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ensors 2003, 3, 110-118 sensors IN 1424-8220 2003 by MDPI http://www.mdpi.net/sensors H 2 Detection ensing Characteristic of CuO/nO 2 ensor Jinhuai Liu 1,2,*, Xingjiu Huang 2, GangYe 2, Wei Liu 2, Zheng Jiao 2, Wanglian Chao 1, Zhongbai Zhou 3 and Zengliang Yu 1 1 Institute of Plasma Physics, Chinese Academy of cience, Hefei 230031,P.R.China 2 Hefei Institute of Intelligent Machines, Chinese Academy of ciences, Hefei, 230031, P. R. China 3 College of Chemistry and Molecular cience, Wuhan University, Wuhan, 430072, P. R. China * Author to whom correspondence should be addressed. E-mail: jhliu@mail.iim.ac.cn Received: 24 February 2003 / Accepted: 1 May 2003 / Published: 12 May 2003 Abstract: Among the various metal oxide additives tested, the complex of CuO is outstanding in promoting the sensing properties of an no 2 sensor for H 2 in air. The no 2 sensors loaded with 5 wt.% CuO is extremely sensitive to H 2 at 200 o C and below, while it is almost insensitive to many other gases. The response to H 2 is rather slow but the recovery is very rapid. The added CuO particles interact electronically with the surface of no 2 (p-n junctions) to make the sensor highly resistive, while the interaction is disconnected when CuO is sulfurized to Cu in the H 2 containing atmosphere, leading to a drastic decrease in electrical resistance. The H 2 sensing properties, particularly the rate of response, of CuO/nO 2 sensors are influenced by the CuO loadings and operating temperature as well as the thickness of CuO loading film. Keywords: Tin oxide, copper oxide, sensing properties, H 2 Introduction The detection of H 2, a bad-smelling and toxic gas, is very important in environmental monitoring. Therefore, much attention has been paid to the search for H 2 gas sensitive materials. The sensing properties of various semiconductor oxides, especially the no 2 -based materials, have been extensively studied. It has been claimed that the sensitivity and selectivity to H 2 are improved by adopting a quickly cooling method [1] or by adding hydrophobic silica [2], ZrO 2 [3], CeO 2 [4], or basic

ensors 2003, 3 111 oxides [5] to the sensor element. It was also found that the addition as noble metal Ag to no 2 makes the materials very sensitive to H 2 [6,7]. We have tried to improve the H 2 sensitivity by modifying the surface of no 2 with various metal oxides, and found that CuO is a unique excellent promoter of the no 2 gas sensor for the sensitive and selective detection of H 2. This paper deals with the H 2 sensing properties of no 2 sensors loaded with various metal oxides, especially CuO. The sensing mechanism of CuO/nO 2 sensor as well as the effects of CuO loading conditions and H 2 gas concentration on the sensing characteristics are also described. Experimental The no 2 powder was prepared from ncl 4. An aqueous solution of ncl 4 was neutralized with an aqueous solution of ammonia (28%). The precipitate obtained (stannic acid) was thoroughly washed with deionized water, dried at 100 o C and calcined at 600 o C for 5h in air. To be loaded with metal oxides, the no 2 powder was impregnated with an aqueous solution of each metal salt (typically acetates for Ca, r, Ni, Cu, Zn, Cd, Ag, Zr and Ce and ammonium salts for V, Mo, W and P ), followed by drying and calcining at 600 o C for 5h. no 2 was impregnated with a solution of Cu acetate to a fixed CuO loading of 5 wt.%. The elements having various CuO loadings (1, 4, 6, 10 wt.%) were prepared in the same way. The thickness of CuO was evaluated from multiplication of the deposition rate by the deposition time, because clusters or islands form thin films during the earliest stages of film formation. The gas sensitivity was defined : = ( Ra Rg ) / Ra =ΔR / Ra, where Ra and Rg are the resistance of sensor in air and the test gas respectively. Results and Discussion Effects of Additives on H 2 ensitivity The gas sensitivity to 50 ppm was examined for the no 2 elements loaded with various metal oxides at 200 o C. Fig.1 shows the H 2 sensitivity as a function of the electronegativity (Xi )of the loaded metal cations, we can clearly see that the sensitivity is promoted extensively by metal cation (Xi < 2 ), such as Cu 2+, Cd 2+, Ce 4+, Zr 4+ and so on, while others show no or very modest effects. This tendency is fairly consistent with the proposal of Nakahara et al [5] that, since H 2 is an acidic gas, the H 2 sensitivity increases when the surface of no 2 is loaded with basic additives. Among the examined metal oxides, CuO is singularly outstanding in promoting the sensitivity. This suggests a possibility that its promoting effect results from factors other than acid-based properties of the no 2 surface. Effects of CuO Film Thickness on H 2 ensitivity intered gas sensors are composed of a mixture of CuO and no 2, and thus, CuO is dispersed here and there in a sensor, in the thin film of this study, catalytic layer, CuO, was formed only atop the

