Metallic microgripper with SU-8 adaptor as end-effectors for heterogeneous micro/nano assembly applications

Similar documents
A sub-micron metallic electrothermal gripper

Microfabrication of Heterogeneous, Optimized Compliant Mechanisms SUNFEST 2001 Luo Chen Advisor: Professor G.K. Ananthasuresh

Surface Micromachining

zyvex TEM Sample Lift-out Using the Zyvex Nanoprober System By Kimberly Tuck, Zyvex Corporation

High aspect ratio tapered hollow metallic microneedle arrays with microfluidic interconnector

4. Process Integration: Case Studies

General Introduction to Microstructure Technology p. 1 What is Microstructure Technology? p. 1 From Microstructure Technology to Microsystems

Using Zyvex Microgrippers TM with Zyvex Nanomanipulators

Proceedings Post Fabrication Processing of Foundry MEMS Structures Exhibiting Large, Out-of-Plane Deflections

FABRICATION OF SWTICHES ON POLYMER-BASED BY HOT EMBOSSING. Chao-Heng Chien, Hui-Min Yu,

Tensile Testing of Polycrystalline Silicon Thin Films Using Electrostatic

Today s Class. Materials for MEMS

Lecture 5. SOI Micromachining. SOI MUMPs. SOI Micromachining. Silicon-on-Insulator Microstructures. Agenda:

FABRICATION PROCESSES FOR MAGNETIC MICROACTUATORS WITH POLYSILICON FLEXURES. Jack W. Judy and Richard S. Muller

Thomas M. Adams Richard A. Layton. Introductory MEMS. Fabrication and Applications. Springer

Filling and Planarizing Deep Trenches with Polymeric Material for Through-Silicon Via Technology

Uncrosslinked SU-8 as a sacrificial material

Chapter 4 Fabrication Process of Silicon Carrier and. Gold-Gold Thermocompression Bonding

UV15: For Fabrication of Polymer Optical Waveguides

Dr. Lynn Fuller Webpage:

Gold Passivated Mechanically Flexible Interconnects (MFIs) with High Elastic Deformation

Tackling the optical interconnection challenge for the Integrated Photonics Revolution

Fabrication of 3D Microstructures with Single uv Lithography Step

Microfabrication Using Silicon Mold Inserts and Hot Embossing

Fully-integrated, Bezel-less Transistor Arrays Using Reversibly Foldable Interconnects and Stretchable Origami Substrates

Preface Preface to First Edition

Poly-SiGe MEMS actuators for adaptive optics

Vacuum casting, a new answer for manufacturing biomicrosystems

Lithography Independent Fabrication of Nano-MOS-Transistors with W = 25 nm and L = 25 nm

Single crystal silicon supported thin film micromirrors for optical applications

Micro-Electro-Mechanical Systems (MEMS) Fabrication. Special Process Modules for MEMS. Principle of Sensing and Actuation

Regents of the University of California 1

Compact hybrid plasmonic-si waveguide structures utilizing Albanova E-beam lithography system

Micro Injection Molding of Micro Fluidic Platform

Regents of the University of California

Polymer Microfabrication (Part II) Prof. Tianhong Cui, Mechanical Engineering ME 8254

3-D, Self-aligned, Micro-assembled, Electrical Interconnects for Heterogeneous Integration

Silver Diffusion Bonding and Layer Transfer of Lithium Niobate to Silicon

Integrated CoPtP Permanent Magnets for MEMS Electromagnetic Energy Harvesting Applications

Micro-Electro-Mechanical Systems (MEMS) Fabrication. Special Process Modules for MEMS. Principle of Sensing and Actuation

Microstructures using RF sputtered PSG film as a sacrificial layer in surface micromachining

Design and fabrication of MEMS devices using the integration of MUMPs, trench-refilled molding, DRIE and bulk silicon etching processes

PHYS 534 (Fall 2008) Process Integration OUTLINE. Examples of PROCESS FLOW SEQUENCES. >Surface-Micromachined Beam

Ultra Fine Pitch Bumping Using e-ni/au and Sn Lift-Off Processes

MEASUREMENTS OF MECHANICAL PROPERTIES OF MICROFABRICATED THIN FILMS

Mater. Res. Soc. Symp. Proc. Vol Materials Research Society

Change in stoichiometry

Journal of Advanced Mechanical Design, Systems, and Manufacturing

IMECE A DUAL-EDM REVERSE DAMASCENE PROCESS FOR RF SWITCHES AND OTHER BULK METAL DEVICES

Wafer Bonding Technology FOR VACUUM PACKAGING USING GOLD- SILICON EUTECTIC

Lab #2 Wafer Cleaning (RCA cleaning)

Thin. Smooth. Diamond.

