENCE ON TRIBOLOGY JUNE Kragujevac, Serbia and Montenegro

Fabrication Technology

Gridless end-hall. Ion Sources. For Ion Assisted Thin Film Deposition & Substrate Cleaning

AC : MICROWAVE PLASMA CLEANER DESIGN FOR SEMI- CONDUCTOR FABRICATION AND MATERIALS PROCESSING LABO- RATORY USE

ITER TOKAMAK VACUUM VESSEL THERMAL SHIELD ADDITIONAL NEUTRAL SHIELDING

Microwave Plasma Processing

ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING?

2015 Technology and Manufacturing Innovations at SuperPower

Citation JOURNAL OF APPLIED PHYSICS (1995),

CVD DIAMOND AND RELATED MATERIALS AT INSTITUTE FOR SPACE RESEARCH AND INDUSTRY: RESEARCH, DEVELOPMENT AND INNOVATION.

Deposition Technology and Applications of DLC Films

Cryogenic substrate cooling or substrate heating without vacuum feedthroughs

GA A25721 ALUMINUM COATINGS AS A DEUTERIUM PERMEATION BARRIER ON FOAM SHELLS AND THE DEPENDENCE ON FOAM SURFACE FINISH

Experimental study of plasma window 1*

High Performance Lithium Battery Anodes Using Silicon Nanowires

Journal of Chemical and Pharmaceutical Research, 2017, 9(1): Research Article

Welding Processes. Consumable Electrode. Non-Consumable Electrode. High Energy Beam. Fusion Welding Processes. SMAW Shielded Metal Arc Welding

Grain Sizes and Surface Roughness in Platinum and Gold Thin Films. L.L. Melo, A. R. Vaz, M.C. Salvadori, M. Cattani

Sputter-free and reproducible laser welding of electric or electronic copper contacts with a green laser

High Rate low pressure PECVD for barrier and optical coatings

Roll-to-roll Technology for Transparent High Barrier Films

Titanium Welding Technology

Semiconductor Manufacturing Technology. IC Fabrication Process Overview

SCRATCH-FREE & PILE-FREE PLASMA ANNEALING OF STAINLESS STEEL AND NICKEL ALLOY WIRE, ROPE &TUBE A

TOP 5 REASONS TO USE FILM-CAST PTFE LINER TUBING FOR YOUR NEXT CATHETER DESIGN

Parylene: what is it?

MANUFACTURING PROCESSES

RightCopyright 2006 American Vacuum Soci

Connecting Coolers to Superconducting Magnets with a Thermal-Siphon Cooling Loop

Non-Evaporable Getter Coating for UHV/XHV Applications

Amorphous Silicon Solar Cells

Advances in Intense Pulsed Light Solutions For Display Manufacturing. XENON Corporation Dr. Saad Ahmed Japan IDW 2016

Mater. Res. Soc. Symp. Proc. Vol Materials Research Society

CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS

12th International Workshop on RF Superconductivity. A.Frigo, G.Lanza, H.Padamsee, V.Palmieri, D.Tonini

SolarWindow. Innovating Alternative and Renewable Energy Solutions. Corporate» Technology» Media» Investors» Contact

Thin AC-PDP Vacuum In-line Sealing Using Direct-Joint Packaging Method

Verifying the electrostatic theory of whiskers University of Toledo

LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology

Ultra High Barrier Coatings by PECVD

INTRODUCTION TO WELDED METAL

Chapter 3 Silicon Device Fabrication Technology

UV Coloring of Optical Fiber Final Report

Bonded Neo Magnetization Guide

Induction surface hardening of hard coated steels

Specimen configuration

Y, XY, XYZ and Sample Manipulators. MultiCentre Sample Handling Systems. MultiCentre XYZ Stages

Process Flow in Cross Sections

PRIREV. ZI Vagos, lote

Visualization and Control of Particulate Contamination Phenomena in a Plasma Enhanced CVD Reactor

Novel Solutions for ESD Sensitive Devices

11.3 Polishing with Laser Radiation

Using a standard Penning Gauge as a powerful means of monitoring and feedback control

Clean coating of lithium with parylene-n. Abstract

Properties of TiN thin films grown on SiO 2 by reactive HiPIMS

Electron Emission. The reader is familiar with the current conduction (i.e. flow of electrons) through a conductor. 28 Principles of Electronics

SIP Hi-TECH Range exclusive to SIP

CONFERENCE EVALUATION FORM

Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications

UV-LED: Beyond the Early Adopters

GENCOA. Perfect your process

3M Electromagnetic Compatible Products

BASED ON WELDING/JOINING TECHNOLOGIES

Abcite X45. Technical Data and Application Guide. Product description. Typical applications. Product range. Product certifications.

