Vertically aligned Ni magnetic nanowires fabricated by diblock-copolymer-directed Al thin film anodization
|
|
- Audra Freeman
- 6 years ago
- Views:
Transcription
1 Vertically aligned Ni magnetic nanowires fabricated by diblock-copolymer-directed Al thin film anodization Researcher: Kunbae (Kevin) Noh, Graduate Student, MAE Dept. and CMRR Collaborators: Leon Chen, Research Scientist, MAE Dept. and CMRR Edward Choi, Postdoctoral Researcher, MAE Dept. and CMRR Stanley Kim, Graduate Student, MAE Dept. and CMRR Advisor: Sungho Jin, Professor, MAE Dept. and CMRR Center for Magnetic Recording Research & MAE Department University of California, San Diego 1
2 Outline Introduction - Nano patterning by diblock copolymer - Nano patterning by anodized aluminum oxide Experimental Results and Analysis - Schematic process illustration - Diblock copolymer formation - Pattern transfer by reactive ion etch - Al guided anodization using patterned diblock copolymer - Ni nanowires (NWs) electrodeposition into vertical pores Future Plans - Strategies to improve pattern density and periodicity - Fabrication of composite soft/hard magnetic nanowires Summary 2
3 Introduction What are block copolymers? Comprise two or more homopolymer subunits linked by covalent bonds A B ex) PS-b-PMMA (Polystrylene-block-poly(methyl methacrylate)) Diblock copolymer Due to its self ordering nature at certain conditions, it can be used as a building block for nanofabrication A B A(C) Advantages Simple, fast and parallel fabrication process Triblock copolymer Higher pattern density compared to other self ordered templates such as AAO Tailorable pore size and pitch distance Drawbacks Small thickness of BCP template Low selectivity as an RIE etch mask Lack of long range ordering if not guided Bockstaller et al., Adv. Mat 17, 1331 (2005) 3
4 Among these Polystyrene-b-poly(4-vinylpyridine) micelle structure [expressed as PS-b-P4VP] in solvent such as toluene and ethanol is one of the frequently studied materials. Hexagonally close packed arrangement as being cast on Si substrate Further reorganized when being annealed at specific solvent vapor atmosphere toluene spin coat PS P4VP PS in corona; P4VP in core Self assemble of monolayer 4
5 Anodized Aluminum Oxide Approach Versatile Platform Because of: -. Self-ordered nature -. Economic method -. Simple process -. High aspect ratios -. Tailored pore size
6 Aluminum Anodizing Process Anodization set-up Self-ordered - + guided Pt Electrolyte Al Masuda and Fukuda, Science 268, 1466 (1995) Masuda et al. Appl. Phys. Lett. 71, 2770 (1997) 6
7 Pattern Creation by e-beam Lithography Guided AAO Processing for Periodic, Square Patterns Self-ordered region 25nm E-beam guided + AAO nanopatterned region obtained at UCSD 7
8 Experimental Details & Current Status 8
9 Experimental details Schematic fabrication process for vertically aligned Ni nanowires P4VP PS Au Al Si [Spin coating] [PS removal by O 2 plasma] [Al anodization] Al 2 O 3 Al Ni [Solvent annealing] [Al etching by RIE] [Ni electrodeposition] [Surface reconstruction] [P4VP residual removal by RIE] 9
10 RMS value (nm) Aluminum Film Deposition Flatness of Al film is an important factor for high-quality AAO formation, especially with thin film AAO applications. Roughness control of sputter deposited film on Si substrate evaluated at various T s temperature (77K to RT) o C deposited o C o C -115 o C deposited 25degC 500nm Al film thickness (um) -90degC 500nm 10
11 PS-b-P4VP porous film on Al thin film/si substrate As-spun PS-b-P4VP Low mag. of solvent annealed PS-b-P4VP Solvent annealed PS-b-P4VP Interpore distance, D int = 48.3nm ± 2.7nm 11
12 Pattern Transfer by RIE RIE I: Residual P4VP etching located bottom of the pores RIE II: Selective Al etching exposed to the surface Dark spots inside bright rims reveal bare Al indents created by RIE process Bright spots reveal Al underneath porous PS-b-P4VP film SEM Image obtained after certain amount of time under SEM beam illumination, revealing RIEinduced indented Al surface after DBCP polymer is degraded. 12
