Disturbed and scattered, the path of thermal conduction through diamond lattice
|
|
- Sherman Harmon
- 6 years ago
- Views:
Transcription
1 Disturbed and scattered, the path of thermal conduction through diamond lattice Firooz Faili 1*, William Huang 1, Julian Calvo 2, Martin Kuball 2 and Daniel Twitchen 1 1) Element Six Technologies, 3901 Burton Drive, Santa Clara, CA, 95030, USA 2) University of Bristol, Center for Device Tomography and Reliability, Bristol, UK, Tyndal Avenue 1, BS8 TL1 * firooz.faili@e6.com ABSTRACT With more phonons carrying the energy in the lattice, the phonon density of states in diamond extends to a much higher frequencies than that of any other material. This is related to the Debye temperature of diamond, being the highest of any bulk materials and of having the highest sound velocity of any known bulk materials. However, the thermal conductivity not only depends on the number of phonons and how fast they are, but also on how long they can travel without being disturbed or scattered. The measurement of this length of travel is the Mean Free Path of the phonons, l, which depends on the number of phonons in the lattice through the 3-phonon processes (Normal and Umpklapp), and the imperfections in the lattice (boundaries, grain boundaries, non sp3 bonds, isotopes, impurities, extended defects, dislocations, etc.). Consequently, the real world thermal conductivity of a given piece of diamond will depend on the quality of the lattice, yielding values from 1 W/mºK (ultra-nanocrystalline diamond) to more than 3400 W/mºK for isotopically pure single crystal diamond. KEY WORDS: CVD diamond, thermal management, thermal interface, grain boundaries, defect density, extended defects, impurities NOMENCLATURE k thermal conductivity D thermal diffusivity C p heat capacity (constant pressure) R thermal resistance L length A cross-sectional area C v heat capacity (constant volume) l mean free path sound velocity INTRODUCTION To develop any fundamental model of phonon scattering related to its thermal properties requires a range of samples measured over a wide temperature range which have been characterized for factors such as grain size, point defect density, extended defect density, sp2 fraction and isotopic purity. Extensive measurements have been made over wide range of temperature, developing a baseline of thermal conductivity values for different grades of diamond. This paper also reports on the phonon scattering model using the theory of Callaway-Holland built on an off-the-shelf software platform with input terms for point defect density; extended defect density (e.g. dislocations and stacking faults); grain boundary barrier resistance and grain size, and tested against the measured thermal conductivity and other material properties. The primary objective and novelty of this work is in furthering the understanding that the state of the diamond lattice is the dominating determinant in quality and level of thermal conductance in CVD diamond, and the development of a predictive mathematical model capable of forecasting the responses as a function variation in such states. CHARACTERIZATION (BULK EFFECTS) In order to develop a fundamental understanding of phonon heat transport in polycrystalline diamond, it is essential a) have understanding of what are the governing factors impacting the thermal conductivity and b) to have a carefully measured set of thermal and material data for a range of thermal grades of diamond [1]. With those data sets in hands one can proceed to provide a definitive phonon scattering model that address outstanding questions about in-plane k xy and cross-plane k z thermal conductivity and its relation to grain size and intrinsic grain quality. Grain Size While there are CVD diamond growth chemistries that continue to promote re-nucleation to avoid grain size development, in general for a parameter such as thermal conductivity it is highly desirable to choose conditions consistent with [2]: Exceptional intra grain purity with respect to point and extended defect Exceptionally well inter-grown and low defect density grain boundaries Large grains Figure 1: Showing Nomarski microscopy of polycrystalline diamond surface and method of grain size characterization.
2 Figure 1 a shows typical cross-section of polycrystalline CVD diamond, with the fine grain nucleation material developing in size and volume with thickness. The grain structure can easily be observed by either a plasma decoration etch (opens up the grain boundaries due to different etch rates) or using non-destructive optical techniques such as Nomarski microscopy. Based on this test, the analysis shows that for this plasma and substrate chemistry, the grain size is approximately 10% of growth thickness. Heat Capacity One of the most critical factors associated with methods relying on measuring heat diffusivity to calculate the thermal conductivity or thermal boundary resistance for diamond is the understanding of the responses of fundamental properties such as heat capacity and density to factors such as the measurement temperature or the growth process conditions [3, 4]. In essence if one extract thermal data from the correlation: Diamond Thickness Sensitivity of CVD diamond thermal conductivity with respect to the changing thickness has been well established [6]. The plotted data in Figure 3 shows the improvement of thermal conductivity of diamond, using laser flash and FTIR, as more nucleation layer is removed from two different grades of diamond. This trend appears to be reaching a steady value after the removal of 25 µm of nucleation layer for 1500 W/mºK material grade. In case of the 1800 W/mºK grade diamond, the thermal conductivity continues to improve even after removal of 50 µm of material from the nucleation interface. Equation 1: It should be based on relevant, reliable and current values for. It is imperative to recognize that singularly assumed values for used for a wide range of temperature measurement would yield inaccurate results. With regards to a collaborative work with partners in US and in Europe focused on a series of internal round robin measurements for two extreme grades of diamond [5]. The intention was to determine if special allowance was needed for specific grades of diamond, or if a single value could be used whether it was single crystal, heavily doped polycrystalline, high-quality polycrystalline or nanocrystalline diamond. The two extreme cases taken were boron (ca 0.1 atomic percent; B/cm -3 ) doped polycrystalline CVD diamond (BDD), and high purity single crystal (3A) diamond (no grain boundaries and point defect density <1x10 17 cm -3 ). The indications are that a single would work for both extreme cases, and the results holds significance in two regards. Firstly, one can appreciate the significance of variation as a function of temperature (Figure 2). Second, a modest change in measurement temperature would result in a steep (17% change over 20ºK) calculated equivalence from 1250 to 1500 W/mºK thermal conductivity. Figure 3: The impact of interface material on the thermal conductivity of diamond With the exception of laser flash measurement of 1800 W/mºK grade material, the measured negative contribution of the nucleation layer to the thermal conductivity of the material is of the order of 14% to 18%. The substantially higher slope of change for the laser flash measurement of 1800 W/mºK (dashed blue line) is attributed to the lower accuracy of the technique for thinner films. CHARACTERIZATION (LATTICE EFFECTS) Phonon Scattering Model Fundamentals The special diamond lattice properties lead to very advantageous vibrational properties which boosts the thermal conductivity. The phonon density of states in diamond extends to much higher frequencies than in any other material, i.e. there are more phonons carrying the energy in the lattice. This is related to the Debye temperature of diamond, being the highest in any bulk materials and also having the highest sound velocity of any known bulk materials. For reference comparison of diamond and silicon properties are highlighted in Figure 4 and Table 1. Figure 2: Variation of heat capacity with temperature. Figure 4: Density of states of bulk Diamond vs. Silicon.
