Status of the DESY NanoLab Project
|
|
- Preston Dean
- 6 years ago
- Views:
Transcription
1 Status of the DESY NanoLab Project Ralf Röhlsberger DESY Wissenschaftlicher Ausschuss DESY 7 June 2011
2 Mission of the DESY NanoLab To accomodate the growing need for structural probes on the nanoscale, DESY plans to establish a centre for analysis, production and handling of nanoscale and nanostructured materials, guided by experiments with micro- and nanobeams at PETRA III and FLASH. Modular group of buildings, erected in successive phases, to accomodate DESY groups and external partners First phase shall constitute the core of the building complex Helmholtz Zentrum Geesthacht (HZG) will be the first partner contributing funds for an own building section More partners to join in the following phases Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 2
3 The Building Site PETRA III+ FLASH II NanoLab CFEL CSSB PETRA III+ Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 3
4 The Building Site Possible area for NanoLab + Extensions 25b 25f PETRA III Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 4
5 1 st phase specification DESY (NanoLab) Room for 4 W3 groups (3 experimental, 1 theory) = 4 x 150 m 2 office space + 3 x 150 m 2 lab space 500 m 2 laboratory space for general use, including a 300 m 2 low-vibration section for sensitive instruments HZG (Engineering Materials Science Center) 800 m 2 office space Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 5
6 Architectural Competition for Urban Development Collection of 3 proposals from hammeskrause architekten, Stuttgart REINER BECKER ARCHITEKTEN, Berlin planpark architekten, Hamburg winner Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 6
7 Current Status of Architectural Planning (as of 13. May 2011) Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 7
8 Current Status of Architectural Planning (as of 13. May 2011) Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 8
9 Current Status of Architectural Planning (as of 13. May 2011) DESY, 1st phase : 4 stories with 685 m 2 total floor area each m 2 low-vibration lab space HZG, 1st phase : Atrium : 3240 m 2 total floor area 4 stories with 315 m 2 total floor area each (office space only) 1260 m 2 total floor area 570 m 2 total floor area Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 9
10 Timeline June 2011: Call for tender for architectural planning Spring/Summer 2012: Start of construction End of 2013: Completion Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 10
11 Instrumentation for Central labs (First Phase) Microscopes: o Scanning electron microscope (robust, general use) o Field-emission SEM for high-resolution applications o Atomic force microscopes o Optical microscopes, e.g., confocal, fluorescence, laserscanning First phase of central UHV system with metal deposition techniques and analysis (Auger, LEED) Magnetic characterisation of samples via MOKE, magnetometry Soft-matter deposition techniques like spin-coating, dip coating, Langmuir-Blodgett etc. Chemistry laboratory, clean rooms Details of instrumentation and infrastructure to be defined with scientists (in-house and potential users) Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 11
12 Instrumentation (Later stages) Lithography techniques: Electron-beam lithography, Interference lithography, Nano-imprint lithography Dry (plasma) etching and wet etching techniques for lithography processes Focussed ion-beam (FIB) processing of samples with nanomanipulation Extension of the UHV system and its infrastructure Cryo-handling of biological samples, cryo-tem, environmental SEM Synergies to be explored and to be coordinated with intrumentation available and planned at HZG, CFEL, CSSB, University of Hamburg (Bahrenfeld Campus) Ralf Röhlsberger Status of the the NanoLab WA Meeting, 7. June 2011 Page 12
Seminar Micro- and Nano-technology
Seminar Micro- and Nano-technology Seminar 1 Schedule Wednesday 17:45-18:30 Yannick Bourgin yannick.bourgin@uni-jena.de Phone: +49(3641)947990 www.iap.uni-jena.de Presentations 2 Presentation by 2 students
More informationSurface Acoustic Wave fabrication using nanoimprint. Zachary J. Davis, Senior Consultant,