13 Guided Al anodization under the optimized condition -- More periodic vertical AAO pores formed Top view Bird eye s view Interpore distance, D int = 48.3nm ± 2.7nm For pattern transfer, applied voltage, V a = D int [V] / 2.5 [V/nm] ~ 19.4V 13
14 Ni NWs (~30 nm dia) electrodeposition into vertical AAO nanoholes Ni NWs liberated from AAO by etch removal of AAO Top view of Ni NWs into AAO 14
15 Future Plans Guided assembly of DBCP Pattern doubling by tuning anodizing process for higher density application D int = D int / 3 ~ 27.9 nm, therefore V a = D int /2.5 ~ 11.2 V Nanoimprint mould fabrication by guided assembly of DBCP Pattern doubling by using NIL master mould for BPM application 15
16 Pattern Doubling Triangular pre-patterns + guided AAO processing. Pattern doubling has been created. 50 nm 200 nm Pattern doubling 16
17 NIL-guided AAO process Master mould having significantly reduced dimension (e.g. ~20nm diameter and ~40nm pitch) can be utilized as a pre-patterning medium for directed AAO assembly 2µm Noh K, Choi C, Kim JY, Oh Y, Brammer KS, Loya MC, and Jin S, J. Vac. Sci. Technol. B. 28(6), C6M88, 2010 Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineering 17
18 Summary Spontaneous self-assembly of PS-b-P4VP diblock copolymer has been explored as an RIE mask for nanofabrication process --- to form more periodic and smaller diameter AAO nucleation. DBCP-guided Al thin film anodization has been demonstrated for a high aspect ratio (>~ 30) nanoporous template, which could be useful for higher-density nanowire array structures. Example magnetic Ni NWs were electrochemically deposited into AAO template to demonstrate its versatility as a template for 1-D NWs. Highly dense, long-range-ordered AAO templates will be obtained with the pattern doubling concept, which is desirable for magnetic memory media application. 18
19 Acknowledgements Financial Support by CMRR at UCSD, Iwama fund, NSF Various other UCSD and outside collaborators. 19
PARAMETER EFFECTS FOR THE GROWTH OF THIN POROUS ANODIC ALUMINUM OXIDES
10.1149/1.2794473, The Electrochemical Society PARAMETER EFFECTS FOR THE GROWTH OF THIN POROUS ANODIC ALUMINUM OXIDES S. Yim a, C. Bonhôte b, J. Lille b, and T. Wu b a Dept. of Chem. and Mat. Engr., San
More informationMacroscopic Arrays of Block Copolymers with Areal Densities of 10 Terbit/inch 2 and Beyond
Macroscopic Arrays of Block Copolymers with Areal Densities of 10 Terbit/inch 2 and Beyond Soojin Park*, Dong Hyun Lee, Bokyung Kim, Sung Woo Hong Department of Polymer Science and Engineering, University
More informationSimple fabrication of highly ordered AAO nanotubes
Journal of Optoelectronic and Biomedical Materials Volume 1, Issue 1, March 2009, p. 79-84 Simple fabrication of highly ordered AAO nanotubes N. Taşaltin a, S. Öztürk a, H. Yüzer b, Z. Z. Öztürk a,b* a
More informationFabrication of Highly Ordered Al 2 O 3 Nanohole Arrays As a Nanostructured Template
Fabrication of Highly Ordered Al 2 O 3 Nanohole Arrays As a Nanostructured Template Jie Gong, Bill Butler and Giovanni Zangari Materials Science Program University of Alabama at Tuscaloosa This work was
More informationSeeing is Believing. - Nanostructure of Anodic Alumina Film - The International Hard Anodizing Association 15th Technical Symposium
Seeing is Believing - Nanostructure of Anodic Alumina Film - The International Hard Anodizing Association 15th Technical Symposium September 24-26, 2014 Sheraton Lincoln Harbor Hotel, Weehawken, NJ Sachiko
More informationProperties of nanostructures obtained by anodization of aluminum in phosphoric acid at moderate potentials
Properties of nanostructures obtained by anodization of aluminum in phosphoric acid at moderate potentials L Zaraska, G D Sulka 1 and M Jaskuła Department of Physical Chemistry & Electrochemistry, Jagiellonian
More information3. Monodomain porous alumina obtained by nanoimprint lithography
3. Monodomain porous alumina obtained by nanoimprint lithography 3.1 Nanoimprint lithography (NIL) In the previous chapter, the preparation of polydomain porous alumina by self-ordering was discussed.