3 Properties Diamond Silicon Sound speed (Transversal acoustic branch) Debye Temperature (Transversal acoustic branch) m/s 8430 m/s K K Table 1: Salient properties of diamond compared with silicon relevant to extreme thermal properties. The thermal conductivity is given by:, where C v is the heat capacity, which depends on number of phonons carrying the heat, and v the sound velocity. However, the thermal conductivity not only depends on how many phonons and how fast they are, also it depends on how long they can travel without being disturbed/scattered. The measurement of this is the Mean Free Path of the phonons, l, which depends on the number of phonons in the lattice through the 3-phonon processes (Normal and Umpklapp), and the imperfections in the lattice (boundaries, grain boundaries, non sp3 bonds, isotopes, impurities, extended defects, dislocations, etc.). Therefore, in the real world the thermal conductivity of a given piece of diamond will depend on the quality of the lattice, being possible to observe values from 1 W/mºK (ultrananocrystalline diamond) to more than 3400 W/mºK for isotopically pure single crystal diamond. Defect and impurities Analysis and measurements TEM and scanning thermal AFM To develop any fundamental model of phonon scattering related to its thermal properties requires a range of samples measured over a wide temperature range which have been characterized for factors such as grain size, point defect density, extended defect density, sp2 fraction and isotopic purity. Many of these parameters will use specific techniques optimized for diamond such as electron paramagnetic resonance (EPR) and secondary ion mass spectroscopy (SIMS) [7, 8]. Using TEM it was possible to delineate the difference in presence of defects amongst various grades of diamond (Figure 5). Figure 5: Bright field TEM analysis reveals dislocations By combining Scanning Thermal Microscopy (SThM), which combines AFM with an electrically conductive tip to allow operation in constant current mode to probe differences in local thermal conductivity and TEM, the relationship between dislocation density and the thermal conductivity was established (Figure 6). Figure 6: Stacking faults/dislocations within a grain can have significant impact on the thermal properties. Table 2 contains a summary of experimentally determined values for disruptive properties such as nitrogen concentration, dislocation density and C-Vacancies as well as grain size for various grades of diamond. Table 2: Table of values for some disruptive properties in diamond grains measured for various grades of CVD diamond. MEASURING THE THERMAL CONDUCTIVITY Two different techniques for measuring the thermal conductivity of CVD diamond samples were used. Laser flash was used for measuring the cross-plane thermal conductivity and heated bar was used for measuring the in-plane thermal conductivity. Laser Thermal Flash Diffusivity Technique A laser-pulse technique (Figure 7) is used as the reference laboratory methodology for cross-plane thermal conductivity measurements [9]. This technique makes use of a short, highenergy, laser pulse of approximately 8 ns in duration. The pulse impinges on one face of the diamond plate. The temperature rise on the opposite face is measured via a fast (20 MHz), far-ir point photo-voltaic detector. The temperature rise as measured by the detector is read into a digital storage oscilloscope from which the thermal diffusivity, and hence, thermal conductivity is deduced. The diamond is mounted in a cryostat to ensure that the temperature of the sample is known precisely. A 5 o K variation in the temperature can cause more than a 3% error in the determined thermal conductivity at 300 o K. This technique directly measures the thermal diffusivity D, which is related to the thermal conductivity k, via the specific heat capacity C p and density ρ of the material by equation (1):
4 Figure 7: Laser-flash setup and methodology. The laser flash technique measures the thermal diffusivity perpendicular to the plane of the diamond plate. It has been reported that, in some cases, CVD diamond exhibits anisotropy in k owing to its columnar grain structure; the thermal diffusivity parallel to the plane of the plate may be lower than that perpendicular to the plate surface. A carefully designed and constructed steady state heated bar technique was used to measure the in-plane TC. Heated bar technique for measuring in-plane thermal conductivity The in-plane thermal conductivity of the diamond is calculated by using simple Joule heating thermometry [10]. In this technique a resistive heater is attached to the specimen at one end and a heat sink is attached to the opposite end. A differential temperature is measured along the length of the specimen by placing two K-type thermocouples between the heat source and the heat sink. A high precision IV probe is used to measure the power delivered to the specimen. Figure 8 shows the basic schematic of the setup. MODELING THERMAL CONDUCTIVITY Callaway-Holland Model The Callaway method has been extensively used for analysing the thermal conductivity of diamond. However, typically it has been implemented without splitting longitudinal and transversal phonon branches and making use of a big set of free parameters. This model has been implemented ignoring some nonessential integral values and accounting for phonon-phonon scattering as well as scattering caused due to point defects (substitution impurities and interstitial impurities and vacancies) and extended defects (dislocations and grain boundaries). Starting with the basic heat flux equation: 1 1, C V vl V k 3 Equation 2 : vx( E) f r p Figure 9: Thermal flux Where: C V is heat capacity (density of phonons carrying the heat) v is sounds velocity (how fast phonons can carry the heat) and l is mean free path (MFP) of phonons (how long they can travel undisturbed) Attempting to determine phonon distribution through Boltzmann transport equation: Equation 3: is non-trivial. However, one can attempt to apply relaxation time approximation to the following: Figure 8: The basic layout of the measured sample, heater, thermocouples and heat-sink. The most important engineering aspect of the in-plane k measurement tool is in achieving optimum thermal isolation, minimizing heat losses and ensuring temperature measurement accuracy while utilizing long (>30 mm) high free-standing diamond films. Once the primary factors are accurately measured, the calculation is as follows: Thermal resistance is calculated by equation 7: Thermal conductivity is calculated by equation 8: Equation 4: ( ) MATHEMATICAL MODEL This section reports on the phonon scattering model using the theory of Callaway-Holland built on a commercially available software platform and tested against the measured k and other material properties. The mathematical model was built in Mathematica with the following input characteristics (sensitivities) and accounting for the following factors that includes certain diamond lattice defects: Diamond thickness Boundary/Grain boundary scattering Isotope/Impurity impact Impact of extended and point defects Dislocations densities Electron/hole-phonon scattering