Thin. Smooth. Diamond.

NANOTUBE MICRO-OPTO-MECHANICAL SYSTEMS

Effects of Film Thickness on the Yielding Behavior of Polycrystalline Gold Films

Outline. Introduction to the LIGA Microfabrication Process. What is LIGA? The LIGA Process. Dr. Bruce K. Gale Fundamentals of Microfabrication

Micro-Electro-Mechanical Systems (MEMS) Fabrication. Special Process Modules for MEMS. Principle of Sensing and Actuation

Leveraging the Precision of Electroforming over Alternative Processes When Developing Nano-scale Structures

Gaetano L Episcopo. Introduction to MEMS

Sensors and Actuators Designed and Fabricated in a. Micro-Electro-Mechanical-Systems (MEMS) Course. Using Standard MEMS Processes

Electrical and Fluidic Microbumps and Interconnects for 3D-IC and Silicon Interposer

Advanced Polymers And Resists For Nanoimprint Lithography

Multiple-height Microstructures Fabricated by ICP-RIE and Embedded Masking Layers

On-chip MEMS for automated chip-to-chip assembly

MEMS Fabrication. Beyond Integrated Circuits. MEMS Basic Concepts

Chapter 2 OVERVIEW OF MEMS

Silicon Nitride Biaxial Pointing Mirrors with Stiffening Ribs

EE C245 ME C218 Introduction to MEMS Design Fall 2011

Mechanically Flexible Interconnects with Highly Scalable Pitch and Large Stand-off Height for Silicon Interposer Tile and Bridge Interconnection

MICRO-ELECTRO-MECHANICAL VARIABLE BLAZE GRATINGS

Surface Micromachining

Demonstration for integrating capacitive pressure sensors with read-out circuitry on stainless steel substrate

MEMS Surface Fabrication

3D microfabrication with inclined/rotated UV lithography

The Effect of Fillers in Nonconductive Adhesive on the Reliability of Chip-on-Glass Bonding with Sn/Cu Bumps

Evaluation of length scale effects for micro and nano-sized cantilevered structures

SCIENCE CHINA Technological Sciences. Replication of large area nanoimprint stamp with small critical dimension loss

There are basically two approaches for bulk micromachining of. silicon, wet and dry. Wet bulk micromachining is usually carried out

II. A. Basic Concept of Package.

Tutorial on Micro Electro Mechanical Systems (MEMS)

Out-of-plane microstructures using stress engineering of thin films

Sub-5 nm Structures Process Development and Fabrication Over Large Areas

Micro-Nano Fabrication Research

Fabrication Technology, Part II

MEMS II: January 23. Lab 1: Pop-up mirror - PolyMUMPS - Thermal actuators - Mirror CoventorWare

Lecture 6. Through-Wafer Interconnect. Agenda: Through-wafer Interconnect Polymer MEMS. Through-Wafer Interconnect -1. Through-Wafer Interconnect -2

Aspects of Fabrication and Characterization of electro-thermal micro actuators

GE Sensing & Inspection Technologies MEMS. Global Solutions for Microsystems

Note Application of Screen Printing in Flexible Miniature Thermocouple Process Development

Final Project Report. Date Jan. 30 th, To: Kenji Homma, Adaptive Technologies, Blackburgh, Virginia.

A tapered hollow metallic microneedle array using backside exposure of SU-8

Chapter 2 Manufacturing Process

Micromachined NH3 Gas Sensor with ppb-level Sensitivity Based on WO3 Nanoparticles Thinfilm

6.777J/2.732J Design and Fabrication of Microelectromechanical Devices Spring Term Solution to Problem Set 2 (16 pts)

Micromachining AMT 2505

Cambridge University Press A Guide to Hands-on MEMS Design and Prototyping Joel A. Kubby Excerpt More information.