More informationAAO MCP Substrate Development at ANL. High Energy Physics Division, Materials Science Division Argonne National Laboratory Friday, June 11, 2010
AAO MCP Substrate Development at ANL Seon W. Lee and H. Hau Wang High Energy Physics Division, Materials Science Division Argonne National Laboratory Friday, June 11, 2010 Contents What is AAO? Advantage
More informationA Functional Micro-Solid Oxide Fuel Cell with. Nanometer Freestanding Electrolyte
Electronic Supplementary Material (ESI) for Journal of Materials Chemistry A. This journal is The Royal Society of Chemistry 2017 SUPPLEMENTARY INFORMATION A Functional Micro-Solid Oxide Fuel Cell with
More informationFabrication of Highly Ordered Gold Nanorods Film Using Alumina Nanopores
JNS 2 (2012) 235-240 Fabrication of Highly Ordered Gold Nanorods Film Using Alumina Nanopores Z. Soltani a,*, M. Moradi b, M. Noormohammadi b, F. Behzadi b a Department of Physics, Shiraz Branch, Islamic
More informationSynthesis of Nanostructures by Electrochemical Processing
Synthesis of Nanostructures by Electrochemical Processing Giovanni Zangari, Robert M. Metzger, Bill Butler University of Alabama at Tuscaloosa The work presented was partly sponsored through DOD grant
More informationWP7 JRA2 JRA2 Research on High Precision Manufacturing. Investigation of optimum NIL stamp fabrication method to copy sub-10 nm BCP features
DELIVERABLE REPORT WP7 JRA2 JRA2 Research on High Precision Manufacturing D7.1 Investigation of optimum NIL stamp fabrication method to copy sub-10 nm BCP features M18 NFFA-Europe has received funding
More informationDesign, Fabrication, Optimization and Verification of FePt based Bit Patterned Media
Design, Fabrication, Optimization and Verification of FePt based Bit Patterned Media Jian-Ping Wang, Professor MINT Center & Electrical and Computer Engineering Department, Graduate Faculty of Chemical
More informationMagnetic pinning in hybrid YBa 2 Cu 3 O 7-x /ferromagnetic nano-dot structures obtained by di-block copolymer self-assembly method
Magnetic pinning in hybrid YBa 2 Cu 3 O 7-x /ferromagnetic nano-dot structures obtained by di-block copolymer self-assembly method Traian Petrişor Jr., Bianca Moş, Mihai Gabor, Mircea Năsui, Amalia Mesaroş,
More informationStudy on the influence on the formation of highly ordered porous anodic aluminia membrane
Study on the influence on the formation of highly ordered porous anodic aluminia membrane O Pong-Sik, Ryang Se-Hun, Sin Gum-Chol, Hwang Guk-Nam, Hong Yong-Son * Kim Hyong Jik Normal University, Pyongyang,
More informationNanoimprinting in Polymers and Applications in Cell Studies. Albert F. YEE Chemical Engineering & Materials Science UC Irvine
Nanoimprinting in Polymers and Applications in Cell Studies Albert F. YEE Chemical Engineering & Materials Science UC Irvine Presentation outline Motivation Reversal imprinting Soft inkpad imprinting on
More informationDirect Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography
Macromolecular Research, Vol. 13, No. 5, pp 435-440 (2005) Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography Bo Kyung Yoon, Wonseok Hwang, Youn Jung
More informationAligned Carbon Nanofibre-Polymer Composite Membranes. CNT Growth and Manipulation. Eleanor Campbell Dept. of Physics, Göteborg University
Aligned Carbon Nanofibre-Polymer Composite Membranes CNT Growth and Manipulation Eleanor Campbell Dept. of Physics, Göteborg University Plasma CVD Growth Polymer/Nanofibre Composite Low ambient temperature
More informationMacrophase Separation Using Block Copolymer Blends
Macrophase Separation Using Block Copolymer Blends Rachel Philiph 1,2, Kameron Oser 1, Sam Nicaise 1, and Karl Berggren 1 1 Department of Electrical Engineering and Computer Science, Massachusetts Institute
More informationFig. S-1. thermal. used to. pump the. electrolyte. cathode
Fabrication of Functional Polymeric Nanotubes with Modulated Pore Diameters Mohammad Raoufi, Holger Schönherr* Supporting Information Fig. S-1 Schematicc of the reactor used for anodization. The temperature
More informationMetallization deposition and etching. Material mainly taken from Campbell, UCCS
Metallization deposition and etching Material mainly taken from Campbell, UCCS Application Metallization is back-end processing Metals used are aluminum and copper Mainly involves deposition and etching,
More informationLehigh University Annual Progress Report: 2009 Formula Grant
Lehigh University Annual Progress Report: 2009 Formula Grant Reporting Period July 1, 2012 June 30, 2013 Formula Grant Overview Lehigh University received $119,007 in formula funds for the grant award
More informationThe Improvement in Energy Efficiency Based on Nano-structure Materials
International Workshop on 1iGO Science and Technology 2010 The Improvement in Energy Efficiency Based on Nanostructure Materials Chien Chon Chen Department of Energy and Resources, National United University,
More informationIntegration of Block-Copolymer with Nano- Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology
Integration of Block-Copolymer with Nano- Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology April 2010 update SNL Geoff Brennecka (PI) Bruce Burckel Matt George Jack Skinner
More informationTHE EFFECTS OF ANODIZING CONDITION AND POST TREATMENT ON THE GROWTH OF NICKEL NANOWIRES USING ANODIC ALUMINUM OXIDE