ensors 2003, 3 112 no 2 film. Fig.2 shows the effects of doping layer thickness on the sensitivity of the film. It is apparent that the sensitivity of the CuO/nO 2 film is strongly dependent on the thickness of the doping layer. Considering that CuO resistance is attributed to formation of p-n junction between CuO layer and no 2 film, by which electrons of n-type semiconductor no 2 is depleted and the sensor resistance is raised. For a sensor with a thickness of 7.5 nm, however, the sensor resistance decreased remarkably. This fact can be explained from the following: numbers and sizes of CuO islands atop no 2 increase, and then the distance between each pair of islands is closer, and finally electrical conduction by tunneling lowers the sensor resistance. If the thickness of the film is too thick, we consider the reason is that a certain amount of CuO cannot interact with H 2 and transformed Cu, that is to say, there are some p-n junctions. In case of a thickness of less than 7.5 nm, it is assumed that since the quantity of doped CuO is so small, p-n junction depth is so small that it could not extend to the bottom of the no 2 film. 0,9 Cu 2+ 0,7 0,5 r 2+ Ca 2+ Ce 4+ Zr 4+ Cd 2+ Zn 2+ Ni 2+ Cu 2+ 0,3 0,1 0,0 W 6+ Mo 6+ V 5+ n 4+ P 5+ 1,5 2,0 2,5 Electronegativity Figure 1. The sensitivity of various metal oxided-loaded no 2 element to 50 ppm at 200 o C as a function of the electronegativity (Xi) of the metal cations. 0,9 0,7 0,5 0,3 0,1 0 5 10 15 20 25 Thickness/nm Figure 2. The dependence of sensitivity on the thickness of doping layer (1 ppm H 2,180 o C).

ensors 2003, 3 113 Effects of H 2 Gas Concentration Fig.3 is a plot of the sensitivity of the element as a function of H 2 gas concentration in air at different operation temperatures. The sensor exhibits a significant increase in sensitivity upon exposure to a very low concentration of H 2 (5ppm ) in air, at around 100 ppm the sensitivity reaches a saturation value, and therefore we can infer that the active region of the element to be between 0 and 100 ppm. 150 o C 100 o C 200 o C 300 o C 0,0 0 20 40 60 80 100 Conc./ppm Figure 3. The sensitivity of the sensor element as a function of H 2 gas concentration at different operation temperature. Effects of Cuo Loadings and Operation Temperature Plots of the sensitivity to 100 ppm H 2 in air as a function of operating temperature for five different elements prepared from no 2 with 1.0, 4, 5, 6 and 10 wt.% CuO are shown in Fig.4. In order to explain the effect of CuO loadings clearly, sensitivity of an element made from pure no 2 to H 2 is also plotted at the bottom of the Figure. It is evident that to a good approximation pure no 2 is not at all or much less sensitive to H 2. Only on addition of CuO does it becomes sensitive to H 2 ; the sensitivity to H 2 (100 ppm in air ) tends to increase with increasing CuO loading up 5 wt.%. The response and recovery time of different CuO loadings for no 2 sensor are reported in Fig.5. At the same time, we also indicate the sensitivity curve clearly in the Figure. The response time defines the time taken for the sensor to reach 90% of the saturation value after contact by the test gas with the surface of the sensor, the recovery time is the time of the resistance recovery to the initial level after the removal of the test gas from the environment. We may see that, at CuO loadings of 10%, the response was too slow to attain a steady state during the test period of 80 min. The resistance of the pure no 2 element decreased very slowly from the air level on switching on the H 2 flow to reach a steady state about 40 min, after exposure to 100 ppm H 2 when the air flow was resumed, the recovery was also slow. However, the CuO (5 wt.%)/ no 2 element showed an extremely high