5 The model s primary outputs are: Thermal conductivity vs. temperature Thermal conductivity vs. impurity concentration (or defect concentration) Heat capacity as a function of temperature Mean Free Path (MFP) as a function of temperature Model fit versus measured data The capability of the model was verified by showing the exceptional between the measured data and the predicted trend (Figure 10). The discrete measured thermal conductivity data points for different grades of diamond are superimposed on modeled plots. The accuracy of the model is particularly notable when considering the significant differences between the four various grades of diamond. From the optical grade 2000 W/mºK thermal conductivity diamond to the opaque 1000 W/mºK, mechanical grade material. Figure 10: Model and experimental data for different grades of diamond versus temperature Figure 11: Anisotropy in thermal conductivity of diamond as a function of temperature and diamond thickness Lastly, examining the reported data from various researchers, one can see that an explanation through simplified grain boundary scattering would be a good fit for polycrystalline diamond larger than 10 µm grain size [11]. With smaller grain size the effects of excess grain boundary and the contribution of non-diamond inclusions (nucleation face growth) could explain the significant scattering of the data. It would be fair to suggest that below 1 µm grain size, a simple Calloway model will be insufficient to explain the observed scatter and the model should be adjusted for interfacial thermal resistance (Kapitza) contribution [12, 13]. In Figure 12, the data from Angadi et al was superimposed with the results of the predictive model for two different scenarios, focusing on the changes in thermal conductivity for 1500 W/mºK grade CVD diamond. One (in green) is based on Callaway alone, while the second (in red) considers additional Kapitza contribution. Another powerful outcome of the model is to enable the user to investigate the changes in anisotropy of thermal conductivity of CVD polycrystalline diamond. The illustration of that effect is presented in Figure 11, for 1800 W/mºK diamond grade. The model shows that the ratio of cross-plane to in-plane thermal conductivity of CVD diamond has a value of ~4 at 5 ºK which reduces near unity at about 400 ºK. Simply put, the lower the temperature the larger the level of anisotropy. This is primarily due to transport of heat by long MFP phonons which are more sensitive to grain size effects. Conversely, the higher the temperature the higher the isotropy as the short MFP phonons began to dominate the function of transporting the heat and the fact that they are less impacted by the grain size. Figure 12: Impact of grain size on thermal conductivity of CVD diamond While the Callaway model alone, correctly predicts the reducing trend of the thermal conductivity as a function of
6 grain size, the addition of Kapitza resistance provides a closer match for the reported data scatter in literature. SUMMARY & CONCLUSIONS In reviewing the results, one may draw the following conclusions: The model provides a broad range of coverage in predicting the thermal conductivity of diamond as a function of temperature, grain size and a number of disruptive lattice features very accurately. The model and the prevailing data suggest that thin ultrananocrystalline CVD diamond will follow the same trend and changes in the thermal conductivity as a function of grain size and thickness as the microcrystalline diamond. When considering thick diamond film properties, the ability to control and the understanding of the scattering impacts of the various forms of defects incorporated in CVD diamond lattice is paramount for optimizing CVD diamond thermal performances. Acknowledgments This work was supported by DARPA Contract No: FA C-7517, managed by Dr. Avram Bar Cohen and Dr. John Blevins with support from Dr. Joseph Maurer and Dr. Abirami Sivananthan. References [1]D.J. Twitchen, C.S.J. Pickles, S.E. Coe, et al., Thermal Conductivity Measurements on CVD Diamond, Diamond and Related Materials, 10(3-7), (2001) [2]J. Hartmann, M. Costello, and M. Reichling, Influence of Thermal Barriers on Heat Flow in High Quality Chemical Vapor Deposited Diamond, Physical Review Letter, Volume 80, Number 1, , (January 1998) [3]Sir C.V. Raman, The Heat Capacity of Diamond between 0 and 1000 o K, Proceedings of Indian Academy of Sciences, A46, , (1957) [4]A.C. Victor, Heat Capacity of Diamond at High Temperatures, The Journal of Chemical Physics, Volume 36, Number 7, , (April 1962) [5]Austrian Institute of Technology, Element Six Technologies, Thermophysical Characterization of Element Six Diamond, Commissioned Report (2013) [6]J. E. Graebner, Measurement of Thermal Conductivity and Thermal Diffusivity of CVD Diamond, International Journal of Thermophysics, Volume 19, Number 2, , (1998) [7]S. Felton, B. Cann, R. J. Cruddace, M. E. Newton and D. Fisher, EPR Measurements on the g = 2.00 Region of HPHT N Doped Diamond, A poster presentation at 57 th Diamond Conference, (2006) [8]D. Zhou, F.A. Stevie, L. Chow, et al., Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometry, Journal of Vacuum Science and Technology A, Volume 17, Number 4, , (August/July 1999) [9]B. Remy, D. Maillet, S. Andre, Laser Flash Diffusivity Measurement of Diamond Films, International Journal of Thermophysics, Volume 19, Number 3, , (May 1998) [10]S. D. Wolter, D. A. Borca-Tasciuc, G. Chen, et al., Thermal Conductivity of Epitaxially Textured Diamond Films Diamond and Related Materials, 12, 61-64, (2003) [11]M. A. Angadi, T. Watanabe, A. Bodapti, et al., Thermal Transport and Grain Boundary Conductance in Ultrananocrystalline Diamond Thin Films, Journal of Applied Physics, 99, , (2006) [12]S.L. Shinde, E.S. Piekos, J.P. Sullivan, et al., Phonon Engineering of Nanostructures, Sandia Report, SAND (2010) [13]J. A. Calvo, M. Kuball, Control of the in-plane Thermal Conductivity of Ultra-thin Nanocrystalline Diamond Films through the Grain and Grain boundary Properties, Acta Materialia, Volume 103, pp. 104 (2016)
Supporting Information
Supporting Information Large-Area, Transfer-Free, Oxide-Assisted Synthesis of Hexagonal Boron Nitride Films and Their Heterostructures with MoS2 and WS2 Sanjay Behura, Phong Nguyen, Songwei Che, Rousan
More informationMicrostructural Characterization of Materials
Microstructural Characterization of Materials 2nd Edition DAVID BRANDON AND WAYNE D. KAPLAN Technion, Israel Institute of Technology, Israel John Wiley & Sons, Ltd Contents Preface to the Second Edition
More informationPhysics and Material Science of Semiconductor Nanostructures
Physics and Material Science of Semiconductor Nanostructures PHYS 570P Prof. Oana Malis Email: omalis@purdue.edu Today Bulk semiconductor growth Single crystal techniques Nanostructure fabrication Epitaxial
More information1. Introduction. What is implantation? Advantages
Ion implantation Contents 1. Introduction 2. Ion range 3. implantation profiles 4. ion channeling 5. ion implantation-induced damage 6. annealing behavior of the damage 7. process consideration 8. comparison
More informationSolid. Imperfection in solids. Examples of Imperfections #2. Examples of Imperfections #1. Solid
Solid Imperfection in solids By E-mail: Patama.V@chula.ac.th Solid State of materials Rigid Strong bonding ionic, van der aals, metal bonding normally has crystal structure Examples of Imperfections #
More informationWhither Diamond Spreaders?