THE EFFECTS OF ANODIZING CONDITION AND POST TREATMENT ON THE GROWTH OF NICKEL NANOWIRES USING ANODIC ALUMINUM OXIDE M. T. Safarzadeh 1, A. Arab 2 and S. M. A. Boutorabi 2,3,* * boutorabi@iust.ac.ir Received:
More informationInternational Journal of Computer Engineering and Applications, Volume XII, Issue I, Jan. 18, ISSN
International Journal of Computer Engineering and Applications, Volume XII, Issue I, Jan. 18, www.ijcea.com ISSN 2321-3469 EFFECT OF CONCENTRATION AND TEMPERATURE ON ALUMINIUM OXIDE NANOPORE FESEM IMAGES
More informationIntroduction to Micro/Nano Fabrication Techniques. Date: 2015/05/22 Dr. Yi-Chung Tung. Fabrication of Nanomaterials
Introduction to Micro/Nano Fabrication Techniques Date: 2015/05/22 Dr. Yi-Chung Tung Fabrication of Nanomaterials Top-Down Approach Begin with bulk materials that are reduced into nanoscale materials Ex:
More informationHalf-pitch 15-nm metal wire circuit fabricated using directed self-assembly of PS-b-PMMA
Half-pitch 15-nm metal wire circuit fabricated using directed self-assembly of PS-b-PMMA Y. Seino, Y. Kasahara, H. Kanai, K. Kobayashi, H. Kubota, H. Sato, S. Minegishi, K. Miyagi, K. Kodera, N. Kihara,
More informationMultibranching Carbon Nanotubes via Self-Seeded Catalysts
Multibranching Carbon Nanotubes via Self-Seeded Catalysts NANO LETTERS 2006 Vol. 6, No. 2 324-328 Joseph F. AuBuchon, Li-Han Chen, Chiara Daraio, and Sungho Jin* Materials Science and Engineering Program,
More informationTHE INFLUENCE OF SUBSTRATE PREPARATION, ANODIZATION CONDITIONS AND POST ANODIZING TREATMENT ON AAO MICROSTRUCTURE. Eva JINDROVÁ, Vít JAN, Jan ČUPERA
THE INFLUENCE OF SUBSTRATE PREPARATION, ANODIZATION CONDITIONS AND POST ANODIZING TREATMENT ON AAO MICROSTRUCTURE Eva JINDROVÁ, Vít JAN, Jan ČUPERA Brno University of Technology, Faculty of Mechanical
More informationScienceDirect. Formation of Cu and Ni Nanowires by Electrodeposition
Available online at www.sciencedirect.com ScienceDirect Procedia Materials Science 8 (2015 ) 617 622 International Congress of Science and Technology of Metallurgy and Materials, SAM - CONAMET 2013 Formation
More informationThe effect of pulsed electrodeposition parameters on the microstructure and magnetic properties of the CoNi nanowires
JNS 1 (2012) 249-255 The effect of pulsed electrodeposition parameters on the microstructure and magnetic properties of the CoNi nanowires M. Almasi Kashi *, A. Ramazani, N. Akhshi, E. J. Khamse, Z. Fallah
More informationMagnetic Properties of 100 NM-Period Nickel Nanowire Arrays Obtained From Ordered Porous-Alumina Templates
Mat. Res. Soc. Symp. Proc. Vol. 636 2001 Materials Research Society Magnetic Properties of 100 NM-Period Nickel Nanowire Arrays Obtained From Ordered Porous-Alumina Templates K. Nielsch, R.. Wehrspohn,
More informationFabrication and Structural Studies of Porous Anodic Oxide Film on Pure Aluminium and Aluminium Alloy (AA 1100)
http://www.e-journals.in Chemical Science Transactions DOI:10.7598/cst2014.726 2014, 3(2), 556-561 RESEARCH ARTICLE Fabrication and Structural Studies of Porous Anodic Oxide Film on Pure Aluminium and
More informationAdvanced Polymers And Resists For Nanoimprint Lithography
Q U A L I T Y A S S U R A N C E MICROSYSTEMS & NANOSYSTEMS SPECIAL REPORT Advanced Polymers And Resists For Nanoimprint Lithography Numerous polymer systems specifically designed for nanoimprint lithography
More informationAnisotropic Magnetism and Magnetoresistance in Iron Nanowire Arrays
CHINESE JOURNAL OF PHYSICS VOL. 47, NO. 6 DECEMBER 2009 Anisotropic Magnetism and Magnetoresistance in Iron Nanowire Arrays M. N. Ou, 1,2 T. J. Yang, 2 and Y. Y. Chen 1 1 Institute of Physics, Academia
More informationLarge Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures
Supporting Information Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics Parvaneh Mokarian-Tabari,,,* Ramsankar Senthamaraikannan,, Colm Glynn,
More informationMetal Oxide Nanotubes and Photo-Excitation Effects: New Approaches for Low Temperature Solid Oxide Fuel Cells
GCEP Research Symposium Stanford University October 2,2009 Metal Oxide Nanotubes and Photo-Excitation Effects: New Approaches for Low Temperature Solid Oxide Fuel Cells Paul C. McIntyre 1,2 & Shriram Ramanathan
More informationHierarchical and Well-ordered Porous Copper for Liquid Transport Properties Control
Supporting Information Hierarchical and Well-ordered Porous Copper for Liquid Transport Properties Control Quang N. Pham 1, Bowen Shao 2, Yongsung Kim 3 and Yoonjin Won 1,2 * 1 Department of Mechanical
More informationUC San Diego UC San Diego Electronic Theses and Dissertations
UC San Diego UC San Diego Electronic Theses and Dissertations Title Fabrication and applications of nanocomposite structures using anodized aluminum oxide membranes Permalink https://escholarship.org/uc/item/715380zp
More informationSupplementary Information. for
Electronic Supplementary Material (ESI) for ChemComm. This journal is The Royal Society of Chemistry 2014 Supplementary Information for Nanoslitting Phase-separated Block Copolymers by Solvent Swelling
More informationHoley Silicon as efficient thermoelectric material
Supporting Information: Holey Silicon as efficient thermoelectric material Jinyao Tang 1, 3*, Hung-Ta Wang 1*, Dong Hyun Lee 4, Melissa Fardy 1, Ziyang Huo 1, Thomas P. Russell 4, 1, 2, 3 Peidong Yang
More informationSchematic creation of MOS field effect transistor.
