Chips Face-up Panelization Approach For Fan-out Packaging

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Chips Face-up Panelization Approach For Fan-out Packaging Oct. 15, 2015 B. Rogers, D. Sanchez, C. Bishop, C. Sandstrom, C. Scanlan, TOlson T. REV A Background on FOWLP Fan-Out Wafer Level Packaging o Chips embedded in molded panel o IOs fanned in and out over mold surface using polymer and RDL buildup layers Benefits Conventional fan-out o WLCSP-type packaging for chips with high IO count o Excellent electrical properties and performance o Smallest possible package form factor o No custom substrate required First Generation ewlb o Multi-chip and SIP applications Challenges Reliability, Yield, Cost Brunnbauer, M. et. al., Embedded Wafer Level Ball Grid Array (ewlb), Electronics Packaging Technology Conference 8 th Proceedings, Dec. 2006. October 29, 2015 2 www.cpmt.org/scv/ 1

Chips Face-up FOWLP o Front surface of die protected by mold compound o Cu studs provide current pathways o Planar surface supports high density RDL o Adaptive Patterning addresses die shift October 29, 2015 3 Benefits of Face-up Approach Challenges with exposed die in conventional structure o Mold flash o Protruding metal from chip singulation o Polymer or RDL cracking at silicon-mold transition o Silicon die has poor CTE match to PCB Conventional fan-out structure Chips Face-up FOWLP o Rugged package with encased die o No discontinuity at die edge o Improved BLR performance October 29, 2015 4 www.cpmt.org/scv/ 2

Chips Face-up Process Flow Wafer Prep Panelization Fan-out Package Finishing Cu Stud Pattern and Backgrind Singulation Die Attach to Carrier Molding Carrier Removal Panel Top Grind Polymer Coat, Pattern, Cure RDL Pattern and Polymer Coat, Pattern, Cure Panel Backgrind Backside Laminate Laser Mark, Saw, TnR Die Location Meas. UBM Pattern and Ball Drop and Reflow ` ` October 29, 2015 5 Wafer Prep Cu Studs Cu Stud Pattern and Backgrind Singulation Die Attach to Carrier Molding Carrier Removal Panel Top Grind Low cost Cu stud fabrication Dry film plating template High speed Cu plating Minimize Cu stud target height Die Location Meas. MT Cu studs on bond pads Low contact resistance Good thermal performance October 29, 2015 6 www.cpmt.org/scv/ 3

Wafer Prep Backgrind and Singulation Cu Stud Pattern and Backgrind Singulation Die Attach to Carrier Backgrind Optimize silicon thickness for panel warpage control Singulation Standard laser groove and wafer saw Molding Carrier Removal Panel Top Grind Die Location Meas. October 29, 2015 7 Panelization Die Attach Cu Stud Pattern and Backgrind Singulation Die Attach Molding Chips placed face-up on release tape & carrier Placement accuracy can affect overlay, yield Serial process -> significant costs Carrier Removal Panel Top Grind Die Location Meas. October 29, 2015 8 www.cpmt.org/scv/ 4

Panelization Die Attach Chip shooter + Adaptive Patterning High speed, high yield, low costs October 29, 2015 9 Panelization Molding Cu Stud Pattern and Backgrind Singulation Die Attach to Carrier Molding Requirements: High silica filled mold compound No surface voids or incomplete molding Good adhesion of die to release tape Carrier Removal Panel Top Grind Die Location Meas. October 29, 2015 10 www.cpmt.org/scv/ 5

Panelization Molding Placement pitch = nominal pitch (1 + comp factor) Pitch increased to account for shrinkage during molding October 29, 2015 11 Panelization Carrier Removal, Top Grind Cu Stud Pattern and Backgrind Singulation Die Attach to Carrier Carrier removal Panel top grind Reveal Cu studs and set frontside mold thickness Mold thickness tolerance = (BGT, TGT) Molding Carrier Removal Panel Top Grind Die Location Meas. October 29, 2015 12 www.cpmt.org/scv/ 6

Panelization Die Location Measurement Optical scanner used to determine position and rotation of every die on the panel Measured X, Y, and angle shifts 3mm X 3mm package on a 300mm panel Control ~ ± 20um in X and Y, ± 0.2 degrees in theta October 29, 2015 13 Adaptive Patterning Customization of design on each package to match actual die location Process Flow October 29, 2015 14 www.cpmt.org/scv/ 7

