Creating Greater Capacity on Smaller Spaces. Nanofabrication and Its Impact on Sensor Manufacturing

Transcription

1 Creating Greater Capacity on Smaller Spaces Nanofabrication and Its Impact on Sensor Manufacturing

2 The context of Smart City and IoT

3 Artifical Intelligence drivning the need for new smart devices PC Era Mobile Era AI Era Encompasses: Internet of Things Autonumos Vechicles Big Data Cloud AR/VR

4 How does Smart City developments affect capital equipment industry? Social media and Others 2 M GB/day Smart Airplanes 4 M GB/day Public Safety Systems 50 M GB/day Smart Vehicles 40 M GB/day Smart Factories 50 M GB/day Smart Buildings 55 M GB/day Explosion of data generation A smart city of 1 million people will generate 200 million GB of data per day by Majority of data will be generated by new categories of smart devices.

5 How does Smart City developments affect capital equipment industry? Key drivers generating need for new capabilities from capital equipment industry Exponential data growth Cloud analytics Wearable devices Network communications Automotive AI Industry IoT

6 How does Smart City developments affect capital equipment industry? What are the consequences of the new device needs? Historically most new process generations have been developed by using same materials but reduced size now material development has to be integrated into the development programs. Development cycles increase in time more difficult to predict development time and thereby time-to-market. Interdisciplinary approach will be required to a larger extent as well as borrow fabrication technologies and approach from other areas within the electronics industry.

7 Obducat s position in the Smart Devices value chain Smart Module Embedded chips Modules Wireless components Senors/cameras Communication device Substrate and materials suppliers Lithography processing unit Metallization processing unit Chemical Mechanical Polishing Inspection and QA Final component assembly These processes are repeated many times depending on number of layers in the component Substrate cleaning and preparation Resist application Patterning process Develop Etch Lift off Obducat processes Wet processing equipment Coating equipment; Spin, spray, slit, inkjet etc Lithography equipment; NIL Wet processing equipment

8 Obducat Group Overview

9 History 2016 Launch of EITRE Large Area 2015 Acquisition of solar-semi Gmbh 2014 Launched and sold SINDRE 400 Gen2 system with UV based process 2013 Launched UV based NIL process for mass-production 2013 Sold the first SINDRE production system for BIO applications to Kimberly-Clark 2009 Sold NIL system to Toshiba 2008 Sold NIL system to Sony 2008 Sold the first SINDRE 400 fully automated system for LED production 2006 Breakthrough order for NIL production system, LG and Samsung launches products with Obducat Inside 2005 IPS and STU introduced on the market 2004 Completed the development of process concept for mass-production 2002 First Asian orders for NIL and first NIL into Semiconductor area 2000 The first NIL system is sold 1999 Soft Press Key Imprint technology is Patented by Obducat 1996 Development of Nano Imprint begins together with LTH 1989 Company is founded, aiming at replacing LBR mastering technology with EBR

10 Obducat Overview The company Obducat is the leading company in the lithography processing and nano imprint lithography ( NIL ) field Obducat has established a world leading position in the market of lithography with an installation base far exceeding any competitor within NIL More than 450 customer installations world-wide More than 200 patent applications of which 168 granted patents Organization of 55 employees Facility space of 1800m2 including 150m2 Class 10/100 cleanroom Publicly listed on Nordic Growth Market stock exchange in Sweden with approx shareholders ( Business model Obducat s business concept is to develop and supply NIL and lithography processing solutions for production and replication of advanced micro- and nano structures for mass production as well as for R&D purposes. The company s revenues sources encompass Equipment, Consumables, Stampers, Services (Maintenance, Process optimization). The company focuses on offering the most competitive Cost of Ownership Key customers / Partners Toshiba Kimberly-Clark LG Hamamatsu Photonics Sony ST Microelectronics NASA NEC Sumitomo Infineon First sensor Flir And others world leading companies under NDA

11 Obducat Overview Obducat Europe GmbH - Sales - R&D - Manufacturing - Administration Obducat AB - Sales - R&D - Manufacturing - Administration Obducat Japan (in collaboration with APPEX Corp) Obducat sales UK Obducat China (in collaboration with Business Sweden ) Obducat Asia Ltd Obducat North America Inc Obducat sales France Distributor Israel AVBA Distributor Indien Edgetech Distributor Singapore, Malyasia and Thailand LMS Technologies Distributor S. Korea Tricomtek General presentation, Obducat 2017 CONFIDENTIAL

12 Obducat NIL technology

13 How does Obducat NIL work? All our NIL systems are based on the patented Soft Press Technology. Air Pressure parallelism thin and uniform residual layer! Independent of stamp & substrate thickness variations, bow or waviness Any resist thickness High Imprint depth uniformity Homogenous pressure distribution Possible to print on curved surfaces! Always full area imprint in one shot!