Whither Diamond Spreaders? NSF-ONR Workshop on Nano/Microscale Thermal Transport March 4, 2012 Ken Goodson Mechanical Engineering Stanford University Al silicon DC Torch Reactor, Sp3 ISI Web of Knowledge
More informationDislocations Linear Defects
Dislocations Linear Defects Dislocations are abrupt changes in the regular ordering of atoms, along a line (dislocation line) in the solid. They occur in high density and are very important in mechanical
More informationDept.of BME Materials Science Dr.Jenan S.Kashan 1st semester 2nd level. Imperfections in Solids
Why are defects important? Imperfections in Solids Defects have a profound impact on the various properties of materials: Production of advanced semiconductor devices require not only a rather perfect
More informationThermal Conductivity. Theory, Properties, and Applications. Terry M. Tritt. Kluwer Academic/Plenum Publishers
Thermal Conductivity Theory, Properties, and Applications Edited by Terry M. Tritt Clemson University Clemson, South Carolina Kluwer Academic/Plenum Publishers New York, Boston, Dordrecht, London, Moscow
More informationP. N. LEBEDEV PHYSICAL INSTITUTE OF THE RUSSIAN ACADEMY OF SCIENCES PREPRINT
P. N. LEBEDEV PHYSICAL INSTITUTE OF THE RUSSIAN ACADEMY OF SCIENCES PREPRINT 18 CHANNELING A.V. BAGULYA, O.D. DALKAROV, M.A. NEGODAEV, A.S. RUSETSKII, A.P. CHUBENKO, V.G. RALCHENKO, A.P. BOLSHAKOV EFFECT
More informationThis paper is part of the following report: UNCLASSIFIED
UNCLASSIFIED Defense Technical Information Center Compilation Part Notice ADP012199 TITLE: Grain-Size-Dependent Thermal Transport Properties in Nanocrystalline Yttria-Stabilized Zirconia DISTRIBUTION:
More informationPolycrystalline and microcrystalline silicon
6 Polycrystalline and microcrystalline silicon In this chapter, the material properties of hot-wire deposited microcrystalline silicon are presented. Compared to polycrystalline silicon, microcrystalline
More informationProcedia Chemistry 1 (2009) Proceedings of the Eurosensors XXIII conference
Procedia Chemistry 1 (2009) 609 613 Procedia Chemistry www.elsevier.com/locate/procedia Proceedings of the Eurosensors XXIII conference Thermal Characterization of Polycrystalline CVD Diamond Thin Films
More informationSiC crystal growth from vapor
SiC crystal growth from vapor Because SiC dissolves in Si and other metals can be grown from melt-solutions: Liquid phase epitaxy (LPE) Solubility of C in liquid Si is 0.029% at 1700oC high T process;
More informationChapter 2 Crystal Growth and Wafer Preparation
Chapter 2 Crystal Growth and Wafer Preparation Professor Paul K. Chu Advantages of Si over Ge Si has a larger bandgap (1.1 ev for Si versus 0.66 ev for Ge) Si devices can operate at a higher temperature
More informationRepetition: Adhesion Mechanisms
Repetition: Adhesion Mechanisms a) Mechanical interlocking b) Monolayer/monolayer c) Chemical bonding d) Diffusion e) Psedo diffusion due to augmented energy input (hyperthermal particles) Repetition:
More information7 µc-si:h n-i-p solar cells on textured Ag ZnO:Al back reflectors
7 µc-si:h n-i-p solar cells on textured Ag ZnO:Al back reflectors 7.1 Introduction The present study on ZnO:Al and textured Ag back reflectors is aimed at application in thin film µc-si n-i-p solar cells.
More informationRecent progress in the growth of heteroepitaxial diamond for detector applications
Recent progress in the growth of heteroepitaxial diamond for detector applications 4th ADAMAS Workshop at GSI 2015-12-03 2015-12-04 Michael Mayr, Oliver Klein, Martin Fischer, Stefan Gsell, Matthias Schreck
More informationCHAPTER 4: Oxidation. Chapter 4 1. Oxidation of silicon is an important process in VLSI. The typical roles of SiO 2 are:
Chapter 4 1 CHAPTER 4: Oxidation Oxidation of silicon is an important process in VLSI. The typical roles of SiO 2 are: 1. mask against implant or diffusion of dopant into silicon 2. surface passivation
More informationInfluence of optically active defects on thermal conductivity of polycrystalline diamond
Eur. Phys. J. Appl. Phys. 80, 20102 (2017) EDP Sciences, 2017 DOI: 10.1051/epjap/2017170217 Regular Article THE EUROPEAN PHYSICAL JOURNAL APPLIED PHYSICS Influence of optically active defects on thermal
More informationMaterial Science. Prof. Satish V. Kailas Associate Professor Dept. of Mechanical Engineering, Indian Institute of Science, Bangalore India
Material Science Prof. Satish V. Kailas Associate Professor Dept. of Mechanical Engineering, Indian Institute of Science, Bangalore 560012 India Chapter 5. Diffusion Learning objectives: - To know the
More informationGrowth and properties of (ultra) nano crystalline diamond
Growth and properties of (ultra) nano crystalline diamond Hadwig Sternschulte 1,2 1 nanotum, Technische Universität München, D-85748 Garching, Germany 2 Physik Department E19, Technische Universität München,
More informationBoron doped diamond deposited by microwave plasma-assisted CVD at low and high pressures
Available online at www.sciencedirect.com Diamond & Related Materials 17 (2008) 481 485 www.elsevier.com/locate/diamond Boron doped diamond deposited by microwave plasma-assisted CVD at low and high pressures
More informationINFLUENCE OF NEEDLED FELT C/C PROCESSING ON FRICTION PERFORMANCE
INFLUENCE OF NEEDLED FELT C/C PROCESSING ON FRICTION PERFORMANCE Christopher Byrne Southern Illinois University at Carbondale Center for Advanced Friction Studies Mechanical Engineering and Energy Processes
More informationLab IV: Electrical Properties
Lab IV: Electrical Properties Study Questions 1. How would the electrical conductivity of the following vary with temperature: (a) ionic solids; (b) semiconductors; (c) metals? Briefly explain your answer.
