Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD

Save this PDF as:
 WORD  PNG  TXT  JPG

Size: px
Start display at page:

Download "Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD"

Transcription

1 AIMCAL 2005 Myrtle Beach, SC, USA, October 19th, 2005 Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD E. Reinhold, C. Steuer VON ARDENNE Anlagentechnik GmbH, Dresden, Germany C. Metzner, B. Scheffel Fraunhofer Institut Elektronenstrahl- und Plasmatechnik, Dresden, Germany

2 Plasma Activated EB-PVD of Titanium and its Compounds by Means of Large Area SAD Outline 1 Introduction 2 Description of Experiments 3 Coating Results 4 Results of Process Enlargement 5 Conclusions and Outlook The joint project of VON ARDENNE and FEP concerning the development of large area plasma activation of EB-PVD has been sponsored by the Department of Economy and Labour of Saxony. 2

3 Introduction Industrial applications of EB-PVD of metal strip: Steel strip: Corrosion protection (stacks of metals and oxides) Preparation for soldering (copper coatings) Catalytic properties (aluminum, titanium oxide) High resistance / low resistance (silicon dioxide / metals) Al strip: Enhanced reflectance (metals + low / high index layer pairs) Solar absorption (metal / metal oxide gradient layers, AR layers) Cu strip: Solar absorption (metal / metal oxide gradient layers, AR layers) High conductivity (metals, noble metals) Plastic web: Metallization of web (capacitors, barrier coatings) Inorganic oxide coatings (transparent barrier) Optical coatings on web (reflective, antireflective, holographic) Partial substitution of glass substrates (solar cells...) Applications of web and thin metal foils come close to each other. Industrial profitable PVD of flexible substrates requires high rates. 3

4 Introduction 4

5 Introduction 5

6 Introduction Possibilities of improvement of layer properties: Ion assisted reactive EB-PVD: Combination of an ion source and EB evaporation Enhancement of the reactivity of the process gas leads to stoichiometry stabilization of evaporated compounds as oxides. Plasma activated (reactive) EB-PVD: Combination of a plasma generating equipment and EB evaporation Enhancement of the reactivity of the evaporated material leads to stoichiometrical compounds, improved density, hardness,... Spotless arc activated deposition (SAD): An additional crucible-near anode is installed. Crucible is the cathode. A diffuse arc is ignited between the anode and the hottest zones on the evaporant. 6

7 Introduction Principle arrangement of the SAD equipment Crucible (cathode) 4 EB gun 2 Anode 5 Metal strip 3 Gas manifold 6 Plasma cloud 7

8 Introduction Advantages and limitations of SAD: + High plasma densities with 60% ionisation degree can be achieved. + The additional equipment in the process-surrounding of the EB evaporator is less expensive than other plasma generation tools. + The position of the arc on the evaporant coincides with the location of the electron beam generated vapor source. Therefore the activated vapor distribution may be similar to the initial EB vapor distribution. - Only some refractory metals allow the ignition of a diffuse arc on the evaporant. Examples: Mo, Zr, Ta, W, Ti. Questions regarding coating of titanium and its compounds: Which coating rates can be achieved today using SAD in case of titanium and its compounds titanium dioxide and titanium nitride? Which layer properties can be achieved by means of SAD? Is it possible to extend the SAD process to large area dimensions? 8

9 Description of Experiments Stage 1: Free span metal strip coating Technical data of the lab coater MAXI: Max. strip width: 280 mm Max. strip thickness: 500 µm Max. substrate speed: 60 m/min 1 Unwinder 2 Heating 3 Sputter etching 4 EB gun 5 Crucible (cathode) 6 Anode 7 Gas manifold 8 Measurement devices 9 Upwinder 9

10 Description of Experiments Stage 1: Free span steel strip coating Feature Titanium Titanium oxide Titanium nitride Crucible Cooled copper Cooled copper Cooled copper Evaporant Titanium Titanium Titanium EB acc. voltage 40 kv 40 kv 40 kv EB power 60 kw 27 kw 17 kw Process gas / Oxygen Nitrogen Gas flow / sccm 2000 sccm Proc. pressure 2 x 10e-5 mbar 2.3 x 10e-3 mbar 2 x10e-3 mbar Arc current 200 A A 100 A Bias voltage / 130 V pulsed DC 100 V pulsed DC Measurements: Layer thickness: GDEOS, Ellipsometry Optical constants: Ellipsometry Hardness: Nanoindentation 10

11 Description of Experiments Stage 2: Metal foil coating on a cooling drum Winding system 2 IR heater 3 Glow discharge 4 Sputtering 5 EB gun 6 Cooling drum 7 Crucible system (cathode) 8 Anode 9 Gas manifold 11

12 Description of Experiments Stage 2: Metal foil coating on a cooling drum Process enlargement: - Doubling of the substrate width - Doubling of the coating distance - Coating of thin stainless steel foils EB-figure: Double source: Jumping beam; Two filled ellipses Distance 600 mm Technical data of FOBA 600: Substrate width 600 mm Substrate thickness µm Max. speed 1000 m/min Movable cooled copper crucible Temperature cooling drum: -20 C 12

13 Description of Experiments Stage 2: Metal foil coating on a cooling drum Feature Crucible Evaporant EB acc. voltage EB power Process gas Gas flow Proc. pressure Arc current Bias voltage Measurements: Titanium Titanium oxide Titanium nitride Cooled copper Cooled copper Cooled copper Titanium Titanium Titanium 60 kv 60 kv 60 kv 100 kw 52 kw 44 kw / Oxygen Nitrogen / 8000 sccm 4000 sccm < 1 x 10e-4 mbar 2 x 10e-3 mbar 2 x 10e-3 mbar 1000 A 800 A 600 A / 120 V pulsed DC 120 V pulsed DC Layer thickness: GDEOS, ellipsometry Optical constants: Spectral ellipsometry 13

