3D Vertical RRAM. Henry (Hong-Yu) Chen, H.-S. Philip Wong Stanford University, CA, USA Collaborator: Peking University, China
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1 3D Vertical RRAM Henry (Hong-Yu) Chen, H.-S. Philip Wong Stanford University, CA, USA Collaborator: Peking University, China Santa Clara, CA 1
2 What is RRAM? 0 : High Resistance State (HRS) 1 : Low Resistance State (LRS) HRS LRS: SET LRS HRS: RESET Santa Clara, CA 2
3 Why 3D Architecture in RRAM? RRAM has showed excellent single-cell performance. FLASH RRAM cell area (F 2 ) <4 if 3D <4 if 3D multi-bit 3 3 scalability <20nm <10nm voltage >20V <3V speed ~10µs <10ns energy/bit ~100pJ ~0.1pJ endurance <1E5 1E6-1E12 retention >10years >10years?? A technology path toward 3D integration is needed in RRAM. 3D NAND by Samsung, VLSIT, D NAND by Toshiba, VLSIT, 2009 Santa Clara, CA 3
4 Bit-Cost Effective 3D Integration Horizontal RRAM Estimated Cost Horizontal RRAM V.S. DPT : Double Patterning Technology I. G. Baek, et al., IEDM, 2011 (Samsung) Vertical RRAM Santa Clara, CA 4
5 Various 3D VRRAM Architectures I. G. Baek, et al., IEDM, 2009 & 2011(Samsung) W.-C. Chien, et al., VLSI, 2012(Macronix) L. Zhang, et al., IMW, 2013(IMEC) Santa Clara, CA 5
6 Recent Advances in Demonstration 1. Samsung [ I. G. Baek, et al., IEDM, 2011 ] TiN/TaOx/barrier/TiN Size: 30nm in width Switching Voltage:~3/-4V Reset Current: ~80 µa Endurance: 100 Cycles 2. Macronix [ W.-C. Chien, et al., VLSI, 2012 ] W/WOx/SP-TiN/TiN Size: 10nmx100nm Speed: ~50ns Reset Current: ~200 µa Switching Voltage:~3/-2.5V Good read immunity Endurance: 600 Cycles(T) Endurance: 300 Cycles(B) Santa Clara, CA 6
7 Outline 3D Vertical RRAM Demonstration Key Issues for 3D Memory Array Summary Santa Clara, CA 7
8 Outline 3D Vertical RRAM Demonstration Key Issues for 3D Memory Array Summary Santa Clara, CA 8
9 3D Cross-Point Using Metal Planes H.-Y. Chen, et al., IEDM, 2012 (Stanford) Santa Clara, CA 9
10 3D Cross-Point Using Metal Planes Each Vertical RRAM Cell is randomly accessible in the array! Vertical Transistor H.-Y. Chen, et al., IEDM, 2012 (Stanford) Santa Clara, CA 10
11 3D VRRAM: Write/Read Scheme Write Scheme Read Scheme 1. Vw applied to the selected cell s WL 2. Vw/2 applied to unselected cells WL ( to avoid unintentional writing) 3. SL of the selected cell s pillar turned on 4. BL of the selected cell s pillar ground 1. Vr applied to the selected cells WL 2. SL that controls the selected cells turned on 3. The data of a row of cells read out by the sense amplifier (S/A) Santa Clara, CA 11 H.-Y. Chen, et al., IEDM, 2012 (Stanford)
12 Device Fabrication and Performance voltage <3.5V current ~50 µa speed ~100 ns R on /R off 100kΩ/10MΩ endurance >1E8 retention >28h@125C H.-Y. Chen, et al., IEDM, 2012 (Stanford) S. Yu, H.-Y. Chen, et al., VLSIT, 2013 (Stanford) Santa Clara, CA 12
13 Metal Electrode Scaling H.-Y. Chen, et al., under review (Stanford) S. Yu, H.-Y. Chen, et al., VLSIT, 2013 (Stanford) Metal electrode scaled to 5 nm is feasible. => Improve integration density Santa Clara, CA 13
14 Demonstration of Array Operation Read D1&D2 Read D3&D4 V1 V2 V3 V ~1V ~1V SET D1 0 Float -4V -2V RESET D1 0 Float +4V +2V V/2 write scheme S. Yu, H.-Y. Chen, et al., VLSIT, 2013 (Stanford) Santa Clara, CA 14
15 Outline 3D Vertical RRAM Demonstration Key Issues for 3D Memory Array Summary Santa Clara, CA 15
16 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies IMEC VRRAM_1 Stanford VRRAM_2 HRRAM 2.5D Santa Clara, CA 16
17 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies Sneak current Reading current Sneak path causes read disturbance problem and increases the power consumption. Santa Clara, CA 17
18 Challenges for 3D Memory Array Sufficient on/off ratio requirement Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies High current density requirement Ex. (>10MA/cm 2 ) Polarity requirement High endurance requirement Scalability requirement 3D low temperature fabrication requirement Santa Clara, CA 18
19 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies Parasitic capacitance causes RC delay. Santa Clara, CA 19
20 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies ~ 4 orders of magnitudes increase in R j at scaled wire dimensions. J. Liang, et al. IMW 2012, p. 61. Santa Clara, CA 20
21 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies The thinner the electrode, the more resistive plane electrode =>Higher switching voltages H.-Y. Chen, et al., under review (Stanford) Santa Clara, CA 21
22 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies Complicated wire routing Increased circuit overhead Santa Clara, CA 22
23 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Etching AR ~ 30 Fabrication technologies R. Katsumata, et al. VLSI 2009, p Etching capability CMOS-friendly material Santa Clara, CA 23
24 Challenges for 3D Memory Array Sneak path leakage Selection Device Parasitic capacitance Line resistance Plane resistance Interconnection Fabrication technologies All the 3D array designs face the similar challenges with the different degree of influence. IMEC VRRAM_1 Stanford VRRAM_2 HRRAM 2.5D Santa Clara, CA 24
25 Summary 3D vertical RRAM cross-point array is promising for next generation mass storage due to the effective bit cost. A comprehensive understanding for the particular VRRAM array is reported in this talk: (1) memory architecture design (2) read/write schemes (3) device fabrication, scaling, and characterization (4) array operation demonstration Key issues for developing 3D memory array were discussed. Santa Clara, CA 25
26 Acknowledgement Stanford Non-Volatile Memory Technology Research Initiative (NMTRI) member companies 973 Program (2011CBA00602), China Stanford Nanofabrication Facility (SNF), a member of the NSF-supported National Nanotechnology Infrastructure Network (NNIN) H.-Y. Chen is additionally supported by Intel Fellowship Taiwanese Government Scholarships to Study Abroad IEEE Electron Devices Society PhD Student Fellowship Santa Clara, CA 26
27 Summary 3D vertical RRAM cross-point array is promising for next generation mass storage due to the effective bit cost. A comprehensive understanding for the particular VRRAM array is reported in this talk: (1) memory architecture design (2) read/write schemes (3) device fabrication, scaling, and characterization (4) array operation demonstration Key issues for developing 3D memory array were discussed. Santa Clara, CA 27
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