A NOVEL METHOD FOR THE IMPROVEMENT IN THERMOELECTRIC PROPERTY OF TIN OXIDE THIN FILMS AND ITS APPLICATION IN GAS SENSING

Plasma Heat and Surface Treatment

Transcription:

Novel Device for In-Situ Thick Coatings of Long, Small Diameter Accelerator Vacuum Tubes A. Hershcovitch, M. Blaskiewicz, J.M. Brennan, W. Fischer, C-J Liaw, W. Meng, R. Todd Brookhaven National Laboratory, Upton, New York 11973, U.S.A A. Custer, A. Dingus, M. Erickson, N. Jamshidi, R. Laping, H. J. Poole PVI, Oxnard, California 93031, USA 1

Relativistic Heavy Ion Collider (RHIC) Complex 2

Problems that must be solved in order to enhance RHIC luminosity Lower vacuum chamber resistivity and control electron cloud formation! The RHIC vacuum chamber is made of 7.1 cm ID stainless steel tubing with 1.6 µm surface roughness in cold bore (2.1 µm in warm section). Stainless steel has high resistivity. Coat tube with copper! Electron clouds, which have been observed in many accelerators including RHIC can act to limit machine performance through dynamical instabilities and/or associated vacuum pressure increases. Formation of electron clouds is a result of electrons bouncing back and forth between surfaces, which cause emission of secondary electrons (electron multipacting effect). a-c coating! 3

Possible Solutions Coating the stainless steel walls with about 10 micrometers of oxygen free high conductivity copper (OFHC) can prevent problems arising from high resistivity. Mike Blaskiewicz made rigorous computations, which are appropriate for our case. Mike combined effects of low temperature and large magnetic fields will yield a net reduction in room temperature resistivity of RRR=50 in the copper coating. The mean free path of conduction electrons is 2 microns, which is equal to the skin depth at 20 MHz. It is therefore prudent to include the anomalous skin effect when calculating the effect of the coating. When this is done it is found that 10 micrometers of copper should be acceptable for even the most extreme future scenarios. Complete details can be found at BNL report: M. Blaskiewicz, Copper Coating Specification for the RHIC Arcs, C-A/AP/ note #413 Dec 2010 (unpublished). Covering the OFHC with a very thin layer of amorphous graphite to reduce SEY (secondary electron yield) But, Cu coatings thicker than 2 μm have columnar and other grain structures that might have lower SEY like gold black. SEY measurements of copper coated stainless steel discs and rectangular samples were sent to CERN for SEY measurements at both room and cryogenic temperatures. Encouraging results were obtained. Nevertheless, new experimental SEY measurements indicated that there was no need to pursue a-c coating either, since well-scrubbed bare copper can have its SEY reduced to 1 (SEY < 1.3 is needed to eliminate electron cloud problems). 4

DEPOSITION PROCESSES & OPTIONS Coating methods can be divided into two major categories: chemical vapor deposition (CVD) and physical vapor deposition (PVD). Due to the nature of the RHIC configuration, only PVD is viable for in-situ coating of the RHIC vacuum pipes. First, the temperature under which coating can be made cannot be high (400 C is required for some conventional CVD), since the RHIC vacuum tubes are in contact with superconducting magnets, which would be damaged. A second very severe constraint is the long distance between access points. Introduction of vapor from access points that are 500 meters apart into tubes with 7.1 centimeters ID would likely not propagate far and result in extremely non-uniform coating. CVD out; but these constraints also severely restrict PVD options. Obviously evaporation techniques (ovens, e-beams) cannot be used in 7.1 centimeters ID, 500-meter long tubes. Therefore, evaporation must be accomplished locally. Of the plasma deposition devices like magnetrons, diodes, triodes, cathodic arcs, RF, etc., magnetrons are the most commonly used plasma deposition devices. In magnetrons, magnetic fields are utilized to confine electrons that generate high density plasma (usually argon or xenon) near the surface of the material that is being sputtered. Major advantages of magnetron sputtering sources are that they are versatile, longlived, high-rate, large-area, low-temperature vaporization sources that operate at relatively low gas pressure and offer reasonably high sputtering rates as compared to most other sputtering sources. Chose to develop magnetron mole! 5

Magnetron Developed After Iterations A mobile magnetron, shown below, with a 15 cm long cathode was designed, fabricated, and tested to coat samples of RHIC cold bore with OFHC at an average coating rate of 30 Å/sec (factor 6 higher than absolutely needed). Copper deposition rates were measured with a 6 MHz crystal rate monitor: 500 m in 30 days 6

Magnetron & Coating Challenges Solved Inadequate copper utilization: thin cathode & very uneven erosion(magnetron integrity structural restrictions magnetics). Inconsistent adhesion, which did not always meet rigorous industrial standard (tape; nail). 7

Magnetron with Moving Magnets & thickest possible cathode is used, which reduces the target to substrate distance to less than 1.5 cm (unprecedented) 50-cm long cathode magnetron magnet package moving mechanisms: hydraulic (top) guide wheel motion (bottom); and, resultant erosion. 8

Coating Adhesion Strength Consistent coatings with good adhesion are achieved routinely with first (proprietary) step that may not be needed in RHIC followed by optimized discharge cleaning: positive voltage (of about 1 kv) is applied to the magnetron at a pressure of over 2 Torr. The optimized results yielded adhesion strength of over 12 kg (maximum capability pull test fixture) or at least 2.5x10 6 N/m 2. 9