14 Coating Results Stage 1: Free span metal strip coating Feature Titanium Titanium oxide Titanium nitride Coating rate 400 nm/s nm/s 30 nm/s Dyn. dep. rate 5500 nm x m/min nm x m/min 420 nm x m/min Appearance metallic brilliant transparent golden Optical constants n(550nm) = k(550nm) 0.01 Hardness Process stability: 2h (limitation by crucible) Dense plasma on the evaporant 7 10 GPa Diffuse arc is steered by the hottest zone on the titanium melt (electron beam impingement) 30 GPa 14

15 Coating Results Stage 1: Free span metal strip coating Refractive index at various coating rates depends on: Reactive gas inlet Substrate temperature Arc parameters Bias voltage Titanium dioxide refractive index at various SAD rates 15

16 Results of Process Enlargement Stage 2: Metal foil coating on a cooling drum a) EB-evaporation without SAD b) Start of SAD: diffuse arc ignition c) High density plasma of the SAD process Double source distribution: Distance of two EB heated zones up to 600 mm Diffuse arc is split and steered by both overheated regions One anode for two sources Large area SAD by superposition of two plasma generation zones 16

17 Results of Process Enlargement Stage 2: Results of metal foil coating on a cooling drum Feature Coating rate Dyn. dep. rate Appearance Optical constants Hardness Titanium oxide 50 nm/s 600 nm x m/min transparent n(550nm) = 2.3 k(550nm) 0.01 Titanium nitride 36 nm/s 430 nm x m/min golden 33 GPa Double source reactive SAD allows long term stable and homogeneous deposition of extended substrates with coatings from titanium compounds. Crucible movement lead to an increased process duration of 8h. High rates can be achieved in spite of reduced vapor utilization (increased coating distance). 17

18 Results of Process Enlargement Stage 2: Metal foil coating on a cooling drum Layer thickness s(nm) Position across the substrate x(mm) Average layer thickness distribution of the titanium dioxide coating 18

19 Conclusions and Outlook Titanium and its compounds can be coated by means of (reactive) SAD at high and stable rates. The dynamic deposition rate of titanium dioxide amounts to approximately 1000 nm x m/min. Comparison 1: The same rate can be achieved with more than 20 dual cylindrical magnetrons. This means that the equipment costs of SAD compared with sputtering solutions are considerably lower. There is the possibility of substitution of expensive titanium suboxides as evaporant by low cost titanium. Comparison 2: The price of Ti 3 O 5 is about 140 USD/kg. Compared with this the price of titanium is only about 5 USD/kg. This means that the coating costs can be reduced drastically in the case of reactive SAD. The experiments have displayed that the SAD process can be extended to a large area technology. There are no limitations regarding substrate widths. The way into several industrial applications is opened now. 19

20 Conclusions and Outlook Coatings from titanium and its compounds on various substrates and their applications: Coating Titanium Titanium oxide Substrate Stainless steel Aluminum Aluminum Stainless steel, ceramics Application Catalysts Roof elements Enhanced reflectors Photocatalytic applications Titanium oxynitride Titanium nitride Copper Steel, others Solar absorbers Decorative coatings Fuel cells SAD can be expected in these industrial application fields! 20

21 Thank you for your kind attention! 21

22 BACK TO LIST

Roll-to-roll Technology for Transparent High Barrier Films

Roll-to-roll Technology for Transparent High Barrier Films Roll-to-roll Technology for Transparent High Barrier Films Presented at the AIMCAL Fall Technical Conference, October 19-22, 2008, Myrtle Beach, SC, USA Nicolas Schiller, John Fahlteich, Matthias Fahland,

More information

Transactions on Engineering Sciences vol 2, 1993 WIT Press, ISSN

Transactions on Engineering Sciences vol 2, 1993 WIT Press,  ISSN A study of thin-film continuous coating process by vapour deposition P. Gimondo," F. Arezzo,* B. Grifoni,* G. Jasch& "Centra Sviluppo Materiali SpA, Via di Castel & Von Ardenne Anlagentchnik GmbH, Plattleite

More information

Applied Research for Vacuum Web Coating: What is Coming Next?

Applied Research for Vacuum Web Coating: What is Coming Next? Applied Research for Vacuum Web Coating: What is Coming Next? Matthias Fahland, John Fahlteich, Steffen Günther, Manuela Junghähnel, Claus Luber, Nicolas Schiller, Cindy Steiner, Steffen Straach, Michiel

More information

High Rate low pressure PECVD for barrier and optical coatings

High Rate low pressure PECVD for barrier and optical coatings High Rate low pressure PECVD for barrier and optical coatings, Matthias Fahland, John Fahlteich, Björn Meyer, Steffen Straach, Nicolas Schiller Outline Introduction PECVD New developments magpecvd arcpecv

More information

AC Reactive Sputtering with Inverted Cylindrical Magnetrons

AC Reactive Sputtering with Inverted Cylindrical Magnetrons AC Reactive Sputtering with Inverted Cylindrical Magnetrons D.A. Glocker, Isoflux Incorporated, Rush, NY; and V.W. Lindberg and A.R. Woodard, Rochester Institute of Technology, Rochester, NY Key Words:

More information

Vacuum Equipment for TCO and AR Coatings Deposition by Reactive Magnetron Sputtering

Vacuum Equipment for TCO and AR Coatings Deposition by Reactive Magnetron Sputtering Vacuum Equipment for TCO and AR Coatings Deposition by Reactive Magnetron Sputtering E. Yadin; V. Kozlov; E. Machevskis, Sidrabe, Inc., 17 Krustpils str.,riga, LV1073, Latvia. Tel: +371 7249806, Fax: +371

More information

From Vacuum to Atmosphere and back an in-house Process Chain for Different Products

From Vacuum to Atmosphere and back an in-house Process Chain for Different Products From Vacuum to Atmosphere and back an in-house Process Chain for Different Products Dr. Steffen Günther Vacuum coating low pressure 10-1 10-4 Pa (10-3 10-6 mbar) unhindered particle movement no unintended

More information

ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING?

ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING? ITO SPUTTER COATED FILMS FOR TOUCH PANEL APPLICATIONS USING ROTARY SINTERED CERAMIC ITO TARGETS: WHAT CAN BE LEARNED FROM GLASS COATING? Paul Lippens AIMCAL Web coating conference 2012 Outline Introduction

More information

1 Introduction. 2 Basic Technology

1 Introduction. 2 Basic Technology Innovative Clear Barrier Technology for the Packaging Industry Nicolas Schiller 1, Steffen Straach, Steffen Günther Fraunhofer FEP, Germany Alexandra L. Quiceno G., Antonio García Contreras BIOFILM, Columbia

More information

Advanced Sheet-to-Sheet and Roll-to-Roll thin-film processing on ultra-thin flexible glass for flexible electronic devices

Advanced Sheet-to-Sheet and Roll-to-Roll thin-film processing on ultra-thin flexible glass for flexible electronic devices Advanced Sheet-to-Sheet and Roll-to-Roll thin-film processing on ultra-thin flexible glass for flexible electronic devices M. Junghaehnel 1, J. Westphalen 1, F. Naumann 2, G. Lorenz 2, M. Fahland 1, S.

More information

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Can deposit any material on any substrate (in principal) Start with pumping down to high vacuum ~10-7 torr Removes residual gases eg oxygen from

More information

Thermal Evaporation. Theory

Thermal Evaporation. Theory Thermal Evaporation Theory 1. Introduction Procedures for depositing films are a very important set of processes since all of the layers above the surface of the wafer must be deposited. We can classify

More information

Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating

Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating Dr Tony Williams Gencoa Ltd, UK Victor Bellido-Gonzalez, Dr Dermot Monaghan, Dr Joseph Brindley, Robert Brown SVC 2016,

More information

Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications

Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications AIMCAL 2016 Cindy Steiner John Fahlteich Dresden, 01.06.2016 page 1 Ethylene Tetrafluoroethylene (ETFE) semi-crystalline

More information

Productivity versus Profitability in Vacuum Web Coating

Productivity versus Profitability in Vacuum Web Coating Productivity versus Profitability in Vacuum Web Coating Liz Josephson, Applied Films Corp., Longmont, USA Dirk Hoffmann, Applied Films GmbH & Co KG, Alzenau, Germany Gerard Loebig, Applied Films GmbH &

More information

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material

Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material Thin Films: Sputtering Systems (Jaeger Ch 6 & Ruska Ch 7,) Sputtering: gas plasma transfers atoms from target to substrate Can deposit any material on any substrate (in principal) Start with pumping down

More information

Optical Coatings. Photonics 4 Luxury Coatings , Genève. Dr. Andreas Bächli Head of Optical Coatings at RhySearch, Buchs (SG)

Optical Coatings. Photonics 4 Luxury Coatings , Genève. Dr. Andreas Bächli Head of Optical Coatings at RhySearch, Buchs (SG) Optical Coatings Photonics 4 Luxury Coatings 21.06.2017, Genève Dr. Andreas Bächli Head of Optical Coatings at RhySearch, Buchs (SG) RhySearch The Research- and Innovation Center in the Rhine Valley RhySearch

More information

micro resist technology

micro resist technology Characteristics Processing guidelines Negative Tone Photoresist Series ma-n 1400 ma-n 1400 is a negative tone photoresist series designed for the use in microelectronics and microsystems. The resists are

More information

This article was originally published in a journal published by Elsevier, and the attached copy is provided by Elsevier for the author s benefit and for the benefit of the author s institution, for non-commercial

More information

Metallization deposition and etching. Material mainly taken from Campbell, UCCS

Metallization deposition and etching. Material mainly taken from Campbell, UCCS Metallization deposition and etching Material mainly taken from Campbell, UCCS Application Metallization is back-end processing Metals used are aluminum and copper Mainly involves deposition and etching,

More information

HiPIMS Technology: advantages and disadvantages

HiPIMS Technology: advantages and disadvantages Vacuum plasma technology HiPIMS Technology: advantages and disadvantages Cr - DC Cr - HiPIMS Alessandro Patelli alessandro.patelli@venetonanotech.it Outline 1. What is HiPIMS Ti target surface 2. What

More information

APPLICATION-DRIVEN PRODUCTIVE VACUUM TECHNOLOGY

APPLICATION-DRIVEN PRODUCTIVE VACUUM TECHNOLOGY FRAUNHOFER INSTITUTE FOR ELECTRON BEAM AND PLASMA TECHNOLOGY FEP SPECIAL SEMINAR APPLICATION-DRIVEN PRODUCTIVE VACUUM TECHNOLOGY APRIL 15, 2014 SOKOLNIKI ECC PROGRAM TUESDAY, APRIL 15 TH 10:15 10:20 Opening

More information

PRECISION OPTICAL FILTERS BY EOSS - ENHANCED OPTICAL SPUTTERING SYSTEM. Fraunhofer

PRECISION OPTICAL FILTERS BY EOSS - ENHANCED OPTICAL SPUTTERING SYSTEM. Fraunhofer PRECISION OPTICAL FILTERS BY EOSS - ENHANCED OPTICAL SPUTTERING SYSTEM EOSS ENHANCED OPTICAL SPUTTERING SYSTEM Fraunhofer IST, Braunschweig Contact: Dr. M. Vergöhl +49 531 2155 640 EOSS Coating System

More information

Semiconductor Manufacturing Technology. IC Fabrication Process Overview

Semiconductor Manufacturing Technology. IC Fabrication Process Overview Semiconductor Manufacturing Technology Michael Quirk & Julian Serda October 00 by Prentice Hall Chapter 9 IC Fabrication Process Overview /4 Objectives After studying the material in this chapter, you