GLM General information. Technical Datasheet

Welcome MNT Conference 1 Albuquerque, NM - May 2010

Approach for the 3D-alignment in micro- and nano-scale assembly processes

Investigation of ProTEX PSB Thin Film as Photosensitive Layer for MEMS capacitive pressure sensor diaphragm based Si/SiC Wafer

Transcription:

Metallic microgripper with SU-8 adaptor as end-effectors for heterogeneous micro/nano assembly applications K. Kim, E. Nilsen, T. Huang, A. Kim, M. Ellis, G. Skidmore, J.-B. Lee 542/0367 Microsystem Technologies j (2004) jjj jjj Ó Springer-Verlag 2004 DOI 10.1007/s00542-004-0367-6 Abstract This paper presents design, fabrication, and characterization of easy-to-handle electroplated nickel microgrippers with SU-8 adaptors for heterogeneous micro/nano assembly applications. Two distinctive designs of microgrippers as end-effectors of micro/nano assembly applications have been developed in this work. The first design is 200 lm thick electroplated nickel microgripper with a plastic mechanical displacement amplifier that is driven by a piezoelectric actuator. The piezoelectric actuator is capable of creating 5 lm displacement which is amplified to 10 lm by the plastic mechanical amplifier and finally such displacement generates 50 139 lm microgripper tip displacement. The second design is 20 lm thick electroplated nickel microgripper embedded in SU-8 adaptor for easy-to-handle operation. The second design is electro-thermally actuated using a set of jouleheated bent beams. With applied actuation voltage in the range of 2 4 V, the microgripper generates tip displacement of 4 32 lm. Extensive thermal and mechanical finite element modeling have been carried out and measurement results were compared with the simulation results. Such developed easy-to-handle microgrippers can be used for micro/nano pick-and-place assembly applications. Received: 8 August 2003/Accepted: 6 November 2003 K. Kim (&), J.-B. Lee Department of Electrical Engineering, University of Texas at Dallas, Richardson, Texas, USA e-mail: kskim@utdallas.edu K. Kim, E. Nilsen, T. Huang, M. Ellis, G. Skidmore Zyvex Corporation, Richardson, Texas 75081, USA A. Kim Department of Mechanical Engineering, Rensselaer Polytechnic Institute, Troy, New York, USA This work was supported by the National Institute of Standards and Technology-Advanced Technology Program (NIST-ATP) (award # needed). The authors would like to thank the members of Design Engineering Group at Zyvex Corporation, Mr. Yohannes Desta from the Center for Advanced Microstructures and Devices (CAMD) at Louisiana State University for the valuable technical discussions, and the members of Micro and Nano Device and Systems (MiNDS) Laboratory and Cleanroom staffs at the University of Texas at Dallas. 1 Introduction The development of manufacturing systems that are able to integrate a variety of micro devices into a single, heterogeneous system will trigger major advances in the achievable complexity and functionality of microsystems. One promising approach is to equip existing robotic systems with specialized end-effectors so that they are better suited to precisely handle and manipulate micro components. Many efforts have been made in the research and development of a variety of microgrippers and their applications in MEMS, micro-optics and biological sample manipulation [Kim et al. (1992), Suzuki (1996), Lumina et al. (1999)]. Recent developments in microsystems indicate a growing interest and need for three-dimensional manipulation of micron-sized structures to form specialized, microrobotic systems. This requires research efforts in the area of microsystem integration, particularly in the area of microassembly [Hunter et al. (1999), Cohn et al. (1998), Nelson et al. (1998), Huang et al. (2003)]. However, the current approaches in such manipulation have been limited by time consuming manual assembly and poor yield [Ellis et al. (2002)]. Pick-and-place robotic micro/nano assembler and manipulator systems which use conventional computerbased macroscopic control yet capable of micron scale assembly have been developed at Zyvex Corporation (Richardson, Texas, U.S.A.) [Huang et al. (2003), Ellis et al. (2002)]. In such micro/nano assembler and manipulator systems, one of crucial components is microgripper as an end-effector. Silicon microgripper was commonly used for such an application [Ellis et al. (2002)]. In this work, two types of metallic microgrippers were investigated which can be used as end-effectors for such micro/nano assembler and manipulator applications. 2 Design and simulation Two distinctive designs of metallic microgrippers were investigated in this work. The first design is a relatively thick (200 lm), large scale (15 mm in length), and uses mechanically amplified piezoelectric actuation. The second design is relatively thin (20 lm), smaller scale (1.5 mm in length), and uses direct electro-thermal actuation using joule heating of rmultiple number of bent-beams. The design 1 has three different types of electroplated nickel microgripper structures as shown in Fig. 1. This design is based on the previous work on the poly-silicon microgripper at Zyvex [Ellis et al. (2002)]. The 1