More informationChapter 4. Ionic conductivity of GDC. electrolyte
Chapter 4 Ionic conductivity of GDC electrolyte 4.1 Introduction Solid oxides with fluorite structure, such as, ZrO 2 and CeO 2, when doped with aliovalent cations become oxygen ion conductor and are used
More informationDeformation Criterion of Low Carbon Steel Subjected to High Speed Impacts
Deformation Criterion of Low Carbon Steel Subjected to High Speed Impacts W. Visser, G. Plume, C-E. Rousseau, H. Ghonem 92 Upper College Road, Kingston, RI 02881 Department of Mechanical Engineering, University
More informationDefinition and description of different diffusion terms
Definition and description of different diffusion terms efore proceeding further, it is necessary to introduce different terms frequently used in diffusion studies. Many terms will be introduced, which
More informationUniversity of Bristol - Explore Bristol Research
Liu, D., Francis, D., Faili, F., Middleton, C., Anaya, J., Pomeroy, J. W.,... Kuball, M. (2017). Impact of diamond seeding on the microstructural properties and thermal stability of GaN-on-diamond wafers
More informationExcimer Laser Annealing of Hydrogen Modulation Doped a-si Film
Materials Transactions, Vol. 48, No. 5 (27) pp. 975 to 979 #27 The Japan Institute of Metals Excimer Laser Annealing of Hydrogen Modulation Doped a-si Film Akira Heya 1, Naoto Matsuo 1, Tadashi Serikawa
More informationLearning Objectives. Chapter Outline. Solidification of Metals. Solidification of Metals
Learning Objectives Study the principles of solidification as they apply to pure metals. Examine the mechanisms by which solidification occurs. - Chapter Outline Importance of Solidification Nucleation
More informationCharacterization of Nanoscale Electrolytes for Solid Oxide Fuel Cell Membranes
Characterization of Nanoscale Electrolytes for Solid Oxide Fuel Cell Membranes Cynthia N. Ginestra 1 Michael Shandalov 1 Ann F. Marshall 1 Changhyun Ko 2 Shriram Ramanathan 2 Paul C. McIntyre 1 1 Department
More informationCHAPTER 4 THE STUDIES OF THE CVD GROWTH PROCESS FOR EPITAXIAL DIAMOND (100) FILMS USING UHV STM
CHAPTER 4 THE STUDIES OF THE CVD GROWTH PROCESS FOR EPITAXIAL DIAMOND (100) FILMS USING UHV STM 4.1 Introduction This chapter presents studies of the CVD diamond growth process using UHV STM. It has been
More informationmuch research (in physics, chemistry, material science, etc.) have been done to understand the difference in materials properties.
1.1: Introduction Material science and engineering Classify common features of structure and properties of different materials in a well-known manner (chemical or biological): * bonding in solids are classified
More informationImaging with Diffraction Contrast
Imaging with Diffraction Contrast Duncan Alexander EPFL-CIME 1 Introduction When you study crystalline samples TEM image contrast is dominated by diffraction contrast. An objective aperture to select either
More informationNucleation and growth of nanostructures and films. Seongshik (Sean) Oh
Nucleation and growth of nanostructures and films Seongshik (Sean) Oh Outline Introduction and Overview 1. Thermodynamics and Kinetics of thin film growth 2. Defects in films 3. Amorphous, Polycrystalline
More informationFigure 2.3 (cont., p. 60) (e) Block diagram of Pentium 4 processor with 42 million transistors (2000). [Courtesy Intel Corporation.