More information

PROPERTIES OF MATERIALS PART HARDNESS

PROPERTIES OF MATERIALS PART HARDNESS CHAPTER 3 PROPERTIES OF MATERIALS PART 2 30.07.2007 3.1.10 HARDNESS A Resistance to permanently indenting the surface Large hardness means resistance to plastic deformation or cracking In compression,

More information

Vacuum deposition of TiN

Vacuum deposition of TiN J.Lorkiewicz DESY.27.10.02 Vacuum deposition of TiN (TiN coating of high power coupler elements as an anti-multipactor remedy at DESY) The scope of the project: - reducing secondary electron emission and

More information

Effect of Glass Formation- Thin Films

Effect of Glass Formation- Thin Films Effect of Glass Formation- Thin Films Kathleen Richardson Clemson University richar3@clemson.edu richar3@clemson.edu Structure of Glass: Effects of Formation - Films 1 Glass ancient transmission medium

More information

Lecture Day 2 Deposition

Lecture Day 2 Deposition Deposition Lecture Day 2 Deposition PVD - Physical Vapor Deposition E-beam Evaporation Thermal Evaporation (wire feed vs boat) Sputtering CVD - Chemical Vapor Deposition PECVD LPCVD MVD ALD MBE Plating

More information

Energy Efficient Glazing Design. John Ridealgh Off-Line Coatings Technology Group Pilkington European Technology Centre

Energy Efficient Glazing Design. John Ridealgh Off-Line Coatings Technology Group Pilkington European Technology Centre Energy Efficient Glazing Design John Ridealgh Off-Line Coatings Technology Group Pilkington European Technology Centre 2 John Ridealgh 30th November 2009 Talk Outline Pilkington Group Limited & NSG Group

More information

A Plasma Emission Controller for Reactive. Magnetron Sputtering of Titanium Dioxide Films

A Plasma Emission Controller for Reactive. Magnetron Sputtering of Titanium Dioxide Films Adv. Theor. Appl. Mech., Vol. 5, 2012, no. 1, 1-10 A Plasma Emission Controller for Reactive Magnetron Sputtering of Titanium Dioxide Films Raad A. Swady DMPS, College of Arts & Sciences, University of

More information

Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties

Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties Journal of Multidisciplinary Engineering Science and Technology (JMEST) Growth Of TiO 2 Films By RF Magnetron Sputtering Studies On The Structural And Optical Properties Ahmed K. Abbas 1, Mohammed K. Khalaf

More information

Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC

Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC Comparison of Different Sputter Processes for ITO: Planar DC versus Planar AC P. Sauer,H.-G.Lotz, A. Hellmich R. Kukla, J. Schröder Applied Films GmbH &,Co. KG, Alzenau, Germany Outline n n n n n n Current

More information

The most efficient way of transforming sunlight into heat

The most efficient way of transforming sunlight into heat The most efficient way of transforming sunlight into heat TiNOX, The Energy Trap Decisive for highest performance of a solar absorber plate is: - highest possible absorption of solar radiation - minimum

More information

MINISTRY OF EDUCATION AND SCIENCE OF UKRAINE

MINISTRY OF EDUCATION AND SCIENCE OF UKRAINE MINISTRY OF EDUCATION AND SCIENCE OF UKRAINE National Technical University of Ukraine "Igor Sikorsky Kyiv Polytechnic Institute" Faculty of Physical Engineering Departments physics of metals 1 Student

More information

II. NEG THIN FILM DEPOSITION

II. NEG THIN FILM DEPOSITION Deposition of Non-Evaporable Getter Thin Films and Vacuum Pumping Performances Ankit Sur Engineering Department, Wayne State University, Detroit, MI 48202 The ERL (Energy Recovery Linac) proposed at Cornell

More information

High Performance Lithium Battery Anodes Using Silicon Nanowires

High Performance Lithium Battery Anodes Using Silicon Nanowires Supporting Online Materials For High Performance Lithium Battery Anodes Using Silicon Nanowires Candace K. Chan, Hailin Peng, Gao Liu, Kevin McIlwrath, Xiao Feng Zhang, Robert A. Huggins and Yi Cui * *To

More information

EQUIPMENT AND SYSTEM FOR VACUUM COATING METALLIZING, SPUTTERING, PLASMA and PECVD. Hybrid system KOLZER DGK 36

EQUIPMENT AND SYSTEM FOR VACUUM COATING METALLIZING, SPUTTERING, PLASMA and PECVD. Hybrid system KOLZER DGK 36 email : carlo.gennari@fastwebnet.it web site : http://carlogennariforni.beepworld.it/kolzer.htm EQUIPMENT AND SYSTEM FOR VACUUM COATING METALLIZING, SPUTTERING, PLASMA and PECVD Hybrid system KOLZER DGK

More information

TUTORIAL ON SPUTTER DEPOSITION

TUTORIAL ON SPUTTER DEPOSITION MATERION ADVANCED CHEMICALS COATING MATERIALS NEWS September 2011 Volume 22 Issue 1 TUTORIAL ON SPUTTER DEPOSITION NEW ON THE WEB Non-Silicon Thin-Film PV Materials Progress and Challenges by - David A.