Fig. 1. In-plane displacement simulation results for the design 1; (a) type A, (b) type B, and (c) type C microgrippers 2 microgripper tip opens when a force is applied at the bottom of the microgripper as shown in Figure 1. The overall size of the microgripper is approximately 15 mm by 13.5 mm and 200 lm thick. Mechanical finite element analysis (FEA) was carried out using ANSYS (ANSYS, Inc., Canonsburg, Pennsylvania, USA) with an assumption that the electroplated nickel obeys Hook s law. The Young s modulus and Poisson s ratio of electroplated nickel used were 130 GPa and 0.31, respectively. The type A microgripper shows relatively large tip opening of the microgripper but more prone to out-ofplane displacement which is undesirable. Type B and C show relatively smaller tip opening of the microgripper but less prone to out-of-plane displacement due to the addition of significant mass in the middle of the microgripper. Figure 1 shows amounts of the in-plane displacement of the three different types of microgrippers with a mechanical displacement of 10 lm at the bottom of the microgripper. Type A shows 160 lm tip opening while the type B and C show 108 and 124 lm tip opening, respectively. The design 2 as shown in Fig. 2 is based on the mechanically amplified microfabricated bent-beam structures [Huang et al. (2003), Ellis et al. (2002)]. Again, electroplated nickel was used as the microgripper structural material. The primary difference of this design from the design 1 is the use of massive SU-8 structures as an adaptor for easy-to-handle operation. The SU-8 adaptor provides mechanical support and electrical isolation for the electroplated nickel microgripper. In addition, it is shaped to be compatible with micro/nano pick-and-place robotic systems to allow precise alignment. This enhancement will allow us to make one step closer to the realization of a system which is capable of massively parallel assembly and manipulation in micro/nano scales using robotic pick-and-place system. In this design, a mesh is implemented to promote attachment strength between nickel microgripper structure and SU-8 adaptor. The overall size of design 2 microgripper is approximately 1.5 mm by 1.7 mm and 4 mm by 8 mm for the SU-8 adaptor. The thicknesses of the electroplated nickel microgripper and the SU-8 adaptor are 20 and 170 lm, respectively. The microgripper tip consists of three separate square contact areas having a slight inclination at rest, which provides parallel gripping surfaces when used with designed object dimensions. Electro-thermo-mechanical FEA for the microgripper design 2 was performed using ANSYS. Figure 3 shows the 3-dimensional mesh used for the FEA. Fine meshing was used for critical areas such as bent-beams and microgripper arms and relatively coarse meshing was used for SU-8 adaptor and nickel pad area. In this FEA, we assumed that electroplated nickel microgripper and SU-8 adaptor obey Hook s law and material properties of electroplated nickel and SU-8 do not change as a function of temperature. In addition, we assumed that there is no residual stress in the electroplated nickel and SU-8. The properties of electroplated nickel used for simulation are as follows: Young s modulus of 130 GPa, thermal expansion coefficient of 13.1 ppm/ C, Poisson s ratio of 0.31, resistivity of 6 10 )8 X-m, and thermal conductivity 60.7 10 6 W/lm C [Davis et al. (1991), Fritz et al. (2000)]. The properties of SU-8 used for the simulation are as follows: Young s modulus of 4.4 GPa, thermal expansion coefficient of 50 ppm/ C, Poisson s ratio of 0.22, nearly infinite resistivity of 10 44 X-m, and thermal conductivity 0.2 10 6 W/lm C. Figure 4a and b show the design 2 microgripper ANSYS FEA simulation results for the temperature distribution and in-plane displacement, respectively when a voltage of 3 V is applied. With an applied voltage of 3 V, the induced Fig. 2. Schematic diagram of an integrated metallic microgripper with SU-8 adaptor Fig. 3. Three-dimensional finite element mesh diagram for the design 2

