Aligned Carbon Nanofibre-Polymer Composite Membranes CNT Growth and Manipulation Eleanor Campbell Dept. of Physics, Göteborg University
Plasma CVD Growth Polymer/Nanofibre Composite Low ambient temperature growth Dielectrophoretic separation of metallic and semiconducting SWNT & its use in device fabrication (if time)
Plasma CVD Growth of Nanotubes /fibres T = 700 C Ni catalyst C 2 H 2 :NH 3 = 1:5, 4 Torr tip-grown fibres Fe catalyst C 2 H 2 :H 2 = 1:3 7 Torr base-grown MWNT Ni Fe
Growth Quality depends critically on Plasma Current Density 1.5 ma/cm 2 Array growth on Mo substrate C 2 H 2 :NH 3 = 1:5 Kabir et al., Nanotech. 16 (2005) 458 Kabir et al., Nanotech. 17 (2006) 790 10 ma/cm 2
M. Jönsson Optical spectroscopy shows the relative decrease in molecular/atomic precursors and also a clear increase in CN intensity beyond 30 ma (4.5 ma/cm 2 ) - Onset of non-catalytic deposition and increased sputtering
B. Gindre 7 6 3 ma/cm(b) 2 Length of CNFs (um) 5 4 3 2 4.5 ma/cm 2 (c) 1.5 (a) ma/cm 2 1 (d) 10 ma/cm 2 0 0 20 40 60 80 100 120 140 160 180 200 220 240 260 280 300 Time (min) Can these vertically aligned CNF be used to make an anistropically conducting polymer membrane? Diameter ca. 50 nm
Polymer CNT Composite Materials Array of individual nanotubes grown on a Mo substrate Arrays after spin-coating showing photonic-crystal effects Morjan, Gromov, Gindre
Electrical Characterisation Two probe measurements (-5;+5)V Deposition of gold electrodes by metal evaporation with a mask (0.5mm in diameter and 2mm apart) Mo &Mo layer Au PS+VACNF Substrate Au PS &Mo layer PS Au Substrate Au PS+VACNF & Mo layer Au PS+VACNF Substrate Au PS+VACNF & PS+VACNF layer Au PS+VACNF Substrate Au
Measured resistance through film without fibre i.e. Polystyrene alone (3 µm thick): 10 4 Ω With CNF: 50 Ω There are approximately 45000 nanofibres contacted for each measurement -The average resistance per fibre is ca. 200-300 kω (compares with ca. 100 kω for individual fibres with 0.5 ma current carrying capacity)
Removing the polymer from the substrate alkali base alkali base Leave for a couple of days Few GΩ along the membrane (2mm distance) Ag PS+VACNFs Ag
How to reduce the chip temperature to make good quality CNT at temperatures lower than 450 o C (CMOS compatibility)? Use very local resistive heating only where you want the nanotube(s) to grow. Mo Electrodes with narrow resistive bridge. Catalyst deposited on bridge (5nm Al 2 O 3, 1 nm Fe) 14 ma, 2V for heating Dittmer et al., Appl. Phys. A in press
Temperature simulation corresponding to conditions in the experiment
Dittmer et al., Appl. Phys. A, in press Room Temperature Growth: MWNT Atmospheric pressure 7 Torr With aligning electric field No electric field applied during growth MWNT (Fe catalyst, acetylene precursor) C 2 H 2 :H 2 :Ar = 10 sccm: 300 sccm: 500 sccm
0.7-1.8 nm diameter Raman AFM Replace acetylene with ethylene SWNT Chip at 60 o C
Growth stops when temperature falls below ca. 500 o C
Thanks to: Array Growth and Membranes: Oleg Nerushev Raluca Morjan Martin Jönsson Baptiste Gindre Andrei Gromov Shafiq Kabir Nanorelay: SangWook Lee Anders Eriksson Jari Kinaret et al (theory) Dielectrophoretic Separation: Andrei Gromov Low Temperature Growth: Staffan Dittmer Oleg Nerushev
AC Dielectrophoresis for separating metallic and semiconducting nanotubes r ε ε r 2 F ε E 2 1 1 Re( ) ε2 + 2ε1 2: nanotube 1: solvent For semiconducting SWNT F is negative, for metallic SWNT the force is positive, attracting the CNT to the electrodes. (Krupke et al) In this way metallic nanotubes can be preferentially attracted to electrodes leaving proportionately more semiconducting SWNT in dispersion. D.S. Lee, et al., Appl. Phys. A 80 (2005), 5
Nanotubes left in dispersion after deposition cycles Proportion of CNTs (%) 100 80 60 40 20 0 ref. Semiconducting Metallic 1 2 3 final (7) Raman analysis Number of Deposition Cycles D.S. Lee, et al., Appl. Phys. A 80 (2005), 5
Laminar flow no mixing of liquids Electrodes Although the interaction time is very short we get a significant increase in metallic content of lower channel on a single pass
reference sample suspension in Na-DOC, λ ex. 785nm > 50% metallic metallic fraction 6mg/L in 1% Na-DOC Raman intensity, a.u m s m s 140 160 180 200 220 240 260 280 300 320 wavenumbers, cm -1 140 160 180 200 220 240 260 280 300 320 Still problem with bundle formation
Carbon Nanotube Nanorelay Carbon nanotube Source electrode Drain electrode Gate electrode high Q oscillator, logical switch, bistable memory element, Mechanical resonance frequency in GHz range, switching speed could be faster. J. Kinaret et al. (S. Viefers), Appl. Phys. Lett. 82, 1287 (2003) L.M. Jonsson et al., J. Appl. Phys. 96, 629 (2004)
Nanorelay Fabrication (a) S SiO2 G D (e) (b) PMMA (d) (c) 10μm AC Acid free method to make suspended structure: S. W. Lee et. al Appl. Phys. A 78, 283 (2004)
S.W: Lee et al., Nano Lett. 4 (2004) 2027 3.5 3.0 Introduction of critical point drying led to 75% suspension length (nm) 2.5 2.0 1.5 1.0 0.5 0.0 0 20 40 60 80 100 thickness (nm) Axelsson et al., New J. Phys 7 (2005) 245
I source-drain vs Gate Voltage, V SD = 0.5 V 1.2 0.025 Current (μa) 1.0 0.8 0.6 0.4 0.2 0.0 Current (μa) 0.020 0.015 0.010 0.005 0.000 0.12 0 2 4 6 8 10 12 Voltage (V) 25-10 -8-6 -4-2 0 2 4 6 8 10 Voltage (V) 0.10 20 Current (μa) 0.08 0.06 0.04 0.02 Current(μA) 15 10 5 to (1) 0.00 0 0 1 2 3 4 5 6 Voltage (V) 0 5 10 15 20 25 V gate (V)