More information

Microwave Plasma Processing

Microwave Plasma Processing Microwave Plasma Processing MUEGGE GMBH Hochstraße 4-6 64385 Reichelsheim Fon +49 (0) 6164-93 07 11 Fax +49 (0) 6164-93 07 93 info@muegge.de www.muegge.de Microwave Plasma Processing Microwave Plasma Technology:

More information

Gridless end-hall. Ion Sources. For Ion Assisted Thin Film Deposition & Substrate Cleaning

Gridless end-hall. Ion Sources. For Ion Assisted Thin Film Deposition & Substrate Cleaning Gridless end-hall Ion Sources For Ion Assisted Thin Film Deposition & Substrate Cleaning End-Hall Ion Sources mark I Ion Source The Mark I End-Hall is ideal for small research and development and pilot

More information

HiPIMS Deposition of Metal and Oxide Coatings

HiPIMS Deposition of Metal and Oxide Coatings HiPIMS Deposition of Metal and Oxide Coatings 1 GT West, 1 PJ Kelly, 1 P Barker, 2 JW Bradley and 2 A Mishra 1. Surface Engineering Group, Manchester Metropolitan University, UK 2. Electrical Engineering

More information

LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS. Dr. Saad Ahmed XENON Corporation November 19, 2015

LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS. Dr. Saad Ahmed XENON Corporation November 19, 2015 LOW TEMPERATURE PHOTONIC SINTERING FOR PRINTED ELECTRONICS Dr. Saad Ahmed XENON Corporation November 19, 2015 Topics Introduction to Pulsed Light Photonic sintering for Printed Electronics R&D Tools for

More information

Lecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE Dr. Alan Doolittle

Lecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE Dr. Alan Doolittle Lecture 12 Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12 Evaporation and Sputtering (Metalization) Evaporation For all devices, there is a need to go from semiconductor to metal.

More information

Surface Coating of Tungsten Carbide by Electric Exploding of Contact

Surface Coating of Tungsten Carbide by Electric Exploding of Contact Surface Coating of Tungsten Carbide by Electric Exploding of Contact Evgeny G. Grigoryev General Physics Department, Moscow Engineering Physics Institute, Kashirskoe sh. 31, Moscow, 115409, Russia Abstract.

More information

Ion-assist applications of broad-beam ion sources

Ion-assist applications of broad-beam ion sources Ion-assist applications of broad-beam ion sources H.R. Kaufman a and J.M.E. Harper b a Kaufman & Robinson, Inc., 1306 Blue Spruce Dr., Fort Collins, CO 80524; b University of New Hampshire, Dept. of Physics,

More information

A NOVEL METHOD FOR THE IMPROVEMENT IN THERMOELECTRIC PROPERTY OF TIN OXIDE THIN FILMS AND ITS APPLICATION IN GAS SENSING

A NOVEL METHOD FOR THE IMPROVEMENT IN THERMOELECTRIC PROPERTY OF TIN OXIDE THIN FILMS AND ITS APPLICATION IN GAS SENSING INTERNATIONAL JOURNAL ON SMART SENSING AND INTELLIGENT SYSTEMS, VOL. 1, NO. 2, JUNE 2008 A NOVEL METHOD FOR THE IMPROVEMENT IN THERMOELECTRIC PROPERTY OF TIN OXIDE THIN FILMS AND ITS APPLICATION IN GAS

More information

Reactive Partial Transient Liquid Phase Bonding (R-PTLPB) of YSZ to Crofer22APU Using Nickel and Copper-Nickel as Core Interlayers

Reactive Partial Transient Liquid Phase Bonding (R-PTLPB) of YSZ to Crofer22APU Using Nickel and Copper-Nickel as Core Interlayers Contributed Papers from Materials Science and Technology (MS&T) 2015 October 4 8, 2015, Greater Columbus Convention Center, Columbus, Ohio, USA Copyright 2015 MS&T15 Reactive Partial Transient Liquid Phase

More information

Amorphous Silicon Solar Cells

Amorphous Silicon Solar Cells The Birnie Group solar class and website were created with much-appreciated support from the NSF CRCD Program under grants 0203504 and 0509886. Continuing Support from the McLaren Endowment is also greatly

More information

Process steps for Field Emitter devices built on Silicon wafers And 3D Photovoltaics on Silicon wafers

Process steps for Field Emitter devices built on Silicon wafers And 3D Photovoltaics on Silicon wafers Process steps for Field Emitter devices built on Silicon wafers And 3D Photovoltaics on Silicon wafers David W. Stollberg, Ph.D., P.E. Research Engineer and Adjunct Faculty GTRI_B-1 Field Emitters GTRI_B-2

More information

Decorative Coatings PVD the bright choice

Decorative Coatings PVD the bright choice a parent company of Decorative Coatings PVD the bright choice kenosistec.com a parent company of Why PVD Coating Best surface properties PVD is still one of the most effective method for modifying and

More information

IMRE/ETPL Flagship Project

IMRE/ETPL Flagship Project IMRE/ETPL Flagship Project Nanoparticulate Barrier Films & Gas Permeation Measurement Techniques for Thin Film Solar & Display Application Problems Senthil Ramadas Institute of Materials Research & Engineering

More information

Material Evaporation Application Comment MP P / Optical films, Oxide films, Electrical contacts. Doping, Electrical contacts.

Material Evaporation Application Comment MP P / Optical films, Oxide films, Electrical contacts. Doping, Electrical contacts. for vapour Aluminum (Al) -, Optical, Oxide, Electrical BN liners with lid are recommended due to the reactivity and the fact that Al creeps out. Cooling down of the cell with 1K per minute. 660 972 Antimony

More information

Optical and Electrical Characterization of CuO Thin Films as Absorber Material for Solar Cell Applications

Optical and Electrical Characterization of CuO Thin Films as Absorber Material for Solar Cell Applications American Journal of Condensed Matter Physics 16, 6(1): 1-6 DOI: 1.5923/j.ajcmp.11.1 Optical and Electrical Characterization of CuO Thin Films as Absorber Material for Solar Cell Applications K. S. Wanjala

More information

A process chain using a non-vacuum electron beam as a universal tool for material processing

A process chain using a non-vacuum electron beam as a universal tool for material processing A process chain using a non-vacuum electron beam as a universal tool for material processing T. Hassel, N. Murray, A. Beniyash VIII. International Conference - Beam technologies and laser application St.

