SEMI Draft Document 4538 REVISION OF SEMI F GUIDE FOR METALLIC MATERIAL COMPATIBILITY IN GAS DISTRIBUTION SYSTEMS

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1 SEMI Draft Document 4538 REVISION OF SEMI F GUIDE FOR METALLIC MATERIAL COMPATIBILITY IN GAS DISTRIBUTION SYSTEMS Background Information Note: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this document. Note: Recipients of this document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, patented technology is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided. The ballot proposes to add alloy KM38 to F Guide for Metallic Material and Gas Compatibility in Gas Delivery Systems, requested by Dan Mudd. KM38 is a Japanese ferritic stainless steel similar to KM45. It has a history of successful use in some gas system components. This letter ballot will be reviewed by the Materials of Construction of Gas Delivery Systems Task Force and adjudicated by the Gases Committee at their meetings in Dallas, TX, during the week of 7 April, Note: Additions are indicated by underline and deletions are indicated by strikethrough.

2 SEMI Draft Document 4538 REVISION OF SEMI F , GUIDE FOR METALLIC MATERIAL COMPATIBILITY IN GAS DISTRIBUTION SYSTEMS 1 Purpose 1.1 The purpose of this guide is to document the industry acceptable compatibility of metallic materials with semiconductor process gases. 2 Scope 2.1 This guide is applicable to metallic materials that are exposed to process gases within the gas distribution systems of semiconductor manufacturing equipment. It is not applicable to high pressure, bulk delivery systems. 2.2 This guide is specific to High Purity and Ultra-High Purity chemical delivery systems. NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use. 3 Limitations 3.1 This guide is only applicable when the process gases have less than 1 ppm water vapor. Higher levels of water vapor in some process gases other than the inert category have been known to cause corrosion in gas delivery systems. 3.2 This guide is only applicable for temperatures less than 60 C. At temperatures above 60 C, corrosion mechanisms such as stress corrosion cracking may occur and more detailed analysis is recommended. 3.3 The compatibility is limited to the gas phase of the chemistries listed. Liquid phase compatibility is not considered in this Guide. 3.4 This guide only addresses the degradation of the metallic materials when exposed to the applicable chemistries. It does not address potential issues associated with catalytic decomposition of gases in the presence of metal alloys. For information on this subject, see the Proceedings of the Institute of Environmental Sciences 1. 4 Referenced Standards and Documents 4.1 SEMI Standards SEMI E52 Practice for Referencing Gas and Gas Mixtures Used in Digital Mass Flow Controllers SEMI F19 Specification for the Surface Condition of the Wetted Surfaces of Stainless Steel Components SEMI F20 Specification for 316L Stainless Steel Bar, Forgings, Extruded Shapes, Plate, and Tubing for Components Used in General Purpose, High Purity and Ultra-High Purity Semiconductor Manufacturing Applications 4.2 ASTM Standard 2 ASTM F2063 Standard Specification for Wrought Nickel-Titanium Shape Memory Alloys for Medical Devices and Surgical Implants 1 Yasuyauki Shirai, Seok-kui Lee, Shinji Miyoshi, and Tadahiro Ohmi, The Evaluation of Thermal Decomposition Characteristics of Active Specialty Gases on Various Metal Surfaces using FTIR Method, Proceedings of the Institute of Environmental Sciences, American Society for Testing and Materials, 100 Barr Harbor Drive, West Conshohocken, Pennsylvania , USA. Telephone: ; Fax: ; Page 1 Doc SEMI

3 4.3 SAE International 3 HS-1086 Metals and Alloys in the Unified Numbering System NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions. 5 Terminology 5.1 Abbreviations and Acronyms UNS Unified Numbering System ppm parts per million by volume 5.2 Definitions halides binary compounds, one part of which is a halogen atom and the other part is an element or a radical that is less electronegative than the halogen halogenated hydrocarbons hydrocarbons with one or more hydrogen atoms substituted by halogen atoms halogens elements in Group 17 (Old style VIIA) of the periodic table, namely, Fluorine, Chlorine, Bromine and Iodine hydrocarbons gases with a chemical structure consisting of only carbon and hydrogen elements. These gases have a carbon backbone and have hydrogen atoms attached to this backbone hydrides compounds of hydrogen with a more electropositive element inerts gases that are not reactive under normal conditions oxides compounds of oxygen with other elements. 6 Metallic Material Compatibility 6.1 Baseline Material The Ultra High Purity grade material described in SEMI F20 when combined with the Ultra High Purity grade conditioning of the surfaces as described in SEMI F19 is assumed to be compatible with all process gases used in chemical delivery systems for semiconductor manufacturing equipment (within the limitations described in 3). 6.2 Alternate Materials Alternate materials other than the Ultra High Purity grade material described by SEMI F19 and SEMI F20 may be allowed in chemical delivery systems. The materials considered by this Guide are described in Table 1. UNS numbers are used (where possible) to identify the chemical composition and unless otherwise noted, all commercial alloys that comply with the applicable UNS/ASTM specification are considered equivalent. If listed as compatible (see Table 3), these alternative materials are considered to be at least as resistant to reaction as the Ultra High Purity grade material defined in SEMI F19/SEMI F20. Table 1 Alternative Metallic Materials Metal Alloy S31603 UHP S31603 HP S31603 GP S31603 S31600 N06625 N06600 Alloy Class (SEMI F19/SEMI F20 Ultra High Purity Grade) (SEMI F19/SEMI F20 High Purity Grade) (SEMI F19/SEMI F20 General Purpose Grade) 3 SAE International, 400 Commonwealth Drive, Warrendale, PA USA. Telephone: ; Fax: ; Page 2 Doc SEMI