Figure 2.1 (p. 58) Basic fabrication steps in the silicon planar process: (a) oxide formation, (b) selective oxide removal, (c) deposition of dopant atoms on wafer, (d) diffusion of dopant atoms into exposed
More informationAnisotropic and Nonhomogeneous Thermal Conduction in 1 µm Thick CVD Diamond
Anisotropic and Nonhomogeneous Thermal Conduction in 1 µm Thick CVD Diamond Aditya Sood 1,2, Jungwan Cho 1, Karl D. Hobart 3, Tatyana Feygelson 3, Bradford Pate 3, Mehdi Asheghi 1, Kenneth E. Goodson 1
More informationImperfections, Defects and Diffusion
Imperfections, Defects and Diffusion Lattice Defects Week5 Material Sciences and Engineering MatE271 1 Goals for the Unit I. Recognize various imperfections in crystals (Chapter 4) - Point imperfections
More informationStudy on Be and Si Doping of Cubic Boron Nitride Films YE QING
Study on Be and Si Doping of Cubic Boron Nitride Films YE QING MASTER OF PHILOSOPHY CITY UNIVERSITY OF HONG KONG APRIL 2008 CITY UNIVERSITY OF HONG KONG 香港城市大學 Study on Be and Si Doping of Cubic Boron
More informationMaterials Aspects of GaAs and InP Based Structures
AT&T Materials Aspects of GaAs and InP Based Structures V. Swaminathan AT&T Belt Laboratories Breinigsvil/e, Pennsylvania A. T. Macrander Argonne National Laboratory Argonne, Illinois m Prentice Hall,
More informationSupporting Online Material for
www.sciencemag.org/cgi/content/full/327/5961/60/dc1 Supporting Online Material for Polarization-Induced Hole Doping in Wide Band-Gap Uniaxial Semiconductor Heterostructures John Simon, Vladimir Protasenko,
More informationChapter 5 Epitaxial Growth of Si 1-y C y Alloys
Chapter 5 Epitaxial Growth of Si 1-y C y Alloys 5.1 Introduction Traditionally, the incorporation of substitutional carbon into silicon and silicongermanium alloys during growth is of great interest for
More informationSilver Diffusion Bonding and Layer Transfer of Lithium Niobate to Silicon
Chapter 5 Silver Diffusion Bonding and Layer Transfer of Lithium Niobate to Silicon 5.1 Introduction In this chapter, we discuss a method of metallic bonding between two deposited silver layers. A diffusion
More informationSupplementary Information
Supplementary Information Supplementary Figure 1 Characterization of precursor coated on salt template. (a) SEM image of Mo precursor coated on NaCl. Scale bar, 50 μm. (b) EDS of Mo precursor coated on
More information3D Nano-analysis Technology for Preparing and Observing Highly Integrated and Scaled-down Devices in QTAT
Hitachi Review Vol. 54 (2005), No. 1 27 3D Nano-analysis Technology for Preparing and Observing Highly Integrated and Scaled-down Devices in QTAT Toshie Yaguchi Takeo Kamino Tsuyoshi Ohnishi Takahito Hashimoto
More informationChapter 4 One-dimensional Nanostructures: Nanowires and Nanorods
Chapter 4 One-dimensional Nanostructures: Nanowires and Nanorods Introduction 4.2 Spontaneous Growth 4.2.2 Vapor-liquid-solid growth 4.3 Template-based Synthesis 4.3.1 Electrochemical deposition 4.3.2
More informationLecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE Dr. Alan Doolittle
Lecture 12 Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12 Evaporation and Sputtering (Metalization) Evaporation For all devices, there is a need to go from semiconductor to metal.
More informationHot-wire deposited intrinsic amorphous silicon
3 Hot-wire deposited intrinsic amorphous silicon With the use of tantalum as filament material, it is possible to decrease the substrate temperature of hot-wire deposited intrinsic amorphous silicon, while
More informationFrom sand to silicon wafer
From sand to silicon wafer 25% of Earth surface is silicon Metallurgical grade silicon (MGS) Electronic grade silicon (EGS) Polycrystalline silicon (polysilicon) Single crystal Czochralski drawing Single
More informationTHE exceptional properties of diamond promise to make
JOURNAL OF THERMOPHYSICS AND HEAT TRANSFER Vol. 11, No., October December 1997 Impact of Nucleation Density on Thermal Resistance near Diamond-Substrate Boundaries M. N. Touzelbaev* and K. E. Goodson Stanford
More information3. Solidification & Crystalline Imperfections
3. Solidification & Crystalline Imperfections solidification (casting process) of metals divided into two steps (1) nucleation formation of stable nuclei in the melt (2) growth of nuclei into crystals
More informationFabrication Process. Crystal Growth Doping Deposition Patterning Lithography Oxidation Ion Implementation CONCORDIA VLSI DESIGN LAB
Fabrication Process Crystal Growth Doping Deposition Patterning Lithography Oxidation Ion Implementation 1 Fabrication- CMOS Process Starting Material Preparation 1. Produce Metallurgical Grade Silicon
More informationSEMICONDUCTORS R. A. SMITH CAMBRIDGE AT THE UNIVERSITY PRESS. M.A., PH.D. Head of the Physics Department Royal Radar Establishment Malvern J 959
SEMICONDUCTORS BY R. A. SMITH M.A., PH.D. Head of the Physics Department Royal Radar Establishment Malvern CAMBRIDGE AT THE UNIVERSITY PRESS J 959 CONTENTS Chapter 1. The Elementary Properties of Semiconductors
More informationHall coefficient, mobility and carrier concentration as a function of composition and thickness of Zn-Te thin films
Available online at www.pelagiaresearchlibrary.com Advances in Applied Science Research, 2015, 6(4):215-220 ISSN: 0976-8610 CODEN (USA): AASRFC Hall coefficient, mobility and carrier concentration as a
More informationNanosecond Laser Processing of Diamond Materials
Lasers in Manufacturing Conference 2015 Nanosecond Laser Processing of Diamond Materials Jan-Patrick Hermani a, *, Christian Brecher a, Michael Emonts a a Fraunhofer IPT, Steinbachstr. 17, 52074 Aachen,
More informationActivation Behavior of Boron and Phosphorus Atoms Implanted in Polycrystalline Silicon Films by Heat Treatment at 250 C
Japanese Journal of Applied Physics Vol. 44, No. 3, 2005, pp. 1186 1191 #2005 The Japan Society of Applied Physics Activation Behavior of Boron and Phosphorus Atoms Implanted in Polycrystalline Silicon
More informationOptical Characterization of Epitaxial Semiconductor Layers