More information

CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS

CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS 64 Rev.Adv.Mater.Sci. 24(2010) K. 64-68 Abu-Shgair, H.H. Abu-Safe, A. Aryasomayajula, B. Beake and M.H. Gordon CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS Khaleel Abu-Shgair 1,

More information

RightCopyright 2006 American Vacuum Soci

RightCopyright 2006 American Vacuum Soci Title Gallium nitride thin films deposite magnetron sputtering Author(s) Maruyama, T; Miyake, H Citation JOURNAL OF VACUUM SCIENCE & (2006), 24(4): 1096-1099 TECHNOL Issue Date 2006 URL http://hdl.handle.net/2433/43541

More information

LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology

LOT. Contents. Introduction to Thin Film Technology. Chair of Surface and Materials Technology Introduction to Thin Film Contents 1. Introduction and Application Examples (2h) 2. Preparation of Thin Films by PVD (Physical Vapor Deposition) (6h) 2.1 Vacuum Technique (1h) 2.1.1 Kinetics of Gases 2.1.2

More information

Ultra High Barrier Coatings by PECVD

Ultra High Barrier Coatings by PECVD Society of Vacuum Coaters 2014 Technical Conference Presentation Ultra High Barrier Coatings by PECVD John Madocks & Phong Ngo, General Plasma Inc., 546 E. 25 th Street, Tucson, Arizona, USA Abstract Silicon

More information

Low temperature deposition of thin passivation layers by plasma ALD

Low temperature deposition of thin passivation layers by plasma ALD 1 Low temperature deposition of thin passivation layers by plasma ALD Bernd Gruska, SENTECH Instruments GmbH, Germany 1. SENTECH in brief 2. Low temperature deposition processes 3. SENTECH SI ALD LL System

More information

PRIREV. ZI Vagos, lote

PRIREV. ZI Vagos, lote 2017 PRIREV We are the only Portuguese company that provides Decorative PVD services in several business areas. Our mission is make our partners more competitive in their markets with higher added value

More information

Atmospheric Pressure Plasma Jets: Concepts and Realization of Miniaturized Jets and Jet Arrays. D. Theirich, J. Kedzierski, J.

Atmospheric Pressure Plasma Jets: Concepts and Realization of Miniaturized Jets and Jet Arrays. D. Theirich, J. Kedzierski, J. Mitgliedschaften des fmt Bergische Universität Wuppertal Institut für Polymertechnologie Atmospheric Pressure Plasma Jets: Concepts and Realization of Miniaturized Jets and Jet Arrays Deutsche Gesellschaft

More information

Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications

Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications Philip D. Rack,, Jason D. Fowlkes, and Yuepeng Deng Department of Materials Science and Engineering University

More information

Oxide Growth. 1. Introduction

Oxide Growth. 1. Introduction Oxide Growth 1. Introduction Development of high-quality silicon dioxide (SiO2) has helped to establish the dominance of silicon in the production of commercial integrated circuits. Among all the various

More information

Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers

Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers SRF Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers J. Langner 1, M.J. Sadowski 1, P. Strzyzewski 1, R. Mirowski 1, J. Witkowski 1, S. Tazzari 2, L.

More information

ELA-6, ELA -30V, ELA -60V, ELA -120 ELECTRON-BEAM WELDING EQUIPMENT

ELA-6, ELA -30V, ELA -60V, ELA -120 ELECTRON-BEAM WELDING EQUIPMENT ELECTRON- BEAM WELDING IN VACUUM ELA-6, ELA -30V, ELA -60V, ELA -120 ELECTRON-BEAM WELDING EQUIPMENT Single pass welding of metals and of different thickness from 0,1 up to 400 mm in vacuum. ELECTRON-BEAM

More information

THE PENNSYLVANIA STATE UNIVERSITY SCHREYER HONORS COLLEGE DEPARTMENT OF ENGINEERING SCIENCE AND MECHANICS

THE PENNSYLVANIA STATE UNIVERSITY SCHREYER HONORS COLLEGE DEPARTMENT OF ENGINEERING SCIENCE AND MECHANICS THE PENNSYLVANIA STATE UNIVERSITY SCHREYER HONORS COLLEGE DEPARTMENT OF ENGINEERING SCIENCE AND MECHANICS A STUDY OF BIASED TARGET ION BEAM DEPOSITED DIELECTRIC OXIDES FELIX ARONOVICH FALL 2013 A thesis

More information

Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets

Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets Managing Anode Effects and Substrate Heating from Rotatable Sputter Targets Frank Papa*, Dermot Monaghan**, Victor Bellido- González**, and Alex Azzopardi** *Gencoa Technical & Business Support in US,

More information

Magnetron Sputter Cathodes planar & rotatable. Linear ion sources. Reactive gas controller & endpoint detector

Magnetron Sputter Cathodes planar & rotatable. Linear ion sources. Reactive gas controller & endpoint detector GENCOA products cover 3 sputtering related areas Magnetron Sputter Cathodes planar & rotatable Reactive gas controller & endpoint detector Linear ion sources Other activities include on-site process implementation,

More information

Thin film silicon technology. Cosimo Gerardi 3SUN R&D Tech. Coordinator

Thin film silicon technology. Cosimo Gerardi 3SUN R&D Tech. Coordinator Thin film silicon technology Cosimo Gerardi 3SUN R&D Tech. Coordinator 1 Outline Why thin film Si? Advantages of Si thin film Si thin film vs. other thin film Hydrogenated amorphous silicon Energy gap

More information

Surface Micromachining

Surface Micromachining Surface Micromachining Outline Introduction Material often used in surface micromachining Material selection criteria in surface micromachining Case study: Fabrication of electrostatic motor Major issues