14 Obducat Group Product Portfolio

15 Product overview Nano Imprint Equipment Utilizing the proprietary technology developed in-house and the knowledge gained from application development projects the last 20 years, Obducat can offer the most comprehensive range of lithography solutions and application support for Nano and Micro patterning in the market. EITRE-Line SINDRE-Line EITRE-Line Large Substrates Consumables Manual R&D tools Stand-alone Nanoimprinters - Eitre 3 - Eitre 6 - Eitre 8 (8 x 8 ) Fully automated systems Production systems with throughput ~60wph (LED) and cassette handling - Imprint size 4 8 wafers - Other sizes and applications upon request including > Display Sizes Gen 5 Semiautomatic systems NIL tool for Display standard sizes up to Gen 2. Suitable for both Thermal, UV and STU processes. Semiautomatic imprint process up to GEN 2 size Master stamps Silicon, Quartz & Nickel IPS and STU materials Polymer and resist materials with various characteristics that can be tailored for specific applications

16 Product overview Coating and wet-processing Obducat also offer a wide range of fully automatic and semiautomatic wet processing equipment solutions. Priming Spin coating (open bowl or RccT) Spray coating Baking Developing Applications Etching Cleaning Post CMP cleaning Lift-off Stripping EL-Line (easyline) QS-Line (quickstep) QS-Line (quickstep) Large Substrates MC-Line (microcluster) Manual lab spinner module up to Ø8 (Ø200 mm) Bench mounted & stand-alone spin-coater, spray-coater, developer, wet-process spinner, hot-, cool & HMDSplates for low volume production up to Ø12 (Ø300 mm) Semiautomatic systems Stand-alone spin-coater, spray-coater, developer, wet-process spinner, hot-, cool & HMDS-plates manual or full automatic robotic system up to GEN 5 size Fully automatic production systems Consisting of platforms with robot handling and all lithography processes from coating, baking to development and cleaning application

17 Obducat Overview Application Areas

18 Obducat Overview Application Areas LED Life science Display Components Micro/Nano Fluidics 50 nm Half-Pitch Aluminum Pattern Etched micro-pss substrate made with SINDRE 400 Micro needle array with nano textured surface and cantilever for ultra low masses. Nano Wire Grid Polarizer for micro display and optical communication components. 100 nm fluidic device for DNAanalysis. High Density Interconnects MEMS/NEMS Devices Optical Components 3-dimensional optical lens structures for application in optical sensors, CMOS etc. 3D via imprinted using IPS -STU process. The versatile NIMBLe NEMS device consisting of fingers electrically coupled in pairs.

19 Optical Applications

20 Optical components Applications Patterning of lenses for images sensors Manufacturing of DFB lasers Reflective and diffractive patterns Photonic devices Plasmonic devices Light guides Sony nano AR produced with Obducat NILtechnology Pseudo-Mangin Mirror seeker for MBDA Missile systems UK

21 Life science applications

22 Life Science Application Nanostructured TDD Problems with regards to maintaining the efficiency level of delivered drug and avoidance of foreign body and immune response can be inhibited by mimicking the cell structure (biomimetics). Obducat supplied the pilot production line to Kimberly-Clark for manufacturing of the drug delivery devices in Q

23 Display Application

24 Displays The LCD infrastructure allows for scale up to large substrate manufacturing enabelling cost reduction Three areas where NIL can create improvements Polarizer Color filters TFTs The benefits are; Improved image quality Improved light transmission Lower power consumption Extended battery lifetime Reduced costs Thinner displays

25 How can Sensor Manufacturing benefit from nanofabrication methods

26 How can sensor manufacturing benefit from nanofabrication methods? Component size reduction Manufacturing cost reduction Ultra low power consumption communication devices need to be shrunk to reduce power consumption Super hydrophobicity surfaces for sensors low cost nanostructuring to improve sensor functionality and reliability Some applications requires the use of e.g. coating by use of shadow mask for selective deposition as alternative to inkjet need for nano level means nano masks which can be produced cost effectively by NIL Selective area coating and nano patterning substrate surface ununiformity no problem for NIL compared to traditional litho where focus depth will limit Large substrate processing capabilities enable switch from semi production infrastructure to LCD infrastructure but at the same time maintain possibility for sub-micron resolution

27 How can sensor manufacturing benefit from nanofabrication methods? Currently new developments ongoing to include climate controlled substrate chambers to enable the processing of novel materials Substrate bow from pre-processing NIL conformity eliminates limitations from this problem Extreme high frequency applications need for 3D patterning for antenna fabrication and integration into small devices Patterning of lenses for better optical performance Local power generation PZT with low defectivity Possibility of reduction of solar-cell size and thickness without loosing to much performance through the use of low cost nanofabriction enables integration into smart devices and sensors

28 Thank You for Your attention Patrik Lundström Obducat AB (publ)