Surface Acoustic Wave fabrication using nanoimprint Zachary J. Davis, Senior Consultant, zjd@teknologisk.dk Center for Microtechnology & Surface Analysis Micro and Nano Technology Sensor Technology Top
More informationIntroduction to Micro and Nanotechnologies
Micro & Nanobioengineering Lab Biomedical Engineering Department McGill University Introduction to Micro and Nanotechnologies David Juncker david.juncker@mcgill.ca www.bmed.mcgill.ca/nanomed McGill, Nov
More informationDr. Priyabrat Dash Office: BM-406, Mob: Webpage: MB: 205
Email: dashp@nitrkl.ac.in Office: BM-406, Mob: 8895121141 Webpage: http://homepage.usask.ca/~prd822/ MB: 205 Nonmanufacturing In continuation from last class... 2 Top-Down methods Mechanical-energy methods
More informationJohn de Laeter Centre
John de Laeter Centre Major research infrastructure hub at Curtin University, Perth, W.A. ~$30M worth of microscopes, spectrometers, diffractometers and experimental facilities AuScope partner, Microscopy
More informationIntroduction to Micro/Nano Fabrication Techniques. Date: 2015/05/22 Dr. Yi-Chung Tung. Fabrication of Nanomaterials
Introduction to Micro/Nano Fabrication Techniques Date: 2015/05/22 Dr. Yi-Chung Tung Fabrication of Nanomaterials Top-Down Approach Begin with bulk materials that are reduced into nanoscale materials Ex:
More informationMicrostructural Characterization of Materials
Microstructural Characterization of Materials 2nd Edition DAVID BRANDON AND WAYNE D. KAPLAN Technion, Israel Institute of Technology, Israel John Wiley & Sons, Ltd Contents Preface to the Second Edition
More informationThe principles and practice of electron microscopy
The principles and practice of electron microscopy Second Edition Ian M. Watt CAMBRIDGE UNIVERSITY PRESS Contents Preface tofirstedition page ix Preface to second edition xi 1 Microscopy with light and
More informationfuture s in the making Vibration Control Solutions AVOS
Vibration Control Solutions AVOS Ostec Corporate Group produces and offers hi-tech innovative scientific and analytical equipment. Our mission is to be a company that finds, selects, protects and develops
More informationPHS6317 NANO-ENGINEERING OF THIN FILMS
PHS6317 NANO-ENGINEERING OF THIN FILMS Ludvik Martinu, ing., PhD Professor Chairholder: NSERC Multisectorial Industrial Research Chair in Coatings and Surface Engineering ludvik.martinu@polymtl.ca www.polymtl.ca/larfis
More informationInfluence of the oxide thickness on the magnetic properties of Fe/ FeO multilayers.
DESY Summer Student Program Influence of the oxide thickness on the magnetic properties of Fe/ FeO multilayers. Student: Guryeva Tatyana Supervisors: Ralf Röhlsberger Kai Schlage Sebastien Couet Hamburg,
More informationUnit title: Nanotechnology
Unit title: Nanotechnology Unit code: K/601/0311 QCF level: 4 Credit value: 15 Aim This unit examines the role of nanotechnology at the interface of Chemistry, Biology, Physics and Engineering, especially
More informationMicro-Nano Fabrication Research
Micro-Nano Fabrication Research Technical Education Quality Improvement Programme 22-23 December 2014 Dr. Rakesh G. Mote Assistant Professor Department of Mechanical Engineering IIT Bombay rakesh.mote@iitb.ac.in;
More informationInnovative Roll-to-Roll Equipment & Material Development Suite
Innovative Roll-to-Roll Equipment & Material Development Suite For Next Generation Technology from Carpe Diem Technologies and the University of Massachusetts Amherst By John Berg, Dimitur Benchev, James
More informationAdvanced Manufacturing Choices
Advanced Manufacturing Choices Table of Content Mechanical Removing Techniques Ultrasonic Machining (USM) Sputtering and Focused Ion Beam Milling (FIB) Ultrasonic Machining In ultrasonic machining (USM),
More informationScanning Electron Microscope & Surface Analysis. Wageningen EM Centre Marcel Giesbers
Scanning Electron Microscope & Surface Analysis Wageningen EM Centre Marcel Giesbers Scanning Electron Microscope & Surface Analysis SEM vs Light Microscope and Transmission EM Secondary Electron Imaging
More informationMicro & nanofabrica,on
Micro & nanofabrica,on Photolitography : - contact - projec,on Electron Beam lithography (EBL) Nano imprint lithography Etching Contact Photolithography Substrate (e.g. Silicon wafer) Photoresist spinning