More information

FORMATION OF TiO 2 THIN FILM BY ION-BEAM-MIXING METHOD AND ITS APPLICATION AS THE CORROSION PROTECTING FILM

FORMATION OF TiO 2 THIN FILM BY ION-BEAM-MIXING METHOD AND ITS APPLICATION AS THE CORROSION PROTECTING FILM ORAL REFERENCE:ICF100266OR FORMATION OF TiO 2 THIN FILM BY ION-BEAM-MIXING METHOD AND ITS APPLICATION AS THE CORROSION PROTECTING FILM Yuji KIMURA 1 and Hirotsugu SAITO 1 1 Dept. of Materials Science and

More information

Small-Scale Resistance Welding for Medical and Industrial Applications

Small-Scale Resistance Welding for Medical and Industrial Applications Small-Scale Resistance Welding for Medical and Industrial Applications Girish P. Kelkar, Ph.D. (author of The Weld Nugget ) http://www.welding-consultant.com/ Excellence In Material Joining Difference

More information

The Effects of Defects on the Moisture-Barrier Performance of Clear Coatings on Polymer Substrates.

The Effects of Defects on the Moisture-Barrier Performance of Clear Coatings on Polymer Substrates. AIMCAL, CHARLESTON, SC, 2013 The Effects of Defects on the Moisture-Barrier Performance of Clear Coatings on Polymer Substrates. The National Centre for Printed Electronics ALF part SMITH of Centre for

More information

REDUCTION OF REFLECTION LOSSES IN SOLAR CELL BY USING TIAL2 AND ZR ANTI REFLECTIVE COATING

REDUCTION OF REFLECTION LOSSES IN SOLAR CELL BY USING TIAL2 AND ZR ANTI REFLECTIVE COATING IJRET: International Journal of Research in Engineering and Technology eissn: 2319-1163 pissn: 2321-738 REDUCTION OF REFLECTION LOSSES IN SOLAR CELL BY USING TIAL2 AND ZR ANTI REFLECTIVE COATING S. Anandhi

More information

Sputter-free and reproducible laser welding of electric or electronic copper contacts with a green laser

Sputter-free and reproducible laser welding of electric or electronic copper contacts with a green laser Abstract Lasers in Manufacturing Conference 2015 Sputter-free and reproducible laser welding of electric or electronic copper contacts with a green laser Kaiser, Elke*; Pricking, Sebastian; Stolzenburg,

More information

Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities

Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities Status of Research on Deposition of Superconducting Films for RF Accelerating Cavities J. Langner, L. Catani*, A. Cianchi*, K. Czaus, R. Mirowski, R. Russo*, M.J. Sadowski, S. Tazzari*, F. Tazzioli***,

More information

High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets

High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets H. Zhu 1, 2, *, J. Hüpkes 1, E. Bunte 1 1 IEF5-Photovoltaik, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany

More information

Available online at ScienceDirect. Physics Procedia 71 (2015 )

Available online at  ScienceDirect. Physics Procedia 71 (2015 ) Available online at www.sciencedirect.com ScienceDirect Physics Procedia 71 (2015 ) 105 109 18th Conference on Plasma-Surface Interactions, PSI 2015, 5-6 February 2015, Moscow, Russian Federation and the

More information

Galvanic Metallisation of CFRP devices

Galvanic Metallisation of CFRP devices 5th International CFK-Valley Stade Convention 7. 8. June 2011, Stadeum Stade, Germany A. Dietz, G. Klumpp, H.-J- Kramer Fraunhofer IST, Braunschweig C. Haas Astrium GmbH Friedrichshafen Overview GMES -

More information

Development of low roughness, low resistance bottom electrodes for tunnel junction devices

Development of low roughness, low resistance bottom electrodes for tunnel junction devices Development of low roughness, low resistance bottom electrodes for tunnel junction devices Designing and assembly of a new annealing setup for 150mm wafers David Filipe Coelho de Almeida Aurélio Setembro

More information

ACTIVATION AND FUNCTIONALIZATION OF POLYMERS BASED ON GEOMETRY- INDEPENDENT PLASMA SOURCE CONCEPTS

ACTIVATION AND FUNCTIONALIZATION OF POLYMERS BASED ON GEOMETRY- INDEPENDENT PLASMA SOURCE CONCEPTS ACTIVATION AND FUNCTIONALIZATION OF POLYMERS BASED ON GEOMETRY- INDEPENDENT PLASMA SOURCE CONCEPTS October 25, 2017 - Parts2Clean Fachforum und Innovationsforum AGENDA Fraunhofer IST Basics about plasma

More information

Sputter Coating. Technical Brief

Sputter Coating. Technical Brief Sputter Coating Technical Brief Document Number TB-SPUTTER Issue 2 (01/02) Introduction HP000107 Quorum Technologies Ltd main sales office: South Stour Avenue Ashford Kent U.K. Tel: ++44(0) 1233 646332

More information

Nanoscale Barrier Coating on BOPP Packaging Film by ALD Presented by: Dr. Johanna Lahti Senior Research Fellow Tampere University of Technology

Nanoscale Barrier Coating on BOPP Packaging Film by ALD Presented by: Dr. Johanna Lahti Senior Research Fellow Tampere University of Technology Nanoscale Barrier Coating on BPP Packaging Film by ALD Presented by: Dr. Johanna Lahti Senior Research Fellow Tampere University of Technology Co-authors: Kimmo Lahtinen (LUT*), Petri Johansson (TUT),

More information

2.1.2 Evaporation of alloy and compound films Reactive Evaporation Activated Reactive Evaporation

2.1.2 Evaporation of alloy and compound films Reactive Evaporation Activated Reactive Evaporation Contents 1. Introduction and Application Examples (2h) 2. Preparation of Thin Films by PVD (Physical Vapor Deposition) (12h) 2.1 Vacuum Technique (1h) 2.1.1 1 Kinetics of Gases 2.1.2 Transport and Pumping

