Ion Beam Technology. FIB Nanofabrication at Its Excellence

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1 Ion Beam Technology FIB Nanofabrication at Its Excellence High-Resolution and Versatile Focused Ion Beam Nanofabrication, Lithography and Nanoengineering FOCUSED ION BEAM NANOFABRICATION

2 Cutting-edge research is all about being the first to identify and answer today s most pressing questions in science and engineering. A new state of the art in FIB technology Excellent beam spot characteristics Focused Ion Beam nanofabrication beyond gallium

3 FIB meets LITHO High-resolution and versatile nanofabrication employing advanced FIB techniques with lithography instrumentation The ionline Plus breaks new ground for your nanofabrication challenges by realizing the synergy of a focused ion beam and a mature lithography architecture. It combines various direct FIB processing techniques with the unrivaled stability, automation, reproducibility, and high resolution of a lithography instrument. Repeat accurate results Develop efficient processes Apply versatile techniques ionline Plus ensures highest resolution and reproducible nanofabrication over extended areas and periods of time. This is possible due to beam and deflection precision with unique dynamic compensations, the longterm stability of its patented nanofib ion beam technology, and the Laser Interferometer Stage. ionline Plus delivers direct FIB patterning for simplified, flexible, efficient, and automated material processing. Thanks to live and in-situ process development, including imaging, x-sectioning and metrology, and a reduced number of steps, nanofabrication results are faster and easier to achieve. ionline Plus is built for versatile FIB nanopatterning and nanoengineering, which can be applied to flat or topo - graphic samples and provides complex 3D nanofabrication to control the lateral shape and depth. This can be extended by various techniques for fabrication and process control, such as multiple gas injection systems, nanoprobers and nanoprofilometer. Stable and automated FIB milling enables large arrays of small features to be created, as required for plasmonic applications. Direct patterning of new materials simplifies advanced prototyping of devices such as X-ray zone plates. Dedicated dose control in combination with 3D stitching is applied to complex structures such as a 1-mm-long microfluidic mixer channel. FIB nanofabrication techniques Besides preparation of TEM or APT samples, all FIB techniques can be employed for nanofabrication, and enhance its efficiency by introducing new process pathways. Direct patterning by milling, deposition, or etching, hard masking, maskless ion implantation, and surface functionalization all complement and synergize with Electron Beam Lithography (EBL) and other resist-based approaches. 3

4 nanofib Three ion column High resolution and excellent beam spots Raith s proprietary FIB technology continuously evolves to meet all the critical requirements of advanced nanofabrication. The latest-generation nanofib Three column truly defines a new state of the art in FIB technology and is complemented by the advanced beam control of Raith s new pattern generator and instrument platform. Long-term stability The nanofib Three technology shows exceptional long-term stability due to its liquid-flow optimized ion source and patented emission control. It thus provides guaranteed low drifts in probe current and beam position. Placement accuracy 1 µm Long-term processing for large and complex shapes such as a 3D nano absorber structure 9 nm The nanofib Three ion column uses dedicated low-distortion octupole deflectors and advanced beam blanking, enabling accurate beam position and pattern acuity within a writing field as well as for stitching of multiple fields. 100 nm High resolution The nanofib Three ion column is optimized for highest resolution and excellent spot characteristics by its very short optical length and small working distance. With the latest dynamic compensations, best beam performance is achieved throughout the entire write field area. 100 nm FIB cutting sub-10 nm features (1) and keeping a high-aspect-ratio ribbon (2) in challenging materials like polycrystalline gold. The nanofib Three column is a new state of the art in gallium FIB, showing a significant improvement compared to conventional FIB technology. A FIB typically exhibits large beam tails outside the central spot. The nanofib Three, on the other hand, has a narrow central spot and record low beam tails. This is the tightest beam spot in gallium FIB, enabling high resolution nanofabrication. 1 E +0 1 E E - 2 nanofib Three Reference A Reference B Reference C 1 E E - 4 nanofib technology based on collaboration with J. Gierak, LPN-CNRS. 1 E position [nm] 4

5 IONselect technology FIB nanofabrication beyond gallium IONselect technology provides stable delivery of gold, silicon, or other ions with nanometer beam diameters. The flow-optimized alloy ion source and low-aberration ion optics enable easy switching between multiple ion species from a single source, while preserving the high resolution and stability of the nanofib Three column. Multi Species Alloy Source Improve for the future Explore new techniques The IONselect technology is a unique upgrade path for the nanofib Three to expand beyond gallium, to add new ion species for enhanced processing and imaging. A range of species is available with the AuSi source, from doubly-charged light ions to heavy ions and clusters, all with excellent handling. The multi-species ion beam technology allows for different interaction mechanisms and unique yet-to-beexplored nanofabrication techniques. Processing with low contamination, specific functionalization, higher resolution and surface-sensitive milling will pave the way for new breakthroughs in next-generation research. High lateral resolution Low contamination Surface-sensitive processes 200 nm 200 nm Direct milling with Si ions for plasmonic arrays results in small features and low contamination. Heavy ions like Au offer surface milling or functionalization. 500 nm Light ions can be applied to achieve patterning and imaging at the sub-10 nm scale. 5