More informationNCERCAMP at the University of Akron. Major Equipment
Tescan LYRA-3 Model XMU FIB-FESEM Scanning Electron Microscope (SEM) with Focused Ion Beam (FIB) capability and a Transmission Electron Microscope (STEM) detector. The FIB can perform cross sectioning
More informationNanoscale Imaging, Material Removal and Deposition for Fabrication of Cutting-edge Semiconductor Devices
Hitachi Review Vol. 65 (2016), No. 7 233 Featured Articles Nanoscale Imaging, Material Removal and Deposition for Fabrication of Cutting-edge Semiconductor Devices Ion-beam-based Photomask Defect Repair
More informationSCIENCE CHINA Technological Sciences. Replication of large area nanoimprint stamp with small critical dimension loss
SCIENCE CHINA Technological Sciences RESEARCH PAPER March 2012 Vol.55 No.3: 600 605 doi: 10.1007/s11431-011-4695-3 Replication of large area nanoimprint stamp with small critical dimension loss MENG FanTao
More informationFully-integrated, Bezel-less Transistor Arrays Using Reversibly Foldable Interconnects and Stretchable Origami Substrates
Electronic Supplementary Material (ESI) for Nanoscale. This journal is The Royal Society of Chemistry 2016 Fully-integrated, Bezel-less Transistor Arrays Using Reversibly Foldable Interconnects and Stretchable
More informationNanoimprinting in Polymers and Applications in Cell Studies. Albert F. YEE Chemical Engineering & Materials Science UC Irvine
Nanoimprinting in Polymers and Applications in Cell Studies Albert F. YEE Chemical Engineering & Materials Science UC Irvine Presentation outline Motivation Reversal imprinting Soft inkpad imprinting on
More informationNano-imprinting Lithography Technology І
Nano-imprinting Lithography Technology І Agenda Limitation of photolithograph - Remind of photolithography technology - What is diffraction - Diffraction limit Concept of nano-imprinting lithography Basic
More informationCopper Interconnect Technology
Tapan Gupta Copper Interconnect Technology i Springer Contents 1 Introduction 1 1.1 Trends and Challenges 2 1.2 Physical Limits and Search for New Materials 5 1.3 Challenges 6 1.4 Choice of Materials 7
More informationSelf organization and properties of Black Silicon
TECHNISCHE UNIVERSITÄT ILMENAU 51st IWK Internationales Wissenschaftliches Kolloquium September 11-15, 2006 Self organization and properties of Black Silicon M. Fischer, M. Stubenrauch, Th. Kups, H. Romanus,
More informationMicroscopy...Seeing the Unseen
Technical Workshops Series 2013 Three Day Intensive Workshop on Venture Center Microscopy...Seeing the Unseen Organized by Venture Center Learn Organized by For whom When Principles and applications of
More informationCenter for Nanotechnology Education Programs
Center for Nanotechnology Education Programs Ethan Allen Manager, Education & Outreach, CNT January 11, 2010 Nanotechnology Education at UW - History CNT NTUF UIF Fellowships Nanotech Ph.D. Option NSF-IGERT
More information2008 Summer School on Spin Transfer Torque
2008 Summer School on Spin Transfer Torque Nano-scale device fabrication 2-July-2008 Byoung-Chul Min Center for Spintronics Research Korea Institute of Science and Technology Introduction Moore s Law
More informationSpecimen Preparation Technique for a Microstructure Analysis Using the Focused Ion Beam Process
Specimen Preparation Technique for a Microstructure Analysis Using the Focused Ion Beam Process by Kozue Yabusaki * and Hirokazu Sasaki * In recent years the FIB technique has been widely used for specimen
More informationHelmholtz Centre Berlin for Materials and Energy, D Berlin, Germany c
Electronic Supplementary Material (ESI) for Nanoscale. This journal is The Royal Society of Chemistry 2015 Electronic Supplementary Information (ESI) for New insights into colloidal gold flakes: structural
More informationEECS130 Integrated Circuit Devices
EECS130 Integrated Circuit Devices Professor Ali Javey 9/13/2007 Fabrication Technology Lecture 1 Silicon Device Fabrication Technology Over 10 15 transistors (or 100,000 for every person in the world)
More informationNINT Supporting Innovative Ideas through Nanotechnology
