Ion-plasma technologies and equipment
VACUUM ION-PLASMA INSTALLATIONS OF «OPAL» SERIES «Opal» series ion-plasma installations are designed for deposition of low-emission, reflective and toned coatings on the flat glasses with 1.6x3 msizes. «Opal-3Pro» installation The low-e coating structure in installation technology is TiO(SnO)-[Ni (80%), Cr (0%)]-Ag-[Ni (80%), Cr (0%)]-TiO(SnO). The installation has a special loader chamber for loading and unloading of flat glass in one operation cycle. -3 base pressure, Pa 5x10 planar magnetron, pcs 3 dual magnetron, pcs 6 ion source, pcs glass carriage rate, mm/s -80 maximal sizes of flat glass, m 1.6x3 nonuniformity of film thickness % power consumption, kw 00 installation square, m 50
VACUUM ION-PLASMA INSTALLATIONS OF KO MKR SERIES Automated vacuum ion-plasma installation KO MKR is designed for deposition of radio-reflective coatings on the surface of ground-based and space-based reflectors with diameter up to 3 meters. Installation KO MKR KO MKR installation has an automated system for reflector heating with temperature accuracy ºC. KO MKR installation provides deposition of radio reflective coating with high thickness uniformity ~5 % and adhesion (not less than 60 kg/sm), reflectance not less than 98 % at the 4 and 33 GHz. -4 base pressure, Pa 5х10 diameter of circular magnetrons, mm 50 dimensions of rectangular magnetrons, mm 100х700 magnetron discharge current, A 15 power consumption, kw 107 installation square, m 60
VACUUM ION-PLASMA INSTALLATIONS OF «YASHMA» SERIES «Yashma» (eng. Jasper) installation are designed for surface modification by the means of sputtered particles and accelerated ions. «Yashma-5» and ARM NTP- installations Vacuum installation provides coatings deposition in inert and reactive atmospheres. The stoichiometric thin films (oxides, nitrides) can be deposited. The gas implanter generates a vertical beam of gas ions with wide energy range. basr pressure, Pa 5х10-4 carriage's moving speed, mm/s...30 material cathode nonmagnetic metals and alloys accelerated ions gas power consumption, kw 40 installation square, m 0
SPACE IMITATION TECHIQUES Installation VU KG is designed for determination of gas release kinetics. -4 residual pressure, Pa 6х10 temperature control, ºC 5...15 balance sensitivity, g 10-7 0 thermal regulation, С -160...+160 0 temperature stability, С ±1 Installation VU KG Installation VU ZSPG is designed for determination of contamination ability of gas release products from the coatings. Installation VU ZSPG -4 residual pressure, Pa 6,67х10 effusion temperature range, ºC +5...+150 temperature range, ºC -183...+5 temperature control, ºC 5 balance sensitivity, g 10-7
Installation VU SKM is designed for testing coatings by complex influence of different factors (vacuum, electrons, protons, solar radiation, temperature). Two electron guns (energies are 50 kev and 100 kev respectively). Proton source (energy is up to 50 kev). Solar radiation imitator ISO-SKM-1. Temperature control of hot bench with testing probes during irradiation is provided by running heat carrier. System of optical measurements provides measurement of spectral reflectance and adsorption of solar radiation by testing materials in vacuum in the range from 50 nm to 800 nm. Installation VU SKM Installation VU STANDART is designed for determination of characteristics of gas release from non-metal materials (GOST Р 50109). residual pressure, Pa 5х10-4 heating block temperature,ºc 15±1 condensation block temperature,ºc 5±0,5 Installation VU Standart
VACUUM ION-PLASMA INSTALLATIONS FOR THIN FILM DEPOSITION FROM THE RF DISCHARGE Installations are designed for obtaining nanoclustered ferromagnetic materials for microelectronics, biocompatible calcium phosphate thin films, dielectric thin films, etc. Ion-plasma installations for deposition of calcium phosphate coatings base pressure, Pa 5х10-4 ion beam current, A 0,1...0,5 cathode material magnetic metals, ceramics, composite materials mass, kg 450 installation square, m 1
VACUUM ION-PLASMA INSTALLATION RM RTP Installation RM RTP is designed for working out of technologies of radiotechnical and temperature control coatings. Installation RM RTP -4 base pressure, Pa 10 rotary speed, rpm 1...95 magnetron discharge voltage, V 100...600 magnetron discharge current, А 0,5...15 ion beam voltage, kv 1...3 ion beam current, А 0,1...1 cathode material nonmagnetic metals and alloys mass, kg 650 installation square, m 1
VACUUM ION-PLASMA INSTALLATIONS OF ARM UVK SERIES ARM UVK installations are designed for deposition of radiotechnical coatings, temperature control coatings and multifunctional coatings on rolled polymer films. Installation ARM UVK-1 The roll transport mechanism in the ARM UVK- base pressure, Pa 5х10-4 rotatable speed, mm/s...30 magnetron current, A 15 material cathode metals and alloys accelerated ions gas power consumption, kw 60 installation square, mm 4500х3000 mass, kg 3700
ION-PLASMA INSTALLATION FOR FINISHING ION BEAM TREATMENT OF FUEL RODS OF WATER-COOLED NUCLEAR REACTOR Vacuum ion-plasma installation of finishing ion beam treatment of fuel rods of water-cooled nuclear reactor is designed for cleaning and polishing surface fuel rods with length up to 500 mm. Installation provides deposition of the doping elements from the magnetron discharge plasma. Installation KVK -4 base pressure, Pa 10 ion beam current, A 0,9 magnetron discharge current, A 0,5...9 ion source voltage, kv 3,5 cartridge rotary speed, rpm 1,8 fuel rod rotary speed, rpm 0...15 power consumption, kw 15 mass, kg 650
VACUUM INSTALLATION «CRYSTAL» Installation «Crystal» is designed for crystal grown by Bridgmen-Stokbarger method. The installation feature is possibility to change of crystal grown method. The installation has a precision cooled drives with regulated rate and displacement position. The high precision control of heater temperature and temperature gradient in out of the heater was realized by two-wave pyrometers and high-temperature thermocouples. -3 base pressure, Pa 10 overpressured of inert gas, kgf/cm 3 grown crystals sizes: - length, mm 350 - dia, mm 70 - mass, kg 9 power consumption, kw 70 mass, kg 1500