Schematic creation of MOS field effect transistor. Gate electrode Drain electrode Source electrode Gate oxide Gate length Page 1 Step 0 The positively doped silicon wafer is first coated with an insulating
More informationPeriodic Holes with 10 nm Diameter Produced by Grazing Ar + Milling of the Barrier Layer in Hexagonally Ordered Nanoporous Alumina
Periodic Holes with 10 nm Diameter Produced by Grazing Ar + Milling of the Barrier Layer in Hexagonally Ordered Nanoporous Alumina NANO LETTERS 2002 Vol. 2, No. 1 37-41 Tao Xu, Giovanni Zangari, and Robert
More informationChapter 4 Fabrication Process of Silicon Carrier and. Gold-Gold Thermocompression Bonding
Chapter 4 Fabrication Process of Silicon Carrier and Gold-Gold Thermocompression Bonding 4.1 Introduction As mentioned in chapter 2, the MEMs carrier is designed to integrate the micro-machined inductor
More informationDr. Priyabrat Dash Office: BM-406, Mob: Webpage: MB: 205
Email: dashp@nitrkl.ac.in Office: BM-406, Mob: 8895121141 Webpage: http://homepage.usask.ca/~prd822/ MB: 205 Nonmanufacturing In continuation from last class... 2 Top-Down methods Mechanical-energy methods
More informationLow-cost, deterministic quasi-periodic photonic structures for light trapping in thin film silicon solar cells
Low-cost, deterministic quasi-periodic photonic structures for light trapping in thin film silicon solar cells The MIT Faculty has made this article openly available. Please share how this access benefits
More informationSupporting information. In-situ TEM observation of phase transition of nanoscopic patterns on. baroplastic block copolymer film during nanoindentation
Supporting information In-situ TEM observation of phase transition of nanoscopic patterns on baroplastic block copolymer film during nanoindentation Ara Jo, Gil Ho Gu, Hong Chul Moon, Sung Hyun Han, Sang
More informationControlled fabrication of patterned lateral porous alumina membranes
Controlled fabrication of patterned lateral porous alumina membranes Manoraham Gowtham, Laurent Eude, Costel Sorin Cojocaru, Berndt Marquardt, Hee Jeen Jeong, Pierre Legagneux, Kim K Song, Didier Pribat
More informationCHAPTER 9 AFM PROFILING AND NANOLITHOGRAPHY WITH NEEDLE-TIPPED CANTILEVERS
CHAPTER 9 AFM PROFILING AND NANOLITHOGRAPHY WITH NEEDLE-TIPPED CANTILEVERS Since Ag 2 Ga nanoneedles can be directly grown on (or even in place of) the tips on AFM cantilevers using the pulling technique
More informationThermal Nanoimprinting Basics
Thermal Nanoimprinting Basics Nanoimprinting is a way to replicate nanoscale features on one surface into another, like stamping copies are made by traditional fabrication techniques (optical/ebeam lith)
More informationLight enhancement by the formation of an Al-oxide honeycomb nano-structure on the n-gan surface of thin-gan light-emitting diodes
Light enhancement by the formation of an Al-oxide honeycomb nano-structure on the n-gan surface of thin-gan light-emitting diodes C. L. Lin, P. H. Chen Department of Chemical and Materials Engineering,
More informationSimple method for formation of nanometer scale holes in membranes. E. O. Lawrence Berkeley National Laboratory, Berkeley, CA 94720
Simple method for formation of nanometer scale holes in membranes T. Schenkel 1, E. A. Stach, V. Radmilovic, S.-J. Park, and A. Persaud E. O. Lawrence Berkeley National Laboratory, Berkeley, CA 94720 When
More informationToday s Class. Materials for MEMS
Lecture 2: VLSI-based Fabrication for MEMS: Fundamentals Prasanna S. Gandhi Assistant Professor, Department of Mechanical Engineering, Indian Institute of Technology, Bombay, Recap: Last Class What is
More informationSCIENCE CHINA Technological Sciences. Replication of large area nanoimprint stamp with small critical dimension loss
SCIENCE CHINA Technological Sciences RESEARCH PAPER March 2012 Vol.55 No.3: 600 605 doi: 10.1007/s11431-011-4695-3 Replication of large area nanoimprint stamp with small critical dimension loss MENG FanTao
More informationOptical Properties of CNT Arrays Growth in Porous Anodic Alumina Templates
Research Article International Journal of Current Engineering and Technology E-ISSN 2277 4106, P-ISSN 2347-5161 2014 INPRESSCO, All Rights Reserved Available at http://inpressco.com/category/ijcet Optical