NINT Supporting Innovative Ideas through Nanotechnology (Capabilities and Expertise) Dr. Marianna Kulka, PhD Group Leader, NINT National Research Council Marianna.kulka@nrc.ca National Institute for Nanotechnology
More informationNEBRASKA NANOSCALE FACILITY CHARACTERIZATION FACILITIES
NEBRASKA NANOSCALE FACILITY CHARACTERIZATION FACILITIES Jeff Shield Department of Mechanical & Materials Engineering Nebraska Center for Materials and Nanoscience National Nanotechnology Coordinated Infrastructure
More informationTHIN METALLIC LAYERS STRUCTURED BY E-BEAM LITHOGRAPHY. Miroslav HORÁČEK, Vladimír KOLAŘÍK, Michal URBÁNEK, František MATĚJKA, Milan MATĚJKA
THIN METALLIC LAYERS STRUCTURED BY E-BEAM LITHOGRAPHY Miroslav HORÁČEK, Vladimír KOLAŘÍK, Michal URBÁNEK, František MATĚJKA, Milan MATĚJKA Ústav přístrojové techniky AV ČR, v. v. i., Královopolská 147,
More information47 Mangeron Boulevard, Iaşi, Romania Tel Fax:
The National Institute of Research and Development for Technical Physics (NIRDTP) of Iaşi belongs to the network of national institutes coordinated by the Ministry of National Education. The mission of
More informationPolymer Microscopy. Second edition LINDA C. SAWYER. and. DAVID T. GRUBB Cornell University Ithaca, NY USA. Hoechst Celanese Corporation Summit, NJ USA
Polymer Microscopy Second edition LINDA C. SAWYER Hoechst Celanese Corporation Summit, NJ USA and DAVID T. GRUBB Cornell University Ithaca, NY USA CHAPMAN & HALL London Glasgow Weinheim New York Tokyo
More informationAdvanced Polymers And Resists For Nanoimprint Lithography
Q U A L I T Y A S S U R A N C E MICROSYSTEMS & NANOSYSTEMS SPECIAL REPORT Advanced Polymers And Resists For Nanoimprint Lithography Numerous polymer systems specifically designed for nanoimprint lithography
More informationADVANCED NANOSCALE SCIENCE & ENGINEERING NANOPHYSICS SEMESTER MONTH CONTENT LAB THEMES SKILLS ASSESSMENTS. Cutting it Down to Nano Lab
September Nano-Intro (Same topics for nanophysics and nanochem) Topic I: GOT NANO? Unit 1 Nano -Calculations Metric Review 2 Dimensional Analysis 3 Dimensional Analysis Sci. Not. & Sig. Figs. NanoDefinitions
More informationGeneral Introduction to Microstructure Technology p. 1 What is Microstructure Technology? p. 1 From Microstructure Technology to Microsystems
General Introduction to Microstructure Technology p. 1 What is Microstructure Technology? p. 1 From Microstructure Technology to Microsystems Technology p. 9 The Parallels to Microelectronics p. 15 The
More informationNanotechnology Program Elements. Nanoelectronics and Computing. Sensors. - Structural Materials. Structural Materials
Nanotechnology Program Elements - Nanoelectronics and Computing - Sensors - Structural Materials Nanoelectronics and Computing Molecular electronics & photonics Computing architecture Assembly Sensors
More informationProcessing guidelines. Negative Tone Photoresists mr-ebl 6000
Characteristics Processing guidelines Negative Tone Photoresists mr-ebl 6000 mr-ebl 6000 is a chemically amplified negative tone photoresist for the use in micro- and nanoelectronics. - Electron beam sensitive
More informationFEI Materials Science Driving Discovery Through Innovative Solutions
FEI Materials Science Driving Discovery Through Innovative Solutions Explore. Discover. Resolve. Innovative materials play essential roles in safety, clean energy, transportation, human health, and industrial
More informationLow aberration monolithic diffraction gratings for high performance optical spectrometers
Low aberration monolithic diffraction gratings for high performance optical spectrometers P. Triebel 1, T. Diehl 1, M. Burkhardt 2, L. Erdmann 2, A. Kalies 2,A. Pesch 2, A. Gatto 2 1 Carl Zeiss Spectroscopy
More informationMicro- and Nano-Technology... for Optics
Micro- and Nano-Technology...... for Optics 3.2 Lithography U.D. Zeitner Fraunhofer Institut für Angewandte Optik und Feinmechanik Jena Electron Beam Column electron gun beam on/of control magnetic deflection
More informationIonscope SICM. About Ionscope. Scanning Ion Conductance Microscopy. Ionscope A brand of OpenIOLabs Limited
SICM About is a brand of OpenIOLabs Ltd, headquartered in Cambridge UK, is the worldleader in (SICM), a rapidly emerging Scanning Probe Microscopy (SPM) technique which allows nanoscale topographical mapping
