WHEN THIN FILM MATTERS PVD SYSTEMS.

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1 WHEN THIN FILM MATTERS PVD SYSTEMS

2 WHEN THIN FILM MATTERS POLYTEKNIK AS Polyteknik AS is a PVD equipment manufacturer with an innovative and best service approach. With more than twenty years in business, industry. FLEXIBILITY RELIABILITY KNOWHOW DEDICATION PVD SYSTEMS The portfolio of platform systems range from small scale R&D to high volume or large area deposition systems. Polyteknik AS cover several deposition processes including sputtering, evaporation, and varieties of these. At Polyteknik AS you will meet a dedicated team interested purposes. Our reliable PVD systems are featuring: Modular standard systems Modular process packages Modular investment platforms HISTORY Director and Owner, Jens William Larsen (M.Sc.) founded Polyteknik AS in During the years, we have grown from being a local knowhow and technology platforms

3 YOUR NEXT PVD SYSTEM DRIVEN BY UNIQUE PROCESSES Epitaxial Growth Highly ionised sputtering Glancing Angle Deposition Combined evaporation and sputtering BROAD MARKET APPLICATION Semiconductor and MEMS Automotive & Power electronics Optical sensors and communication Advanced packaging Photovoltaics R&D FLEXTURA PVD PLATFORM from Polyteknik AS is unveiling a new way of modular thinking for PVD systems. From the single chamber with classic PVD processes investments follow increasing demands of your facility. The Polyteknik Flextura systems are highlighting a unique combination of high 03

4 MODULARITY OF THE FLEXTURA PVD PLATFORM 04

5 FLEXIBLE PRODUCTION FLEXTURA SPUTTER FLEXIBILITY AND PREPARED FOR THE FUTURE 7KH )OH[WXUD 6SXWWHU PRGXOH ZDV RULJLQDOO\ GHVLJQHG ZLWK ȵH[LELOLW\ DQG PHGLXP YROXPH sputtering processes in mind. Meaning multiple smaller targets to limit the capital binding Sputtering of metals, dielectrics, oxides, and nitrides in noble target materials. The typical application could be as a batch process, but the compatibility with the Flextura Cluster platform also opens to upgrade to a fully automated ΖGHDO IRU UHDFWLYH VSXWWHULQJ DQG WUXH FR GHSRVLWLRQ IURP PXOWLSOH WDUJHWV Single wafer or batch process FDVVHWWH WR FDVVHWWH RSHUDWLRQ IROORZLQJ DQ\ LQFUHDVHG QHHG RI FDSDFLW\ High quality, high uniformity layers Scalable capacity from medium to high volume production for low Cost of Ownership The Sputter modules of the Flextura PVD platform handles sputtering processes from Very small footprint and a clean design standard metallisation or electrode layers to reactive sputtering of AlN, TCOs or even ternary alloys. 6WURQJ UHOLDEOH SURGXFWLRQ WRROV Fully automated process control with advanced data logging 6(&6 *(0 0(6 LQWHJUDWLRQ RSWLRQDO Wide range of processes: DC, Pulsed DC, HiPIMS, RF, and MF 05

6 FLEXIBLE PROCESSES FLEXTURA EVAPORATOR as well as ion beam assisted deposition (IBAD). Though not well known as a process in connection with a cluster tool, the Flextura Evaporator modules can be connected to the Flextura Cluster platform for single substrate processing of advanced processes such as FLEXIBILITY AND RELIABILITY IS THE KEY! New clean design and smaller footprint Various processes: Thermal evaporation Ion beam assisted deposition (IBAD) High quality, high uniformity layers Scalable capacity from medium to high volume production for low Cost of Ownership Fully automated process control with advanced data logging ADVANCED PROCESS CONTROL OTM (Optical Thickness Monitor) 03 06