ensors 2003, 3 114 sensitivity to 100 ppm H 2. A prominent feature of the CuO/nO 2 element was its very fast recovery rate on turning off the H 2. As seen from the Figure, the resistance could completely recover to the initial level in 1 min, but the response time was about 7 min. The influence of CuO loadings on the sensing characteristics are generalized as follows. If the CuO loadings are too small, CuO particles cannot cover the whole no 2 surface to make a sufficient number of p-n junctions ( low H 2 sensitivity ). If the CuO loadings are too large, the conversion from CuO to Cu in the H 2 - containing atmosphere takes too long (slow response ). From the viewpoint of high H 2 sensitivity and switching-like recovery, an optimum CuO loading seems to be 5 wt.%. The Figure also shows that all the five elements have a maximum sensitivity at an operating temperature of 150 o C. 1,1 0,9 0,7 no 2 1 wt.% CuO 4 wt.% CuO 5 wt.% CuO 6 wt.% CuO 10 wt.% CuO 0,5 0,3 0,1 0,0 50 100 150 200 250 300 350 Operating temperature Figure 4. Gas sensitivity of pure and CuO-doped no 2 elements at different operating temperatures. 90 Time/min 80 70 60 50 40 30 2 3 1.0 0.8 0.6 0.4 20 0.2 10 0 1 0 0 2 4 6 8 10 wt.% CuO Figure 5. The effect of CuO loadings on response and recovery time and sensitivity. 1 recovery curve 2 response curve 3 sensitivity curve (150 o C)

ensors 2003, 3 115 The electivity of CuO/nO 2 Element The CuO (5wt.%) / no 2 element was also tested for their sensitivity to other gases such as CO, i- C 4 H 10, CH 3 H, (CH 3 ) 2, C 2 H 5 OH, H 2, etc. Fig.6 shows the sensitivity value for these gases (100%, i.e., without dilution ) together with 100 ppm H 2. It shows very clearly that even for such a high concentration of these gases, the CuO (5wt.%) / no 2 element shows very small or negligible sensitivity compared to H 2 at an operating temperature of 100 o C, except for CH 3 H. The CuO/nO 2 element was also rather sensitive to CH 3 H at 100 o C. This is probably because CuO is sulfurized: CuO + CH 3 H + 3/2O 2 Cu + CO 2 + 2H 2 O In the case of (CH 3 ) 2, to which the element was almost insensitive, however, the sulfurization does not seem to take place. uch a gas sensing mechanism is consistent with the fact that the element was almost insensitive to all the sulfure- free gases tested. These elements have been tested repeatedly and each time, they return to their original resistance of 9.5 MΩ±0.1 MΩ.These sensor elements were kept in operation continuously for 15 days and the resistance variation was monitored each day. It was found to vary from 9.5 to 9.46 MΩ. 1,1 0,9 H 2 0,7 0,5 0,3 0,1 CO i-c 4 H 8 H 2 CH 3 H C 2 H 5 OH (CH 3 ) 2 0,0-0,1 1 2 3 4 5 6 7 Gas Figure 6. Cross sensitivity of CuO/nO 2 sensor element to different gases at an operating temperature of 100 o C. CuO/nO 2 ensing Mechanism The mechanism to explain the observed excellent behavior of increase in sensitivity of the CuO/nO 2 film exposured to H 2 gas can be explained as follows. We consider that sensing reaction of hydrogen sulfide occurs only on the surface of the film and diffusion of chemical species into the inner part of the film is negligible, and p-n junction is formed only at the interface between CuO and no 2. While oxygen-deficient no 2 shows n-type conductivity by electrons, oxygen-excess CuO