More informationzyvex TEM Sample Lift-out Using the Zyvex Nanoprober System By Kimberly Tuck, Zyvex Corporation
TEM Sample Lift-out Using the Zyvex Nanoprober System By Kimberly Tuck, Zyvex Corporation Introduction The Zyvex Nanoprober System, coupled with a focused ion beam (FIB) tool, is a complete solution for
More informationSimple method for formation of nanometer scale holes in membranes. E. O. Lawrence Berkeley National Laboratory, Berkeley, CA 94720
Simple method for formation of nanometer scale holes in membranes T. Schenkel 1, E. A. Stach, V. Radmilovic, S.-J. Park, and A. Persaud E. O. Lawrence Berkeley National Laboratory, Berkeley, CA 94720 When
More informationMicro and nano structuring of carbon based materials for micro injection moulding and hot embossing
Micro and nano structuring of carbon based materials for micro injection moulding and hot embossing Victor Usov, Graham Cross, Neal O Hara, Declan Scanlan, Sander Paulen, Chris de Ruijter, Daniel Vlasveld,
More informationUsing Zyvex Microgrippers TM with Zyvex Nanomanipulators
Using Zyvex Microgrippers TM with Zyvex Nanomanipulators By Ken Tsui and Taylor Cavanah, Zyvex Instruments Introduction The Zyvex nanomanipulator product line can be used for electrical characterization,
More informationIBS/e Ion Beam Sputter Deposition and Etching System. IBS/e with KDC-10 Ion Beam Sputter Deposition and Etching System with Kaufman Ion Source
IBS/e Ion Beam Sputter Deposition and Etching System IBS/e with KDC-10 Ion Beam Sputter Deposition and Etching System with Kaufman Ion Source The Model IBS/e is a high vacuum thin film deposition system
More informationNANO-FABRICATION FOR MESOSCOPIC PHYSICS
NANO-FABRICATION FOR MESOSCOPIC PHYSICS Frédéric Pierre CNRS, Laboratory of Photonics and Nanostructures (LPN), Marcoussis, France ϕ Nano Team LPN PLAN Overview Electron beam lithography Step by step realization
More informationCORE FACILITY USER FEES FEES FLOW CYTOMETRY CORE FACILITY
CORE FACILITY USER FEES This document is for researchers to use for grant applications in 2018. In December 2018 fees will be increased by the CPI rate for WIMR facilities (current rate as at September
More informationE.G.S. PILLAY ENGINEERING COLLEGE (An Autonomous Institution, Affiliated to Anna University, Chennai) Nagore Post, Nagapattinam , Tamilnadu.
Academic Year : Year / Semester : 17MF103 - MATERIALS TESTING AND MECHANICAL CHARACTERIZATION 2017-2018 Programme: M.E Manufacturing Engineering Question Bank I / I Course V.Sivaramakrishnan Coordinator:
More informationIon Beam Technology. FIB Nanofabrication at Its Excellence
Ion Beam Technology FIB Nanofabrication at Its Excellence High-Resolution and Versatile Focused Ion Beam Nanofabrication, Lithography and Nanoengineering FOCUSED ION BEAM NANOFABRICATION Cutting-edge research
More informationApplication Note #124 VITA: Quantitative Nanoscale Characterization and Unambiguous Material Identification for Polymers
Local thermal analysis identifies polymer AFM image of polymer blend Application Note #124 VITA: Quantitative Nanoscale Characterization and Unambiguous Material Identification for Polymers VITA module
More informationMODEL Plasma Cleaner. Simultaneously cleans specimen and specimen holder. Cleans highly contaminated specimens in 2 minutes or less
MODEL 1020 Plasma Cleaner Cleans specimens immediately before they are inserted into the electron microscope; removes existing carbonaceous debris from the specimen and prevents contamination from occurring
More informationScanning Probe Microscopes
Scanning Probe Microscopes Nano NTEGRA Spectra NTEGRA Prima NEXT www.ntmdt.com NTMDT: Customer, Technology, Integrity Our primary goal is customer success in exploring the nanoworld with our innovative
More informationWhy Probes Look the Way They Do Concepts and Technologies of AFM Probes Manufacturing
Agilent Technologies AFM e-seminar: Understanding and Choosing the Correct Cantilever for Your Application Oliver Krause NanoWorld Services GmbH All mentioned company names and trademarks are property
More informationHelmholtz Energy Materials Characterization Platform. Harald Bolt 7 th April 2016, HELSMAC, Cambridge