More informationFabrication of Highly Ordered Nanoparticle Arrays Using Thin Porous Alumina Masks
Fabrication of Highly Ordered Nanoparticle Arrays Using Thin Porous Alumina Masks Y. Lei a, L.W. Teo a, K.S. Yeong b, Y.H. See b, W.K. Chim a,b, W.K. Choi a,b and J.T.L. Thong b a Singapore-MIT Alliance,
More informationPLASMONIC STRUCTURES IN PMMA RESIST
PLASMONIC STRUCTURES IN PMMA RESIST Michal URBÁNEK a, Stanislav KRÁTKÝ a, MARCEL ŠIMÍK b, Vladimír KOLAŘÍK a, Miroslav HORÁČEK a, Milan MATĚJKA a a Institute of Scientific Instruments of the ASCR, v.v.i.,
More informationOne-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography
Appl. Phys. A 80, 1173 1178 (2005) DOI: 10.1007/s00339-004-3176-y Applied Physics A Materials Science & Processing w. wu 1, g.-y. jung 1 d.l. olynick 2 j. straznicky 1 z. li 1 x. li 1 d.a.a. ohlberg 1
More informationImprint lithography for curved cross-sectional structure using replicated Ni mold
Imprint lithography for curved cross-sectional structure using replicated Ni mold Yoshihiko Hirai, a) Satoshi Harada, Hisao Kikuta, and Yoshio Tanaka Mechanical System Engineering, Graduate School of Engineering,
More informationSupporting Online Material for
www.sciencemag.org/cgi/content/full/321/5891/936/dc1 Supporting Online Material for Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Ricardo Ruiz,* Huiman Kang, François
More informationREPORT DOCUMENTATION PAGE
REPORT DOCUMENTATION PAGE Form Approved OMB No. 0704-0188 Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions,
More informationChoi, Jun-Hyuk Korea Institute of Machinery & Materials
The 11 th US-Korea Nanosymposium Choi, Jun-Hyuk 2014. 09. 29 Korea Institute of Machinery & Materials About KIMM Nano-research Bldg Clean RM Five Research Divisions; 1. Advanced Manufacturing Sys. 2. Extreme
More informationTitle: Localized surface plasmon resonance of metal nanodot and nanowire arrays studied by far-field and near-field optical microscopy
Contract Number: AOARD-06-4074 Principal Investigator: Heh-Nan Lin Address: Department of Materials Science and Engineering, National Tsing Hua University, 101, Sec. 2, Kuang Fu Rd., Hsinchu 30013, Taiwan
More informationLect. 2: Basics of Si Technology
Unit processes Thin Film Deposition Etching Ion Implantation Photolithography Chemical Mechanical Polishing 1. Thin Film Deposition Layer of materials ranging from fractions of nanometer to several micro-meters
More informationLarge-Size Liftable Inverted-Nanobowl Sheets as Reusable Masks for Nanolithiography
Large-Size Liftable Inverted-Nanobowl Sheets as Reusable Masks for Nanolithiography NANO LETTERS 2005 Vol. 5, No. 9 1784-1788 Xudong Wang, Changshi Lao, Elton Graugnard, Christopher J. Summers, and Zhong
More informationNanoSystemsEngineering: NanoNose Final Status, March 2011
1 NanoSystemsEngineering: NanoNose Final Status, March 2011 The Nanonose project is based on four research projects (VCSELs, 3D nanolithography, coatings and system integration). Below, the major achievements
More informationMultiphoton lithography based 3D micro/nano printing Dr Qin Hu
Multiphoton lithography based 3D micro/nano printing Dr Qin Hu EPSRC Centre for Innovative Manufacturing in Additive Manufacturing University of Nottingham Multiphoton lithography Also known as direct
More informationProton beam fabrication of nickel stamps for nanoimprint lithography
Nuclear Instruments and Methods in Physics Research B 231 (2005) 407 412 www.elsevier.com/locate/nimb Proton beam fabrication of nickel stamps for nanoimprint lithography K. Ansari *, P.G. Shao, J.A. van
More informationFabrication of regular silicon microstructures by photo-electrochemical etching of silicon
phys. stat. sol. (c) 2, No. 9, 3198 3202 (2005) / DOI 10.1002/pssc.200461110 Fabrication of regular silicon microstructures by photo-electrochemical etching of silicon G. Barillaro *, P. Bruschi, A. Diligenti,
More informationEECS130 Integrated Circuit Devices
EECS130 Integrated Circuit Devices Professor Ali Javey 9/13/2007 Fabrication Technology Lecture 1 Silicon Device Fabrication Technology Over 10 15 transistors (or 100,000 for every person in the world)