4 Metal Alloy N07750 N08825 R30003 R30004 N06022 N10276 Spron 100 Spron 510 N02200 S31703 S31726 S32100 S31254 N08367 N08020 S32205 S32750 N07718 S31277 S30200 S30400 N04400 ASTM F2063 KM38 KM45 Alloy Class Cobalt Based Alloy Cobalt Based Alloy Cobalt Based Alloy Cobalt Based Alloy Non-Ferrous Alloy Super Super Super Duplex Stainless Steel Super Duplex Stainless Steel Super Non-Ferrous Alloy Shape Memory Alloy Ferritic Stainless Steel Ferritic Stainless Steel NOTE 1: The UNS number is derived from the SAE International/ASTM book Metals and Alloys in the Unified Numbering System. NOTE 2: The Spron materials do not have UNS numbers. For detailed information of the chemical composition of these alloys, contact Seiko Instruments Incorporated. NOTE 3: The KM38 and KM45 materials does not have a UNS number. For detailed information of the chemical composition of theseis alloys, contact Tohoku Steel Company Ltd. 6.3 Process Gases The process gases were derived from SEMI E52. The categorization is based on expected reaction mechanisms and is not related to safety classifications. Table 2 Applicable Process Gases by Category Inerts Category Gases Formula SEMI Gas Code Nitrogen N 2 13 Argon Ar 4 Xenon Xe 6 Helium He 1 Page 3 Doc SEMI

5 Category Gases Formula SEMI Gas Code Hydrocarbons/Halogenated Hydrocarbons Hydrocarbons/Halogenated Hydrocarbons Methane CH 4 28 Ethane C 2 H 6 54 Dichloromethane CH 2 CI Difluoromethane CH 2 F Methyl Fluoride CH 3 F 33 Dichlorodifluoromethane CCI 2 F 2 84 Carbon Tetrachloride CCI Carbon Tetrafluoride CF 4 63 Hexafluoroethane C 2 F Trichlorofluoromethane CCI 3 F 91 Trichlorotrifluoroethane C 2 CI 3 F Trichloromethane CHCI 3 71 Trifluoromethane CHF 3 49 Hexafluoro-2-butyne C 4 F Hexafluorobutadiene-1,3 C 4 F Octafluorocyclobutane C 4 F Octafluorocyclopentene C 5 F Halogens/Halides Chlorine CI 2 19 Bromine Br 2 21 Fluorine F 2 18 Hydrogen Bromide HBr 10 Hydrogen Chloride HCI 11 Hydrogen Fluoride HF 12 Tungsten Hexafluoride WF Boron Trichloride BCI 3 70 Boron Trifluoride BF 3 48 Chlorine Trifluoride CIF 3 77 Sulfur Hexafluoride SF Dichlorosilane SiH 2 CI 2 67 Trichlorosilane SiHCI Silicon Tetrafluoride SiF 4 88 Silicon Tetrachloride SiCI Phosphorus Trifluoride PF 3 62 Nitrogen Trifluoride NF 3 53 Hydrogen H 2 7 Hydrogen Sulfide H 2 S 22 Hydrogen Selenide H 2 SE 23 Arsine AsH 3 35 Ammonia NH 3 29 Germane GeH 4 43 Page 4 Doc SEMI

6 Halogens/Hydrides Oxygen/Oxides Category Gases Formula SEMI Gas Code Phosphine PH 3 31 Diborane B 2 H 6 58 Pentaborane B 5 H Silane SiH 4 39 Disilane Si 2 H 6 97 Trimethylsilane (CH 3 ) 3 SiH 190 Methylsilane CH 3 SiH Oxygen O 2 15 Ozone O 3 30 Carbon Monoxide CO 9 Carbon Dioxide CO 2 25 Nitric Oxide NO 16 Nitrogen Dioxide NO 2 26 Nitrous Oxide N 2 O 27 Sulfur Dioxide SO Compatibility Matrix The metallic materials and their compatibilities are detailed in the Compatibility Matrix (see Table 3). Table 3 Compatibility Matrix Metal Alloys Inerts Hydrocarbons & Halogenated Hydrocarbons Halogens & Halides Hydrogen & Hydrides Oxygen & Oxides S31603 UHP S31603 HP + + X + + S31603 GP + + X + + S X + + S X + + N N X + + N X + + N R R N N Spron Spron N #3 S S S X + + Page 5 Doc SEMI