Helmholtz Energy Materials Characterization Platform Harald Bolt 7 th April 2016, HELSMAC, Cambridge 1 Essential Elements for Transformation of the Energy System Storage Renewables Grids Efficiency Flexible
More informationAdvanced Materials Technology Key Expertise Theme. astutewales.com
Advanced Materials Technology Key Expertise Theme astutewales.com Understanding the Behaviour of Materials. Materials used to manufacture components is a key area for ensuring efficient production and
More informationNanotechnology Principles, Applications, Careers, and Education. Copyright 2011 The Pennsylvania State University
Nanotechnology Principles, Applications, Careers, and Education Copyright 2011 The Pennsylvania State University Outline What are the principles of nanotechnology? What are some applications? What kind
More informationNational Institute of Technology Calicut
National Institute of Technology Calicut School of Nano Science and Technology Centre for Microscopy Hands on Training Program on Scanning Electron (SEM) & Atomic Force Microscopy (AFM) July 18 20, 2011
More informationOrganic Thin Films Laboratory (OTFL), Hanyang University
Organic Thin Films Laboratory (OTFL), Hanyang University Prof. Haiwon Lee (haiwon@hanyang.ac.kr) Department of Chemistry Hanyang University Distinguished Professor Director of Asian Research Network Program
More informationAdvanced resists for e-beam lithography: processing, exposure and characterization (Part II)
Advanced resists for e-beam lithography: processing, exposure and characterization (Part II) Dra. Mariana Pojar de Melo Prof. Dr. Antonio Carlos Seabra Dep. Eng. de Sistemas Eletrônicos Escola Politécnica
More informationCompact hybrid plasmonic-si waveguide structures utilizing Albanova E-beam lithography system
Compact hybrid plasmonic-si waveguide structures utilizing Albanova E-beam lithography system Introduction Xu Sun Laboratory of Photonics and Microwave Engineering, Royal Institute of Technology (KTH),
More informationApplications of Nano Patterning Process 1. Patterned Media
Applications of Nano Patterning Process 1. Patterned Media Contents Introduction Part. 1. Nanoimprinting on Glass Substrate for Patterned Media Part. 2. Nanoinjection Molding of Nanopillars for Patterned
More informationFigure 6. Rare-gas atom-beam diffraction patterns. These results were obtained by Wieland Schöllkopf and Peter Toennies at the Max-Planck Institute
Figure 6. Rare-gas atom-beam diffraction patterns. These results were obtained by Wieland Schöllkopf and Peter Toennies at the Max-Planck Institute in Göttingen, Germany, using a freestanding, 100nm-period
More informationResearch Centre of Advanced Materials and Technologies for Recent and Future Applications PROMATECH
Research Centre of Advanced Materials and Technologies for Recent and Future Applications PROMATECH Slovak Academy of Sciences Pavol Jozef Šafárik University in Košice Technical University of Košice High
More informationSwiss National Optics Plattform SNOP
Swiss National Optics Plattform SNOP History IZOT founded in 2011 as photonic network platform in Eastern Switzerland First outcome: formation of a group of interest in high end optical coating technologies
More informationELECTRON MICROSCOPY MODERN SURFACE, LAYER AND DEFECT ANALYSIS USING REM, FIB, EDX, STEM
FRAUNHOFER INSTITUTE FOR MANUFACTURING ENGINEERING AND AUTOMATION IPA ELECTRON MICROSCOPY MODERN SURFACE, LAYER AND DEFECT ANALYSIS USING REM, FIB, EDX, STEM 1 METHOD Electron microscopy is the favourable
More informationIntegration of Block-Copolymer with Nano- Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology
Integration of Block-Copolymer with Nano- Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology April 2010 update SNL Geoff Brennecka (PI) Bruce Burckel Matt George Jack Skinner
More informationSupporting Information for Effects of Thickness on the Metal-Insulator Transition in Free-Standing Vanadium Dioxide Nanocrystals
Supporting Information for Effects of Thickness on the Metal-Insulator Transition in Free-Standing Vanadium Dioxide Nanocrystals Mustafa M. Fadlelmula 1,2, Engin C. Sürmeli 1,2, Mehdi Ramezani 1,2, T.