More informationStep and Flash Imprint Lithography for sub-100nm Patterning
Step and Flash Imprint Lithography for sub-100nm Patterning Matthew Colburn, Annette Grot, Marie Amistoso, Byung Jin Choi, Todd Bailey, John Ekerdt, S.V. Sreenivasan, James Hollenhorst, C. Grant Willson
More informationFabrication of aligned metallic structures based on block copolymer lithography
88 Fabrication of aligned metallic structures based on block copolymer lithography Yusuke Takahashi Department ofmicroelectronic Engineering, Rochester Institute of Technology, 82 Lomb Memorial Dr., Rochester,
More informationApplications of Nano Patterning Process 1. Patterned Media
Applications of Nano Patterning Process 1. Patterned Media Contents Introduction Part. 1. Nanoimprinting on Glass Substrate for Patterned Media Part. 2. Nanoinjection Molding of Nanopillars for Patterned
More informationEE 5344 Introduction to MEMS. CHAPTER 3 Conventional Si Processing
3. Conventional licon Processing Micromachining, Microfabrication. EE 5344 Introduction to MEMS CHAPTER 3 Conventional Processing Why silicon? Abundant, cheap, easy to process. licon planar Integrated
More informationDevelopment of block copolymer systems for directed self assembly at the University of Queensland
Development of block copolymer systems for directed self assembly at the University of Queensland Imelda Keen, Han-Hao Cheng, Anguang Yu, Thomas Bennett, Ya-Mi Chuang, Kevin Jack, Kristofer Thurecht Andrew
More informationUV15: For Fabrication of Polymer Optical Waveguides
CASE STUDY UV15: For Fabrication of Polymer Optical Waveguides Master Bond Inc. 154 Hobart Street, Hackensack, NJ 07601 USA Phone +1.201.343.8983 Fax +1.201.343.2132 main@masterbond.com CASE STUDY UV15:
More informationNano Fabrication Research at FIU
Nano Fabrication Research at FIU Professor W. Choi s Nano Materials and Devices Lab FIU logo with 25nm line width by e-beam lithography Fastest growing University in the US- Ranked in top 25 largest Universities
More informationControlled Growth, Patterning and Placement of Carbon Nanotube Thin Films
Controlled Growth, Patterning and Placement of Carbon Nanotube Thin Films V. K. Sangwan a,b * #, V. W. Ballarotto b, D. R. Hines b, M. S. Fuhrer a, and E. D. Williams a,b a Center for Nanophysics and Advanced
More informationArea-selective atomic layer deposition for self-aligned fabrication
Area-selective atomic layer deposition for self-aligned fabrication Adrie Mackus Eindhoven University a.j.m.mackus@tue.nl Area-selective ALD for bottom-up processing Top-down Bottom-up Building technology
More informationElectrodeposition of Magnetic Materials
Electrodeposition of Magnetic Materials Neil Robertson HGST, a Western Digital Company San Jose Research Center San Jose, California Electrodeposition and the HDD Business HDD s are a very high volume
More informationFabrication of annular photonic crystals by atomic layer deposition and sacrificial etching
Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching Junbo Feng School of Optoelectronics Science and Engineering, Wuhan National Laboratory for Optoelectronics,
More informationThin film silicon substrate formation using electrochemical anodic etching method
Thin film silicon substrate formation using electrochemical anodic etching method J.-H. Kwon 1, S.-H. Lee 2 and B.-K. Ju* 3 The production of detached porous silicon (PS) layers for layer transfer (LT)
More informationChapter 3 Silicon Device Fabrication Technology
Chapter 3 Silicon Device Fabrication Technology Over 10 15 transistors (or 100,000 for every person in the world) are manufactured every year. VLSI (Very Large Scale Integration) ULSI (Ultra Large Scale
More informationAnodic alumina membranes with defined pore diameters and thicknesses obtained by adjusting the anodizing duration and pore opening/widening time
J Solid State Electrochem (2011) 15:2427 2436 DOI 10.1007/s10008-011-1471-z ORIGINAL PAPER Anodic alumina membranes with defined pore diameters and thicknesses obtained by adjusting the anodizing duration
More informationReview of CMOS Processing Technology
- Scaling and Integration Moore s Law Unit processes Thin Film Deposition Etching Ion Implantation Photolithography Chemical Mechanical Polishing 1. Thin Film Deposition Layer of materials ranging from