6 Superior sample stage capabilities for FIB The Laser Interferometer Stage is a key technology from Raith. It is unique for FIB in that it delivers unmatched accuracy and stability. Besides write field stitching, it enables sample navigation and mark recognition without the need for imaging within the sensitive write field or larger working area, and is useful for long-term nanofabrication even in a single field. FIB beyond single write fields The accuracy of the Laser Interferometer Stage allows for multi-field patterning by precise stitching. Perfect matching of stage and beam movement is combined with sophisticated dose control to overcome the edge effect artifacts at the write field border. Moreover Raith s unique technology enables patterning of paths or periodic structures defined by the laser stage movement (traxx and periodixx). These truly continuous writing strategies can be used for structures spanning long distances without breaks. Stage loops and dose control enable milling with stitching of a several-mm-long photonic coupling device. Stitching allows for direct milling of long wave-guides with a field offset on the 10 nm scale only. 40 µm Continuous milling is applied to a fluidic device, resulting in cm-long nano channels without any interrupts. 2 µm In-situ process optimization All direct FIB processes (milling, etching, deposition) exhibit the great possibility of instantaneous process control for fast optimization in-situ. Various techniques for sample preparation and imaging, including live end-point control, can be applied. Moreover, the laser stage and automation capabilities can be employed for making sophisticated test arrays and directly revisiting them for multiple process checks. Both the process and result checks are truly 3-dimensional with FIB tools, so that sample tilting is a must-have for X-sectioning and imaging. ionline Plus offers different solutions, the standard being a 100 mm laser stage with X-Y interferometer control and a special sample holder providing additional rotation and tilt. For process development and control, live images and endpoint graphs with recording functionality can be used. Raith s 3D module provides additional sample tilt and rotation with full software control. It can be loaded and unloaded like any other sample holder. 200 nm Ion beam deposition is used as a protective layer sectioning of a X-ray zone plate. 6

7 Extended functionality with nanoengineering The capabilities of the ionline Plus can be further extended with nanoengineering options that are supplied with the system or added later on during a field upgrade. Typical nanoengineering options for FIB are various gas injection systems, nanomanipulators and a nanoprofilometer. Versatile writing strategies As for FIB milling, the use of the best writing strategy is also essential for gas assisted processes. The total dose inadequately defines the process, so that more sophisticated control over the beam strategy is required in terms of scan direction, refresh times, and loops. Raith s unique FLEXposure writing modes are used to obtain the smallest feature size, the best composition, or the exact 3D shape desired. Parallel axis Longitudinal Transversal Concentric Three boxes milled into silicon, visualizing different patterning strategies: lines left to right one loop, lines left to right many loops, concentric outward one loop (from left to right). The line scan profile of NanoSense is overlaid. Nanomanipulators Nanomanipulators for intuitive control of metal tips and other end effectors can be used for various applications. Besides the mechanical manipulation of nano objects or lift-out of sample parts, the electrical connection of the tip can be used for in-situ electrical probing. The NanoSense option employs a surface-sensitive distance sensor with an existing nanomanipulator. This can serve as a scout for the attached probing tip as well as for the other tips, for easy probing and sample approach. Moreover, it can be used for nanoprofilometry, adding 3D process control to lateral secondary electron imaging information. 2 µm NanoSense probe as scout Second probe follows blind Scouting function for efficient tip approach and nanoprobing. Gas injection systems With a gas injection system, a local flow of gas is introduced over a sample. Gas-assisted etching shows increased milling rates, better selectivity and less redeposition. Moreover, ion beam induced deposition is applied for X-sectioning, TEM sample preparation, masking for subsequent processing, or wiring of nano objects. These complex gas-induced processes can be well controlled using various hardware configurations, including multiple GIS s from different opposite directions. In combination with flexible software parameters and automation, the results can be further optimized for rate, resolution, resistivity, or planarity. Nanoprofilometry of a series of deposited lines with increasing dose and height. 7

8 FIB Nanofabrication at Its Excellence Versatile and accurate sub-10-nm FIB nanofabrication Excellent beam spot characteristics and lowest beam tails (nanofib Three column) Nanofabrication with multiple ion species beyond gallium (IONselect technology) Quick and flexible manual operation as well as advanced lithography automation Direct patterning using ion milling for fastest time to results Resist exposure, maskless ion implantation and hardmasking Ion-beam-induced deposition and gas-assisted etching X-sectioning and sample preparation Device modification and Circuit Edit applications Laser Interferometer Stage enables true write field stitching and continuous writing Nanomanipulators for in-situ probing and profilometry Configurable setup with upgrade paths ionline Plus has been designed on a versatile and configurable platform. With guaranteed performance, the system can be customized and field-upgraded, keeping pace with latest research trends and being prepared for future tool options. Ports for additional and future options Various multi-line and mono-line gas injection systems Sales Head office Raith GmbH Konrad-Adenauer-Allee Dortmund, Germany Phone Fax sales@raith.com Support Europe / Rest of world Phone support@raith.com America Raith America Inc Long Island Motor Parkway Suite 101 Islandia, New York USA Phone Fax sales@raithamerica.com Support America Phone support@raithamerica.com Asia / Pacific Raith Asia Ltd. Two Chinachem Exchange Square No. 338 King s Road Floor 7, Unit North Point Hong Kong Phone Fax sales@raithasia.com Support Asia / Pacific Phone support@raithasia.com Automated focus control Cartesian nanomanipulators Nanoprofilometer Various optical cameras India Raith India Pvt. Ltd. Sri Krishna Complex, No 36, 2nd Floor Opposite to Mother Theresa School M. E. S. Ring Road Bangalore India Phone Fax sales@raithindia.com Support India Phone support@raithindia.com Devices and images in cooperation with Argonne National Laboratory (p. 3), Harvard University (p. 5), MPI Stuttgart (p. 3 and p. 6), Peking University (p. 6), Stanford University (p. 4), University of Florida (p. 5 and p. 6), University of Stuttgart (p. 3 and p. 4), Zhejiang University (p. 4) Your challenge is our mission.