More informationNanotechnology & UIC (Engineering & Science)
Nanotechnology & Nanobiotechnology @ UIC (Engineering & Science) by G.Ali Mansoori, PhD mansoori@uic.edu BioEngineering, Chemical Engineering & Physics Departments at Livingston Nanotechnology Conference
More informationFabrication and STM Nanostructuring of tetrahedral amorphous Carbon. Teja Roch
Fabrication and STM Nanostructuring of tetrahedral amorphous Carbon Teja Roch Fabrication and STM Nanostructuring of tetrahedral amorphous Carbon (ta-c) Content: Who are we? What are we doing? Why are
More informationRemote Access Laboratory Guide
Remote Access Laboratory Guide Electrodeposition of Nickel Nanowires In this exercise, you will: Understand the process of electroplating and its use at the nanoscale. Describe the function of a template
More informationLithography Independent Fabrication of Nano-MOS-Transistors with W = 25 nm and L = 25 nm
Lithography Independent Fabrication of Nano-MOS-Transistors with W = 25 nm and L = 25 nm J. T. Horstmann John_Horstmann@ieee.org C. Horst Christian.Horst@udo.edu K. F. Goser goser@ieee.org Abstract The
More informationDesign, Fabrication, Optimization and Verification of FePt based Bit Patterned Media
Design, Fabrication, Optimization and Verification of FePt based Bit Patterned Media Jian-Ping Wang, Professor MINT Center & Electrical and Computer Engineering Department, Graduate Faculty of Chemical
More informationDPN 5000 System. Figure 1: The DPN 5000 System. Page 1 of 5. Created on 9/9/2011 Revision
Introduction NanoInk s is a dedicated, versatile instrument capable of nanopatterning a variety of materials with nanoscale accuracy and precision. With NanoInk s proprietary MEMs devices and deposition
More informationThe Hummer VI. Brian Thomas Lithography. October 29, Hummer VI THE UNIVERSITY OF TEXAS AT DALLAS ERIK JOHNSON SCHOOL OF ENGINEERING
The Hummer VI Brian Thomas Lithography October 29, 2003 Hummer VI THE UNIVERSITY OF TEXAS AT DALLAS ERIK JOHNSON SCHOOL OF ENGINEERING DOCUMENT NUMBER: FA2003-LI-006 EDITION: 1.0 PAGE: 1 of 6 The Hummer
More informationMetrology at the Nanoscale What are the Grand Challenges?
Metrology at the Nanoscale What are the Grand Challenges? Research Challenges for Nanomanufacturing Systems February 11-12, 2008 National Science Foundation Arlington, VA Kevin W. Lyons Manufacturing Engineering
More informationAccommodation of Characterization Tools
Accommodation of Characterization Tools Understanding Vibration, Stray Electromagnetic Fields and Acoustics to Avoid Catastrophic Interferences in New Building Construction or Building Renovation Presented
More informationFabrication Process. Crystal Growth Doping Deposition Patterning Lithography Oxidation Ion Implementation CONCORDIA VLSI DESIGN LAB
Fabrication Process Crystal Growth Doping Deposition Patterning Lithography Oxidation Ion Implementation 1 Fabrication- CMOS Process Starting Material Preparation 1. Produce Metallurgical Grade Silicon
More informationInnovation Collaboration Research Excellence
Innovation Collaboration Research Excellence The Australian Institute for Innovative Materials is a purpose-built facility helping to advance materials research, innovation and application. Innovative
More informationSpecimen configuration
APPLICATIONNOTE Model 1040 NanoMill TEM specimen preparation system Specimen configuration Preparing focused ion beam (FIB) milled specimens for submission to Fischione Instruments. The Model 1040 NanoMill
More informationENMAT101A Engineering Materials and Processes Associate Degree of Applied Engineering (Renewable Energy Technologies) Lecture 10 Practical Microscopy
ENMAT101A Engineering Materials and Processes Associate Degree of Applied Engineering (Renewable Energy Technologies) Lecture 10 Practical Microscopy Silicon atoms www.highered.tafensw.edu.au Metallographic
More informationFabrication of Micro and Nano Structures in Glass using Ultrafast Lasers
Fabrication of Micro and Nano Structures in Glass using Ultrafast Lasers Denise M. Krol University of California, Davis IMI Glass Workshop Washington DC April 15-17, 2007 Femtosecond laser modification