Adaptive Patterning Methods Adaptive Routing Dynamically adapts RDL routing to accurately align to true die position Adaptive Alignment Aligns the entire RDL layer to true die position within the unit October 29, 2015 15 Adaptive Routing Dynamically adapts Via1 and a portion of RDL pattern of each individual package to align to the true position of each die Via2, UBM and BGA pattern fixed with respect to package edge 1) Create a nominal fanout RDL design 2) Omit a small portion of the RDL design near the die pads (prestratum) 3) Complete the design after measuring the true position of each chip October 29, 2015 16 www.cpmt.org/scv/ 8

Effectiveness of Adaptive Routing Minimal adjustment in RDL trace lengths, typically 10 to 20µm October 29, 2015 17 Adaptive Alignment Entire RDL layer and Via1 shift to match die shift; misalignment is effectively moved to the UBM stack Via2, UBM and BGA patterns remain fixed with respect to package edge Adaptive Alignment Via2 slightly undersized; via2 and bump locations held constant Via1 and RDL patterns adapted for die shift X spacing Y spacing October 29, 2015 18 www.cpmt.org/scv/ 9

Post Mold Yield with Adaptive Alignment 3mm X 3mm package in 300mm panel ± 20um shifts in X and Y, ± 0.2 degrees in theta Adaptive Alignment enabled 99.98% overlay yield October 29, 2015 19 Dual Die Module Example Two die, 4.5 mm x 8.5 mm M-Series package 3.6 x 4.1 mm & 3.5 x 3.17mm devices Utilizes multi-mode Adaptive Patterning Adaptive alignment over each die Adaptive routing on die-to-die connections Adaptive Patterning Simulation October 29, 2015 20 www.cpmt.org/scv/ 10

Fan-out Polymer Coat, Pattern, Cure RDL Pattern and Polymer oy Coat, Pattern, Cure UBM Pattern and Conventional build-up: polymer 1, RDL, polymer 2, UBM layers + ball drop and reflow Unique Adaptive Patterning design files facilitate good overlay to chips and Cu studs Planar mold surface supports high density RDL wiring Mold layer provides good inductor performance Ball Drop and Reflow October 29, 2015 21 Package Finishing Panel Backgrind Backside Laminate Laser Mark, Saw, TnR Package finishing used to complete part Optional backside laminate for fully encased structure Backside epoxy coating Semiconductor device Fine pitch Cu stud Mold compound Planar RDL build-up Solder ball PCB Fully assembled M-Series part October 29, 2015 22 www.cpmt.org/scv/ 11

BLR on 8x8mm Full Array TV Passed BLR requirements at 8mm X 8mm body size Test Vehicle Testing Status Drop Results Cycling Results Full Array 8X8 mm 2 Completed 1500 cycles and 1000 drops No failures to 256 drops First failure at 665 cycles TC Results Deca internal TV: 8x8mm full array Testing of larger body sizes currently underway October 29, 2015 23 FOWLP Cost Challenge Conventional approach utilizes wafer fab equipment for build up layers New approach: Use of solar-based processes Solar processes applicable to FOWLP Patterned polymer Sputtered barriers and seed layers Electroplated metals Thin, warped wafer handling 6 solar wafers Solar-like wafer and panel flow line created for FOWLP processing Low capital investment High throughput: > 100 wafers or panels per hour for wafer prep and fan-out processes October 29, 2015 24 www.cpmt.org/scv/ 12

FOWLP Manufacturing Formats Currently 300mm round, with large panel in development Large Panel Future Production Initial production 300mm round Photo of demo panel June 2015 October 29, 2015 25 Summary Advantages of chips face-up approach with Adaptive Patterning: 1) Low contact resistance to Al pads 2) Low chip attach costs 3) High yields through mold and Via1 overlay 4) Tight ground rules 5) Fully protected die edge 6) Planar surface for fine pitch RDL 7) Good RF performance 8) Robust BLR Challenges: Minimizing wafer prep costs Control of grind tolerances October 29, 2015 26 www.cpmt.org/scv/ 13

Thank You www.cpmt.org/scv/ 14