microdice System for Separation of SiC Wafer Using Thermal Laser Separation

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microdice System for Separation of SiC Wafer Using Thermal Laser Separation - System Integration Technologies Fraunhofer ENAS - (Ronny Neubert, 3D-Micromac AG)

3D-Micromac At a Glance Manufacturer and service provider for Laser micromachining systems and Production equipment for printing and coating technologies Design of complete machining systems including process development and service in-house Founded in 2002 Founded US subsidiary in 2014

1. Thermal Laser Separation (TLS-Dicing ) 2. Application examples 3. microdice system 4. Conclusion 3 15.06.2016

Thermal Laser Separation (TLS) Starting point (and optional straightness) defined by scribe TLS is a cleaving process, initiated by heat and cooling Cooling Laser Initial scribe or Continous scribe 4

TLS-Dicing Technology Cracking zone Dicing direction Tensile stress Compressive stress 5

Main Properties of TLS-Dicing Residue-free Zero kerf No chipping Nearly perfect sidewalls Works for back-side metal Works for: SiC Si (Semi & PV) GaAs / Ge *1 JFET on 4H-SiC-Wafer, thickness 160 µm with PCM (left upper rim) and back side metal, Dicing speed 200 mm/s 6

1. Thermal Laser Separation (TLS-Dicing ) 2. Application examples 3. microdice system 4. Conclusion 7 15.06.2016

TLS-Dicing for SiC Exemplary Results Special USPs for SiC: Dicing speed 200 mm/s One cleaving pass per street PCM in street acceptable (no design rules) No tool wear Perfect side wall Further USPs: Back-side metal is separated w./o. pealing Tape not damaged *2 SiC-JFET, Wafer thickness 160 µm, Die size 3.16 X 3.16 mm², Back-side metal, mounted on DCB 8

Current (ma) TLS-Dicing Electrical Parameters for SiC 20 15 *2 I-V blocking characteristics SiC JFET 1 SiC JFET 2 SiC JFET 3 SiC JFET 4 SiC JFET 5 10 *2 SiC-JFET, Wafer thickness 160 µm, Die size 3.16 X 3.16 mm², Back-side metal, mounted on DCB 5 0 0-500 -1000-1500 -2000 Voltage (V) No impact on electrical perfomance by TLS 9

TLS-Dicing Electrical Parameters for Si Project A cutting solar cell Project B Dicing of power-diodes HAZ from LEI *3 Cell Removed cell No HAZ from TLS Leakage current of diodes is significantly reduced TLS Electroluminescence measurement Damage free cutting through pn-junction is possible 10

TLS-Dicing Bending Stength *4 Comparison to ablative laser dicing 3 4x higher Resizing-ring (ø 300 to 200 mm, Si 775 µm) 11

TLS-Dicing Separation of Back Side Metal Works with back side metal (up to 10 µm) Recommended: ratio metal to bulk: < 1 : 100 No peeling! *5 Si-Wafer with back side metal 12

TLS-Dicing Optical Properties One NIR cleaving-laser for all substrates For Si / Ge / GaAs / doped SiC a NIR-laser is optimal Different dopants are acceptable Scribing process option for PCM available *6 PCM / metal JFET- on 4H-SiC 13

TLS-Dicing for Other Materials *7 *9 *8 Si-Wafer Ge Si on glass 14

1. Thermal Laser Separation (TLS-Dicing ) 2. Application examples 3. microdice system 4. Conclusion 15 15.06.2016

TLS-Dicing - Motivation SiC Dicing is a hard job (hardness 9.2 on Mohs scale) Cost High costs for saw blades Reduced uptime Quality Delamination of back side metal Defects by chipping Speed 2-10 mm/s Limited throughput 16

Our Solution microdice System for TLS-Dicing Lower cost, excellent cleaving results, and higher throughput 17

Advantages of TLS-Dicing Technology Cost reduction Minimal CoO due to contactless processing Increased yield by zero kerf Function Speed Excellent back-side metal separation Higher bending strength Dicing speed up to 300 mm/s Significant higher throughput 18

microdice System Up to 300 mm (12 ) wafer size Integrated laser sources with long lifetime Integrated patented micro stretching function Automated wafer handling SECS / GEM interface Compatible with common SEMI standards Consumables: only DI-water microdice 19

microdice - Major Components Processing unit (left side) Scribing function (by pulsed fiber laser) Cleaving function (cw laser and cooling) Alignment system Vacuum chuck Handling unit (right side) 2 x 200 mm or 1 x 300 mm cassette Fault detection Major components 20

TLS-Dicing on microdice - a Case Study for SiC Current trends for SiC-products: The market volume of SiC is growing with CAGR of 25% One saw blade can t saw one 6 inch wafer 6 inch 4 inch Transition from 4 to 6 has been started 21

Advantage I - Throughput Wafer: 150 mm SiC Back side metal 160 µm thickness 1 mm die edge length PCM in street 70 µm street with Wafer p. h. mechanical saw TLS 4,3 Parameter: Speed 200 mm/s 0,4 mechanical saw TLS 22

Advantages II Reduced Footprint Saves Cost Footprint (m²) mechanical saw TLS 32 9 mechanical saw TLS Footprint for sawing 4 pieces 150 mm SiC-Wafer p.h (9 saws vs. 1 microdice ) 23

Assumptions for Cost Calculation Considered: Throughput: 4 wafer per hour Consumables (saw blades) Invest/depreciation for tool Footprint Not considered: Benefit in terms of yield Reduced operator costs mechanical saw: 37 TLS-Dicing : 2.40 24

1. Thermal Laser Separation (TLS-Dicing ) 2. Application examples 3. microdice system 4. Conclusion 25 15.06.2016

Conclusion Minimal cost of ownership Clean process Better electrical properties High throughput Less breakage Increased yield Damage-free backside metal TLS-Dicing provides excellent cleaving results in combination with high yield and throughput. 26

TLS-Dicing - Cooperation with Fraunhofer IISB More then 8 years of successful cooperation *10 Experienced scientists Wide range of measurement tools Equipped with the latest version of TLS-Dicing tool in clean room TLS-Project partly funded by European contract 611332 SEA4KET 27

Image sources *1 Courtesy Fraunhofer Gesellschaft *2 Dohnke et. al: Comparison of different novel chip separation methods for 4H-SiC, Proceedings of ECSREAM conference, Grenoble 2014 *3 Koitzsch et. al.: Improving Electric Behavior and Simplifying Production of Si-Based Diodes by Using Thermal Laser Separation, Proceedings of ASMC2013, Saratoga Sprigs, (NY) 2013. *5 Karl Dohnke *4, 6-10 Courtesy Fraunhofer Gesellschaft 28

Thank you for your attention! 3D-Micromac AG Technologie-Campus 8 09126 Chemnitz, Germany http://3d-micromac.com Phone: +49 371 400 43 0 E-Mail: info@3d-micromac.com 29 6/15/2016