More informationSTM Characterization of MoS 2 films
Center for the Computational Design of Functional Layered Materials STM Characterization of MoS 2 films Maria Iavarone Physics Department, Temple University EFRC Annual Meeting May 12-13,2016 STM -Iavarone
More informationBiomaterials in Medical device design
Biomaterials in Medical device design 1 Dr Joseph Buhagiar B. E n g ( H o n s. ) P h D ( B h a m ) D e p a r t m e n t o f M e t a l l u r g y a n d M a t e r i a l s E n g i n e e r i n g U n i v e r
More informationSynthesis of Nanostructures by Electrochemical Processing
Synthesis of Nanostructures by Electrochemical Processing Giovanni Zangari, Robert M. Metzger, Bill Butler University of Alabama at Tuscaloosa The work presented was partly sponsored through DOD grant
More informationSingle-digit-resolution nanopatterning with. extreme ultraviolet light for the 2.5 nm. technology node and beyond
Electronic Supplementary Material (ESI) for Nanoscale. This journal is The Royal Society of Chemistry 205 Supplementary Information for: Single-digit-resolution nanopatterning with extreme ultraviolet
More informationNano Summit: Bringing Academia and Industry Together
Nano Summit: Bringing Academia and Industry Together A strong partnership with industry is one of the pillars that lead to a successful and strong emerging technology program Center for Nanotechnology
More informationLIFT-OFF TECHNIQUE USING DIFFERENT E-BEAM WRITERS. Jana CHLUMSKÁ, Vladimír KOLAŘÍK, Stanislav KRÁTKÝ, Milan MATĚJKA, Michal URBÁNEK, Miroslav HORÁČEK
LIFT-OFF TECHNIQUE USING DIFFERENT E-BEAM WRITERS Jana CHLUMSKÁ, Vladimír KOLAŘÍK, Stanislav KRÁTKÝ, Milan MATĚJKA, Michal URBÁNEK, Miroslav HORÁČEK Institute of Scientific Instruments of the ASCR, v.
More informationSo What Is Nanotechnology
So What Is Nanotechnology Science of Technology 2011 Project Lead The Way, Inc. What Is Nanotechnology? Nanotechnology allows the manipulation of atoms or molecules to create or modify materials at the
More informationIn operandi observation of dynamic annealing: a case. Supplementary Material
In operandi observation of dynamic annealing: a case study of boron in germanium nanowire devices Supplementary Material Maria M. Koleśnik-Gray, 1,3,4 Christian Sorger, 1 Subhajit Biswas, 2,3 Justin D.
More informationNanoLund 2020 STRATEGIC PLAN FOR THE CENTER FOR NANOSCIENCE LUND UNIVERSITY
NanoLund 2020 STRATEGIC PLAN FOR THE CENTER FOR NANOSCIENCE LUND UNIVERSITY 2016 2020 Vision To be a world-leading research center that uses the unique opportunities offered by nanoscience and nanotechnology
More informationDevelopment of multilayerbased x-ray optics for FEL and synchrotron applications
Development of multilayerbased x-ray optics for FEL and synchrotron applications Saša Bajt Photon Sciences, DESY, Hamburg Instrumentation seminar, March 2, 2012 X-ray sources have developed at a staggering
More informationIntroduction to Nanofabrication: Top Down to Bottom Up
Welcome to NACK s Webinar Introduction to Nanofabrication: Top Down to Bottom Up NACK is an NSF-funded ATE Resource Center supporting faculty in Nanotechnology Education Hosted by MATEC Networks www.matecnetworks.org
More informationSolutions with Light. Energy and environment, Information and communication, Healthcare and medical technology, Safety and mobility.
Fraunhofer Institute for Applied Optics and Precision Engineering Solutions with Light EXPERTISE in Optical system technology 2 Solutions with Light The Fraunhofer IOF conducts application oriented research
More informationFabrication of Highly Ordered Al 2 O 3 Nanohole Arrays As a Nanostructured Template
Fabrication of Highly Ordered Al 2 O 3 Nanohole Arrays As a Nanostructured Template Jie Gong, Bill Butler and Giovanni Zangari Materials Science Program University of Alabama at Tuscaloosa This work was
More informationNanotechnology Activities in Korea
Nanotechnology Activities in Korea Hee-Gook Lee President LG Electronics, Inc. CONTENTS I. National Programs Industry Academia NTRA II. Summaries Overview of Korean Approach Korean environments and the
More information