Günther Bauer Wolfgang Richter (Eds.) Optical Characterization of Epitaxial Semiconductor Layers With 271 Figures Springer Contents Contributors XV 1 Introduction 1 Günther Bauer, Wolfgang Richter 2 Analysis
More informationFeasibility study for Ultrasonic Examination of High thickness Austenitic Stainless Steel Forgings
Feasibility study for Ultrasonic Examination of High thickness Austenitic Stainless Steel Forgings Ashutosh Singh L&T Special Steels and Heavy Forgings, More info about this article: http://www.ndt.net/?id=21156
More informationrespectively. A plot of the Raman shift position as a function of layer number in Figure S1(c)
Supplementary Information - Mapping of Shear and Layer-Breathing Raman modes in CVD-Grown Transition Metal Dichalcogenides: Layer Number, Stacking Orientation and Resonant Effects Maria O Brien 1,2, Niall
More informationFused-Salt Electrodeposition of Thin-Layer Silicon
NREL/CP-450-22928 UC Category: 1250 Fused-Salt Electrodeposition of Thin-Layer Silicon J.T. Moore, T.H. Wang, M.J. Heben, K. Douglas, and T.F. Ciszek Presented at the 26th IEEE Photovoltaic Specialists
More informationManufacturability of highly doped Aluminum Nitride films
Manufacturability of highly doped Aluminum Nitride films Sergey Mishin Yury Oshmyansky Advanced Modular Systems, Inc Goleta, CA/USA smishin@amssb.com yoshmyansky@amssb.com Abstract There have been several
More informationMolecular Beam Epitaxy (MBE) BY A.AKSHAYKRANTH JNTUH
Molecular Beam Epitaxy (MBE) BY A.AKSHAYKRANTH JNTUH CONTENTS Introduction What is Epitaxy? Epitaxy Techniques Working Principle of MBE MBE process & Epitaxial growth Working conditions Operation Control
More informationThe story so far: Isolated defects
The story so far: Infinite, periodic structures have Bloch wave single-particle states, labeled by a wavenumber k. Translational symmetry of the lattice + periodic boundary conditions give discrete allowed
More informationATOMIC LAYER DEPOSITION OF 2D TRANSITION METAL DICHALOGENIDES
ATOMIC LAYER DEPOSITION OF 2D TRANSITION METAL DICHALOGENIDES Annelies Delabie, M. Caymax, B. Groven, M. Heyne, K. Haesevoets, J. Meersschaut, T. Nuytten, H. Bender, T. Conard, P. Verdonck, S. Van Elshocht,
More informationSupplementary Materials for
advances.sciencemag.org/cgi/content/full/4/8/eaat4712/dc1 Supplementary Materials for In situ manipulation and switching of dislocations in bilayer graphene Peter Schweizer, Christian Dolle, Erdmann Spiecker*
More informationECE 440 Lecture 27 : Equilibrium P-N Junctions I Class Outline:
ECE 440 Lecture 27 : Equilibrium P-N Junctions I Class Outline: Fabrication of p-n junctions Contact Potential Things you should know when you leave Key Questions What are the necessary steps to fabricate
More informationThermal Evaporation. Theory
Thermal Evaporation Theory 1. Introduction Procedures for depositing films are a very important set of processes since all of the layers above the surface of the wafer must be deposited. We can classify
More informationA Preliminary Report on Phygen s Chromium Nitride Coatings. John B. Woodford, Ph.D. and. Mohumad al-zoubi, Ph.D. Argonne National Laboratory
A Preliminary Report on Phygen s Chromium Nitride Coatings by John B. Woodford, Ph.D and Mohumad al-zoubi, Ph.D Argonne National Laboratory Introduction To protect a vulnerable surface from wear or chemical
More informationPROCESS FLOW AN INSIGHT INTO CMOS FABRICATION PROCESS
Contents: VI Sem ECE 06EC63: Analog and Mixed Mode VLSI Design PROCESS FLOW AN INSIGHT INTO CMOS FABRICATION PROCESS 1. Introduction 2. CMOS Fabrication 3. Simplified View of Fabrication Process 3.1 Alternative
More informationAn advantage of thin-film silicon solar cells is that they can be deposited on glass substrates and flexible substrates.
ET3034TUx - 5.2.1 - Thin film silicon PV technology 1 Last week we have discussed the dominant PV technology in the current market, the PV technology based on c-si wafers. Now we will discuss a different
More informationMicroelettronica. Planar Technology for Silicon Integrated Circuits Fabrication. 26/02/2017 A. Neviani - Microelettronica
Microelettronica Planar Technology for Silicon Integrated Circuits Fabrication 26/02/2017 A. Neviani - Microelettronica Introduction Simplified crosssection of an nmosfet and a pmosfet Simplified crosssection
More informationSession 1A4a AC Transport, Impedance Spectra, Magnetoimpedance
Session 1A4a AC Transport, Impedance Spectra, Magnetoimpedance Magneto-impedance of [Co 40Fe 40B 20/Cu] Multilayer Films S. U. Jen, T. Y. Chou, C. K. Lo,.................................................................
More information10/7/ :43 AM. Chapter 5. Diffusion. Dr. Mohammad Abuhaiba, PE
10/7/2013 10:43 AM Chapter 5 Diffusion 1 2 Why Study Diffusion? Materials of all types are often heat-treated to improve their properties. a heat treatment almost always involve atomic diffusion. Often
More informationCHAPTER 3. Experimental Results of Magnesium oxide (MgO) Thin Films
CHAPTER 3 Experimental Results of Magnesium oxide (MgO) Thin Films Chapter: III ---------------------------------------------------------------- Experimental Results of Magnesium oxide (MgO) Thin Films
More informationSUPPLEMENTARY INFORMATION
SUPPLEMENTARY INFORMATION doi:.38/nphoton..7 Supplementary Information On-chip optical isolation in monolithically integrated nonreciprocal optical resonators Lei Bi *, Juejun Hu, Peng Jiang, Dong Hun
More informationAmorphous and Polycrystalline Thin-Film Transistors
Part I Amorphous and Polycrystalline Thin-Film Transistors HYBRID AMORPHOUS AND POLYCRYSTALLINE SILICON DEVICES FOR LARGE-AREA ELECTRONICS P. Mei, J. B. Boyce, D. K. Fork, G. Anderson, J. Ho, J. Lu, Xerox
More informationDefects in solids http://www.bath.ac.uk/podcast/powerpoint/inaugural_lecture_250407.pdf http://www.materials.ac.uk/elearning/matter/crystallography/indexingdirectionsandplanes/indexing-of-hexagonal-systems.html
More informationCHAPTER 5: DIFFUSION IN SOLIDS
CHAPTER 5: DIFFUSION IN SOLIDS ISSUES TO ADDRESS... How does diffusion occur? Why is it an important part of processing? How can the rate of diffusion be predicted for some simple cases? How does diffusion