Fig. 4. ANSYS FEA simulation results of the design 2 with an applied voltage of 3 V: (a) temperature distribution; (b) in-plane displacement; and (c) induced current density distribution current is 14.04 ma and the maximum current density is approximately 12 10 6 pa/lm 2. Maximum temperature of 106 C occurs at the bent-beam structures and the balancing mass in the middle of the microgripper and thin arms of the microgripper are also substantially heated near to the maximum temperature. We can notice that the majority area of the SU-8 polymeric adaptor and the nickel pad area embedded in the SU-8 adaptor are maintained at low temperature. Maximum in-plane outward displacement for each tip is approximately 9.239 lm, yielding a tip opening of 18.478 lm for the microgripper when 3 V is applied. Gripper tips also moves )3.55 lm in the length direction and out-of-plane displacement is found to be negligibly small ()0.02 lm for each tip). Figure 4c shows the induced current density distribution near the bentbeam, and as expected the primary current path is through the bent-beams. 3 Fabrication The fabrication sequence for the design 1 was started with thermal oxidation of silicon substrate or spin casting of SU-8 as a sacrificial layer. Metallic seed layers were deposited and a 220 lm thick SU-8 2075 layer was spin coated. The wafer was soft-baked at 95 C for 90 min, exposed with an energy dose of 650 mj/cm 2, followed by post-baking at 95 C for 20 min. After development, the wafer was cleaned by reactive ion etch (RIE) which is followed by nickel electroplating through developed SU-8 mold. A nickel sulfamate electroplating bath was used and the current density was set at 10 ma/cm 2. Average growth rate of electroplated nickel was approximately 25 lm/ hour. After the completion of the electroplating, SU-8 was completely dry etched using RIE with O 2 and CF 4 gas mixtures. Finally, the sacrificial oxide or SU-8 layer was etched and microgrippers were released from the substrate. Figure 5 shows scanning electron microscope (SEM) photomicrographs of batch fabricated three different types of electroplated nickel microgrippers of the design 1. The fabrication sequence for the design 2 is shown in Fig. 6. Silicon substrate was thermally oxidized to form an oxide sacrificial layer. A 50 Å chromium adhesion layer and a 300 Å gold seed layer were deposited using electronbeam evaporation. A 25 lm thick SJR 5740 (Shipley) photoresist was spin coated and patterned. A 20 lm thick nickel was electroplated in a 55 C nickel sulfamate bath with mechanical agitation. Next, the SJR 5740 photoresist mold was removed and the seed/adhesion metallic layers were etched away. In order to create SU-8 adaptor, approximately 50 lm thick SU8 2025 was spin-coated which was followed by an evacuation process to remove air trapped in the trenches between the electrodeposited nickel structures. After the 1st SU-8 layer deposition, surface of SU-8 shows surface topology of the nickel microgripper. The 1st SU-8 layer was baked and the 2nd SU8 layer (120 lm thick SU8 2075) was spin coated to create a planarized polymeric adaptor for the microgripper. The double-layer SU 8 were baked and patterned, resulting in nickel microgripper structures partially embedded in SU-8 adaptor structures. Finally, batch microfabricated metallic microgrippers with SU8 adaptors were released by etching of the 2 lm SiO 2 in buffered HF solutions. Figure 7 shows SEM photomicrographs and optical photomicrographs of the released design 2 microgrippers. The microgripper has an initial tip opening of 170 lm at rest and the tooth of the tip is 10 lm in width and 20 lm in height resulting in an aspect ratio of 2:1. The grippers were picked up manually with tweezers using the patterned notches in the SU-8 adaptors from a set of microgripper (Figure 7d and e). 4 Characterization The design 1 microgrippers were mounted on a test station (Fig. 8a) in which a piezoelectric actuator was installed at 3 Fig. 5. SEM photomicrographs of design 1 microgrippers: (a) type A; (b) type B; (c) type C

4 Fig. 8. a Design 1 microgripper test station, b microgripper installed on a robotic pick-and-place tool Fig. 6. Fabrication sequence of Ni microgrippers integrated with SU8 adaptors the bottom of the vertical column and a plastic mechanical displacement amplifier connects the microgripper and the piezoelectric actuator. A maximum of 5 lm displacement was generated at the piezoelectric actuator and such displacement was mechanically amplified by the plastic intermediate piece. At the top end of the plastic, the displacement became a maximum of 10 lm. Such amplified displacement directly applied to the microgripper in a manner as shown in Fig. 1. The amount of the tip openings were in the range of 135 165 lm for type A, 52 108 lm for type B and C. The wide variation of the measurement values is due to the difference of the alignment quality between the microgripper and the mechanical amplifier for each sample since the microgripper was manually mounted. The maximum deviation between the average value of the measured data and the simulation results is 31% for type B and C. Figure 8b shows an optical photomicrograph which shows a microgripper installed on a macroscopically controlled robotic micro pick-and-place tool. The design 2 microgripper was tested using a probe station by directly applying voltage between nickel pads. Applied voltage in the range of 2 5 V, frequency in the range of 0 5 Hz sawtooth and pulsed waveform were used to drive the microgripper. Figure 9 shows in-plane outward displacement of the tip of the microgripper as a function of the applied voltage. Up to applied voltage of 3.5 V, reproducible displacements were observed and there are good agreement between the ANSYS simulation results and measurement results for various types. As the applied voltage increased beyond 3.5 V, the measured displacement became greater than the simulation results. Such a deviation was getting larger as the applied voltage continually increased. This could be explained by the plastic deformation of electroplated nickel microgripper due to excessive heating. For various types of the design 2 microgrippers, thermal deformation and complete failure of the microgripper by bent-beam burning occurred typically at around 4.5 5 V. Figure 10 shows optical photomicrographs of burning nickel bentbeams (Fig. 10-a) and completely burnt microgripper (Fig. 10b) with excessive heating. Fig. 7. SEM and optical photomicrographs of design 2 microgrippers: a a microgripper; b close-up view of a microgripper tip; c close-up view of the teeth of the tip; d a microgripper manually picked-up at the SU-8 adaptor notch by a tweezer; e a set of a microgripper