ensors 2003, 3 116 shows p-type conductivity by holes. intered gas sensors are composed of a mixture of CuO and no 2, and thus, CuO is dispersed here and there in a sensor. In this case, in an oxidizing atmosphere a thick charge depletion layer is formed near the grain surface of no 2 as a p-n junction, as shown in Fig.7 (1). The electrons associated with these charged species are drawn from the conduction band of the bulk material, leading to an increase in resistance. As a result a potential barrier appears at the boundary forming a continuous chain of n-p-n-p junctions. The schematic band diagram of the typical n-p-n-p is a no 2 -CuO-nO 2 -CuO and band structure in the vicinity of the CuO/nO 2 interface can be drawn as shown in Fig. 7(2) (3). However, if the above CuO layer is exposed to H 2 or other sulfur compound gases, the CuO is converted to Cu which is a good electronic conductor in the following equations. CuO + H 2 Cu + H 2 O Figure 7. chematic diagram of CuO/nO 2 sensing mechanism. 1. no 2 particles surrounded by CuO 2. band structure for CuO-nO 2 contact 3. potential barrier diagram of n-no 2 /p-cuo/n-no 2 /p-cuo 4. potential barrier diagram of n- no 2 /metallic-cu/n-no 2 3. potential barrier appeared again This Cu is known to be metallic in nature and thus the n-p-n heterostructure as well as charge depletion layer will be destroyed and transformed to a metal-n-type semiconductor configuration. A

ensors 2003, 3 117 typical metal-n-semiconductor band picture can be drawn in Fig.7 (4). ince the work function of Cu is lower than that of no 2 the band bending is as shown. This particular situation arises because at equilibrium there is a flow of electrons from the lower work function species, i.e., Cu, to higher work function species, i.e., no 2. This results in the band bending downwards which facilitates the easy flow of electrons from Cu to no 2 and vice versa, since there is no barrier between them as shown in Fig.7 (4). This flow of electrons results in a decrease in electrical resistance. This configuration is similar to a metal-semiconductor contact for an ohmic junction where there is an unimpeded conduction of electrons in either direction. This theory explains quite convincingly the decrease in resistance on exposure of CuO/nO 2 sensor element to reducing gases like H 2 and the increase in resistance back to the original value once this H 2 atmosphere ceases to exist. This is because Cu converts back to CuO when heated in air at the operating temperature of about 200 o C and returns to its normal state, which is shown as follows, Cu + 3/2O 2 CuO + O 2 o, the potential barrier appears again, as seen in Fig.7(5). Conclusion Among various metal oxides. CuO is a unique promoter of no 2 based elements for the detection of H 2 in air. Typical features of CuO/nO 2 sensors are extremely high sensitivity to H 2, high selectivity and very rapid recovery on switching off H 2. The active range of a CuO/nO 2 sensor is between 0 and 100 ppm. The optimum thickness of the CuO layer for the CuO/nO 2 is about 7.5 nm and the optimum CuO loading seems to be 5 wt.%. The CuO (5wt.%) / no 2 sensor is extremely sensitive to H 2 at 150 o C. The CuO particles dispersed on the no 2 surface exert a strong electronic interaction with no 2, which makes the sensor element highly resistive. Exposure to H 2 converts CuO to Cu, resulting in the disruption of the electronic interaction and hence in a drastic decrease of the electrical resistance of the element. In this way, the unique H 2 sensing properties of CuO/nO 2 sensors benefit from both the chemical affinity of CuO to H 2 and the strong electronic interaction taking place only between CuO and no 2. The dispersion state of CuO particles, such as particle size and population, is very important for the H 2 sensing characteristics, as illustrated from the significant influence of CuO loadings. Acknowledge This work was financially supported by the National Natural cience Foundation of China, under project 60274061, which is gratefully acknowledged. References 1. Lantto V. and Romppainen P. J. Electrochem. oc. 1988, 135, 2550-2556. 2. Kanefusa.; Nitta M. and Haradome M. J. Electrochem. oc. 1985, 132, 1770-1773.

ensors 2003, 3 118 3. Kandfusa.; Nitta M.; Haradome M., Tech. Digest, 7 th chemical ensor ymp., aitama, Japan, ept.,1988, 25-26, 145-148. 4. Fang G.; Liu Z.; Liu C.; Yao K-L. ensors and Actuators B. 2000, 66, 46-48. 5. NakaharaT.;TakahataK.;Matsuura., Proc.ym.Chem.,ensors,Honolulu,HI,UA,Oct. 1987, 18-23, 55-64. 6. Mizei J.; Lanto V. ensors and Actuators B 1991, 4, 163-168. 7. Mizei J. ensors and Actuators B 1993, 15-16, 328-333. ample Availability: Available from the authors. 2003 by MDPI (http://www.mdpi.net). Reproductio is permitted for noncommercial purposes.