7 Metal Alloys Inerts Hydrocarbons & Halogenated Hydrocarbons Halogens & Halides Hydrogen & Hydrides Oxygen & Oxides S N N S S N S S X + + S X + + N X X X ASTM F KM X + + KM X + + #1 "+" represents compatible #2 "X" represents less compatible than SEMI F19/SEMI F20 Ultra High Purity Grade material #3 Although Nickel 200 is compatible with most oxides, it can react with carbon monoxide to produce nickel carbonyls. Due to this potential reaction mechanism, Nickel 200 is not recommended for use in carbon monoxide applications. Other high nickel alloys in this table that contain chromium do not have this same problem due to protective layer of chromium oxide. NOTE 4: Combinations of compatible gases are also considered compatible. Any combination of gases that contains an incompatible gas is considered incompatible. NOTE 5: Limitations may exist for gases not in the defined gas list (see Table 2). For metallic materials not included in Table 1 or process chemistries not included in Table 2, users must make independent assessments. Page 6 Doc SEMI

8 RELATED INFORMATION 1 Common and/or Example Designations and Typical Applications NOTICE: This related information is not an official part of SEMI F105 and was derived from input from available literature. This related information was approved for publication by full letter ballot on September 5, R1-1 Common and/or Example Designations and Typical Applications R1-1.1 Information in Table R1-1 is provided as reference material only. Common and/or Example Designations are provided for ease of use only. All commercial alloys that comply with the applicable UNS/ASTM specification are considered equivalent. Table R1-1 Common and/or Example Designations and Typical Applications Metal Alloy Common and/or Example Designations Typical Application S31603 UHP SEMI F19/SEMI F20 Ultra High Purity Grade Valve bodies, tubing, fittings, seals S31603 HP SEMI F19/SEMI F20 High Purity Grade Tubing, fittings S31603 GP SEMI F19/SEMI F20 General Purpose Grade Tubing, fittings S L Stainless Steel Filter media S Stainless Steel Springs N06625 Inconel 625 Valve bodies, tubing, fittings N06600 Inconel 600 Valve, regulator, and transducer diaphragms N07750 Inconel X750 Valve, regulator, and transducer diaphragms N08825 Incoloy 825 Bellows R30003 Elgiloy Valve, regulator, and transducer diaphragms R30004 Havar Valve, regulator, and transducer diaphragms N06022 Hastelloy C22 Valve bodies, tubing, fittings, diaphragms N10276 Hastelloy C276 Valve bodies, tubing, fittings Spron 100 Spron 100 Valve, regulator, and transducer diaphragms Spron 510 Spron 510 Valve, regulator, and transducer diaphragms N02200 Nickel 200 Filter media, face seal gaskets S L Stainless Steel Valve bodies, tubing, fittings S LN Stainless Steel Valve bodies, tubing, fittings S Stainless Steel Bellows S SMO Valve bodies, tubing, fittings N08367 AL-6XN Valve bodies, tubing, fittings N Cb3 Valve bodies, tubing, fittings S32205 Duplex Stainless Steel Valve bodies, tubing, fittings S32750 Super Duplex Stainless Steel Valve bodies, tubing, fittings N07718 Inconel 718 Valve, regulator, and transducer diaphragms S31277 Incoloy 27-7MO Solenoid valve housing and seat S Stainless Steel Springs S Stainless Steel Springs N04400 Monel 400 Seals ASTM F2063 Shape Memory Alloy Seals KM38 KM38 Valve stems KM45 KM45 Valve stems Page 7 Doc SEMI

9 NOTICE: SEMI makes no warranties or representations as to the suitability of the standard(s) set forth herein for any particular application. The determination of the suitability of the standard(s) is solely the responsibility of the user. Users are cautioned to refer to manufacturer s instructions, product labels, product data sheets, and other relevant literature respecting any materials or equipment mentioned herein. These standards are subject to change without notice. By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and the risk of infringement of such rights are entirely their own responsibility. Page 8 Doc SEMI

Background Statement for SEMI Draft Document 4651 REVISION OF SEMI F GUIDELINES FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING

Background Statement for SEMI Draft Document 4651 REVISION OF SEMI F63-0701 GUIDELINES FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING Note: This background statement is not part of the balloted item.