More information

Low Cost Bipolar Plates for Large Scale PEM Electrolyzers

Low Cost Bipolar Plates for Large Scale PEM Electrolyzers 1 Low Cost Bipolar Plates for Large Scale PEM Electrolyzers A. S. Gago, A. S. Ansar, P. Gazdzicki, N. Wagner, J. Arnold, K. A. Friedrich Electrochemical Energy Technology Institute of Engineering Thermodynamics

More information

Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li

Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering Tao Chen a, Maojin Dong, Jizhou Wang,Ling Zhang and Chen Li Science and Technology on Surface Engineering Laboratory,

More information

Citation JOURNAL OF APPLIED PHYSICS (1995),

Citation JOURNAL OF APPLIED PHYSICS (1995), Title Copper nitride thin films prepared sputtering Author(s) MARUYAMA, T; MORISHITA, T Citation JOURNAL OF APPLIED PHYSICS (1995), Issue Date 1995-09-15 URL http://hdl.handle.net/2433/43537 Copyright

More information

Sputtered Zinc Oxide Films for Silicon Thin Film Solar Cells: Material Properties and Surface Texture

Sputtered Zinc Oxide Films for Silicon Thin Film Solar Cells: Material Properties and Surface Texture Poster FVS Workshop 2002 Sputtered Zinc Oxide Films for Silicon Thin Film Solar Cells: Material Properties and Surface Texture Texture etching of sputtered ZnO:Al films has opened up a variety of possibilities

More information

Thickness and composition analysis of thin film samples using FP method by XRF analysis

Thickness and composition analysis of thin film samples using FP method by XRF analysis Technical articles Thickness and composition analysis of thin film samples using FP method by XRF analysis Hikari Takahara* 1. Introduction X-ray fluorescence spectroscopy (XRF) is an elemental quantification

More information

Advances in Intense Pulsed Light Solutions For Display Manufacturing. XENON Corporation Dr. Saad Ahmed Japan IDW 2016

Advances in Intense Pulsed Light Solutions For Display Manufacturing. XENON Corporation Dr. Saad Ahmed Japan IDW 2016 Advances in Intense Pulsed Light Solutions For Display Manufacturing XENON Corporation Dr. Saad Ahmed Japan IDW 2016 Talk Outline Introduction to Pulsed Light Applications in Display UV Curing Applications

More information

Materials Characterization

Materials Characterization Materials Characterization C. R. Abernathy, B. Gila, K. Jones Cathodoluminescence (CL) system FEI Nova NanoSEM (FEG source) with: EDAX Apollo silicon drift detector (TE cooled) Gatan MonoCL3+ FEI SEM arrived

More information

Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications

Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications Vacuum plasma treatment and coating of fluoropolymer webs challenges and applications Cindy Steiner, John Fahlteich Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP,

More information

Properties of TiN thin films grown on SiO 2 by reactive HiPIMS

Properties of TiN thin films grown on SiO 2 by reactive HiPIMS Properties of TiN thin films grown on SiO 2 by reactive HiPIMS Friðrik Magnus 1, Árni S. Ingason 1, Ólafur B. Sveinsson 1, S. Shayestehaminzadeh 1, Sveinn Ólafsson 1 and Jón Tómas Guðmundsson 1,2 1 Science

More information

Special Electrically Resistant Heated Furnaces

Special Electrically Resistant Heated Furnaces Special Electrically Resistant Heated Furnaces Drying of Ceramic Components Autor: Roland Waitz, Malte Möller Many ceramic masses are fabricated in plastic or liquid condition by addition of water. In

More information

ScienceDirect. High performance coatings for solar receivers and new dedicated manufacturing solution

ScienceDirect. High performance coatings for solar receivers and new dedicated manufacturing solution Available online at www.sciencedirect.com ScienceDirect Energy Procedia 48 (2014 ) 701 706 SHC 2013, International Conference on Solar Heating and Cooling for Buildings and Industry September 23-25, 2013,

More information

A Brief History of the Thermal Mass Flow Meter and Controller

A Brief History of the Thermal Mass Flow Meter and Controller A Brief History of the Thermal Mass Flow Meter and Controller William J. Alvesteffer, William C. Baker, Randy Cole, and David C. Jacobs, Teledyne Hastings Instruments, Hampton, Virginia Chapter 18 from

More information

SunMaxxTM Information Guide: Evacuated Tube Solar Collectors

SunMaxxTM Information Guide: Evacuated Tube Solar Collectors SunMaxxTM Information Guide: Evacuated Tube Solar Collectors P: 877.SUNMAXX / 888.SOLAR.11 www.siliconsolar.com / www.sunmaxxsolar.com Silicon Solar Inc Innovative Solar Solutions SunMaxxTM Information

More information

SuperChrome PVD Coating

SuperChrome PVD Coating SuperChrome PVD Coating Gary Vergason, Michael Brazil, Mark Fitch, Rick Smith ITB Smart Automotive Surfaces September 28-29, 2016 SUPERCHROME Sept 2016 page 1 Vergason Technology, Inc. Design, assembly,

More information

Experiences of PLD Technology for LIB Separators. PICODEON Oy. Neal White

Experiences of PLD Technology for LIB Separators. PICODEON Oy. Neal White Experiences of PLD Technology for LIB Separators PICODEON Oy Neal White 1 Outline Introduction to Picodeon Ceramic coating rationale Separator overview Why PLD for LIB separators Current status of Picodeon

More information

High-end solutions for high-tech industries. Dr. Sebastian Gatz, Klaus Ruhmer

High-end solutions for high-tech industries. Dr. Sebastian Gatz, Klaus Ruhmer High-end solutions for high-tech industries Dr. Sebastian Gatz, Klaus Ruhmer 14.11.2017 Focus on technology Meyer Burger is a leading global technology company specializing in innovative systems and processes

More information