7 FLEXIBLE INVESTMENT VOLUME PRODUCTION APPLICATIONS High yield production by PVD: Metallisation, TCOs, AlN, optical Glancing Angle Deposition on wafers in mass production scale (GLAD) semicon solutions PROCESS MODULES FLEXTURA CLUSTER The Flextura Cluster platform is unveiling a new way of modular thinking of PVD systems Flexible production and prepared for the future. The Flextura PVD platform is truly almost Plug&Play and you may add process modules as your need for capacity or new processes increase. The modules function as stand alone units see Flextura Sputter or Flextura Evaporator which may be connected to a Flextura PVD Cluster. Increased layer quality Epitaxial growth HiPIMS sputtering (highly ionised) chamber High aspect ratio metallisation Layer property tuning Direct magnetron sputtering (DC, RF and pdc) cassette 03 07

8 UNIQUE PROCESS CONTROL WITH CRYOSOFT *HQHULF LQ KRXVH GHYHORSHG VRIWZDUH 9HU\ XVHU IULHQGO\ Ȃ VLPSOH WR RSHUDWH Multiple user levels Recipe based processing Save, load, edit recipes Multilayer or multiprocesses Individual or batch recipe )XOO\ DXWRPDWLF RU VHPL DXWRPDWLF PRGH Advanced datalogging of all process parameters System status integrated feedback from components Remote system monitoring or operation SPECIALISED APPLICATIONS 3URFHVV IUDPH IRU HSLWD[LDO JURZWK RI WKLQ ȴOPV DW HOHYDWHG WHPSHUDWXUHV XS WR r& +LJK 3UHVVXUH 5*$ IRU G\QDPLF LQ VLWX UHJXODWLRQ LQ UHDFWLYH VSXWWHULQJ SURFHVV 3ODVPD (PLVVLRQ 0RQLWRULQJ 3(0 IRU LQ VLWX G\QDPLF UHJXODWLRQ RI ȵRZ RU SRZHU WR DFKLHYH controlled stoichiometry, and deposition rate in especially reactive sputtering processes HiPIMS sputtering for highly ionised deposition (OHFWURVWLF FKXFN (6& ZLWK EDFNVLGH JDV IRU VXEVWUDWH FRROLQJ RU KHDWLQJ 5) '& ELDV RSWLRQ Market leading process software technology for accurate real time control of deposition 03 08

9 A SPUTTERING WORKHORSE PROCESSES Single or dual side sputtering DC, RF, pdc or HiPIMS Plasma cleaning Single or multilayer deposition without breaking vacuum APPLICATION AND CAPACITY Versatile development tool and medium volume production tool Proven volume production of QCM biosensors and biomedical electrodes DISCOVERY A true workhorse for medium volume sputtering. The Discovery platform is a typical batch system with single or dual side sputtering perfect for deposition of electrodes on temperature sensitive piezoelectric materials, biosensors etc. electrodes in volume production of QCM biosensors and through hole electrode coating

10 ENDLESS VERTICAL SPUTTERING NUMEROUS BENEFITS Modular design Short pump down times High uniformity coating Vertical sputtering Limited pinhole defects High volume Large area manufacturing PROCESSES Sputtering of metals and dielectrics Controlled reactive sputtering Proven through hole deposition on large area Up to 6 linear magnetrons Dual side sputtering Plasma cleaning and degassing TYPICAL APPLICATION AREAS INFINITY SYSTEMS is a modular system comprised of minimum one process chamber and a load lock. The throughput can gradually be increased by adding MEMS and Piezo sensor fabrication Battery, Fuel cell and TEG production Membranes and solar absorbers HiPIMS and biasing for through hole metallisation on temperature sensitive piezo ceramic composites

11 SPECIALISED APPLICATONS TURNKEY SYSTEMS Tube coating (internal and external) control ROLL-TO-ROLL Linear or drum design Substrates: Metals, polymers, textiles etc. Special substrate: Silicone web Transparent conductive oxides Metallisation, electrode layers Semiconducting oxides TUBE COATING CUSTOM COATING SYSTEMS processes ensuring high reliability, high quality and optimised throughput of the production line. Multilayer optical absorber coating Automated process Internal tube coaters Accelerator and synchrotron components 03 11

12 POLYTEKNIK AS Moellegade 21 DK9750 Oestervraa Denmark PHONE: WEB: MADE IN DENMARK