More informationSupplimentary Information. Large-Scale Synthesis and Functionalization of Hexagonal Boron Nitride. Nanosheets
Electronic Supplementary Material (ESI) for Nanoscale. This journal is The Royal Society of Chemistry 2014 Supplimentary Information Large-Scale Synthesis and Functionalization of Hexagonal Boron Nitride
More informationProcess Flow in Cross Sections
Process Flow in Cross Sections Process (simplified) 0. Clean wafer in nasty acids (HF, HNO 3, H 2 SO 4,...) --> wear gloves! 1. Grow 500 nm of SiO 2 (by putting the wafer in a furnace with O 2 2. Coat
More informationIMPERFECTIONSFOR BENEFIT. Sub-topics. Point defects Linear defects dislocations Plastic deformation through dislocations motion Surface
IMPERFECTIONSFOR BENEFIT Sub-topics 1 Point defects Linear defects dislocations Plastic deformation through dislocations motion Surface IDEAL STRENGTH Ideally, the strength of a material is the force necessary
More informationR Sensor resistance (Ω) ρ Specific resistivity of bulk Silicon (Ω cm) d Diameter of measuring point (cm)
4 Silicon Temperature Sensors 4.1 Introduction The KTY temperature sensor developed by Infineon Technologies is based on the principle of the Spreading Resistance. The expression Spreading Resistance derives
More informationFerromagnetic transition in Ge 1 x Mn x Te semiconductor layers
Materials Science-Poland, Vol. 25, No. 2, 2007 Ferromagnetic transition in Ge 1 x Mn x Te semiconductor layers W. KNOFF *, P. DZIAWA, V. OSINNIY, B. TALIASHVILI, V. DOMUCHOWSKI, E. ŁUSAKOWSKA, K. ŚWIĄTEK,
More informationDefects and Diffusion
Defects and Diffusion Goals for the Unit Recognize various imperfections in crystals Point imperfections Impurities Line, surface and bulk imperfections Define various diffusion mechanisms Identify factors
More informationChapter Outline Dislocations and Strengthening Mechanisms. Introduction
Chapter Outline Dislocations and Strengthening Mechanisms What is happening in material during plastic deformation? Dislocations and Plastic Deformation Motion of dislocations in response to stress Slip
More informationAn atomic level study on the out-of-plane thermal conductivity of polycrystalline argon nanofilm
Article Engineering Thermophysics January 2012 Vol.57 No.2-3: 294298 doi: 10.1007/s11434-011-4787-2 An atomic level study on the out-of-plane thermal conductivity of polycrystalline argon nanofilm JU ShengHong
More informationCEMS study on diluted magneto titanium oxide films prepared by pulsed laser deposition
Hyperfine Interact (2006) 168:1065 1071 DOI 10.1007/s10751-006-9406-2 CEMS study on diluted magneto titanium oxide films prepared by pulsed laser deposition K. Nomura & K. Inaba & S. Iio & T. Hitosugi
More informationSUPPLEMENTARY INFORMATION
High Electrochemical Activity of the Oxide Phase in Model Ceria- and Ceria-Ni Composite Anodes William C. Chueh 1,, Yong Hao, WooChul Jung, Sossina M. Haile Materials Science, California Institute of Technology,
More informationEffects of Lead on Tin Whisker Elimination
Effects of Lead on Tin Whisker Elimination Wan Zhang and Felix Schwager Rohm and Haas Electronic Materials Lucerne, Switzerland inemi Tin Whisker Workshop at ECTC 0 May 30, 2006, in San Diego, CA Efforts
More informationHigh Performance Optical Coatings Deposited Using Closed Field Magnetron Sputtering
High Performance Optical Coatings Deposited Using Closed Field Magnetron Sputtering D.R. Gibson, I.T. Brinkley, and J.L. Martin Applied Multilayers LLC, 1801 SE Commerce Avenue, Battle Ground, WA 98604
More informationNonlinear Thickness and Grain Size Effects on the Thermal Conductivity of CuFeSe 2 Thin Films
CHINESE JOURNAL OF PHYSICS VOL. 51, NO. 1 February 2013 Nonlinear Thickness and Grain Size Effects on the Thermal Conductivity of CuFeSe 2 Thin Films P. C. Lee, 1, 2, 3, M. N. Ou, 3 Z. W. Zhong, 3 J. Y.
More informationOptically Assisted Metal-Induced Crystallization of Thin Si Films for Low-Cost Solar Cells
Optically Assisted Metal-Induced Crystallization of Thin Si Films for Low-Cost Solar Cells Wei Chen, Bhushan Sopori, Kim Jones, and Robert Reedy, National Renewable Energy Laboratory, Golden, CO; N. M.
More information1 HRL Laboratories, LLC, Malibu, California, Baskin School of Engineering, University of California, Santa Cruz, CA *
High Cooling Power Density of SiGe/Si Superlattice Microcoolers Gehong Zeng, Xiaofeng Fan, Chris LaBounty, John E. Bowers, Edward Croke, James Christofferson, Daryoosh Vashaee, Yan Zhang, and Ali Shakouri
More informationDamage buildup in GaN under ion bombardment
PHYSICAL REVIEW B VOLUME 62, NUMBER 11 15 SEPTEMBER 2000-I Damage buildup in GaN under ion bombardment S. O. Kucheyev,* J. S. Williams, and C. Jagadish Department of Electronic Materials Engineering, Research
More informationAmorphous Materials Exam II 180 min Exam
MIT3_071F14_ExamISolutio Name: Amorphous Materials Exam II 180 min Exam Problem 1 (30 Points) Problem 2 (24 Points) Problem 3 (28 Points) Problem 4 (28 Points) Total (110 Points) 1 Problem 1 Please briefly
More informationRapid Imaging of Microstructure using Spatially Resolved Acoustic Spectroscopy
Rapid Imaging of Microstructure using Spatially Resolved Acoustic Spectroscopy Steve Sharples, Matt Clark, Wenqi Li, Mike Somekh Applied Optics Group School of Electrical & Electronic Engineering University
More informationSupplementary Figures
Supplementary Figures Supplementary Figure 1 Structural Characterization of the BTO single crystal by XRD: The panel (a) shows the unit cell of P4mm BaTiO3. In tetragonal P4mm BaTiO3 (BTO), ferroelectricity
More informationCo-Evolution of Stress and Structure During Growth of Polycrystalline Thin Films
Co-Evolution of Stress and Structure During Growth of Polycrystalline Thin Films Carl V. Thompson and Hang Z. Yu* Dept. of Materials Science and Engineering MIT, Cambridge, MA, USA Effects of intrinsic
More informationH.H. WILLS PHYSICS LABORATORY, UNIVERSITY OF BRISTOL, BRISTOL, BS8 1TL, UK
Achieving the Best Thermal Performance for -on- J. Pomeroy a *, M. Bernardoni a, A. Sarua a, A. Manoi a, D.C. Dumka b, D.M. Fanning b, M. Kuball a A H.H. WILLS PHYSICS LABORATORY, UNIVERSITY OF BRISTOL,
More information