More informationSynthesis of nanocarbon materials by PECVD: challenges to direct synthesis via CO 2 reduction using plasma-soec hybrid reactor
22 nd International Symposium on Plasma Chemistry July 5-10, 2015; Antwerp, Belgium Synthesis of nanocarbon materials by PECVD: challenges to direct synthesis via CO 2 reduction using plasma-soec hybrid
More informationResearch Article Growth and Magnetic Properties of Polycrystalline Self-Assembled Bifurcated Co Nanowires
Hindawi Publishing Corporation Journal of Nanomaterials Volume 28, Article ID 78293, 7 pages doi:.55/28/78293 Research Article Growth and Magnetic Properties of Polycrystalline Self-Assembled Co Nanowires
More informationAnodic aluminum oxide template assisted growth of vertically aligned carbon nanotube arrays by ECR-CVD $
Diamond & Related Materials 13 (2004) 1949 1953 www.elsevier.com/locate/diamond Anodic aluminum oxide template assisted growth of vertically aligned carbon nanotube arrays by ECR-CVD $ Po-Lin Chen, Jun-Kai
More informationIn operandi observation of dynamic annealing: a case. Supplementary Material
In operandi observation of dynamic annealing: a case study of boron in germanium nanowire devices Supplementary Material Maria M. Koleśnik-Gray, 1,3,4 Christian Sorger, 1 Subhajit Biswas, 2,3 Justin D.
More informationMultisegmented Nanotubes by Surface-Selective Atomic Layer Deposition
Supporting information Multisegmented Nanotubes by Surface-Selective Atomic Layer Deposition Changdeuck Bae,,* Robert Zierold, Josep M. Montero Moreno, Hyunchul Kim, Hyunjung Shin, Julien Bachmann, and
More informationDepositing and Patterning a Robust and Dense Low-k Polymer by icvd
SRC/SEMATECH ERC for Environmentally Benign Semiconductor Manufacturing Depositing and Patterning a Robust and Dense Low-k Polymer by icvd December 11, 2008 Nathan J. Trujillo Karen K. Gleason Anatomy
More informationSupplementary Figure 1 The lithium polysulfide distribution on the patterned electrode.
Supplementary Figure 1.The lithium polysulfide distribution on the patterned electrode. SEM image of the ITO-carbon electrode after dipping into Li 2 S 8 solution and drying, which shows the random distribution
More informationSupporting Information
Supporting Information Fast-Response, Sensitivitive and Low-Powered Chemosensors by Fusing Nanostructured Porous Thin Film and IDEs-Microheater Chip Zhengfei Dai,, Lei Xu,#,, Guotao Duan *,, Tie Li *,,
More informationInductively Coupled Plasma Etching of Pb(Zr x Ti 1 x )O 3 Thin Films in Cl 2 /C 2 F 6 /Ar and HBr/Ar Plasmas
Korean J. Chem. Eng., 19(3), 524-528 (2002) Inductively Coupled Plasma Etching of Pb(Zr x Ti 1 x )O 3 Thin Films in Cl 2 /C 2 F 6 /Ar and HBr/Ar Plasmas Chee Won Chung, Yo Han Byun and Hye In Kim Department
More informationFabrication Technology, Part I
EEL5225: Principles of MEMS Transducers (Fall 2003) Fabrication Technology, Part I Agenda: Oxidation, layer deposition (last lecture) Lithography Pattern Transfer (etching) Impurity Doping Reading: Senturia,
More informationlight Specific- Power CdTe Thin-Film Solar Cells using Quantum Dots Development of Highly Efficiency, Ultra-light
Development of Highly Efficiency, Ultra-light light Weight, Radiation-Resistant, Resistant, High-Specific Specific- Power CdTe Thin-Film Solar Cells using Quantum Dots Neelkanth G. Dhere Florida Solar
More informationAg 2 S: Fabrication and Characterization Techniques
2 2 S: Fabrication and Characterization Techniques This chapter describes two fabrication methods used for the growth of 2 S thin films. The specific growth parameters are presented for each method as
More informationCeramic Processing Research
Journal of Ceramic Processing Research. Vol. 10, No. 4, pp. 536~540 (009) J O U R N A L O F Ceramic Processing Research Electrical and optical properties of MgO films deposited on soda lime glass by a
More informationL5: Micromachining processes 1/7 01/22/02
97.577 L5: Micromachining processes 1/7 01/22/02 5: Micromachining technology Top-down approaches to building large (relative to an atom or even a transistor) structures. 5.1 Bulk Micromachining A bulk
More information