A New X-Ray CD-Metrology for Nanostructure BPM Patterns

Transcription

1 A New X-Ray CD-Metrology for Nanostructure BPM Patterns Asao Nakano VP, X-ray Research Lab. September 10, 2010 Contributors: Dr.Kazuhiko Omote Dr.Yoshiyasu Ito

2 Rigaku Who? Worldwide Largest X-ray Scientific Instrument Company REHQ BerlinX-ray Diffractometer RITE Protain Crystallography Beijing Shanghai RC Tokyo Yamanashi Osaka SSI RAC General Purpose XRF SmartLab XtaLABmini Supermini RIT NSI XRF Disc Analyzer Metal Contamination HQ, Fab : Subsidary : Distrubuter : USAsales : µxrr/µxrf Inline Monitor 3650 TXRFV300 MFM65

3 Agenda 1.Market Outlook and Background 2.Why X-ray diffraction method for inspection? 3.Grazing Incidence X-ray diffraction 4.Example of Grating measurement 5.Example of DTR measurement 6.Simulation of BPM measurement 7.Summery

4 Market Outlook: HDD shipment is projected a healthy increase by the PC & external storage demands Mobile applications will overtake Desktop Cloud and External storage in the home will coexist 250 PB shipped (K) Mobile-HDD Desktop-HDD PC-SSD Year PB shipped (K) Enterprise-HDD Personal Storage Consumer Electronics HDD HDD Year Source: IDC2010,2009

5 Data Flash Density Trend 1000 Next NAND Flash Technology (22nm) Density(Gb) (40nm) (32nm) (27nm) 40nm 50nm Multi-Chip TSV Thickness:20µm Die Stacked:32 (Samsung) Year Source: Forward Insights 60nm 8 layers Prototype NAND Flash Memory Stack

6 10,000 Technology and Historical Areal Density Trend Areal Density(Gb/in 2 ) MR Head Thin Film Media PRML Channel etc. 60%CGR 90%CGR GMR Head MEPRML Channel etc. AFC LMR TMR Head 25%CGR 50%CGR PMR TFC etc %CGR Advanced PMR DTR BPR TAR CPP GMR Year (Product Available :Mobile) Source:Diskcon-Japan 2010 (HGST)

7 New Technology for Higher Density Recording Magnetic Head Thermally Assisted Recording (TAR) Media Discrete Track Media (DTM) Microwave Assisted Magnetic Recording (MAMR) Bit Patterned Media (BPM) Shingled Magnetic Recording (SMR) Combination of TAR and BPM is expected to the high density recording of >10Tb/in 2 Source: Diskcon-Japan 2010 (Hitachi)

8 Low cost patterned media production by duplication DTM & BPM production Master X10,000? Template X10,000? Products Nano structures of the Master and Template should be observed precisely, because finally 100,000,000 of products are duplicated from the Master. The duplication process from the template to the products is assumed to checked at least once by the inspection tool.

9 The Metrology for the DTM & BPM inspection Why X-ray diffraction method for inspection? The possibility to measure < 10nm without standard Non-destructive/non-contact precise inspection Resist pattern measurement is possible without damage Weak point?

10 GI configuration of X-ray Diffraction Measurement

11 X-ray Diffraction Intensity Evaluation-1

12 X-ray Diffraction Intensity Evaluation-2

13 Parameters determinable by X-ray Diffraction Measurement

14 Simulation of X-ray Diffraction Intensity Distributions-1

15 Simulation of X-ray Diffraction Intensity Distributions-2

16 Actual Tool for X-ray Profile Metrology-1

17 Actual Tool for X-ray Profile Metrology-2 Application Line and Space profile measurement of resist, Si or 6025 Quartz Performance Less than 64nm Half Pitch Less than 150nm height Measurement area 2-3mm(X) by 1mm(Y) Precision <1nm (3 sigma) Measuring time 100 sec/point

18 Measurement of Standard SiO 2 Grating for CD-SEM

19 Least Square Fitting of the Grating Profile Parameters-1

20 Least Square Fitting of the Grating Profile Parameters-2

21 Least Square Fitting of the Grating Profile Parameters-3

22 X-ray intensity simulation for metal covered structure Metal: Ti

23 Application for DTM Profile Measurement

24 X-ray Diffraction Measurement of DTR Resist Pattern Sample was provided by Hitachi

25 Measured DTM Profiles by X-ray Profilometry The tool uncertainty(3σ) is simulated as <0.2nm, beyond ITRS2019

26 X-ray Diffraction Measurement of BPM Pattern Sample rotation are needed around the reciprocal axis Average spacing Fluctuation of the spacing

27 Simulation of X-ray Diffraction Intensity Distributions from BPM shapes X-ray profilometry can measure the parameters like DTR pattern profiles L T L T H L B =20nm L T =20nm H =40nm H L B =20nm L T =16nm H =40nm L B L B Q Z / nm Q Z / nm Q Y / nm -1 Q Y / nm

28 Summary 1. Non-Destructive X-ray profile measurement method is available for BPM. 2. The X-ray Profilometry tool exhibit the ability of CD measurement with 0.2 nm(3σ) accuracy. This is beyond ITRS X-ray Profilometry dose not needs standard because X-ray wave length is determined in the 8 digits. 4. Resist pattern is measured without damage comparing to electron beam measurement method (SEM). 5. Measurement time is currently 100seconds for 1 point.

29 Thank You!