Fig. 10. Optical photomicrographs of the design 2 metallic microgrippers with excessive voltages applied (> 4.5 V): a a burning microgripper; b a completely burnt and structurally disintegrated metallic microgrippers 5 Fig. 9. Outward in-plane displacement of the tip of the design 2 microgripper as a function of the applied voltage 5 Conclusion Electroplated nickel microgrippers were designed, fabricated, and characterized to be used as end-effectors for micro/nano assembly applications. Two distinctive designs were developed: the first design was a relatively large scale microgripper with mechanical amplification of piezoelectric actuation; the second design was a relatively small scale microgripper which was electro-thermally actuated by direct heating of bent-beams and integrated with a novel SU-8 adaptor for easy-to-handle operation. Operations of both designs were successfully demonstrated. A part of the study showed that manual alignment of a microgripper on a conventional robotic tool can cause significant deviation of microgripper operation from one to another. Easy-to-handle, packaging friendly microgripper design could greatly decrease such errors. Failure mechanism of electro-thermally actuated bent-beam nickel microgripper was preliminarily studied. Investigation on the cause of the failure for electroplated metallic microstructures is rare and much study is needed. References Cohn M; Boehringer K; Noworolski M; Singh A; Keller C; Goldberg K; Howe R (1998) Microassembly technologies for MEMS. In: Proc SPIE Micromachining and Microfabrication Process Technology, Vol. 3511: pp. 2 16 Davis T; Kahn D (1991) Contact resistance of oriented electroplated nickel. AMP J Tech 1: 55 63 Ellis M; Skidmore G; Geisberger A; Tsui K; Sarkar N; Randall J (2002) Microfabricated silicon mechanical connectors and micro assembly. Nanotech 2002, Houston, TX Fritz T; Leuerer T; Krüger C; Mokwa W; Schnakenberg U (2000) Mechanical properties of electroplated nickel, Techn. Dig. Micro. Materials Mat 2000, 3rd International Conference and Exhibition: 752 755 Huang T; Nilsen E; Ellis M; Goldsmith C; Kim K; Skidmore G; Kumar N; Lee JB (2003) 3-D Self-aligned, micro-assembled, electrical interconnects for heterogeneous integration, SPIE Photonics West. San Jose, CA, vol 4981 24 Hunter IW; Lafontaine S; Nielsen PF; Hunter PJ; Hollerbach JM (1999) Manipulation and dynamic mechanical testing of microscopic objects using a tele-micro-robot system. Proc Int Conf Robotics Automation 1553 1558 Kim C; Pisano A (1992) Silicon-processed overhanging microgripper. J Microelectromechanical Systems 1(1): 31 36 Lumia R; Shahinpoor M (1999) Microgripper design using electro-active polymers. Proc SPIE. Smart Structures and Materials, vol 3669, pp. 322 329 Nelson B; Zhou Y; Vikramaditya B (1998) Sensor-based microassembly of hybrid MEMS devices. IEEE Control Syst 18(6): 35 45 Suzuki Y (1996) Flexible microgripper and its application to micro-measurement of mechanical and thermal properties. Proc Ninth International Workshop on Micro Electromechanical Systems, pp. 406 411 5 4 2 0 0 3 6 7 Journal number Manuscript number B Dispatch: 27.1.2004 Journal : Microsystem Technologies No. of pages: 5 Author s disk received 4 Used 4 Corrupted Mismatch Keyed