Magnetron Coating Mole Top: photo showing the 50-cm long cathode magnetron spring loaded guide wheels. Leading edge guide wheels are inserted in a RHIC tube Bottom: photo showing the 50-cm long cathode magnetron assembly 10

Deposition System Moving Mechanism Cables moving the magnetron assembly with its electrical power and cooling water are fed through a cable bundle. An umbilical cabling system, which is enclosed in a flexible braided metal sleeve, is driven by a motorized spool. The whole magnetron and umbilical cabling systems are in vacuum. Spool Umbilical Drive drawing Drive Photo of front part of the drive Scaling the umbilical motorized spool drive system to a 500 m cable bundle yields a system that is 3 meters or less in any dimension (plenty room in the RHIC tunnel). Pull cable will be ¼ diameter stranded SS, is typically used in aircraft for flexible linkage with the various airfoil surfaces; very strong (20K tensile) with low elongation. 11

Coating an assembly of a RHIC magnet tube sandwiched between two types of RHIC bellows including a shielded bellow Deposition experiments were performed with the magnetron whose carriage has a springloaded guide wheel assembly for bellow crossing that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Some deposition experiments were performed with spring loaded wheels on both sides of the magnetron, such that a set of wheels rolls over coated areas. No indentation in or damage to coating was observed, i.e. the train like assembly option is viable. 12

Photos of copper coated RHIC stainless steel tubes and bellows Photos of coated bellows (at different lighting) Photos of coated RHIC tubes 13

Originally coating 500 meter section in-situ was considered, requires RHIC bellows replacement with access bellows for copper cathode reloading 14

Other Options Being Considered Presently replacement cathodes utilizing access bellows is not the leading option. Some deposition experiments were performed with spring loaded wheels on both sides of the magnetron, such that a set of wheels rolls over coated areas. No indentation in or damage to coating was observed, i.e. the train like assembly option is viable. Taking few magnets out and coating a series of magnets at a time is being considered. No decision final has been made 15

RF Resistivity First, without discharge cleaning, three 30 cm long RHIC SS tube samples were coated with 2.5 μm to 6.1 μm OFHC at 20 mtorr with AC power. Coating is axially non-uniform (thicker at edges; 6.1 μm had poor adhesion). Coating is matte in appearance (low SEY?). Room temperature resistivity of one of the coated samples 2.5 μm or about 4.5 to 5 μm, was indistinguishable from copper at 180 MHz with coating that s far from ideal. 16

Coating 49cm long tubes (2 μm below); cut out the center 32cm for more RF testing 17

RF Resistivity Measurements Ratio of SS tube coated with 10 μm of copper to pure copper tube versus frequency; experimental data is represented by green dots; red and blue lines are theoretical values based on σ of 4.5 and 5.5 x 10 7 18 mho/meter respectively (5 μm yielded similar results).

RF Resistivity Measurements continued As it can be seen from the figures, the best value for the conductivity of the surface layer is between 4.5 and 5.5 x 10 7 mho/meter. Pure copper has a value of 5.96 x 10 7 mho/meter. Thus, based on these measurements the conductivity of the copper coating is between 75.5% and 92.3%, or about 84% of pure copper. Since joints and connectors reduce experimentally measured Q, conductivity value of coatings may be even closer to pure solid copper. Although resistivity at cryogenic temperature might be different (it must be measure in a system that s being designed), Computations indicate that 10 μm of copper should be acceptable for even the most extreme future scenarios. Ratio of SS tube coated with 5 μm of Cu to pure Cu tube vs frequency; experimental data (green dots); red and blue lines are theoretical values based on σ of 4.5 and 5.5 x 10 7 mho/meter Ratio of SS tube coated with 2 μm of Cu to pure Cu tube vs frequency; experimental data (green dots); red and blue lines are theoretical 19 values based on σ of 4.5 and 5.5 x 10 7 mho/meter

Status In-situ coating method w/excellent adhesion developed and proven. Resistivity of coated RHIC tube samples close to Cu @ room T; SEY lower than SS. Cabling system for mole & spool developed Target to substrate distance 1.5 cm. Commercial coating equipment 10 s cm; 6.3 cm lowest experimental; unique omni-directional coating. Good copper utilization. Lowering RHIC cold bore resistivity & SEY with in-situ Cu coating seems feasible! Need to determine & optimize RF conductivity at cryogenic temperatures & do magnet quench tests on copper coated RHIC cold bore tubing 20

Acknowledgement Work Supported by DOE under Contract No. DE-AC02-98CH1-886 Notice: This manuscript has been authored by Brookhaven Science Associates, LLC under Contract No. DE-AC02-98CH1-886 with the US Department of Energy. The U.S. Government retains, and the publisher, by accepting the article for publication, acknowledges, a world-wide license to publish or reproduce the published form of this manuscript, or others to do so, for the United States Government purposes. 21